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DE69222382D1 - Verfahren und Vorrichtung zur Messung von Lageabweichungen - Google Patents

Verfahren und Vorrichtung zur Messung von Lageabweichungen

Info

Publication number
DE69222382D1
DE69222382D1 DE69222382T DE69222382T DE69222382D1 DE 69222382 D1 DE69222382 D1 DE 69222382D1 DE 69222382 T DE69222382 T DE 69222382T DE 69222382 T DE69222382 T DE 69222382T DE 69222382 D1 DE69222382 D1 DE 69222382D1
Authority
DE
Germany
Prior art keywords
measuring position
position deviations
deviations
measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69222382T
Other languages
English (en)
Other versions
DE69222382T2 (de
Inventor
Moriyuki Nose
Kenji Saitoh
Hiroshi Osawa
Masanobu Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69222382D1 publication Critical patent/DE69222382D1/de
Application granted granted Critical
Publication of DE69222382T2 publication Critical patent/DE69222382T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electron Beam Exposure (AREA)
DE69222382T 1991-08-05 1992-07-31 Verfahren und Vorrichtung zur Messung von Lageabweichungen Expired - Fee Related DE69222382T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3219241A JPH0540013A (ja) 1991-08-05 1991-08-05 ずれ測定方法及びこの方法を用いた露光装置

Publications (2)

Publication Number Publication Date
DE69222382D1 true DE69222382D1 (de) 1997-10-30
DE69222382T2 DE69222382T2 (de) 1998-02-05

Family

ID=16732430

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69222382T Expired - Fee Related DE69222382T2 (de) 1991-08-05 1992-07-31 Verfahren und Vorrichtung zur Messung von Lageabweichungen

Country Status (5)

Country Link
US (1) US5313272A (de)
EP (1) EP0527018B1 (de)
JP (1) JPH0540013A (de)
CA (1) CA2075253C (de)
DE (1) DE69222382T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5495336A (en) * 1992-02-04 1996-02-27 Canon Kabushiki Kaisha Position detecting method for detecting a positional relationship between a first object and a second object
US5615006A (en) * 1992-10-02 1997-03-25 Nikon Corporation Imaging characteristic and asymetric abrerration measurement of projection optical system
JPH0786121A (ja) * 1993-06-30 1995-03-31 Canon Inc ずれ測定方法及びそれを用いた位置検出装置
JPH0743313A (ja) * 1993-07-29 1995-02-14 Canon Inc 異物検査装置及びそれを用いた半導体デバイスの 製造方法
JP3428705B2 (ja) * 1993-10-20 2003-07-22 キヤノン株式会社 位置検出装置及びそれを用いた半導体素子の製造方法
US5625453A (en) * 1993-10-26 1997-04-29 Canon Kabushiki Kaisha System and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction grating
DE69428327T2 (de) * 1993-10-29 2002-07-04 Canon K.K., Tokio/Tokyo Verfahren und System zur Detektion einer Winkelabweichung unter Verwendung eines periodischen Musters
JP3368017B2 (ja) * 1993-10-29 2003-01-20 キヤノン株式会社 位置検出装置及びそれを用いた半導体素子の製造方法
JPH07135168A (ja) * 1993-11-11 1995-05-23 Canon Inc アライメント方法及びそれを用いた位置検出装置
JPH0886612A (ja) * 1994-09-19 1996-04-02 Canon Inc 光ヘテロダイン干渉を利用した位置ずれ検出装置
JP3517504B2 (ja) * 1995-12-15 2004-04-12 キヤノン株式会社 位置検出装置及びそれを用いたデバイスの製造方法
JPH1022213A (ja) * 1996-06-28 1998-01-23 Canon Inc 位置検出装置及びそれを用いたデバイスの製造方法
JP4136067B2 (ja) * 1997-05-02 2008-08-20 キヤノン株式会社 検出装置及びそれを用いた露光装置
JP4109736B2 (ja) * 1997-11-14 2008-07-02 キヤノン株式会社 位置ずれ検出方法
JPH11241908A (ja) 1997-12-03 1999-09-07 Canon Inc 位置検出装置及びそれを用いたデバイスの製造方法
JPH11265847A (ja) 1998-01-16 1999-09-28 Canon Inc 位置検出方法及び位置検出装置
KR100464854B1 (ko) * 2002-06-26 2005-01-06 삼성전자주식회사 반도체 기판의 정렬 방법 및 정렬 장치
JP2005159213A (ja) * 2003-11-28 2005-06-16 Canon Inc シアリング干渉を利用した測定方法及び装置、それを利用した露光方法及び装置、並びに、デバイス製造方法
JP5369588B2 (ja) * 2008-10-01 2013-12-18 株式会社ニコン 接合評価方法、接合評価装置、基板貼り合わせ装置、評価ゲージおよび積層型半導体装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4623257A (en) * 1984-12-28 1986-11-18 At&T Bell Laboratories Alignment marks for fine-line device fabrication
JP2622573B2 (ja) * 1988-01-27 1997-06-18 キヤノン株式会社 マーク検知装置及び方法
JP2546350B2 (ja) * 1988-09-09 1996-10-23 キヤノン株式会社 位置合わせ装置
JP2734004B2 (ja) * 1988-09-30 1998-03-30 キヤノン株式会社 位置合わせ装置
JP2704002B2 (ja) * 1989-07-18 1998-01-26 キヤノン株式会社 位置検出方法
EP0411966B1 (de) * 1989-08-04 1994-11-02 Canon Kabushiki Kaisha Verfahren und Vorrichtung zur Positionsbestimmung
JP2829642B2 (ja) * 1989-09-29 1998-11-25 キヤノン株式会社 露光装置
US5216257A (en) * 1990-07-09 1993-06-01 Brueck Steven R J Method and apparatus for alignment and overlay of submicron lithographic features

Also Published As

Publication number Publication date
JPH0540013A (ja) 1993-02-19
EP0527018B1 (de) 1997-09-24
CA2075253A1 (en) 1993-02-06
US5313272A (en) 1994-05-17
CA2075253C (en) 1999-08-24
EP0527018A1 (de) 1993-02-10
DE69222382T2 (de) 1998-02-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee