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DE69114188D1 - Vorrichtung zur optischen Ausrichtungserfassung. - Google Patents

Vorrichtung zur optischen Ausrichtungserfassung.

Info

Publication number
DE69114188D1
DE69114188D1 DE69114188T DE69114188T DE69114188D1 DE 69114188 D1 DE69114188 D1 DE 69114188D1 DE 69114188 T DE69114188 T DE 69114188T DE 69114188 T DE69114188 T DE 69114188T DE 69114188 D1 DE69114188 D1 DE 69114188D1
Authority
DE
Germany
Prior art keywords
detection device
optical alignment
alignment detection
optical
detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69114188T
Other languages
English (en)
Other versions
DE69114188T2 (de
Inventor
Toshiyuki Iwazawa
Masaki Yamamoto
Yoshito Nakanishi
Takeo Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69114188D1 publication Critical patent/DE69114188D1/de
Publication of DE69114188T2 publication Critical patent/DE69114188T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69114188T 1990-06-22 1991-06-21 Vorrichtung zur optischen Ausrichtungserfassung. Expired - Fee Related DE69114188T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2164717A JP2890701B2 (ja) 1990-06-22 1990-06-22 位置合わせ検出装置

Publications (2)

Publication Number Publication Date
DE69114188D1 true DE69114188D1 (de) 1995-12-07
DE69114188T2 DE69114188T2 (de) 1996-04-18

Family

ID=15798553

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69114188T Expired - Fee Related DE69114188T2 (de) 1990-06-22 1991-06-21 Vorrichtung zur optischen Ausrichtungserfassung.

Country Status (4)

Country Link
US (1) US5155557A (de)
EP (1) EP0463587B1 (de)
JP (1) JP2890701B2 (de)
DE (1) DE69114188T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5241214A (en) * 1991-04-29 1993-08-31 Massachusetts Institute Of Technology Oxides and nitrides of metastabale group iv alloys and nitrides of group iv elements and semiconductor devices formed thereof
JPH08111372A (ja) * 1994-10-07 1996-04-30 Nikon Corp 露光装置
JP4307482B2 (ja) * 2006-12-19 2009-08-05 キヤノン株式会社 位置計測装置、露光装置、およびデバイス製造方法
KR101211698B1 (ko) * 2009-02-02 2013-05-23 한국과학기술원 시선 결합장치
JP5842652B2 (ja) * 2012-02-08 2016-01-13 株式会社島津製作所 波長可変単色光光源

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3943359A (en) * 1973-06-15 1976-03-09 Hitachi, Ltd. Apparatus for relatively positioning a plurality of objects by the use of a scanning optoelectric microscope
US4512000A (en) * 1980-12-23 1985-04-16 Tokyo Shibaura Denki Kabushiki Kaisha Object detector which compares returned signals from successive transmissions
JPS5854648A (ja) * 1981-09-28 1983-03-31 Nippon Kogaku Kk <Nikon> 位置合わせ装置
US4814829A (en) * 1986-06-12 1989-03-21 Canon Kabushiki Kaisha Projection exposure apparatus
US4780616A (en) * 1986-09-25 1988-10-25 Nippon Kogaku K. K. Projection optical apparatus for mask to substrate alignment
JP2648765B2 (ja) * 1988-04-30 1997-09-03 チノン株式会社 光電スイッチの受光信号回路

Also Published As

Publication number Publication date
DE69114188T2 (de) 1996-04-18
EP0463587A1 (de) 1992-01-02
EP0463587B1 (de) 1995-11-02
US5155557A (en) 1992-10-13
JPH0461112A (ja) 1992-02-27
JP2890701B2 (ja) 1999-05-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee