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DE69109416D1 - Verminderung oder Beseitigung der von der Wasserstoff-Ausgabe verursachten Filmsmangeln während der kathodischen Elektrotauchlackierung. - Google Patents

Verminderung oder Beseitigung der von der Wasserstoff-Ausgabe verursachten Filmsmangeln während der kathodischen Elektrotauchlackierung.

Info

Publication number
DE69109416D1
DE69109416D1 DE69109416T DE69109416T DE69109416D1 DE 69109416 D1 DE69109416 D1 DE 69109416D1 DE 69109416 T DE69109416 T DE 69109416T DE 69109416 T DE69109416 T DE 69109416T DE 69109416 D1 DE69109416 D1 DE 69109416D1
Authority
DE
Germany
Prior art keywords
elimination
reduction
output during
hydrogen output
cathodic electrodeposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69109416T
Other languages
English (en)
Other versions
DE69109416T2 (de
Inventor
Mark Robert Winkle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Co
Original Assignee
Rohm and Haas Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Co filed Critical Rohm and Haas Co
Application granted granted Critical
Publication of DE69109416D1 publication Critical patent/DE69109416D1/de
Publication of DE69109416T2 publication Critical patent/DE69109416T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/44Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/44Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
    • C09D5/4488Cathodic paints
    • C09D5/4492Cathodic paints containing special additives, e.g. grinding agents
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Molecular Biology (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Paints Or Removers (AREA)
  • Prevention Of Electric Corrosion (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Basic Packing Technique (AREA)
  • Physical Vapour Deposition (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Magnetic Heads (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Medicines Containing Plant Substances (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69109416T 1990-09-20 1991-08-06 Verminderung oder Beseitigung der von der Wasserstoff-Ausgabe verursachten Filmsmangeln während der kathodischen Elektrotauchlackierung. Expired - Fee Related DE69109416T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/585,428 US5066374A (en) 1990-09-20 1990-09-20 Elimination of film defects due to hydrogen evolution during cathodic electrodeposition

Publications (2)

Publication Number Publication Date
DE69109416D1 true DE69109416D1 (de) 1995-06-08
DE69109416T2 DE69109416T2 (de) 1996-01-04

Family

ID=24341393

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69109416T Expired - Fee Related DE69109416T2 (de) 1990-09-20 1991-08-06 Verminderung oder Beseitigung der von der Wasserstoff-Ausgabe verursachten Filmsmangeln während der kathodischen Elektrotauchlackierung.

Country Status (20)

Country Link
US (1) US5066374A (de)
EP (1) EP0476821B1 (de)
JP (1) JPH04246426A (de)
KR (1) KR920006387A (de)
CN (1) CN1061787A (de)
AT (1) ATE122083T1 (de)
AU (1) AU8249491A (de)
BR (1) BR9103276A (de)
CA (1) CA2047552A1 (de)
CS (1) CS245691A3 (de)
DE (1) DE69109416T2 (de)
FI (1) FI913748L (de)
HU (1) HUT60333A (de)
IE (1) IE912796A1 (de)
IL (1) IL99171A0 (de)
MX (1) MX9101156A (de)
MY (1) MY106521A (de)
NO (1) NO913101L (de)
PL (1) PL291368A1 (de)
ZA (1) ZA916337B (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5266731A (en) * 1991-07-17 1993-11-30 Reilly Industries Electrocatalytic hydrogenations of nitriles to amines
DE19958487C1 (de) * 1999-12-04 2001-02-15 Dupont Performance Coatings Verfahren zur Elektrotauchlackierung und Verwendung von wasserunlöslichen organischen Nitriten und/oder Nitraten als Zusatz zu Elektrotauchlack-Überzugmitteln
GB2418927B (en) * 2003-09-11 2008-04-30 Nippon Paint Co Ltd Method of forming a cationic electrodeposition film forming an electric through hole and an electric through hole-forming cationic electrocoating composition
EP2721101B1 (de) * 2011-06-17 2020-10-14 Henkel AG & Co. KGaA Selbstabscheidende einzelbadbeschichtung für metallkombinationssubstrate und verfahren dafür
WO2017112880A1 (en) * 2015-12-22 2017-06-29 William Marsh Rice University Formation of porous silicon materials with copper-containing pores

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4108817A (en) * 1976-12-30 1978-08-22 Amchem Products, Inc. Autodeposited coatings
JPS5669836A (en) * 1979-11-13 1981-06-11 Toshiba Corp Method for coating glass on semiconductor element
US4877818A (en) * 1984-09-26 1989-10-31 Rohm And Haas Company Electrophoretically depositable photosensitive polymer composition
US4592816A (en) * 1984-09-26 1986-06-03 Rohm And Haas Company Electrophoretic deposition process

Also Published As

Publication number Publication date
KR920006387A (ko) 1992-04-27
PL291368A1 (en) 1992-09-07
CN1061787A (zh) 1992-06-10
FI913748A7 (fi) 1992-03-21
CA2047552A1 (en) 1992-03-21
US5066374A (en) 1991-11-19
ATE122083T1 (de) 1995-05-15
DE69109416T2 (de) 1996-01-04
FI913748A0 (fi) 1991-08-07
JPH04246426A (ja) 1992-09-02
NO913101D0 (no) 1991-08-09
AU8249491A (en) 1992-03-26
BR9103276A (pt) 1992-05-26
MX9101156A (es) 1992-04-01
EP0476821A3 (en) 1992-11-04
IE912796A1 (en) 1992-02-25
MY106521A (en) 1995-06-30
FI913748L (fi) 1992-03-21
CS245691A3 (en) 1992-04-15
IL99171A0 (en) 1992-07-15
HU912660D0 (en) 1992-01-28
EP0476821B1 (de) 1995-05-03
NO913101L (no) 1992-03-23
ZA916337B (en) 1992-05-27
HUT60333A (en) 1992-08-28
EP0476821A2 (de) 1992-03-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee