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DE69024100D1 - Verfahren und Vorrichtung zur Aufrechterhaltung der gewünschten Belichtungswerte - Google Patents

Verfahren und Vorrichtung zur Aufrechterhaltung der gewünschten Belichtungswerte

Info

Publication number
DE69024100D1
DE69024100D1 DE69024100T DE69024100T DE69024100D1 DE 69024100 D1 DE69024100 D1 DE 69024100D1 DE 69024100 T DE69024100 T DE 69024100T DE 69024100 T DE69024100 T DE 69024100T DE 69024100 D1 DE69024100 D1 DE 69024100D1
Authority
DE
Germany
Prior art keywords
maintaining
exposure values
desired exposure
values
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69024100T
Other languages
English (en)
Other versions
DE69024100T2 (de
Inventor
Eustathios Vassiliou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke DSM NV
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of DE69024100D1 publication Critical patent/DE69024100D1/de
Application granted granted Critical
Publication of DE69024100T2 publication Critical patent/DE69024100T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70416—2.5D lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/156—Precursor compound
    • Y10S430/16—Blocked developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mechanical Optical Scanning Systems (AREA)
DE69024100T 1989-05-31 1990-05-29 Verfahren und Vorrichtung zur Aufrechterhaltung der gewünschten Belichtungswerte Expired - Fee Related DE69024100T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/359,806 US4987044A (en) 1989-05-31 1989-05-31 Method and apparatus for maintaining desired exposure levels

Publications (2)

Publication Number Publication Date
DE69024100D1 true DE69024100D1 (de) 1996-01-25
DE69024100T2 DE69024100T2 (de) 1996-05-30

Family

ID=23415358

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69024100T Expired - Fee Related DE69024100T2 (de) 1989-05-31 1990-05-29 Verfahren und Vorrichtung zur Aufrechterhaltung der gewünschten Belichtungswerte

Country Status (8)

Country Link
US (1) US4987044A (de)
EP (1) EP0400578B1 (de)
JP (1) JPH03197951A (de)
KR (1) KR900018726A (de)
CN (1) CN1047927A (de)
AU (1) AU641162B2 (de)
CA (1) CA2016388A1 (de)
DE (1) DE69024100T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5200230A (en) * 1987-06-29 1993-04-06 Dunfries Investments Limited Laser coating process
US5626919A (en) * 1990-03-01 1997-05-06 E. I. Du Pont De Nemours And Company Solid imaging apparatus and method with coating station
WO1992011577A1 (de) * 1990-12-21 1992-07-09 Eos Gmbh Electro Optical Systems Verfahren und vorrichtung zum herstellen eines dreidimensionalen objekts
US5460758A (en) * 1990-12-21 1995-10-24 Eos Gmbh Electro Optical Systems Method and apparatus for production of a three-dimensional object
KR970011573B1 (ko) * 1993-04-14 1997-07-12 마쯔시다덴기산교 가부시기가이샤 3차원 조형방법
IL108059A (en) * 1993-12-17 1998-02-22 Laser Ind Ltd Method and device for placing a laser beam on a work surface, especially for tissue ablation
JP3882147B2 (ja) * 1995-09-09 2007-02-14 バンティコ リミテッド 選択的に彩色された領域を有するポリマー層を製造する方法
ID19337A (id) * 1996-12-26 1998-07-02 Ajinomoto Kk Film perekat antar-pelapis untuk papan pembuat kabel cetakan berlapis-banyak dan papan kabel cetakan berlapis-banyak memakai film ini
US6479790B1 (en) * 2000-01-31 2002-11-12 General Electric Company Dual laser shock peening
DE10165113B3 (de) * 2000-03-15 2019-11-21 Realizer Gmbh Verfahren und Vorrichtung zur Herstellung eines Formkörpers
US6463872B1 (en) 2000-03-31 2002-10-15 Alcatel Laser photocuring system
DE10051415C2 (de) * 2000-10-17 2003-10-09 Advanced Realtime Tracking Gmb Optisches Trackingsystem und -verfahren
US20050101684A1 (en) * 2003-11-06 2005-05-12 Xiaorong You Curable compositions and rapid prototyping process using the same
US20060144522A1 (en) * 2004-03-17 2006-07-06 Vladislav Sklyarevich Apparatus for laminating glass sheets using short wave radiation
DE102013019180A1 (de) * 2013-11-18 2015-05-21 Cl Schutzrechtsverwaltungs Gmbh Verfahren zum Herstellen eines dreidimensionalen Bauteils durch ein generatives Bauverfahren
WO2019053785A1 (ja) * 2017-09-12 2019-03-21 オリンパス株式会社 レンズユニットの製造方法及びレンズユニット
DE102019212446A1 (de) * 2019-08-20 2021-02-25 Robert Bosch Gmbh Verfahren und Recheneinheit zur Ansteuerung wenigstens einer Antriebseinheit wenigstens einer Ablenkungseinheit einer Mikroscannervorrichtung

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2775758A (en) * 1951-05-25 1956-12-25 Munz Otto John Photo-glyph recording
US3364497A (en) * 1966-05-18 1968-01-16 Eastman Kodak Co Recording of digital data
US4238840A (en) * 1967-07-12 1980-12-09 Formigraphic Engine Corporation Method, medium and apparatus for producing three dimensional figure product
DE2025122C3 (de) * 1969-07-17 1974-07-25 Vianova-Kunstharz Ag, Wien Verfahren zur Härtung von Anstrichstoffen und Überzügen mittels von einem Laser emittierter Infrarot-Strahlung
US4135902A (en) * 1978-03-03 1979-01-23 Western Electric Co., Inc. Method and apparatus for drawing optical fibers
JPS6053854B2 (ja) * 1978-05-17 1985-11-27 株式会社リコー 記録装置
DE2910516C2 (de) * 1979-03-16 1987-01-29 Kirin Beer K.K., Tokio/Tokyo Anordnung zum Feststellen von Fehlern in Flaschen oder dergleichen
JPS57179818A (en) * 1981-04-28 1982-11-05 Hayashibara Takeshi Lissajous' figure generating device
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
FR2582858B1 (fr) * 1985-06-04 1988-11-10 Videocolor Procede et appareil d'illumination de la dalle d'un tube de television en couleurs pour la formation de l'ecran
DD249770A1 (de) * 1986-05-29 1987-09-16 Waescheunion Veb Verfahren zur herstellung von kopiervorlagen fuer gemusterte oberflaechen
US4961154A (en) * 1986-06-03 1990-10-02 Scitex Corporation Ltd. Three dimensional modelling apparatus
US4752498A (en) * 1987-03-02 1988-06-21 Fudim Efrem V Method and apparatus for production of three-dimensional objects by photosolidification
FR2612718B1 (fr) * 1987-03-20 1989-05-26 Thomson Csf Systeme numerique de generation des signaux de commande des circuits multivoies de modulation laser pour projecteur a miroirs oscillants, d'image tramee
GB8802689D0 (en) * 1988-02-05 1988-03-02 Atomic Energy Authority Uk Laser scanning system

Also Published As

Publication number Publication date
CN1047927A (zh) 1990-12-19
EP0400578B1 (de) 1995-12-13
JPH03197951A (ja) 1991-08-29
AU5615090A (en) 1990-12-06
DE69024100T2 (de) 1996-05-30
EP0400578A2 (de) 1990-12-05
CA2016388A1 (en) 1990-11-30
US4987044A (en) 1991-01-22
KR900018726A (ko) 1990-12-22
AU641162B2 (en) 1993-09-16
EP0400578A3 (de) 1991-05-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: DSM N.V., HEERLEN, NL

8339 Ceased/non-payment of the annual fee