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DE69023859D1 - Verfahren und Vorrichtung zur quantitativen Bestimmung von Chemikalien zur Behandlung von Halbleitern. - Google Patents

Verfahren und Vorrichtung zur quantitativen Bestimmung von Chemikalien zur Behandlung von Halbleitern.

Info

Publication number
DE69023859D1
DE69023859D1 DE69023859T DE69023859T DE69023859D1 DE 69023859 D1 DE69023859 D1 DE 69023859D1 DE 69023859 T DE69023859 T DE 69023859T DE 69023859 T DE69023859 T DE 69023859T DE 69023859 D1 DE69023859 D1 DE 69023859D1
Authority
DE
Germany
Prior art keywords
semiconductors
chemicals
treatment
quantitative determination
quantitative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69023859T
Other languages
English (en)
Other versions
DE69023859T2 (de
Inventor
Katsue Koashi
Hiroshi Yokota
Naoki Yanai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kurashiki Spinning Co Ltd
Original Assignee
Kurashiki Spinning Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP23219090A external-priority patent/JP3290982B2/ja
Application filed by Kurashiki Spinning Co Ltd filed Critical Kurashiki Spinning Co Ltd
Application granted granted Critical
Publication of DE69023859D1 publication Critical patent/DE69023859D1/de
Publication of DE69023859T2 publication Critical patent/DE69023859T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/359Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using near infrared light
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3577Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing liquids, e.g. polluted water
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/314Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
    • G01N2021/317Special constructive features
    • G01N2021/3174Filter wheel

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
DE69023859T 1989-09-20 1990-09-18 Verfahren und Vorrichtung zur quantitativen Bestimmung von Chemikalien zur Behandlung von Halbleitern. Expired - Fee Related DE69023859T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP24597789 1989-09-20
JP23219090A JP3290982B2 (ja) 1989-09-20 1990-08-31 半導体処理用無機電解質の定量法

Publications (2)

Publication Number Publication Date
DE69023859D1 true DE69023859D1 (de) 1996-01-11
DE69023859T2 DE69023859T2 (de) 1996-07-25

Family

ID=26530331

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69023859T Expired - Fee Related DE69023859T2 (de) 1989-09-20 1990-09-18 Verfahren und Vorrichtung zur quantitativen Bestimmung von Chemikalien zur Behandlung von Halbleitern.

Country Status (4)

Country Link
US (1) US5097130A (de)
EP (1) EP0418799B1 (de)
CA (1) CA2025766A1 (de)
DE (1) DE69023859T2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5242602A (en) * 1992-03-04 1993-09-07 W. R. Grace & Co.-Conn. Spectrophotometric monitoring of multiple water treatment performance indicators using chemometrics
NZ250956A (en) * 1993-03-03 1995-04-27 Grace W R & Co Monitoring concentrations of water treatment compositions using absorbance or emission spectra
US5438406A (en) * 1993-10-07 1995-08-01 The Titan Corporation Tunable narrowband spectrometer with acousto-optical tunable filter
KR100186272B1 (ko) * 1994-03-25 1999-05-15 츠찌야 히로오 가스의 적외선 분광 분석방법 및 이것에 사용되는 장치
JP2743823B2 (ja) * 1994-03-25 1998-04-22 日本電気株式会社 半導体基板のウエット処理方法
US5444528A (en) * 1994-07-27 1995-08-22 The Titan Corporation Tunable spectrometer with acousto-optical tunable filter
ES2187570T3 (es) * 1994-09-01 2003-06-16 Du Pont Proceso de neutralizacion de acidos en una solucion de polimero.
EP0714024B1 (de) * 1994-11-25 2002-01-30 Kyoto Dai-ichi Kagaku Co., Ltd. Vorrichtung und Verfahren zur Bestimmung von Wasserstoffperoxid
US5892229A (en) * 1996-04-22 1999-04-06 Rosemount Analytical Inc. Method and apparatus for measuring vaporous hydrogen peroxide
US5893046A (en) * 1996-06-24 1999-04-06 Taiwan Seimconductor Manufacturing Company, Ltd. Real time monitor of reacting chemicals in semiconductor manufacturing
WO1998022817A1 (en) * 1996-11-18 1998-05-28 Tekmar Company Liquid sample carbon analyzer
USD421653S (en) * 1996-11-18 2000-03-14 Tekmar Company Housing for a laboratory instrument
US6261851B1 (en) 1999-09-30 2001-07-17 International Business Machines Corporation Optimization of CMP process by detecting of oxide/nitride interface using IR system
KR100390553B1 (ko) * 2000-12-30 2003-07-07 주식회사 동진쎄미켐 근적외선 분광기를 이용한 금속막 에칭 공정 제어방법 및에쳔트 조성물의 재생방법
US6794649B2 (en) * 2001-07-09 2004-09-21 Pharmaceutical Systems, Inc. Spectrophotometric determination of gas phase compositions
US7090808B2 (en) * 2001-07-09 2006-08-15 Pharmaceutical Systems, Inc. Apparatus for testing sterilization methods and materials
IL145649A0 (en) * 2001-09-25 2002-06-30 Nira Sciences Ltd Method and apparatus for real-time dynamic chemical analysis
JP4231757B2 (ja) 2003-09-09 2009-03-04 株式会社堀場製作所 溶液中成分濃度測定方法
KR101359169B1 (ko) * 2006-03-16 2014-02-05 구라시키 보세키 가부시키가이샤 전반사 감쇠형 광학 프로브 및 그것을 이용한 수용액 분광 측정 장치
JP4911606B2 (ja) * 2007-03-08 2012-04-04 倉敷紡績株式会社 全反射減衰型光学プローブおよびそれを用いた水溶液分光測定装置
TW200944776A (en) * 2008-03-04 2009-11-01 Kurashiki Boseki Kk Total reflection attenuation type far-ultraviolet spectroscopy and concentration measurement device using the spectroscopy
JP5152803B2 (ja) * 2008-09-24 2013-02-27 倉敷紡績株式会社 液体濃度計
KR101958387B1 (ko) * 2011-07-28 2019-03-20 주식회사 동진쎄미켐 근적외선 분광기를 이용한 구리막 식각 공정 제어방법 및 구리막 식각액 조성물의 재생방법
JP2022041059A (ja) * 2020-08-31 2022-03-11 シスメックス株式会社 検量線の表示方法および分析装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3947124A (en) * 1973-10-26 1976-03-30 National Research Development Corporation Analytical spectroelectrochemistry
JPS6052764A (ja) * 1983-09-01 1985-03-26 Hitachi Ltd アンモニア性過酸化水素液中のアンモニアと過酸化水素の濃度を測定する装置
JPS6060729A (ja) * 1983-09-14 1985-04-08 Hitachi Ltd 洗浄装置
US4627014A (en) * 1984-04-09 1986-12-02 Eastman Kodak Company Method and apparatus for determination of an analyte and method of calibrating such apparatus
US4627008A (en) * 1984-04-25 1986-12-02 Trebor Industries, Inc. Optical quantitative analysis using curvilinear interpolation
US4730112A (en) * 1986-03-07 1988-03-08 Hibshman Corporation Oxygen measurement using visible radiation
US4805623A (en) * 1987-09-04 1989-02-21 Vander Corporation Spectrophotometric method for quantitatively determining the concentration of a dilute component in a light- or other radiation-scattering environment
JPH0827235B2 (ja) * 1987-11-17 1996-03-21 倉敷紡績株式会社 糖類濃度の分光学的測定法

Also Published As

Publication number Publication date
US5097130A (en) 1992-03-17
EP0418799A2 (de) 1991-03-27
EP0418799A3 (en) 1992-04-08
DE69023859T2 (de) 1996-07-25
CA2025766A1 (en) 1991-03-21
EP0418799B1 (de) 1995-11-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee