DE69015472D1 - Gezielte Metallniederschlagung. - Google Patents
Gezielte Metallniederschlagung.Info
- Publication number
- DE69015472D1 DE69015472D1 DE69015472T DE69015472T DE69015472D1 DE 69015472 D1 DE69015472 D1 DE 69015472D1 DE 69015472 T DE69015472 T DE 69015472T DE 69015472 T DE69015472 T DE 69015472T DE 69015472 D1 DE69015472 D1 DE 69015472D1
- Authority
- DE
- Germany
- Prior art keywords
- metal precipitation
- targeted metal
- targeted
- precipitation
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
- H01L21/31116—Etching inorganic layers by chemical means by dry-etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
- H01L21/7688—Filling of holes, grooves or trenches, e.g. vias, with conductive material by deposition over sacrificial masking layer, e.g. lift-off
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/901—Printed circuit
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12389—All metal or with adjacent metals having variation in thickness
- Y10T428/12396—Discontinuous surface component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12528—Semiconductor component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31721—Of polyimide
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/350,182 US5024896A (en) | 1989-07-06 | 1989-07-06 | Collimated metal deposition |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69015472D1 true DE69015472D1 (de) | 1995-02-09 |
DE69015472T2 DE69015472T2 (de) | 1995-07-20 |
Family
ID=23375556
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69015472T Expired - Fee Related DE69015472T2 (de) | 1989-07-06 | 1990-05-12 | Gezielte Metallniederschlagung. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5024896A (de) |
EP (1) | EP0406544B1 (de) |
JP (1) | JPH0652734B2 (de) |
DE (1) | DE69015472T2 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5258264A (en) * | 1989-07-06 | 1993-11-02 | International Business Machines Corporation | Process of forming a dual overhang collimated lift-off stencil with subsequent metal deposition |
US5320934A (en) * | 1991-06-28 | 1994-06-14 | Misium George R | Bilayer photolithographic process |
US5221596A (en) * | 1991-09-03 | 1993-06-22 | Motorola, Inc. | Method of forming a retrograde photoresist profile |
JP2951504B2 (ja) * | 1992-06-05 | 1999-09-20 | シャープ株式会社 | シリル化平坦化レジスト及び平坦化方法並びに集積回路デバイスの製造方法 |
JPH0660548U (ja) * | 1993-02-03 | 1994-08-23 | 池田物産株式会社 | スペアタイヤカバー装置 |
JP2569405Y2 (ja) * | 1993-02-03 | 1998-04-22 | 池田物産株式会社 | スペアタイヤカバー装置 |
WO1996038026A1 (en) * | 1995-05-22 | 1996-11-28 | Dynaco Corporation | Rigid-flex printed circuit boards |
KR19980064444A (ko) * | 1996-12-20 | 1998-10-07 | 윌리엄비.켐플러 | 다층 집적 회로 유전체 구조의 에칭 방법 |
DE19717363C2 (de) * | 1997-04-24 | 2001-09-06 | Siemens Ag | Herstellverfahren für eine Platinmetall-Struktur mittels eines Lift-off-Prozesses und Verwendung des Herstellverfahrens |
US7070697B2 (en) * | 2003-04-14 | 2006-07-04 | Hitachi Global Storage Technologies Netherlands B.V. | Methods of making a read sensor with use of a barrier structure for depositing materials |
JP2010040616A (ja) * | 2008-08-01 | 2010-02-18 | Opnext Japan Inc | 電極形成方法および半導体素子 |
US8233248B1 (en) * | 2009-09-16 | 2012-07-31 | Western Digital (Fremont), Llc | Method and system for providing a magnetic recording transducer using a line hard mask |
US8871102B2 (en) | 2011-05-25 | 2014-10-28 | Western Digital (Fremont), Llc | Method and system for fabricating a narrow line structure in a magnetic recording head |
US8697562B2 (en) | 2011-06-23 | 2014-04-15 | Richard L. McCreery | Metal contacts for molecular device junctions and surface-diffusion-mediated deposition |
US9034564B1 (en) | 2013-07-26 | 2015-05-19 | Western Digital (Fremont), Llc | Reader fabrication method employing developable bottom anti-reflective coating |
KR102432541B1 (ko) * | 2015-09-24 | 2022-08-17 | 주식회사 기가레인 | 벤딩 내구성이 개선된 연성회로기판 및 그 제조방법 |
KR102497358B1 (ko) | 2015-09-24 | 2023-02-10 | 주식회사 기가레인 | 벤딩 내구성이 개선된 연성회로기판 |
KR102442838B1 (ko) * | 2015-09-24 | 2022-09-15 | 주식회사 기가레인 | 3층 유전체 및 4층 그라운드 레이어 구조를 갖는 연성회로기판 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4493855A (en) * | 1982-12-23 | 1985-01-15 | International Business Machines Corporation | Use of plasma polymerized organosilicon films in fabrication of lift-off masks |
US4539222A (en) * | 1983-11-30 | 1985-09-03 | International Business Machines Corporation | Process for forming metal patterns wherein metal is deposited on a thermally depolymerizable polymer and selectively removed |
US4519872A (en) * | 1984-06-11 | 1985-05-28 | International Business Machines Corporation | Use of depolymerizable polymers in the fabrication of lift-off structure for multilevel metal processes |
US4692205A (en) * | 1986-01-31 | 1987-09-08 | International Business Machines Corporation | Silicon-containing polyimides as oxygen etch stop and dual dielectric coatings |
-
1989
- 1989-07-06 US US07/350,182 patent/US5024896A/en not_active Expired - Fee Related
-
1990
- 1990-05-12 DE DE69015472T patent/DE69015472T2/de not_active Expired - Fee Related
- 1990-05-12 EP EP90108998A patent/EP0406544B1/de not_active Expired - Lifetime
- 1990-07-06 JP JP2177643A patent/JPH0652734B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0406544B1 (de) | 1994-12-28 |
DE69015472T2 (de) | 1995-07-20 |
EP0406544A3 (en) | 1991-03-20 |
US5024896A (en) | 1991-06-18 |
EP0406544A2 (de) | 1991-01-09 |
JPH0346330A (ja) | 1991-02-27 |
JPH0652734B2 (ja) | 1994-07-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |