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DE68907681D1 - Verfahren zur herstellung eines duennen legierungsfilms mit hoher saettigung der magnetischen flussdichte. - Google Patents

Verfahren zur herstellung eines duennen legierungsfilms mit hoher saettigung der magnetischen flussdichte.

Info

Publication number
DE68907681D1
DE68907681D1 DE8989117884T DE68907681T DE68907681D1 DE 68907681 D1 DE68907681 D1 DE 68907681D1 DE 8989117884 T DE8989117884 T DE 8989117884T DE 68907681 T DE68907681 T DE 68907681T DE 68907681 D1 DE68907681 D1 DE 68907681D1
Authority
DE
Germany
Prior art keywords
producing
alloy film
high saturation
magnetic flow
flow density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8989117884T
Other languages
English (en)
Other versions
DE68907681T2 (de
Inventor
Yuuji Omata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63243016A external-priority patent/JP2633326B2/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE68907681D1 publication Critical patent/DE68907681D1/de
Application granted granted Critical
Publication of DE68907681T2 publication Critical patent/DE68907681T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/007—Electroplating using magnetic fields, e.g. magnets
    • C25D5/009—Deposition of ferromagnetic material
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/24—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids
    • H01F41/26—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids using electric currents, e.g. electroplating

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Thin Magnetic Films (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Magnetic Heads (AREA)
DE89117884T 1988-09-28 1989-09-27 Verfahren zur Herstellung eines dünnen Legierungsfilms mit hoher Sättigung der magnetischen Flussdichte. Expired - Fee Related DE68907681T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63243016A JP2633326B2 (ja) 1988-08-03 1988-09-28 高飽和磁束密度合金薄膜の製造方法

Publications (2)

Publication Number Publication Date
DE68907681D1 true DE68907681D1 (de) 1993-08-26
DE68907681T2 DE68907681T2 (de) 1994-03-31

Family

ID=17097626

Family Applications (1)

Application Number Title Priority Date Filing Date
DE89117884T Expired - Fee Related DE68907681T2 (de) 1988-09-28 1989-09-27 Verfahren zur Herstellung eines dünnen Legierungsfilms mit hoher Sättigung der magnetischen Flussdichte.

Country Status (3)

Country Link
US (1) US5011581A (de)
EP (1) EP0361451B1 (de)
DE (1) DE68907681T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04129009A (ja) * 1989-10-20 1992-04-30 Seagate Technol Internatl 薄膜磁気読出し・書込みヘッド
US5629020A (en) * 1994-04-22 1997-05-13 Emisphere Technologies, Inc. Modified amino acids for drug delivery
JPH08212512A (ja) * 1995-02-03 1996-08-20 Hitachi Ltd 磁気記憶装置及びそれに用いる薄膜磁気ヘッドとその製造方法
JP3112850B2 (ja) * 1997-01-13 2000-11-27 学校法人早稲田大学 Ｃｏ−Ｎｉ−Ｆｅを主成分とする軟磁性薄膜，その製造方法，それを用いた磁気ヘッド及び磁気記憶装置
US5883762A (en) * 1997-03-13 1999-03-16 Calhoun; Robert B. Electroplating apparatus and process for reducing oxidation of oxidizable plating anions and cations
US6372118B1 (en) 1999-04-12 2002-04-16 Wen Hua Hui Ni-Fe-Co electroplating bath
DE19949549A1 (de) 1999-10-14 2001-04-26 Hille & Mueller Gmbh & Co Elektrolytisch beschichtetes Kaltband, vorzugsweise zur Verwendung für die Herstellung von Batteriehülsen sowie Verfahren zur Beschichtung desselben
KR100352976B1 (ko) * 1999-12-24 2002-09-18 한국기계연구원 전기도금법에 의한 2축 집합조직을 갖는 니켈 도금층 및 그 제조방법
JP3629431B2 (ja) * 2001-01-15 2005-03-16 アルプス電気株式会社 軟磁性膜の製造方法と薄膜磁気ヘッドの製造方法
JP2004152454A (ja) * 2002-11-01 2004-05-27 Hitachi Ltd 磁気ヘッド及びその製造方法
US8536430B2 (en) 2009-01-14 2013-09-17 Geoffrey McCabe Fine tuning means for fulcrum tremolo

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1026781A (en) * 1961-04-07 1966-04-20 Columbia Broadcasting Syst Inc Improvements in or relating to ferrous alloy electrodeposition
US3297418A (en) * 1964-04-24 1967-01-10 Firestone Stanley Magnetic thin film element and method of manufacture
GB1213277A (en) * 1966-12-24 1970-11-25 Plessey Co Ltd Improvements in or relating to electroplating methods and apparatus
US3533922A (en) * 1968-06-26 1970-10-13 Honeywell Inc Composition and process for plating ferromagnetic film
US3592746A (en) * 1969-05-15 1971-07-13 Burroughs Corp Electroplating method of fabricating plated wire memory units
US4053373A (en) * 1975-07-09 1977-10-11 M & T Chemicals Inc. Electroplating of nickel, cobalt, nickel-cobalt, nickel-iron, cobalt-iron and nickel-iron-cobalt deposits
US4014759A (en) * 1975-07-09 1977-03-29 M & T Chemicals Inc. Electroplating iron alloys containing nickel, cobalt or nickel and cobalt
US4046647A (en) * 1976-06-17 1977-09-06 M&T Chemicals Inc. Additive for improved electroplating process
US4214954A (en) * 1978-12-04 1980-07-29 Olin Corporation Plated metallic cathode with porous copper subplating
US4661216A (en) * 1986-04-21 1987-04-28 International Business Machines Corporation Electrodepositing CoNiFe alloys for thin film heads

Also Published As

Publication number Publication date
EP0361451A1 (de) 1990-04-04
EP0361451B1 (de) 1993-07-21
US5011581A (en) 1991-04-30
DE68907681T2 (de) 1994-03-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8327 Change in the person/name/address of the patent owner

Owner name: PANASONIC CORP., KADOMA, OSAKA, JP

8339 Ceased/non-payment of the annual fee