DE60332344D1 - Verfahren zur herstellung eines sige heteroübergang-bipolartransistors - Google Patents
Verfahren zur herstellung eines sige heteroübergang-bipolartransistorsInfo
- Publication number
- DE60332344D1 DE60332344D1 DE60332344T DE60332344T DE60332344D1 DE 60332344 D1 DE60332344 D1 DE 60332344D1 DE 60332344 T DE60332344 T DE 60332344T DE 60332344 T DE60332344 T DE 60332344T DE 60332344 D1 DE60332344 D1 DE 60332344D1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- area opening
- transistor area
- bipolar transistor
- heterover
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/80—Heterojunction BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/01—Manufacture or treatment
- H10D10/021—Manufacture or treatment of heterojunction BJTs [HBT]
Landscapes
- Bipolar Transistors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02077112 | 2002-05-29 | ||
PCT/IB2003/002034 WO2003100845A1 (en) | 2002-05-29 | 2003-05-27 | Method of fabrication sige heterojunction bipolar transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60332344D1 true DE60332344D1 (de) | 2010-06-10 |
Family
ID=29558387
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60332344T Expired - Lifetime DE60332344D1 (de) | 2002-05-29 | 2003-05-27 | Verfahren zur herstellung eines sige heteroübergang-bipolartransistors |
Country Status (10)
Country | Link |
---|---|
US (1) | US7074685B2 (de) |
EP (1) | EP1512172B1 (de) |
JP (1) | JP2005527979A (de) |
KR (1) | KR20050004874A (de) |
CN (1) | CN100521113C (de) |
AT (1) | ATE466378T1 (de) |
AU (1) | AU2003232968A1 (de) |
DE (1) | DE60332344D1 (de) |
TW (1) | TWI308798B (de) |
WO (1) | WO2003100845A1 (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10162074B4 (de) | 2001-12-06 | 2010-04-08 | Ihp Gmbh - Innovations For High Performance Microelectronics / Leibniz-Institut Für Innovative Mikroelektronik | BiCMOS-Struktur, Verfahren zu ihrer Herstellung und Bipolartransistor für eine BiCMOS-Struktur |
KR101060426B1 (ko) * | 2003-12-12 | 2011-08-29 | 엔엑스피 비 브이 | 바이폴라 디바이스 내에 에피택셜 베이스층을 형성하는 방법 및 구조체 |
EP1842229B1 (de) | 2005-01-18 | 2011-01-12 | Nxp B.V. | Bipolartransistor und herstellungsverfahren dafür |
WO2007057803A1 (en) * | 2005-11-21 | 2007-05-24 | Nxp B.V. | Method of manufacturing a semiconductor device and semiconductor device obtained with such a method |
WO2007076576A1 (en) * | 2005-12-30 | 2007-07-12 | Epitactix Pty Ltd | Method and structure for a high performance semiconductor device |
EP2281302B1 (de) | 2008-05-21 | 2012-12-26 | Nxp B.V. | Verfahren zur herstellung eines halbleiterbauelements eines bipolaren transistors |
US7803685B2 (en) * | 2008-06-26 | 2010-09-28 | Freescale Semiconductor, Inc. | Silicided base structure for high frequency transistors |
EP2315238B1 (de) | 2009-10-26 | 2012-06-20 | Nxp B.V. | Bipolarer Heteroübergangstransistor |
EP2346070B1 (de) | 2010-01-13 | 2013-03-20 | Nxp B.V. | Verfahren zur Herstellung eines bipolaren Heteroübertragungstransistors und bipolarer Heteroübertragungstransistor |
EP2372754B1 (de) * | 2010-04-01 | 2018-03-14 | Nxp B.V. | Abstandshalterstruktur bei der Herstellung von flachen Bipolartransistoren |
EP2418681B1 (de) * | 2010-08-10 | 2017-10-11 | Nxp B.V. | Bipolarer Heteroübergangstransistor und Herstellungsverfahren |
EP2458623B1 (de) | 2010-11-26 | 2014-06-25 | Nxp B.V. | Verfahren zur Herstellung eines bipolaren Transistors und bipolarer Transistor |
EP2458624A1 (de) | 2010-11-26 | 2012-05-30 | Nxp B.V. | Verfahren zur Herstellung eines bipolaren Heteroübergangstransistors und integrierte Schaltung mit einem bipolaren Heteroübergangstransistor |
EP2466628A1 (de) | 2010-12-16 | 2012-06-20 | Nxp B.V. | Herstellungsverfahren für zweipoligen Transistor und zweipoliger Transistor |
TWI413468B (zh) * | 2010-12-29 | 2013-10-21 | Unimicron Technology Corp | 製造內嵌式細線路之方法 |
CN102148156B (zh) * | 2011-03-15 | 2015-10-28 | 上海华虹宏力半导体制造有限公司 | 锗硅异质结双极型晶体管的制造方法 |
EP2506297A1 (de) | 2011-03-29 | 2012-10-03 | Nxp B.V. | Bi-CMOS-Vorrichtung und Verfahren |
EP2555235B1 (de) | 2011-08-02 | 2014-06-18 | Nxp B.V. | Verfahren zur Herstellung einer integrierten Schaltung mit mehreren bipolaren Transistoren und integrierte Schaltung mit mehreren bipolaren Transistoren |
EP2581930B1 (de) | 2011-10-11 | 2014-06-04 | Nxp B.V. | Verfahren zur Herstellung eines bipolaren Transistors, bipolarer Transistor und integrierte Schaltung |
EP2565911B1 (de) | 2011-09-02 | 2014-08-20 | Nxp B.V. | Verfahren zur Herstellung einer integrierten Schaltung mit einem bipolaren Transistor und integrierte Schaltung |
CN102420243B (zh) * | 2011-11-09 | 2013-10-23 | 上海华虹Nec电子有限公司 | 锗硅异质结双极晶体管及制造方法 |
EP2747131B1 (de) | 2012-12-18 | 2015-07-01 | Nxp B.V. | Verfahren zur Verarbeitung eines Siliziumwafers |
CN103022109B (zh) * | 2012-12-20 | 2015-02-04 | 清华大学 | 局部氧化抬升外基区全自对准双极晶体管及其制备方法 |
CN108257867B (zh) * | 2018-01-11 | 2020-11-24 | 上海华虹宏力半导体制造有限公司 | 采用非选择性外延的自对准锗硅hbt器件的制造方法 |
CN108110052A (zh) * | 2018-01-30 | 2018-06-01 | 上海华虹宏力半导体制造有限公司 | 锗硅异质结双极晶体管及制造方法 |
TWI743788B (zh) * | 2020-05-18 | 2021-10-21 | 力晶積成電子製造股份有限公司 | 電晶體及其製造方法 |
US12107143B2 (en) | 2022-07-19 | 2024-10-01 | Nxp B.V. | Semiconductor device with extrinsic base region and method of fabrication therefor |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5101256A (en) * | 1989-02-13 | 1992-03-31 | International Business Machines Corporation | Bipolar transistor with ultra-thin epitaxial base and method of fabricating same |
US5773350A (en) * | 1997-01-28 | 1998-06-30 | National Semiconductor Corporation | Method for forming a self-aligned bipolar junction transistor with silicide extrinsic base contacts and selective epitaxial grown intrinsic base |
US20020000664A1 (en) * | 1999-02-05 | 2002-01-03 | Lie-Yea Cheng | Silicon nitride composite hdp/cvd process |
US6169007B1 (en) * | 1999-06-25 | 2001-01-02 | Applied Micro Circuits Corporation | Self-aligned non-selective thin-epi-base silicon germanium (SiGe) heterojunction bipolar transistor BicMOS process using silicon dioxide etchback |
US6346453B1 (en) * | 2000-01-27 | 2002-02-12 | Sige Microsystems Inc. | Method of producing a SI-GE base heterojunction bipolar device |
FR2806831B1 (fr) * | 2000-03-27 | 2003-09-19 | St Microelectronics Sa | Procede de fabrication d'un transistor bipolaire de type double-polysilicium auto-aligne a base a heterojonction et transistor correspondant |
US6664574B2 (en) * | 2001-09-05 | 2003-12-16 | Semiconductor Components Industries Llc | Heterojunction semiconductor device and method of manufacturing |
JP3914064B2 (ja) * | 2002-02-28 | 2007-05-16 | 富士通株式会社 | 混晶膜の成長方法及び装置 |
-
2003
- 2003-05-27 WO PCT/IB2003/002034 patent/WO2003100845A1/en active Application Filing
- 2003-05-27 AU AU2003232968A patent/AU2003232968A1/en not_active Abandoned
- 2003-05-27 EP EP03727767A patent/EP1512172B1/de not_active Expired - Lifetime
- 2003-05-27 US US10/515,763 patent/US7074685B2/en not_active Expired - Lifetime
- 2003-05-27 AT AT03727767T patent/ATE466378T1/de not_active IP Right Cessation
- 2003-05-27 KR KR10-2004-7019147A patent/KR20050004874A/ko not_active Application Discontinuation
- 2003-05-27 JP JP2004508401A patent/JP2005527979A/ja active Pending
- 2003-05-27 DE DE60332344T patent/DE60332344D1/de not_active Expired - Lifetime
- 2003-05-27 CN CNB038120240A patent/CN100521113C/zh not_active Expired - Fee Related
- 2003-05-28 TW TW092114412A patent/TWI308798B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1656609A (zh) | 2005-08-17 |
US7074685B2 (en) | 2006-07-11 |
ATE466378T1 (de) | 2010-05-15 |
KR20050004874A (ko) | 2005-01-12 |
AU2003232968A1 (en) | 2003-12-12 |
EP1512172A1 (de) | 2005-03-09 |
US20050218399A1 (en) | 2005-10-06 |
TWI308798B (en) | 2009-04-11 |
CN100521113C (zh) | 2009-07-29 |
JP2005527979A (ja) | 2005-09-15 |
TW200405569A (en) | 2004-04-01 |
EP1512172B1 (de) | 2010-04-28 |
WO2003100845A1 (en) | 2003-12-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |