DE602005019800D1 - Kathodenverdampfungsmaschine - Google Patents

Kathodenverdampfungsmaschine

Info

Publication number: DE602005019800D1
Authority: DE; Germany
Prior art keywords: expansion machine; cathode; cathode expansion; cathode element; end surface
Prior art date: 2005-12-16
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

DE602005019800T

Other languages

English (en)

Inventor

Larrinaga Josu Goikoetxea

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fundacion Tekniker

Original Assignee

Fundacion Tekniker

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2005-12-16

Filing date

2005-12-16

Publication date

2010-04-15

2005-12-16 Application filed by Fundacion Tekniker filed Critical Fundacion Tekniker

2010-04-15 Publication of DE602005019800D1 publication Critical patent/DE602005019800D1/de

Status Active legal-status Critical Current

2025-12-17 Anticipated expiration legal-status Critical

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32614—Consumable cathodes for arc discharge
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Physics & Mathematics (AREA)
Plasma & Fusion (AREA)
Analytical Chemistry (AREA)
Materials Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)
Soil Working Implements (AREA)
Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

DE602005019800T 2005-12-16 2005-12-16 Kathodenverdampfungsmaschine Active DE602005019800D1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
PCT/ES2005/000687 WO2007068768A1 (es)	2005-12-16	2005-12-16	Máquina de evaporación catódica

Publications (1)

Publication Number	Publication Date
DE602005019800D1 true DE602005019800D1 (de)	2010-04-15

Family

ID=38162586

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE602005019800T Active DE602005019800D1 (de)	2005-12-16	2005-12-16	Kathodenverdampfungsmaschine

Country Status (7)

Country	Link
US (1)	US20090050059A1 (de)
EP (1)	EP1970464B1 (de)
CN (1)	CN101370957B (de)
AT (1)	ATE459734T1 (de)
DE (1)	DE602005019800D1 (de)
ES (1)	ES2342835T3 (de)
WO (1)	WO2007068768A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE102009008161A1 (de) *	2009-02-09	2010-08-12	Oerlikon Trading Ag, Trübbach	Modifizierbare Magnetkonfiguration für Arc-Verdampfungsquellen
JP5649308B2 (ja) *	2009-04-28	2015-01-07	株式会社神戸製鋼所	成膜速度が速いアーク式蒸発源及びこのアーク式蒸発源を用いた皮膜の製造方法
EP2585622B1 (de) *	2010-06-22	2018-01-17	Oerlikon Surface Solutions AG, Pfäffikon	Arc-verdampfungsquelle mit definiertem elektrischem feld
EP2607517A1 (de) *	2011-12-22	2013-06-26	Oerlikon Trading AG, Trübbach	Niedertemperatur-Lichtbogenionen-Plattierbeschichtung
JP5946337B2 (ja) *	2012-06-20	2016-07-06	株式会社神戸製鋼所	アーク式蒸発源
CN103074580B (zh) *	2012-12-25	2015-08-26	王奉瑾	采用电磁加热的物理气相沉积设备
JP6403269B2 (ja) *	2014-07-30	2018-10-10	株式会社神戸製鋼所	アーク蒸発源
CN110268502B (zh) *	2017-02-14	2021-08-24	欧瑞康表面处理解决方案股份公司普费菲孔	具有预定阴极材料蚀除的阴极电弧蒸发
EP3692183A1 (de)	2017-10-03	2020-08-12	Oerlikon Surface Solutions AG, Pfäffikon	Lichtbogenquelle mit begrenztem magnetfeld
CN114481046A (zh) *	2022-01-26	2022-05-13	纳狮新材料有限公司	电弧蒸发装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4673477A (en)	1984-03-02	1987-06-16	Regents Of The University Of Minnesota	Controlled vacuum arc material deposition, method and apparatus
US4724058A (en)	1984-08-13	1988-02-09	Vac-Tec Systems, Inc.	Method and apparatus for arc evaporating large area targets
DE3624150C2 (de) *	1986-07-17	1994-02-24	Leybold Ag	Zerstäubungskatode nach dem Magnetronprinzip
DE4017111C2 (de) *	1990-05-28	1998-01-29	Hauzer Holding	Lichtbogen-Magnetron-Vorrichtung
US5298136A (en) *	1987-08-18	1994-03-29	Regents Of The University Of Minnesota	Steered arc coating with thick targets
DE3800449A1 (de) *	1988-01-09	1989-07-20	Leybold Ag	Verfahren und einrichtung zur herstellung magnetooptischer, speicher- und loeschfaehiger datentraeger
DE4009151A1 (de) *	1990-03-22	1991-09-26	Leybold Ag	Vorrichtung zum beschichten von substraten durch katodenzerstaeubung
DE4329155A1 (de)	1993-08-30	1995-03-02	Bloesch W Ag	Magnetfeldkathode
CA2256847A1 (en) *	1998-12-22	2000-06-22	Munther Kandah	Particle-free cathodic arc carbon ion source
DE10010448C1 (de) *	2000-03-03	2002-04-25	Multi Media Machinery Gmbh	Kathode
JP4679004B2 (ja) *	2000-09-26	2011-04-27	新明和工業株式会社	アーク蒸発源装置、その駆動方法、及びイオンプレーティング装置
DE60105856T2 (de)	2001-03-27	2005-10-20	Fundación Tekniker	Bogenverdampfer mit intensiver magnetführung für grossflächige targets
DE10127013A1 (de) *	2001-06-05	2002-12-12	Gabriel Herbert M	Lichtbogen-Verdampfungsvorrichtung

2005
- 2005-12-16 EP EP05826678A patent/EP1970464B1/de not_active Not-in-force
- 2005-12-16 US US12/097,728 patent/US20090050059A1/en not_active Abandoned
- 2005-12-16 DE DE602005019800T patent/DE602005019800D1/de active Active
- 2005-12-16 ES ES05826678T patent/ES2342835T3/es active Active
- 2005-12-16 AT AT05826678T patent/ATE459734T1/de not_active IP Right Cessation
- 2005-12-16 CN CN2005800525390A patent/CN101370957B/zh not_active Expired - Fee Related
- 2005-12-16 WO PCT/ES2005/000687 patent/WO2007068768A1/es active Application Filing

Also Published As

Publication number	Publication date
HK1129430A1 (en)	2009-11-27
ATE459734T1 (de)	2010-03-15
WO2007068768A1 (es)	2007-06-21
CN101370957B (zh)	2011-01-26
ES2342835T3 (es)	2010-07-15
CN101370957A (zh)	2009-02-18
US20090050059A1 (en)	2009-02-26
EP1970464A1 (de)	2008-09-17
EP1970464B1 (de)	2010-03-03

Publication	Publication Date	Title
DK1278220T3 (da)	2011-03-07	Omskifter-/volumenkontrolenhed til et høreapparat
DE602005019800D1 (de)	2010-04-15	Kathodenverdampfungsmaschine
ATE501520T1 (de)	2011-03-15	Kaltfeldemitter
DE602006016385D1 (de)	2010-10-07	Elektrode für Plasmabrenner mit einer verbesserten Einsatzanlage
AU2003240780A1 (en)	2003-11-11	Electrically conductive yarn comprising metal fibers
ITTV20000035V0 (it)	2000-08-10	Struttura di elemento di protezione particolarmente per pantaloncini per il ciclismo
AR039701A1 (es)	2005-03-09	Combinaciones de compuestos activos fungicidas
BR0112715A (pt)	2003-05-20	Motif com base em leucina e neurotoxinas clostridiais
ECSP034600A (es)	2003-06-25	Compuestos de lactama
SE0501603L (sv)	2007-01-09	Plasmaalstrande anordning, plasmakirurgisk anordning och användning av en plasmakirurgisk anordning
ATE487921T1 (de)	2010-11-15	Positionssensor mit elastomerischem material
DE502004007897D1 (de)	2008-10-02	Diodenlaseranordnung und Strahlformungseinheit dafür
ATE479225T1 (de)	2010-09-15	Elektrisches betätigungsglied
ATE548747T1 (de)	2012-03-15	Hochfluss-röntgen-target und baugruppe
DE502004005004D1 (de)	2007-10-31	Ventilgehäuse mit einer integrierten Schaltungsanordnung
BR9916507A (pt)	2001-10-02	Proteìnas
ATE441936T1 (de)	2009-09-15	Mikrowellengenerator mit oszillierender virtueller kathode
ATE283382T1 (de)	2004-12-15	Lichtbogen-verdampfungsvorrichtung
DE502004008645D1 (de)	2009-01-22	Laserbearbeitungskopf
ATE274170T1 (de)	2004-09-15	Längliche lichtquelle
DE602005013657D1 (de)	2009-05-14	Induktiver Anwesenheits-, Näherungs- oder Positionssensor
CY1113795T1 (el)	2016-07-27	Διαταξη ακροφυσιου εκτοξευσης μελανης που εχει ενα ενεργοποιητη θερμικης καμψης με μια ενεργο ραβδο καθοριζουσα ενα ουσιαστικο τμημα της οροφης του θαλαμου του ακροφυσιου
CA2534928C (en)	2014-10-14	Current sensor
DE60300887D1 (de)	2005-07-28	Verbesserungen an kohlenstofffasermasten
ATE324532T1 (de)	2006-05-15	Rundlager

Legal Events

Date	Code	Title	Description
2011-03-24	8364	No opposition during term of opposition