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DE60025791D1 - Ellipsometer - Google Patents

Ellipsometer

Info

Publication number
DE60025791D1
DE60025791D1 DE60025791T DE60025791T DE60025791D1 DE 60025791 D1 DE60025791 D1 DE 60025791D1 DE 60025791 T DE60025791 T DE 60025791T DE 60025791 T DE60025791 T DE 60025791T DE 60025791 D1 DE60025791 D1 DE 60025791D1
Authority
DE
Germany
Prior art keywords
ellipsometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60025791T
Other languages
English (en)
Inventor
Iwao Mizoguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP33628799A external-priority patent/JP2001153725A/ja
Priority claimed from JP33628899A external-priority patent/JP2001153798A/ja
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Application granted granted Critical
Publication of DE60025791D1 publication Critical patent/DE60025791D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE60025791T 1999-11-26 2000-11-23 Ellipsometer Expired - Lifetime DE60025791D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP33628799A JP2001153725A (ja) 1999-11-26 1999-11-26 偏光角調整機構
JP33628899A JP2001153798A (ja) 1999-11-26 1999-11-26 試料位置出し機構

Publications (1)

Publication Number Publication Date
DE60025791D1 true DE60025791D1 (de) 2006-04-13

Family

ID=26575420

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60025791T Expired - Lifetime DE60025791D1 (de) 1999-11-26 2000-11-23 Ellipsometer

Country Status (3)

Country Link
US (1) US6621578B1 (de)
EP (1) EP1103784B1 (de)
DE (1) DE60025791D1 (de)

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US7027224B2 (en) * 2001-01-31 2006-04-11 Sharp Laboratories Of America, Inc. Wave plate mounting
US6757059B2 (en) * 2001-04-30 2004-06-29 Therma-Wave, Inc. Wafer chuck with integrated reference sample
US7196797B2 (en) * 2004-05-28 2007-03-27 Agilent Technologies, Inc. Differential interferometer with improved cyclic nonlinearity
CN100510700C (zh) * 2006-12-30 2009-07-08 清华大学深圳研究生院 线偏振光成像方法及装置
US8531650B2 (en) 2008-07-08 2013-09-10 Chiaro Technologies LLC Multiple channel locating
US9562760B2 (en) * 2014-03-10 2017-02-07 Cognex Corporation Spatially self-similar patterned illumination for depth imaging
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US9541610B2 (en) 2015-02-04 2017-01-10 Lockheed Martin Corporation Apparatus and method for recovery of three dimensional magnetic field from a magnetic detection system
US9614589B1 (en) 2015-12-01 2017-04-04 Lockheed Martin Corporation Communication via a magnio
US9910105B2 (en) 2014-03-20 2018-03-06 Lockheed Martin Corporation DNV magnetic field detector
US9910104B2 (en) 2015-01-23 2018-03-06 Lockheed Martin Corporation DNV magnetic field detector
US10088452B2 (en) 2016-01-12 2018-10-02 Lockheed Martin Corporation Method for detecting defects in conductive materials based on differences in magnetic field characteristics measured along the conductive materials
US9853837B2 (en) 2014-04-07 2017-12-26 Lockheed Martin Corporation High bit-rate magnetic communication
US10520558B2 (en) 2016-01-21 2019-12-31 Lockheed Martin Corporation Diamond nitrogen vacancy sensor with nitrogen-vacancy center diamond located between dual RF sources
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KR20170108055A (ko) 2015-01-23 2017-09-26 록히드 마틴 코포레이션 자기 검출 시스템에서의 고감도 자력 측정 및 신호 처리를 위한 장치 및 방법
CA2975103A1 (en) 2015-01-28 2016-08-04 Stephen M. SEKELSKY In-situ power charging
WO2016126435A1 (en) 2015-02-04 2016-08-11 Lockheed Martin Corporation Apparatus and method for estimating absolute axes' orientations for a magnetic detection system
WO2017087013A1 (en) 2015-11-20 2017-05-26 Lockheed Martin Corporation Apparatus and method for closed loop processing for a magnetic detection system
WO2017127090A1 (en) 2016-01-21 2017-07-27 Lockheed Martin Corporation Higher magnetic sensitivity through fluorescence manipulation by phonon spectrum control
AU2016388316A1 (en) 2016-01-21 2018-09-06 Lockheed Martin Corporation Diamond nitrogen vacancy sensor with common RF and magnetic fields generator
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US10330744B2 (en) 2017-03-24 2019-06-25 Lockheed Martin Corporation Magnetometer with a waveguide
US20170343621A1 (en) 2016-05-31 2017-11-30 Lockheed Martin Corporation Magneto-optical defect center magnetometer
US10677953B2 (en) 2016-05-31 2020-06-09 Lockheed Martin Corporation Magneto-optical detecting apparatus and methods
US10345396B2 (en) 2016-05-31 2019-07-09 Lockheed Martin Corporation Selected volume continuous illumination magnetometer
US10371765B2 (en) 2016-07-11 2019-08-06 Lockheed Martin Corporation Geolocation of magnetic sources using vector magnetometer sensors
US10281550B2 (en) 2016-11-14 2019-05-07 Lockheed Martin Corporation Spin relaxometry based molecular sequencing
US10228429B2 (en) 2017-03-24 2019-03-12 Lockheed Martin Corporation Apparatus and method for resonance magneto-optical defect center material pulsed mode referencing
US10345395B2 (en) 2016-12-12 2019-07-09 Lockheed Martin Corporation Vector magnetometry localization of subsurface liquids
US10145910B2 (en) 2017-03-24 2018-12-04 Lockheed Martin Corporation Photodetector circuit saturation mitigation for magneto-optical high intensity pulses
US10408890B2 (en) 2017-03-24 2019-09-10 Lockheed Martin Corporation Pulsed RF methods for optimization of CW measurements
US10317279B2 (en) 2016-05-31 2019-06-11 Lockheed Martin Corporation Optical filtration system for diamond material with nitrogen vacancy centers
US10571530B2 (en) 2016-05-31 2020-02-25 Lockheed Martin Corporation Buoy array of magnetometers
US10338163B2 (en) 2016-07-11 2019-07-02 Lockheed Martin Corporation Multi-frequency excitation schemes for high sensitivity magnetometry measurement with drift error compensation
US10527746B2 (en) 2016-05-31 2020-01-07 Lockheed Martin Corporation Array of UAVS with magnetometers
US10359479B2 (en) 2017-02-20 2019-07-23 Lockheed Martin Corporation Efficient thermal drift compensation in DNV vector magnetometry
US10274550B2 (en) 2017-03-24 2019-04-30 Lockheed Martin Corporation High speed sequential cancellation for pulsed mode
US10459041B2 (en) 2017-03-24 2019-10-29 Lockheed Martin Corporation Magnetic detection system with highly integrated diamond nitrogen vacancy sensor
WO2018174916A1 (en) * 2017-03-24 2018-09-27 Lockheed Martin Corporation Use of waveplates in magnetometer sensor
US10338164B2 (en) 2017-03-24 2019-07-02 Lockheed Martin Corporation Vacancy center material with highly efficient RF excitation
US10371760B2 (en) 2017-03-24 2019-08-06 Lockheed Martin Corporation Standing-wave radio frequency exciter
US10379174B2 (en) 2017-03-24 2019-08-13 Lockheed Martin Corporation Bias magnet array for magnetometer
US10699429B2 (en) 2017-08-19 2020-06-30 Cognex Corporation Coding distance topologies for structured light patterns for 3D reconstruction
CN109635619B (zh) 2017-08-19 2021-08-31 康耐视公司 用于三维重建的结构化光图案的编码距离拓扑
CN107726987B (zh) * 2017-10-19 2019-12-13 重庆理工大学 一种光学薄膜的膜厚监控方法
CN113804401B (zh) * 2020-06-16 2024-07-09 三赢科技（深圳）有限公司 全自动水平校正系统及检测设备
CN115046999B (zh) * 2022-06-22 2024-07-02 杭州表面力科技有限公司 一种测量界面间粘附力的测量装置及其方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3880524A (en) 1973-06-25 1975-04-29 Ibm Automatic ellipsometer
FR2501861A1 (fr) 1981-03-11 1982-09-17 Ged Philippe Ellipsometre comportant un prisme a reflexions totales
US5748318A (en) * 1996-01-23 1998-05-05 Brown University Research Foundation Optical stress generator and detector
JPH09210635A (ja) * 1996-02-01 1997-08-12 Olympus Optical Co Ltd 偏光解析装置
EP0950881A3 (de) 1998-04-17 2000-08-16 NanoPhotonics AG Verfahren und Vorrichtung zur automatischen relativen Justierung von Proben bezüglich eines Ellipsometers
JP2000065727A (ja) * 1998-08-20 2000-03-03 Olympus Optical Co Ltd 偏光解析装置

Also Published As

Publication number Publication date
EP1103784A3 (de) 2002-06-19
EP1103784B1 (de) 2006-02-01
EP1103784A2 (de) 2001-05-30
US6621578B1 (en) 2003-09-16

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Legal Events

Date Code Title Description
8332 No legal effect for de