[go: up one dir, main page]

DE60021848D1 - Keramisches heizgerät - Google Patents

Keramisches heizgerät

Info

Publication number
DE60021848D1
DE60021848D1 DE60021848T DE60021848T DE60021848D1 DE 60021848 D1 DE60021848 D1 DE 60021848D1 DE 60021848 T DE60021848 T DE 60021848T DE 60021848 T DE60021848 T DE 60021848T DE 60021848 D1 DE60021848 D1 DE 60021848D1
Authority
DE
Germany
Prior art keywords
heat generation
generation bodies
ceramic heater
level
ceramic substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60021848T
Other languages
English (en)
Other versions
DE60021848T2 (de
Inventor
Yasutaka Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Application granted granted Critical
Publication of DE60021848D1 publication Critical patent/DE60021848D1/de
Publication of DE60021848T2 publication Critical patent/DE60021848T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
    • H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
    • H05B3/143—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds applied to semiconductors, e.g. wafers heating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
    • H05B3/28—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
    • H05B3/283—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Resistance Heating (AREA)
  • Surface Heating Bodies (AREA)
DE60021848T 1999-11-19 2000-02-15 Keramisches heizgerät Expired - Lifetime DE60021848T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP33027099 1999-11-19
JP33027099 1999-11-19
JP33564199 1999-11-26
JP33564199 1999-11-26
PCT/JP2000/000815 WO2001039551A1 (fr) 1999-11-19 2000-02-15 Plaque chauffante en ceramique

Publications (2)

Publication Number Publication Date
DE60021848D1 true DE60021848D1 (de) 2005-09-15
DE60021848T2 DE60021848T2 (de) 2006-06-08

Family

ID=26573474

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60021848T Expired - Lifetime DE60021848T2 (de) 1999-11-19 2000-02-15 Keramisches heizgerät

Country Status (5)

Country Link
US (2) US20020043530A1 (de)
EP (1) EP1124404B1 (de)
AT (1) ATE301916T1 (de)
DE (1) DE60021848T2 (de)
WO (1) WO2001039551A1 (de)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000069219A1 (fr) 1999-05-07 2000-11-16 Ibiden Co., Ltd. Plaque chauffante et son procede de fabrication
JP3293594B2 (ja) * 1999-06-29 2002-06-17 住友電気工業株式会社 光ファイバ融着接続部の保護部材加熱装置及び加熱方法
JP2001118662A (ja) 1999-08-09 2001-04-27 Ibiden Co Ltd セラミックヒータ
JP3381909B2 (ja) * 1999-08-10 2003-03-04 イビデン株式会社 半導体製造・検査装置用セラミックヒータ
WO2001013423A1 (fr) * 1999-08-10 2001-02-22 Ibiden Co., Ltd. Plaque ceramique pour dispositif de production de semi-conducteurs
JP3273773B2 (ja) * 1999-08-12 2002-04-15 イビデン株式会社 半導体製造・検査装置用セラミックヒータ、半導体製造・検査装置用静電チャックおよびウエハプローバ用チャックトップ
WO2001017927A1 (fr) * 1999-09-06 2001-03-15 Ibiden Co., Ltd. Briquette et substrat ceramique en nitrure d'aluminium carbone fritte destine a des equipements de fabrication ou de verification de semi-conducteurs
EP1383167A1 (de) 1999-12-09 2004-01-21 Ibiden Co., Ltd. Keramische scheibe für ein halbleitererzeugungs/inspektionsgerät
JP2001237053A (ja) * 1999-12-14 2001-08-31 Ibiden Co Ltd 半導体製造・検査装置用セラミックヒータおよび支持ピン
US20040222211A1 (en) * 1999-12-28 2004-11-11 Ibiden Co., Ltd. Carbon-containing aluminum nitride sintered body, and ceramic substrate for a semiconductor producing/examining device
US20040011782A1 (en) * 1999-12-29 2004-01-22 Ibiden Co., Ltd Ceramic heater
JP3228924B2 (ja) * 2000-01-21 2001-11-12 イビデン株式会社 半導体製造・検査装置用セラミックヒータ
US7011874B2 (en) 2000-02-08 2006-03-14 Ibiden Co., Ltd. Ceramic substrate for semiconductor production and inspection devices
US6861165B2 (en) * 2000-02-24 2005-03-01 Ibiden Co., Ltd. Aluminum nitride sintered compact, ceramic substrate, ceramic heater and electrostatic chuck
JP2001247382A (ja) 2000-03-06 2001-09-11 Ibiden Co Ltd セラミック基板
JP2001253777A (ja) * 2000-03-13 2001-09-18 Ibiden Co Ltd セラミック基板
EP1233651A1 (de) * 2000-04-07 2002-08-21 Ibiden Co., Ltd. Keramisches heizelement
US20040149718A1 (en) * 2000-04-07 2004-08-05 Yasutaka Ito Ceramic heater
JP2002025758A (ja) * 2000-05-02 2002-01-25 Ibiden Co Ltd ホットプレートユニット
US7071551B2 (en) 2000-05-26 2006-07-04 Ibiden Co., Ltd. Device used to produce or examine semiconductors
JP3516392B2 (ja) 2000-06-16 2004-04-05 イビデン株式会社 半導体製造・検査装置用ホットプレート
WO2002003434A1 (fr) 2000-07-03 2002-01-10 Ibiden Co., Ltd. Radiateur ceramique pour appareil de fabrication ou de test de semi-conducteurs
EP1229572A1 (de) * 2000-07-04 2002-08-07 Ibiden Co., Ltd. Heisse platte für die verarbeitung und das testen von halbleitern
EP1304729A1 (de) * 2000-07-19 2003-04-23 Ibiden Co., Ltd. Keramikheizer für halbleiterfertigungs und test, seine herstellungsmethode und productionssystem dafür
US6815646B2 (en) * 2000-07-25 2004-11-09 Ibiden Co., Ltd. Ceramic substrate for semiconductor manufacture/inspection apparatus, ceramic heater, electrostatic clampless holder, and substrate for wafer prober
EP1251551A1 (de) * 2000-08-30 2002-10-23 Ibiden Co., Ltd. Keramischer heizkörper für halbleiter und inspektionsausrüstungen
JP2002160974A (ja) * 2000-11-22 2002-06-04 Ibiden Co Ltd 窒化アルミニウム焼結体、窒化アルミニウム焼結体の製造方法、セラミック基板およびセラミック基板の製造方法
EP1345472A1 (de) 2000-11-24 2003-09-17 Ibiden Co., Ltd. Keramisches heizelement und verfahren zu seiner herstellung
JPWO2002084717A1 (ja) * 2001-04-11 2004-08-05 イビデン株式会社 半導体製造・検査装置用セラミックヒータ
EP1422754A1 (de) 2001-08-10 2004-05-26 Ibiden Co., Ltd. Keramischer verbindungskörper
US7193180B2 (en) * 2003-05-21 2007-03-20 Lexmark International, Inc. Resistive heater comprising first and second resistive traces, a fuser subassembly including such a resistive heater and a universal heating apparatus including first and second resistive traces
JP4684222B2 (ja) * 2004-03-19 2011-05-18 株式会社クリエイティブ テクノロジー 双極型静電チャック
US7774326B2 (en) * 2004-06-25 2010-08-10 Apple Inc. Methods and systems for managing data
US8071916B2 (en) * 2004-06-28 2011-12-06 Kyocera Corporation Wafer heating apparatus and semiconductor manufacturing apparatus
US20060088692A1 (en) * 2004-10-22 2006-04-27 Ibiden Co., Ltd. Ceramic plate for a semiconductor producing/examining device
JP5199859B2 (ja) * 2008-12-24 2013-05-15 株式会社日本マイクロニクス プローブカード
US20120006809A1 (en) * 2010-06-23 2012-01-12 Colorado State University Research Foundation Sublimation crucible with embedded heater element
JP5915026B2 (ja) * 2011-08-26 2016-05-11 住友大阪セメント株式会社 温度測定用板状体及びそれを備えた温度測定装置
DE102013113048A1 (de) * 2013-11-26 2015-05-28 Aixtron Se Heizvorrichtung für einen Suszeptor eines CVD-Reaktors
JP5962833B2 (ja) * 2015-01-16 2016-08-03 Toto株式会社 静電チャック
CN113675115A (zh) * 2015-05-22 2021-11-19 应用材料公司 方位可调整的多区域静电夹具
JP6643353B2 (ja) * 2015-11-12 2020-02-12 京セラ株式会社 ヒータ
US20170140956A1 (en) * 2015-11-13 2017-05-18 Varian Semiconductor Equipment Associates, Inc. Single Piece Ceramic Platen
JP6758143B2 (ja) * 2016-09-29 2020-09-23 日本特殊陶業株式会社 加熱装置
WO2018128449A1 (ko) * 2017-01-06 2018-07-12 엘지이노텍 주식회사 히팅 로드 및 이를 포함하는 히터
US20210398829A1 (en) * 2018-11-30 2021-12-23 Lam Research Corporation Ceramic pedestal with multi-layer heater for enhanced thermal uniformity

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1112582A (en) * 1913-10-07 1914-10-06 Frank R Whittlesey Electric heater.
US1436657A (en) * 1921-11-26 1922-11-28 Clarence B Ingersoll Electrical heating device
US1799168A (en) * 1930-02-05 1931-04-07 Johnson Axel Electric heating unit
US1998764A (en) * 1933-01-20 1935-04-23 Volgt & Haeffner Ag Electric hot plate
US2458251A (en) * 1937-01-13 1949-01-04 Entpr S Electr Fribourgeoises Solid electric heating plate
US2249476A (en) * 1938-09-26 1941-07-15 John A Knight Electric hot plate
JPS5769183U (de) * 1980-10-15 1982-04-26
US4449039A (en) * 1981-09-14 1984-05-15 Nippondenso Co., Ltd. Ceramic heater
JPS62167396U (de) * 1986-04-11 1987-10-23
JPS62291937A (ja) * 1986-06-12 1987-12-18 Matsushita Electric Ind Co Ltd プロ−バ
EP0493089B1 (de) * 1990-12-25 1998-09-16 Ngk Insulators, Ltd. Heizungsapparat für eine Halbleiterscheibe und Verfahren zum Herstellen desselben
JPH05326112A (ja) * 1992-05-21 1993-12-10 Shin Etsu Chem Co Ltd 複層セラミックスヒーター
JP2898838B2 (ja) * 1993-02-23 1999-06-02 日本碍子株式会社 加熱装置
US5750958A (en) * 1993-09-20 1998-05-12 Kyocera Corporation Ceramic glow plug
JPH07307377A (ja) * 1993-12-27 1995-11-21 Shin Etsu Chem Co Ltd 静電チャック付セラミックスヒーター
JP2647799B2 (ja) * 1994-02-04 1997-08-27 日本碍子株式会社 セラミックスヒーター及びその製造方法
JP2813148B2 (ja) * 1994-03-02 1998-10-22 日本碍子株式会社 セラミックス製品
TW444922U (en) * 1994-09-29 2001-07-01 Tokyo Electron Ltd Heating device and the processing device using the same
US6133557A (en) * 1995-01-31 2000-10-17 Kyocera Corporation Wafer holding member
US5556043A (en) * 1995-02-06 1996-09-17 Lake Superior Paper Industries Angled-rib blocking slab for pulpwood grinder
US5886863A (en) * 1995-05-09 1999-03-23 Kyocera Corporation Wafer support member
EP0899986B1 (de) * 1996-05-05 2004-11-24 Tateho Chemical Industries Co., Ltd. Elektrisches heizelement und mit diesem versehehe spannnvorrichtung
JPH11204238A (ja) * 1998-01-08 1999-07-30 Ngk Insulators Ltd セラミックスヒーター
JPH11260534A (ja) * 1998-01-09 1999-09-24 Ngk Insulators Ltd 加熱装置およびその製造方法
JPH11251040A (ja) * 1998-02-27 1999-09-17 Kyocera Corp セラミックヒータ及びその製造方法
JP4028149B2 (ja) * 2000-02-03 2007-12-26 日本碍子株式会社 加熱装置
JP4156788B2 (ja) * 2000-10-23 2008-09-24 日本碍子株式会社 半導体製造装置用サセプター
JP3982674B2 (ja) * 2001-11-19 2007-09-26 日本碍子株式会社 セラミックヒーター、その製造方法および半導体製造装置用加熱装置
JP3888531B2 (ja) * 2002-03-27 2007-03-07 日本碍子株式会社 セラミックヒーター、セラミックヒーターの製造方法、および金属部材の埋設品
JP3833974B2 (ja) * 2002-08-21 2006-10-18 日本碍子株式会社 加熱装置の製造方法

Also Published As

Publication number Publication date
US20030015521A1 (en) 2003-01-23
ATE301916T1 (de) 2005-08-15
DE60021848T2 (de) 2006-06-08
EP1124404A1 (de) 2001-08-16
EP1124404B1 (de) 2005-08-10
US20020043530A1 (en) 2002-04-18
WO2001039551A1 (fr) 2001-05-31
EP1124404A4 (de) 2003-01-29

Similar Documents

Publication Publication Date Title
DE60021848D1 (de) Keramisches heizgerät
EP1039537A3 (de) Wärmeleitendes Harz-Substrat und Halbleitergehäuse
GB9125889D0 (en) Improvements in and relating to paper machine clothing
EP1266767A3 (de) Flachdruckplattenvorläufer, Substrat dafür und hydrophiles Oberflächenmaterial
ATE273131T1 (de) Strahlungshärtbare verbundschichtplatte oder - folie
DE60112033D1 (de) Heisse platte
DE50110502D1 (de) Piezokeramischer biegewandler sowie verwendung des piezokeramischen biegewandlers
CA2094498A1 (en) Positive temperature coefficient thermistor heater device
EP1396339A3 (de) Flachdruckplattenvorläufer
EP0798949A3 (de) Keramisches Heizelement
FR2833256B1 (fr) Plaques vitroceramiques, plaques de cuisson les comprenant et leurs procedes de fabrication
WO2000079259A3 (de) Gassensor mit planarem sensorelement, dessen längskanten eine fase aufweisen zur erhöhung der thermoschockfestigkeit
IT1311273B1 (it) Piatra di vetro ceramica.
EP0993233A3 (de) Induktor für ein Induktions-Kochfeld
ATE310202T1 (de) Wärmestrahlung reflektierende schicht- poröse metaloxid-folie verbundisolierung
DE60235720D1 (de) Wärmetauscherplatte
EP1345264A4 (de) Keramische leiterplatte des integraltyps und verfahren zu ihrer herstellung
JP2000128654A5 (de)
ES2106923T3 (es) Hoja de transferencia termica.
ATE348228T1 (de) Wärmedämmplatte und deren verwendung bei der sanierung von flachdächern
IT1312566B1 (it) Apparecchio di cottura con fondo adatto all'adduzione di energiatermica mediante conduzione ed induzione elettromagnetica.
PL366923A1 (en) Construction tile
SE9602866D0 (sv) Keramisk spishäll
EP1080921A3 (de) Thermokopf
JP2009123785A5 (de)

Legal Events

Date Code Title Description
8364 No opposition during term of opposition