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DE60018125D1 - Steurung der Ionendosis in einem Implantierungsgerät - Google Patents

Steurung der Ionendosis in einem Implantierungsgerät

Info

Publication number
DE60018125D1
DE60018125D1 DE60018125T DE60018125T DE60018125D1 DE 60018125 D1 DE60018125 D1 DE 60018125D1 DE 60018125 T DE60018125 T DE 60018125T DE 60018125 T DE60018125 T DE 60018125T DE 60018125 D1 DE60018125 D1 DE 60018125D1
Authority
DE
Germany
Prior art keywords
control
implantation device
ion dose
dose
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60018125T
Other languages
English (en)
Other versions
DE60018125T2 (de
Inventor
Marvin Farley
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of DE60018125D1 publication Critical patent/DE60018125D1/de
Publication of DE60018125T2 publication Critical patent/DE60018125T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H01J2237/31703—Dosimetry

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
DE60018125T 1999-04-19 2000-04-14 Steurung der Ionendosis in einem Implantierungsgerät Expired - Fee Related DE60018125T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US293942 1999-04-19
US09/293,942 US6297510B1 (en) 1999-04-19 1999-04-19 Ion implant dose control

Publications (2)

Publication Number Publication Date
DE60018125D1 true DE60018125D1 (de) 2005-03-24
DE60018125T2 DE60018125T2 (de) 2006-01-26

Family

ID=23131226

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60018125T Expired - Fee Related DE60018125T2 (de) 1999-04-19 2000-04-14 Steurung der Ionendosis in einem Implantierungsgerät

Country Status (4)

Country Link
US (1) US6297510B1 (de)
EP (1) EP1047103B1 (de)
JP (1) JP4974402B2 (de)
DE (1) DE60018125T2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7547460B2 (en) * 2000-09-15 2009-06-16 Varian Semiconductor Equipment Associates, Inc. Ion implanter optimizer scan waveform retention and recovery
US6657209B2 (en) * 2000-09-20 2003-12-02 Axcelis Technologies, Inc. Method and system for determining pressure compensation factors in an ion implanter
KR100412354B1 (ko) * 2001-05-30 2003-12-31 삼성전자주식회사 이온주입장치
US6661017B1 (en) * 2002-05-29 2003-12-09 Ibis Technology Corporation Ion implantation system having an energy probe
US7611975B2 (en) * 2002-09-23 2009-11-03 Applied Materials, Inc. Method of implanting a substrate and an ion implanter for performing the method
US7189980B2 (en) * 2003-05-09 2007-03-13 Varian Semiconductor Equipment Associates, Inc. Methods and systems for optimizing ion implantation uniformity control
JP2005005098A (ja) * 2003-06-11 2005-01-06 Sumitomo Eaton Noba Kk イオン注入装置及びその制御方法
JP4738723B2 (ja) * 2003-08-06 2011-08-03 キヤノン株式会社 マルチ荷電粒子線描画装置、荷電粒子線の電流の測定方法及びデバイス製造方法
US7009193B2 (en) * 2003-10-31 2006-03-07 Infineon Technologies Richmond, Lp Utilization of an ion gauge in the process chamber of a semiconductor ion implanter
TWI225272B (en) * 2003-11-04 2004-12-11 Promos Technologies Inc Method of controlling implanting dosage and method of controlling pressure compensate factor in-situ
GB2409926B (en) * 2004-01-06 2006-11-29 Applied Materials Inc Ion beam monitoring arrangement
US7745803B2 (en) * 2004-02-03 2010-06-29 Sharp Kabushiki Kaisha Ion doping apparatus, ion doping method, semiconductor device and method of fabricating semiconductor device
US6870170B1 (en) * 2004-03-04 2005-03-22 Applied Materials, Inc. Ion implant dose control
GB2432040B (en) * 2004-03-04 2007-11-28 Applied Materials Inc Ion implant dose control
US7348568B2 (en) * 2004-06-24 2008-03-25 Lawrence Livermore Natonal Security, Llc Electron beam diagnostic for profiling high power beams
US6965116B1 (en) * 2004-07-23 2005-11-15 Applied Materials, Inc. Method of determining dose uniformity of a scanning ion implanter
KR100675891B1 (ko) 2005-05-04 2007-02-02 주식회사 하이닉스반도체 불균일 이온주입장치 및 불균일 이온주입방법
US7385208B2 (en) * 2005-07-07 2008-06-10 Taiwan Semiconductor Manufacturing Co., Ltd. Systems and methods for implant dosage control
WO2009045722A1 (en) * 2007-09-28 2009-04-09 Varian Semiconductor Equipment Associates, Inc. Two-diemensional uniformity correction for ion beam assisted etching
US7825389B2 (en) * 2007-12-04 2010-11-02 Tel Epion Inc. Method and apparatus for controlling a gas cluster ion beam formed from a gas mixture
US8044374B2 (en) * 2009-06-30 2011-10-25 Twin Creeks Technologies, Inc. Ion implantation apparatus
US8698110B2 (en) * 2011-05-05 2014-04-15 Advanced Ion Beam Technology, Inc. Ion implanting system
US8633458B2 (en) 2011-11-15 2014-01-21 Gtat Corporation Ion implant apparatus and a method of implanting ions
US10483086B2 (en) * 2014-12-26 2019-11-19 Axcelis Technologies, Inc. Beam profiling speed enhancement for scanned beam implanters
US10159991B2 (en) 2015-02-14 2018-12-25 Waxman Consumer Products Group Inc. Showerhead with filter cartridge assembly
CN114242556B (zh) * 2021-12-21 2023-07-11 中国科学院合肥物质科学研究院 一种电子倍增管的电流反馈保护方法及系统

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4234797A (en) 1979-05-23 1980-11-18 Nova Associates, Inc. Treating workpieces with beams
US4539217A (en) 1984-06-27 1985-09-03 Eaton Corporation Dose control method
US4587433A (en) 1984-06-27 1986-05-06 Eaton Corporation Dose control apparatus
US4680474A (en) 1985-05-22 1987-07-14 Varian Associates, Inc. Method and apparatus for improved ion dose accuracy
JPH077658B2 (ja) 1989-05-15 1995-01-30 日新電機株式会社 イオン注入装置
US5229615A (en) 1992-03-05 1993-07-20 Eaton Corporation End station for a parallel beam ion implanter
US5672882A (en) * 1995-12-29 1997-09-30 Advanced Micro Devices, Inc. Ion implantation device with a closed-loop process chamber pressure control system
US5760409A (en) 1996-06-14 1998-06-02 Eaton Corporation Dose control for use in an ion implanter
US5898179A (en) 1997-09-10 1999-04-27 Orion Equipment, Inc. Method and apparatus for controlling a workpiece in a vacuum chamber

Also Published As

Publication number Publication date
DE60018125T2 (de) 2006-01-26
EP1047103A3 (de) 2001-04-04
EP1047103A2 (de) 2000-10-25
US6297510B1 (en) 2001-10-02
JP4974402B2 (ja) 2012-07-11
JP2000353671A (ja) 2000-12-19
EP1047103B1 (de) 2005-02-16

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee