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DE58908411D1 - Hochauflösender Photoresist. - Google Patents

Hochauflösender Photoresist.

Info

Publication number
DE58908411D1
DE58908411D1 DE58908411T DE58908411T DE58908411D1 DE 58908411 D1 DE58908411 D1 DE 58908411D1 DE 58908411 T DE58908411 T DE 58908411T DE 58908411 T DE58908411 T DE 58908411T DE 58908411 D1 DE58908411 D1 DE 58908411D1
Authority
DE
Germany
Prior art keywords
high resolution
resolution photoresist
photoresist
resolution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE58908411T
Other languages
English (en)
Inventor
Michael Dr Rer Nat Dipl Sebald
Recai Dr Ing Dipl Chem Sezi
Rainer Dr Rer Nat Di Leuschner
Siegfried Dr Rer Nat Di Birkle
Hellmut Dr Ing Dipl Chem Ahne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Siemens Corp
Original Assignee
Siemens AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG, Siemens Corp filed Critical Siemens AG
Application granted granted Critical
Publication of DE58908411D1 publication Critical patent/DE58908411D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE58908411T 1989-03-20 1989-03-20 Hochauflösender Photoresist. Expired - Lifetime DE58908411D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP89104950A EP0388484B1 (de) 1989-03-20 1989-03-20 Hochauflösender Photoresist

Publications (1)

Publication Number Publication Date
DE58908411D1 true DE58908411D1 (de) 1994-10-27

Family

ID=8201114

Family Applications (1)

Application Number Title Priority Date Filing Date
DE58908411T Expired - Lifetime DE58908411D1 (de) 1989-03-20 1989-03-20 Hochauflösender Photoresist.

Country Status (3)

Country Link
EP (1) EP0388484B1 (de)
JP (1) JP2954264B2 (de)
DE (1) DE58908411D1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2101710T3 (es) * 1990-12-20 1997-07-16 Siemens Ag Procedimiento fotolitografico.
EP0494383B1 (de) * 1990-12-20 1996-08-14 Siemens Aktiengesellschaft Photoresist
ES2076450T3 (es) * 1990-12-20 1995-11-01 Siemens Ag Polimeros mixtos.
US6004720A (en) 1993-12-28 1999-12-21 Fujitsu Limited Radiation sensitive material and method for forming pattern
WO1996024621A1 (de) * 1995-02-06 1996-08-15 Siemens Aktiengesellschaft Polymere für strahlungsempfindliche lacke
DE59906054D1 (de) * 1998-04-24 2003-07-31 Infineon Technologies Ag Filmbildende Polymere
DE59908549D1 (de) * 1998-04-24 2004-03-25 Infineon Technologies Ag Strahlungsempfindliches Gemisch und dessen Verwendung

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2990281A (en) * 1956-12-17 1961-06-27 Monsanto Chemicals Photosensitive resinous compositions and photographic elements
NL103895C (de) * 1957-08-01
DE1447010C3 (de) * 1963-07-04 1975-05-28 Hoechst Ag, 6000 Frankfurt Vorsensibilisierte Druckplatte zur Herstellung von Flach- und Hochdruckformen und Verfahren zum Herstellen der Druckformen
DE2217744A1 (de) * 1972-04-13 1973-10-18 Agfa Gevaert Ag Lichtempfindliche polymere
DE2718130C2 (de) * 1977-04-23 1979-05-17 Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf lichtempfindliches Aufzeichnungsmaterial
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS5811932A (ja) * 1981-07-15 1983-01-22 Konishiroku Photo Ind Co Ltd 感光性組成物
JP2619358B2 (ja) * 1986-01-08 1997-06-11 株式会社日立製作所 感光性樹脂組成物
US4720445A (en) * 1986-02-18 1988-01-19 Allied Corporation Copolymers from maleimide and aliphatic vinyl ethers and esters used in positive photoresist
WO1989007786A1 (en) * 1988-02-17 1989-08-24 Tosoh Corporation Photoresist composition

Also Published As

Publication number Publication date
EP0388484B1 (de) 1994-09-21
JP2954264B2 (ja) 1999-09-27
JPH02282746A (ja) 1990-11-20
EP0388484A1 (de) 1990-09-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition