DE3851921D1 - Photopolymerisierbare Zusammensetzung. - Google Patents

Photopolymerisierbare Zusammensetzung.

Info

Publication number: DE3851921D1
Authority: DE; Germany
Prior art keywords: photopolymerizable composition; photopolymerizable; composition
Prior art date: 1987-07-21
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE3851921T

Other languages

English (en)

Other versions

DE3851921T2 (de

Inventor

Hideki Nagasaka

Katsuko Ohta

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Mitsubishi Kasei Corp

Original Assignee

Mitsubishi Kasei Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1987-07-21

Filing date

1988-07-18

Publication date

1994-12-01

1988-07-18 Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp

1994-12-01 Application granted granted Critical

1994-12-01 Publication of DE3851921D1 publication Critical patent/DE3851921D1/de

1995-05-24 Publication of DE3851921T2 publication Critical patent/DE3851921T2/de

2008-07-19 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical

Landscapes

Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Medicinal Chemistry (AREA)
Polymers & Plastics (AREA)
Organic Chemistry (AREA)
Polymerisation Methods In General (AREA)
Materials For Photolithography (AREA)

DE3851921T 1987-07-21 1988-07-18 Photopolymerisierbare Zusammensetzung. Expired - Fee Related DE3851921T2 (de)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP18131787		1987-07-21
JP4901788		1988-03-02
JP63145037A JP2538992B2 (ja)	1987-07-21	1988-06-13	光重合性組成物

Publications (2)

Publication Number	Publication Date
DE3851921D1 true DE3851921D1 (de)	1994-12-01
DE3851921T2 DE3851921T2 (de)	1995-05-24

Family

ID=27293490

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE3851921T Expired - Fee Related DE3851921T2 (de)	1987-07-21	1988-07-18	Photopolymerisierbare Zusammensetzung.

Country Status (5)

Country	Link
US (1)	US4966830A (de)
EP (1)	EP0300410B1 (de)
JP (1)	JP2538992B2 (de)
AU (1)	AU603235B2 (de)
DE (1)	DE3851921T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4874685A (en) *	1987-11-27	1989-10-17	The Mead Corporation	Photocurable composition containing a photoreducible dye a thiol and an N,N'-dialkylaniline
JP2571113B2 (ja) *	1988-12-29	1997-01-16	富士写真フイルム株式会社	光重合性組成物
JP3070184B2 (ja) *	1991-10-18	2000-07-24	三菱化学株式会社	光重合性組成物及び感光材料
US5236808A (en) *	1992-04-13	1993-08-17	E. I. Du Pont De Nemours And Company	Visible photosensitizers for photopolymerizable compositions
US5484927A (en) *	1992-04-13	1996-01-16	E. I. Du Pont De Nemours And Company	Visible dye photosensitizers derived from tropinone
EP0780731B1 (de)	1995-12-22	2002-04-17	Mitsubishi Chemical Corporation	Fotopolymerisierbare Zusammensetzung für einen Farbfilter, Farbfilter und Flüssigkristallanzeigevorrichtung
US5786127A (en) *	1996-08-15	1998-07-28	Western Litho Plate & Supply Co.	Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
US20020064728A1 (en)	1996-09-05	2002-05-30	Weed Gregory C.	Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes
EP0889363B1 (de) *	1997-07-03	2005-10-05	E.I. Du Pont De Nemours And Company	Nahinfrarot-empfindliche abbildbare/photopolymerisierbare Zusammensetzungen, Media und verbundene Verfahren
US7830472B2 (en)	2004-04-26	2010-11-09	Mitsubishi Chemical Corporation	Blue color composition for color filter, color filter, and color image display device
JP2006071916A (ja) *	2004-09-01	2006-03-16	Mitsubishi Chemicals Corp	青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
WO2007090550A1 (en) *	2006-02-08	2007-08-16	Kodak Graphic Communications Gmbh	Uv-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer
CN101024920A (zh) *	2006-02-21	2007-08-29	罗门哈斯公司	处理过的制品及其制造和使用方法
EP2009486A4 (de)	2006-04-19	2009-12-09	Mitsubishi Chem Corp	Farbbildanzeigeeinrichtung
US20100039685A1 (en) *	2006-09-05	2010-02-18	Mitsubishi Chemical Corporation	Volume hologram optical recording medium, composition for forming volume hologram recording layer, volume hologram recording material, and volume hologram optical recording method
TW200830299A (en)	2006-10-25	2008-07-16	Mitsubishi Chem Corp	Volume hologram optical recording medium, composition for volume hologram recording layer formation, and volume hologram recording material
CN101939857B (zh)	2008-02-07	2013-05-15	三菱化学株式会社	半导体发光装置、背光源、彩色图像显示装置以及这些中使用的荧光体
CN104447681B (zh) *	2013-09-17	2018-05-01	北京大学	用于治疗癌症的化合物及其制备方法和用途
EP3147335A1 (de)	2015-09-23	2017-03-29	BYK-Chemie GmbH	Farbmittelzusammensetzungen mit netz- und/oder dispergiermittel mit geringer aminzahl

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4147552A (en) *	1976-05-21	1979-04-03	Eastman Kodak Company	Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers
US4162162A (en) *	1978-05-08	1979-07-24	E. I. Du Pont De Nemours And Company	Derivatives of aryl ketones and p-dialkyl-aminoarylaldehydes as visible sensitizers of photopolymerizable compositions
CA1143081A (en) *	1979-01-17	1983-03-15	Kazumasa Kamada	Coating composition and process for producing synthetic resin moldings by using the same
EP0035272B1 (de) *	1980-03-04	1984-07-25	Mitsubishi Rayon Co., Ltd.	Überzugszusammensetzung und Verfahren zur Herstellung synthetischer Harzformteile unter Verwendung dieser Zusammensetzung
JPS56141309A (en) *	1980-04-03	1981-11-05	Mitsubishi Rayon Co Ltd	Coating composition and preparation of synthetic resin molded article using the same
JPS5721401A (en) *	1980-07-14	1982-02-04	Mitsubishi Chem Ind Ltd	Photopolymerizable composition
JPS5815503A (ja) *	1981-07-20	1983-01-28	Fuji Photo Film Co Ltd	光重合性組成物
JPH0230321B2 (ja) *	1981-07-28	1990-07-05	Mitsubishi Chem Ind	Hikarijugoseisoseibutsu
US4454218A (en) *	1982-09-13	1984-06-12	E. I. Du Pont De Nemours And Company	N-Alkylindolylidene and N-alkylbenzo-thiazolylidene alkanones as sensitizers for photopolymer compositions
JPS5956403A (ja) *	1982-09-27	1984-03-31	Mitsubishi Chem Ind Ltd	光重合性組成物
JPS5971048A (ja) *	1982-10-18	1984-04-21	Mitsubishi Chem Ind Ltd	光重合系感光性組成物
EP0127762B1 (de) *	1983-05-02	1987-07-22	E.I. Du Pont De Nemours And Company	N-Alkyl-Amino-Aryl-Keton als Sensibilisator in Photopolymer-Zusammensetzungen
JPH0629285B2 (ja) *	1983-10-14	1994-04-20	三菱化成株式会社	光重合性組成物
GB8525027D0 (en) *	1985-10-10	1985-11-13	Autotype Int Ltd	Water soluble photoinitiators
CA1308852C (en) *	1987-01-22	1992-10-13	Masami Kawabata	Photopolymerizable composition

1988
- 1988-06-13 JP JP63145037A patent/JP2538992B2/ja not_active Expired - Fee Related
- 1988-07-12 US US07/217,981 patent/US4966830A/en not_active Expired - Lifetime
- 1988-07-18 EP EP88111530A patent/EP0300410B1/de not_active Expired - Lifetime
- 1988-07-18 DE DE3851921T patent/DE3851921T2/de not_active Expired - Fee Related
- 1988-07-19 AU AU19139/88A patent/AU603235B2/en not_active Ceased

Also Published As

Publication number	Publication date
DE3851921T2 (de)	1995-05-24
AU1913988A (en)	1989-01-27
EP0300410A3 (en)	1990-12-05
AU603235B2 (en)	1990-11-08
EP0300410B1 (de)	1994-10-26
JP2538992B2 (ja)	1996-10-02
EP0300410A2 (de)	1989-01-25
US4966830A (en)	1990-10-30
JPH0269A (ja)	1990-01-05

Publication	Publication Date	Title
DE68921867D1 (de)	1995-04-27	Photopolymerisierbare Zusammensetzung.
DE3884461D1 (de)	1993-11-04	Antibiotikum-polymer zusammensetzung.
DE3677276D1 (de)	1991-03-07	Photopolymerisierbare zusammensetzung.
DE68914176D1 (de)	1994-05-05	Photopolymerisierbare Zusammensetzung.
DE3873550D1 (de)	1992-09-17	Photopolymerisierbare zusammensetzungen.
DE68915148D1 (de)	1994-06-09	Fotoresist-zusammensetzung.
DE3870011D1 (de)	1992-05-21	Hartbutter-zusammensetzung.
DE68907659D1 (de)	1993-08-26	Warmhaertende organosiloxanzusammensetzung.
FI883238A0 (fi)	1988-07-06	Mikrobicid komposition.
DE3774763D1 (de)	1992-01-09	Carboxy-benzotriazole enthaltende photopolymerisierbare zusammensetzung.
DE3853694D1 (de)	1995-06-08	Photolackzusammensetzung.
DE3851921D1 (de)	1994-12-01	Photopolymerisierbare Zusammensetzung.
DE68916395D1 (de)	1994-07-28	Zusammensetzung.
DE3482215D1 (de)	1990-06-13	Photopolymerisierbare zusammensetzung.
FI880158A0 (fi)	1988-01-14	Diuretisk komposition.
DE3869471D1 (de)	1992-04-30	Fiebersteigende zusammensetzung.
DE3888400D1 (de)	1994-04-21	Photoresistzusammensetzungen.
DE3871083D1 (de)	1992-06-17	Photopolymerisierbare zusammensetzungen.
NO885026L (no)	1989-06-08	Aluminium-motstandsdyktige ildfaste sammensetninger.
DE68919102D1 (de)	1994-12-08	Photopolymerisierbare Zusammensetzung.
DE3874071D1 (de)	1992-10-01	Zahnsteinverhindernde zusammensetzung.
DE3850459D1 (de)	1994-08-04	Lichtempfindliche Zusammensetzungen.
DE68906193D1 (de)	1993-06-03	Hypersphyxia verursachende zusammensetzung.
DE3768145D1 (de)	1991-04-04	Photopolymerisierbare zusammensetzung.
DE3877063D1 (de)	1993-02-11	Photopolymerisierbare dentalzusammensetzung.

Legal Events

Date	Code	Title	Description
1995-11-23	8364	No opposition during term of opposition
2000-09-07	8339	Ceased/non-payment of the annual fee