DE3788103D1 - Lichtempfindliche Zusammensetzung. - Google Patents

Lichtempfindliche Zusammensetzung.

Info

Publication number: DE3788103D1
Authority: DE; Germany
Prior art keywords: photosensitive composition; photosensitive; composition
Prior art date: 1986-08-29
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE87307544T

Other languages

English (en)

Other versions

DE3788103T2 (de

Inventor

Akinobu Fuji Photo Film Koike

Yukio Fuji Photo Film Co Abe

Koichi Fuji Photo Fil Kawamura

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fujifilm Corp

Original Assignee

Fuji Photo Film Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-08-29

Filing date

1987-08-26

Publication date

1993-12-16

1987-08-26 Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd

1993-12-16 Publication of DE3788103D1 publication Critical patent/DE3788103D1/de

1994-03-03 Application granted granted Critical

1994-03-03 Publication of DE3788103T2 publication Critical patent/DE3788103T2/de

2007-08-27 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

Engineering & Computer Science (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Chemical & Material Sciences (AREA)
Materials Engineering (AREA)
Materials For Photolithography (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

DE87307544T 1986-08-29 1987-08-26 Lichtempfindliche Zusammensetzung. Expired - Lifetime DE3788103T2 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP61202915A JPS6358440A (ja)	1986-08-29	1986-08-29	感光性組成物

Publications (2)

Publication Number	Publication Date
DE3788103D1 true DE3788103D1 (de)	1993-12-16
DE3788103T2 DE3788103T2 (de)	1994-03-03

Family

ID=16465273

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE87307544T Expired - Lifetime DE3788103T2 (de)	1986-08-29	1987-08-26	Lichtempfindliche Zusammensetzung.

Country Status (4)

Country	Link
US (1)	US5064741A (de)
EP (1)	EP0262788B1 (de)
JP (1)	JPS6358440A (de)
DE (1)	DE3788103T2 (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2661317B2 (ja) *	1990-03-27	1997-10-08	松下電器産業株式会社	パターン形成方法
JPH04296754A (ja) *	1991-03-26	1992-10-21	Fuji Photo Film Co Ltd	ポジ型フオトレジスト組成物
US5221592A (en) *	1992-03-06	1993-06-22	Hoechst Celanese Corporation	Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester
JP2944296B2 (ja)	1992-04-06	1999-08-30	富士写真フイルム株式会社	感光性平版印刷版の製造方法
JPH05341522A (ja) *	1992-06-09	1993-12-24	Fuji Photo Film Co Ltd	ネガ型フオトレジスト組成物
US5561029A (en) *	1995-04-28	1996-10-01	Polaroid Corporation	Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates
JP3872829B2 (ja) *	1995-08-30	2007-01-24	株式会社東芝	着色薄膜パターンの製造方法
KR0152497B1 (ko) *	1995-08-31	1998-10-01	박홍기	감광성 조성물
JPH0990621A (ja) *	1995-09-21	1997-04-04	Canon Inc	レジスト組成物、同組成物を用いるパターン形成方法、および半導体デバイスの製造方法
JPH10195568A (ja) *	1997-01-10	1998-07-28	Konica Corp	平版印刷版用アルミニウム合金板
US6602645B1 (en)	1999-05-21	2003-08-05	Fuji Photo Film Co., Ltd.	Photosensitive composition and planographic printing plate base using same
EP1211065B1 (de)	2000-11-30	2009-01-14	FUJIFILM Corporation	Lithographische Druckplattenvorläufer
KR100795112B1 (ko) *	2001-02-05	2008-01-17	후지필름 가부시키가이샤	포지티브 레지스트 조성물
KR100846085B1 (ko) *	2001-10-31	2008-07-14	주식회사 동진쎄미켐	액정표시장치 회로용 포토레지스트 조성물
US20040067435A1 (en)	2002-09-17	2004-04-08	Fuji Photo Film Co., Ltd.	Image forming material
EP2354854B2 (de)	2002-09-20	2016-04-06	FUJIFILM Corporation	Verfahren zur Herstellung einer Flachdruckplatte
JP2006058430A (ja)	2004-08-18	2006-03-02	Fuji Photo Film Co Ltd	平版印刷版原版
JP4404734B2 (ja)	2004-09-27	2010-01-27	富士フイルム株式会社	平版印刷版原版
JP4474296B2 (ja)	2005-02-09	2010-06-02	富士フイルム株式会社	平版印刷版原版
JP4404792B2 (ja)	2005-03-22	2010-01-27	富士フイルム株式会社	平版印刷版原版
JP4092593B2 (ja)	2006-05-18	2008-05-28	富士フイルム株式会社	被乾燥物の乾燥方法及び装置
JP4890403B2 (ja)	2007-09-27	2012-03-07	富士フイルム株式会社	平版印刷版原版
JP2009085984A (ja)	2007-09-27	2009-04-23	Fujifilm Corp	平版印刷版原版
JP2009083106A (ja)	2007-09-27	2009-04-23	Fujifilm Corp	平版印刷版用版面保護剤及び平版印刷版の製版方法
JP4790682B2 (ja)	2007-09-28	2011-10-12	富士フイルム株式会社	平版印刷版原版
JP4994175B2 (ja)	2007-09-28	2012-08-08	富士フイルム株式会社	平版印刷版原版、及びそれに用いる共重合体の製造方法
EP2218519A4 (de)	2007-11-14	2012-03-21	Fujifilm Corp	Verfahren zum trocknen eines beschichtungsfilms und verfahren zur herstellung eines vorläufers für eine lithographische druckplatte
JP2009236355A (ja)	2008-03-26	2009-10-15	Fujifilm Corp	乾燥方法及び装置
JP5164640B2 (ja)	2008-04-02	2013-03-21	富士フイルム株式会社	平版印刷版原版
JP5183380B2 (ja)	2008-09-09	2013-04-17	富士フイルム株式会社	赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja)	2009-03-31	2010-10-21	Fujifilm Corp	平版印刷版原版
EP2481603A4 (de)	2009-09-24	2015-11-18	Fujifilm Corp	Lithografische originaldruckplatte
US8828648B2 (en)	2010-02-17	2014-09-09	Fujifilm Corporation	Method for producing a planographic printing plate
JP5253433B2 (ja)	2010-02-19	2013-07-31	富士フイルム株式会社	平版印刷版の作製方法
WO2011125913A1 (ja)	2010-03-31	2011-10-13	富士フイルム株式会社	平版印刷版原版処理用の現像液、該現像液を用いた平版印刷版の作製方法、及び、印刷方法
JP5490168B2 (ja)	2012-03-23	2014-05-14	富士フイルム株式会社	平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja)	2012-03-30	2014-06-04	富士フイルム株式会社	平版印刷版の作製方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL251799A (de) *	1959-05-19
US3954475A (en) *	1971-09-03	1976-05-04	Minnesota Mining And Manufacturing Company	Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US4164421A (en) *	1972-12-09	1979-08-14	Fuji Photo Film Co., Ltd.	Photocurable composition containing an o-quinonodiazide for printing plate
DE2641100C2 (de) *	1976-09-13	1987-02-26	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches Gemisch
DE2718259C2 (de) *	1977-04-25	1982-11-25	Hoechst Ag, 6000 Frankfurt	Strahlungsempfindliches Gemisch
JPS5495687A (en) *	1978-01-11	1979-07-28	Fuji Photo Film Co Ltd	Photopolymerizable composition
JPS6053300B2 (ja) *	1978-08-29	1985-11-25	富士写真フイルム株式会社	感光性樹脂組成物
DE3144480A1 (de) *	1981-11-09	1983-05-19	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
JPS5978339A (ja) *	1982-10-28	1984-05-07	Fuji Photo Film Co Ltd	光重合性組成物
JPS5989303A (ja) *	1982-11-12	1984-05-23	Fuji Photo Film Co Ltd	光重合性組成物
DE3337024A1 (de) *	1983-10-12	1985-04-25	Hoechst Ag, 6230 Frankfurt	Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
JPH0629285B2 (ja) *	1983-10-14	1994-04-20	三菱化成株式会社	光重合性組成物
JPH0697339B2 (ja) *	1984-02-02	1994-11-30	富士写真フイルム株式会社	光重合性組成物
US4837128A (en) *	1986-08-08	1989-06-06	Fuji Photo Film Co., Ltd.	Light-sensitive composition
GB8627059D0 (en) *	1986-11-12	1986-12-10	Cookson Group Plc	Substituted trialine derivatives

1986
- 1986-08-29 JP JP61202915A patent/JPS6358440A/ja active Granted
1987
- 1987-08-26 EP EP87307544A patent/EP0262788B1/de not_active Expired - Lifetime
- 1987-08-26 DE DE87307544T patent/DE3788103T2/de not_active Expired - Lifetime
1990
- 1990-06-04 US US07/532,238 patent/US5064741A/en not_active Expired - Lifetime

Also Published As

Publication number	Publication date
EP0262788A3 (en)	1989-11-08
DE3788103T2 (de)	1994-03-03
EP0262788B1 (de)	1993-11-10
US5064741A (en)	1991-11-12
JPS6358440A (ja)	1988-03-14
EP0262788A2 (de)	1988-04-06
JPH0581019B2 (de)	1993-11-11

Publication	Publication Date	Title
DE3751555D1 (de)	1995-11-16	Photoempfindliche Zusammensetzung.
DE3788103D1 (de)	1993-12-16	Lichtempfindliche Zusammensetzung.
DE68921146D1 (de)	1995-03-23	Lichtempfindliche Zusammensetzung.
DE3761146D1 (de)	1990-01-18	Detergens-zusammensetzung.
DE3773631D1 (de)	1991-11-14	Polyaethylen-zusammensetzung.
DE68921019D1 (de)	1995-03-23	Lichtempfindliche Zusammensetzungen.
DE69014913D1 (de)	1995-01-26	Lichtempfindliche Zusammensetzung.
NO874939D0 (no)	1987-11-26	Substituerte basiske 2-aminotetraliner.
ES2019932B3 (es)	1991-07-16	Compuestos macrolidos.
FI872896L (fi)	1988-02-01	Nytt haorvaordsmedel.
FI883837L (fi)	1988-08-18	Aoksjuka foerhindrande komposition.
DE3774763D1 (de)	1992-01-09	Carboxy-benzotriazole enthaltende photopolymerisierbare zusammensetzung.
FI875703A0 (fi)	1987-12-23	Laekemedelplaoster-kompositioner.
DE3779948D1 (de)	1992-07-30	Sauerstoff entziehende zusammensetzung.
DE3853694D1 (de)	1995-06-08	Photolackzusammensetzung.
DE3778190D1 (de)	1992-05-21	Substituierte indolochinoxaline.
DE3779951D1 (de)	1992-07-30	Klebrigmachende zusammensetzung.
FI874483A0 (fi)	1987-10-12	Herbicid komposition.
DE3850459D1 (de)	1994-08-04	Lichtempfindliche Zusammensetzungen.
DE3764006D1 (de)	1990-09-06	Substituierte aminoxypropanoate.
DE3768145D1 (de)	1991-04-04	Photopolymerisierbare zusammensetzung.
ES2023141B3 (es)	1992-01-01	Algunas 3-benzoil-4-oxolactamas.
DE3773805D1 (de)	1991-11-21	Zusammensetzung.
NO871953L (no)	1987-11-16	Forbedringer vedr. roekeartikler.
DE3773298D1 (de)	1991-10-31	Anaesthesierende zusammensetzung.

Legal Events

Date	Code	Title	Description
1994-12-08	8364	No opposition during term of opposition
2007-09-20	8327	Change in the person/name/address of the patent owner	Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP