DE3761930D1 - Herstellung von elektronischen bauelementen durch ein lithographisches verfahren. - Google Patents

Herstellung von elektronischen bauelementen durch ein lithographisches verfahren.

Info

Publication number: DE3761930D1
Authority: DE; Germany
Prior art keywords: production; electronic components; lithographic process; lithographic; electronic
Prior art date: 1986-03-06
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE8787103008T

Other languages

English (en)

Inventor

Anthony Edward Novembre

Elsa Reichmanis

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

AT&T Corp

Original Assignee

American Telephone and Telegraph Co Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-03-06

Filing date

1987-03-03

Publication date

1990-04-19

1987-03-03 Application filed by American Telephone and Telegraph Co Inc filed Critical American Telephone and Telegraph Co Inc

1990-04-19 Application granted granted Critical

1990-04-19 Publication of DE3761930D1 publication Critical patent/DE3761930D1/de

2007-03-04 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)

DE8787103008T 1986-03-06 1987-03-03 Herstellung von elektronischen bauelementen durch ein lithographisches verfahren. Expired - Fee Related DE3761930D1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US06/837,018 US4701342A (en)	1986-03-06	1986-03-06	Negative resist with oxygen plasma resistance

Publications (1)

Publication Number	Publication Date
DE3761930D1 true DE3761930D1 (de)	1990-04-19

Family

ID=25273278

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE8787103008T Expired - Fee Related DE3761930D1 (de)	1986-03-06	1987-03-03	Herstellung von elektronischen bauelementen durch ein lithographisches verfahren.

Country Status (5)

Country	Link
US (1)	US4701342A (de)
EP (1)	EP0236914B1 (de)
JP (1)	JP2528110B2 (de)
CA (1)	CA1312843C (de)
DE (1)	DE3761930D1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5064681A (en) *	1986-08-21	1991-11-12	International Business Machines Corporation	Selective deposition process for physical vapor deposition
US5139922A (en) *	1987-04-10	1992-08-18	Matsushita Electronics Corporation	Method of making resist pattern
WO1988009527A2 (en) *	1987-05-21	1988-12-01	Hughes Aircraft Company	Silicon-containing negative resist material, and process for its use in patterning substrates
US4935094A (en) *	1989-05-26	1990-06-19	At&T Bell Laboratories	Negative resist with oxygen plasma resistance
JP2707785B2 (ja) *	1990-03-13	1998-02-04	富士通株式会社	レジスト組成物およびパターン形成方法
US5693928A (en) *	1996-06-27	1997-12-02	International Business Machines Corporation	Method for producing a diffusion barrier and polymeric article having a diffusion barrier
TW574622B (en) *	2000-05-05	2004-02-01	Ibm	Copolymer photoresist with improved etch resistance
WO2011116223A1 (en) *	2010-03-18	2011-09-22	Board Of Regents The University Of Texas System	Silicon-containing block co-polymers, methods for synthesis and use
WO2017110290A1 (ja) *	2015-12-22	2017-06-29	富士フイルム株式会社	パターン形成方法、電子デバイスの製造方法、半導体デバイス製造プロセス用樹脂の製造用モノマー、樹脂、樹脂の製造方法、感活性光線性又は感放射線性樹脂組成物、及び、感活性光線性又は感放射線性膜

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3453136A (en) *	1967-01-05	1969-07-01	Dow Corning	Primer for room temperature vulcanizing polyurethanes
EP0093202B1 (de) *	1982-05-03	1986-06-04	International Business Machines Corporation	Poly(Halostyrol) für Negativwiderstände
US4551417A (en) *	1982-06-08	1985-11-05	Nec Corporation	Method of forming patterns in manufacturing microelectronic devices
JPS59148055A (ja) *	1983-02-14	1984-08-24	Nippon Telegr & Teleph Corp <Ntt>	感エネルギ−線材料及びその使用方法
JPS59148056A (ja) *	1983-02-14	1984-08-24	Nippon Telegr & Teleph Corp <Ntt>	高エネルギ−線感応材料及びその使用方法
JPS59208542A (ja) *	1983-05-12	1984-11-26	Nec Corp	レジスト材料
JPS6069647A (ja) *	1983-09-27	1985-04-20	Fujitsu Ltd	パタ−ン形成方法
US4481049A (en) *	1984-03-02	1984-11-06	At&T Bell Laboratories	Bilevel resist
JPS60212757A (ja) *	1984-04-06	1985-10-25	Nippon Telegr & Teleph Corp <Ntt>	レジスト材料
JPS61151530A (ja) *	1984-12-26	1986-07-10	Kanto Kagaku Kk	電子線レジスト材料組成物

1986
- 1986-03-06 US US06/837,018 patent/US4701342A/en not_active Expired - Lifetime
1987
- 1987-03-03 DE DE8787103008T patent/DE3761930D1/de not_active Expired - Fee Related
- 1987-03-03 EP EP87103008A patent/EP0236914B1/de not_active Expired
- 1987-03-05 CA CA000531265A patent/CA1312843C/en not_active Expired - Fee Related
- 1987-03-06 JP JP62050434A patent/JP2528110B2/ja not_active Expired - Lifetime

Also Published As

Publication number	Publication date
JPS62235943A (ja)	1987-10-16
EP0236914B1 (de)	1990-03-14
EP0236914A3 (en)	1987-12-02
JP2528110B2 (ja)	1996-08-28
CA1312843C (en)	1993-01-19
US4701342A (en)	1987-10-20
EP0236914A2 (de)	1987-09-16

Similar Documents

Publication	Publication Date	Title
DE68918975D1 (de)	1994-12-01	Verfahren für die Herstellung von Leiterplatten.
DE58907030D1 (de)	1994-03-31	Verfahren zur Herstellung von Leiterplatten.
DE3882238D1 (de)	1993-08-19	Verfahren zur behandlung von durch ein netzwerk uebertragenen langsamen anforderungen.
DE68923468D1 (de)	1995-08-24	Verfahren zur Herstellung von Mehrschichtschaltungen.
DE3752114D1 (de)	1997-10-16	Verfahren zur Herstellung einer komplementären MOS integrierten Schaltungsanordnung
DE3769900D1 (de)	1991-06-13	Verfahren zur herstellung von furan durch decarbonylisierung von furfural.
AT360649B (de)	1981-01-26	Verfahren zur herstellung von neuen penicillan- saeure-1,1-dioxiden
DE3785686D1 (de)	1993-06-09	Sammelrohrherstellungsverfahren und durch ein solches verfahren erhaltenes sammelrohr.
DE3678127D1 (de)	1991-04-18	Verfahren zur herstellung von durch photopolymerisation vernetzten reliefformen.
ATE81339T1 (de)	1992-10-15	Verfahren zur herstellung von zyklischen sulfaten.
DE3775618D1 (de)	1992-02-13	Verfahren zur herstellung von toner durch suspensionspolymerisation.
DE3787937D1 (de)	1993-12-02	Verfahren zur Herstellung von metallisierten Bildern.
DE3769484D1 (de)	1991-05-29	Verfahren zur herstellung von gedruckten leiterplatten.
DE3761930D1 (de)	1990-04-19	Herstellung von elektronischen bauelementen durch ein lithographisches verfahren.
DE58906369D1 (de)	1994-01-20	Verfahren zur Herstellung von Druckformen.
ATE101144T1 (de)	1994-02-15	Verfahren zur herstellung von cyclischen sulfaten.
DE69001623D1 (de)	1993-06-24	Verfahren zur herstellung von fluor-oxy-fluorsulfonylverbindungen durch direkte fluorierung von fluor-beta-sultonen.
DE3789680D1 (de)	1994-06-01	Verfahren zur Herstellung von Halbleiterbauelementen.
DE69032464D1 (de)	1998-08-13	Verfahren zur Herstellung von Photolackmustern
DE3751023D1 (de)	1995-03-09	Verfahren zur selektiven Härtung von flüssigen, lichtempfindlichen Kunststoffen durch Belichtung mittels einer Maske.
DE68903419D1 (de)	1992-12-17	Ein verfahren zur herstellung von diisopropylauphthalenen.
DE58909380D1 (de)	1995-09-14	Verfahren zur Vorbehandlung von Bauteilen einer gebauten Nockenwelle.
DE69032378D1 (de)	1998-07-09	Ein Verfahren zur Herstellung von Dibenzoxazolylthiophenen
DE3761539D1 (de)	1990-03-08	Verfahren zur herstellung von verbundteilen.
DE69106932D1 (de)	1995-03-09	Ein Verfahren zur Herstellung von Pigmenten.

Legal Events

Date	Code	Title	Description
1991-04-04	8364	No opposition during term of opposition
1995-07-20	8328	Change in the person/name/address of the agent	Free format text: BLUMBACH, KRAMER & PARTNER, 65193 WIESBADEN
2003-01-16	8339	Ceased/non-payment of the annual fee