DE3688946D1 - Röntgenstrahlungsquelle. - Google Patents

Röntgenstrahlungsquelle.

Info

Publication number: DE3688946D1
Authority: DE; Germany
Prior art keywords: ray source; ray; source
Prior art date: 1985-04-30
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE86105914T

Other languages

English (en)

Other versions

DE3688946T2 (de

Inventor

Yasunao Saitoh

Ikuo Okada

Hideo Yoshihara

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nippon Telegraph and Telephone Corp

Original Assignee

Nippon Telegraph and Telephone Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1985-04-30

Filing date

1986-04-29

Publication date

1993-10-07

1985-04-30 Priority claimed from JP60091227A external-priority patent/JPH0638391B2/ja

1986-01-24 Priority claimed from JP61012105A external-priority patent/JPS62172648A/ja

1986-04-29 Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp

1993-10-07 Publication of DE3688946D1 publication Critical patent/DE3688946D1/de

1994-01-13 Application granted granted Critical

1994-01-13 Publication of DE3688946T2 publication Critical patent/DE3688946T2/de

2006-04-30 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

Engineering & Computer Science (AREA)
Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
Plasma & Fusion (AREA)
General Physics & Mathematics (AREA)
Nanotechnology (AREA)
Health & Medical Sciences (AREA)
Public Health (AREA)
Mathematical Physics (AREA)
Theoretical Computer Science (AREA)
Epidemiology (AREA)
Crystallography & Structural Chemistry (AREA)
Environmental & Geological Engineering (AREA)
Optics & Photonics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

DE86105914T 1985-04-30 1986-04-29 Röntgenstrahlungsquelle. Expired - Fee Related DE3688946T2 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP60091227A JPH0638391B2 (ja)	1985-04-30	1985-04-30	Ｘ線露光装置
JP61012105A JPS62172648A (ja)	1986-01-24	1986-01-24	Ｘ線発生装置

Publications (2)

Publication Number	Publication Date
DE3688946D1 true DE3688946D1 (de)	1993-10-07
DE3688946T2 DE3688946T2 (de)	1994-01-13

Family

ID=26347673

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE86105914T Expired - Fee Related DE3688946T2 (de)	1985-04-30	1986-04-29	Röntgenstrahlungsquelle.

Country Status (3)

Country	Link
US (1)	US4771447A (de)
EP (1)	EP0201034B1 (de)
DE (1)	DE3688946T2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS6415920A (en) *	1987-07-10	1989-01-19	Hitachi Ltd	X-ray aligner
US4860328A (en) *	1987-08-25	1989-08-22	Hampshire Instruments, Inc.	Target positioning for minimum debris
US5102776A (en) *	1989-11-09	1992-04-07	Cornell Research Foundation, Inc.	Method and apparatus for microlithography using x-pinch x-ray source
US5243638A (en) *	1992-03-10	1993-09-07	Hui Wang	Apparatus and method for generating a plasma x-ray source
USH1962H1 (en)	1996-09-09	2001-06-05	The United States Of America As Represented By The Secretary Of The Navy	Fast acting double puff valve
DE19753696A1 (de) *	1997-12-03	1999-06-17	Fraunhofer Ges Forschung	Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung
WO2000025322A1 (en) *	1998-10-27	2000-05-04	Jmar Technology Co.	Shaped source of soft x-ray, extreme ultraviolet and ultraviolet radiation
DE19962160C2 (de) *	1999-06-29	2003-11-13	Fraunhofer Ges Forschung	Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung
TWI246872B (en)	1999-12-17	2006-01-01	Asml Netherlands Bv	Radiation source for use in lithographic projection apparatus
US6469310B1 (en)	1999-12-17	2002-10-22	Asml Netherlands B.V.	Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus
US6408052B1 (en) *	2000-04-06	2002-06-18	Mcgeoch Malcolm W.	Z-pinch plasma X-ray source using surface discharge preionization
US6765987B2 (en)	2001-03-15	2004-07-20	Safe Food Technologies, Inc.	Resonant plasma x-ray source
DE10238096B3 (de) *	2002-08-21	2004-02-19	Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.	Gasentladungslampe
US7022937B2 (en) *	2003-01-06	2006-04-04	Matsushita Electric Industrial Co., Ltd.	Plasma processing method and apparatus for performing uniform plasma processing on a linear portion of an object
US7466799B2 (en) *	2003-04-09	2008-12-16	Varian Medical Systems, Inc.	X-ray tube having an internal radiation shield
DE10325151B4 (de) *	2003-05-30	2006-11-30	Infineon Technologies Ag	Vorrichtung für die Erzeugung und/oder Beeinflussung elektromagnetischer Strahlung eines Plasmas
US7688948B2 (en) *	2004-11-29	2010-03-30	Koninklijke Philips Electronics N.V.	Method and apparatus for generating radiation in the wavelength range from about 1 nm to about 30 nm, and use in a lithography device or in metrology
DE102004058500A1 (de) *	2004-12-04	2006-06-08	Philips Intellectual Property & Standards Gmbh	Verfahren und Vorrichtung zum Betreiben einer elektrischen Entladevorrichtung
ITVE20050037A1 (it) *	2005-08-04	2007-02-05	Marco Sumini	Apparecchiatura per trattamenti di radioterapia interstiziale ed intraoperatoria.
KR101044698B1 (ko)	2009-12-01	2011-06-28	한국기초과학지원연구원	전자 맴돌이 공명 이온원 장치를 이용한 엑스선 발생 장치 및 방법
RU2459393C1 (ru) *	2010-12-27	2012-08-20	Учреждение Российской Академии Наук Институт Сильноточной Электроники Сибирского Отделения Ран (Исэ Со Ран)	Способ и устройство для генерации мягкого рентгеновского излучения из плазмы газового разряда лайнерного типа
CN108957026B (zh) *	2018-05-23	2020-07-03	安徽工业大学	一种热态飞灰颗粒的临界反弹速度测量装置和方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US2379397A (en) *	1942-11-16	1945-06-26	Gen Electric X Ray Corp	Anode structure
BE725683A (de) *	1968-12-18	1969-05-29
US3835330A (en) *	1972-09-15	1974-09-10	Us Air Force	Electromagnetic implosion x-ray source
SU1051616A1 (ru) *	1981-06-22	1983-10-30	Институт сильноточной электроники СО АН СССР	Импульсный рентгеновский источник с холодным катодом
US4494043A (en) *	1981-07-02	1985-01-15	Physics International Company	Imploding plasma device
DE3278737D1 (en) *	1982-04-14	1988-08-11	Battelle Development Corp	Providing x-rays
JPS60175351A (ja)	1984-02-14	1985-09-09	Nippon Telegr & Teleph Corp <Ntt>	Ｘ線発生装置およびｘ線露光法
US4644576A (en) *	1985-04-26	1987-02-17	At&T Technologies, Inc.	Method and apparatus for producing x-ray pulses

1986
- 1986-04-29 US US06/857,112 patent/US4771447A/en not_active Expired - Fee Related
- 1986-04-29 DE DE86105914T patent/DE3688946T2/de not_active Expired - Fee Related
- 1986-04-29 EP EP86105914A patent/EP0201034B1/de not_active Expired - Lifetime

Also Published As

Publication number	Publication date
EP0201034B1 (de)	1993-09-01
EP0201034A3 (en)	1988-09-21
US4771447A (en)	1988-09-13
EP0201034A2 (de)	1986-11-12
DE3688946T2 (de)	1994-01-13

Publication	Publication Date	Title
DE3683147D1 (de)	1992-02-06	Strahlungsquelle.
DE3689231D1 (de)	1993-12-02	Röntgenstrahlquelle.
DE3669233D1 (de)	1990-04-05	Roentgenstrahler.
DE3674392D1 (de)	1990-10-25	Roentgenstrahlenapparat.
DE3689349D1 (de)	1994-01-13	Ionenquelle.
DE3685783D1 (de)	1992-07-30	Ultraschall-bestrahlungsanordnung.
DE3688946D1 (de)	1993-10-07	Röntgenstrahlungsquelle.
DE3586192D1 (de)	1992-07-16	Roentgen-anordnung.
NL194596B (nl)	2002-04-02	Lichtbroneenheid.
NO170047C (no)	1992-09-02	Elektron-ione-plasmakilde
DE3667341D1 (de)	1990-01-11	Lichtdichter wegwerfbehaelter.
NO864494D0 (no)	1986-11-11	Seismisk kilde.
DE3689428D1 (de)	1994-02-03	Elektronenstrahlquelle.
DE3674684D1 (de)	1990-11-08	Antithrombogenes medizinisches material.
DE3669015D1 (de)	1990-03-15	Bestrahlungseinrichtung.
DE3683474D1 (de)	1992-02-27	Numerisierungsverfahren.
DE3679522D1 (de)	1991-07-04	Goniometertisch.
DE3678730D1 (de)	1991-05-23	Roentgenroehrenvorrichtungen.
DE3689232D1 (de)	1993-12-02	Ionenquelle.
DE3688132D1 (de)	1993-04-29	Bildbehandlung.
FI860780A0 (fi)	1986-02-21	Ortopedisk vaest.
DE3679122D1 (de)	1991-06-13	Trageinheit.
DE3678065D1 (de)	1991-04-18	Strahlungsdarstellungseinrichtung.
DE3681759D1 (de)	1991-11-07	Abschreckverfahren.
FI872309L (fi)	1987-05-25	Glid- eller taetningselementkombination.

Legal Events

Date	Code	Title	Description
1994-09-29	8364	No opposition during term of opposition
1998-04-09	8339	Ceased/non-payment of the annual fee