DE3483063D1 - Ausrichtungsmarkierungen auf halbleiterscheiben und verfahren zum herstellen der markierungen. - Google Patents
Ausrichtungsmarkierungen auf halbleiterscheiben und verfahren zum herstellen der markierungen.Info
- Publication number
- DE3483063D1 DE3483063D1 DE8484303326T DE3483063T DE3483063D1 DE 3483063 D1 DE3483063 D1 DE 3483063D1 DE 8484303326 T DE8484303326 T DE 8484303326T DE 3483063 T DE3483063 T DE 3483063T DE 3483063 D1 DE3483063 D1 DE 3483063D1
- Authority
- DE
- Germany
- Prior art keywords
- markings
- producing
- alignment
- semiconductor disc
- disc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58087542A JPS59224123A (ja) | 1983-05-20 | 1983-05-20 | ウエハアライメントマ−ク |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3483063D1 true DE3483063D1 (de) | 1990-10-04 |
Family
ID=13917864
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE8484303326T Expired - Lifetime DE3483063D1 (de) | 1983-05-20 | 1984-05-16 | Ausrichtungsmarkierungen auf halbleiterscheiben und verfahren zum herstellen der markierungen. |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4824254A (de) |
| EP (1) | EP0126621B1 (de) |
| JP (1) | JPS59224123A (de) |
| DE (1) | DE3483063D1 (de) |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6292440A (ja) * | 1985-10-18 | 1987-04-27 | Mitsubishi Electric Corp | アライメントマ−ク |
| WO1989008926A1 (en) * | 1988-03-16 | 1989-09-21 | Plessey Overseas Limited | Vernier structure for flip chip bonded devices |
| GB8806232D0 (en) * | 1988-03-16 | 1988-04-13 | Plessey Co Plc | Vernier structure for flip chip bonded devices |
| JPH02234085A (ja) * | 1989-03-08 | 1990-09-17 | Mitsubishi Electric Corp | 半導体装置 |
| IT1251393B (it) * | 1991-09-04 | 1995-05-09 | St Microelectronics Srl | Procedimento per la realizzazione di strutture metrologiche particolarmente per l'analisi dell'accuratezza di strumenti di misura di allineamento su substrati processati. |
| CA2096551A1 (en) * | 1992-05-22 | 1993-11-23 | Masanori Nishiguchi | Semiconductor device |
| US5294975A (en) * | 1992-10-15 | 1994-03-15 | Altera Corporation | Laser alignment target for semiconductor integrated circuits |
| US5300786A (en) * | 1992-10-28 | 1994-04-05 | International Business Machines Corporation | Optical focus phase shift test pattern, monitoring system and process |
| US5316984A (en) * | 1993-03-25 | 1994-05-31 | Vlsi Technology, Inc. | Bright field wafer target |
| US5311061A (en) * | 1993-05-19 | 1994-05-10 | Motorola Inc. | Alignment key for a semiconductor device having a seal against ionic contamination |
| US5469263A (en) * | 1994-07-01 | 1995-11-21 | Motorola, Inc. | Method for alignment in photolithographic processes |
| US5876819A (en) * | 1995-02-17 | 1999-03-02 | Mitsubishi Denki Kabushiki Kaisha | Crystal orientation detectable semiconductor substrate, and methods of manufacturing and using the same |
| KR0170909B1 (ko) * | 1995-09-27 | 1999-03-30 | 김주용 | 반도체 소자의 오버레이 검사방법 |
| DE19939825A1 (de) * | 1999-08-21 | 2001-03-01 | Bosch Gmbh Robert | Bauelement mit einem optisch erkennbaren Marker |
| US6815838B2 (en) | 2002-02-20 | 2004-11-09 | International Business Machines Corporation | Laser alignment target and method |
| TWI288428B (en) | 2004-01-21 | 2007-10-11 | Seiko Epson Corp | Alignment method, method for manufacturing a semiconductor device, substrate for a semiconductor device, electronic equipment |
| US6989682B1 (en) * | 2005-03-16 | 2006-01-24 | United Microelectronics Corp. | Test key on a wafer |
| TWI646230B (zh) | 2013-08-05 | 2019-01-01 | 扭轉生物科技有限公司 | 重新合成之基因庫 |
| CA2975855A1 (en) | 2015-02-04 | 2016-08-11 | Twist Bioscience Corporation | Compositions and methods for synthetic gene assembly |
| WO2016126882A1 (en) | 2015-02-04 | 2016-08-11 | Twist Bioscience Corporation | Methods and devices for de novo oligonucleic acid assembly |
| US9981239B2 (en) | 2015-04-21 | 2018-05-29 | Twist Bioscience Corporation | Devices and methods for oligonucleic acid library synthesis |
| CA2998169A1 (en) | 2015-09-18 | 2017-03-23 | Twist Bioscience Corporation | Oligonucleic acid variant libraries and synthesis thereof |
| KR20180058772A (ko) | 2015-09-22 | 2018-06-01 | 트위스트 바이오사이언스 코포레이션 | 핵산 합성을 위한 가요성 기판 |
| WO2017095958A1 (en) | 2015-12-01 | 2017-06-08 | Twist Bioscience Corporation | Functionalized surfaces and preparation thereof |
| CA3034769A1 (en) | 2016-08-22 | 2018-03-01 | Twist Bioscience Corporation | De novo synthesized nucleic acid libraries |
| WO2018057526A2 (en) | 2016-09-21 | 2018-03-29 | Twist Bioscience Corporation | Nucleic acid based data storage |
| CN110366613A (zh) | 2016-12-16 | 2019-10-22 | 特韦斯特生物科学公司 | 免疫突触的变体文库及其合成 |
| CN110892485B (zh) | 2017-02-22 | 2024-03-22 | 特韦斯特生物科学公司 | 基于核酸的数据存储 |
| US10894959B2 (en) | 2017-03-15 | 2021-01-19 | Twist Bioscience Corporation | Variant libraries of the immunological synapse and synthesis thereof |
| GB2578844A (en) | 2017-06-12 | 2020-05-27 | Twist Bioscience Corp | Methods for seamless nucleic acid assembly |
| WO2018231864A1 (en) | 2017-06-12 | 2018-12-20 | Twist Bioscience Corporation | Methods for seamless nucleic acid assembly |
| EA202090562A1 (ru) | 2017-09-11 | 2020-08-10 | Твист Байосайенс Корпорейшн | Связывающие gpcr белки и их синтез |
| KR102637566B1 (ko) | 2017-10-20 | 2024-02-16 | 트위스트 바이오사이언스 코포레이션 | 폴리뉴클레오타이드 합성을 위한 가열된 나노웰 |
| IL275818B2 (en) | 2018-01-04 | 2024-10-01 | Twist Bioscience Corp | Dna-based digital information storage |
| SG11202011467RA (en) | 2018-05-18 | 2020-12-30 | Twist Bioscience Corp | Polynucleotides, reagents, and methods for nucleic acid hybridization |
| KR20210143766A (ko) | 2019-02-26 | 2021-11-29 | 트위스트 바이오사이언스 코포레이션 | Glp1 수용체에 대한 변이체 핵산 라이브러리 |
| CA3131691A1 (en) | 2019-02-26 | 2020-09-03 | Twist Bioscience Corporation | Variant nucleic acid libraries for antibody optimization |
| WO2020257612A1 (en) | 2019-06-21 | 2020-12-24 | Twist Bioscience Corporation | Barcode-based nucleic acid sequence assembly |
| AU2020356471A1 (en) | 2019-09-23 | 2022-04-21 | Twist Bioscience Corporation | Variant nucleic acid libraries for CRTH2 |
| AU2020355027A1 (en) | 2019-09-23 | 2022-04-21 | Twist Bioscience Corporation | Antibodies that bind CD3 Epsilon |
| TWI736226B (zh) * | 2020-04-21 | 2021-08-11 | 錼創顯示科技股份有限公司 | 對位結構 |
| CN117492336B (zh) * | 2024-01-02 | 2024-04-09 | 天府兴隆湖实验室 | 对准标记及图形对准方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3885877A (en) * | 1973-10-11 | 1975-05-27 | Ibm | Electro-optical fine alignment process |
| GB1550867A (en) * | 1975-08-04 | 1979-08-22 | Hughes Aircraft Co | Positioning method and apparatus for fabricating microcircuit devices |
| US4066485A (en) * | 1977-01-21 | 1978-01-03 | Rca Corporation | Method of fabricating a semiconductor device |
| US4309813A (en) * | 1979-12-26 | 1982-01-12 | Harris Corporation | Mask alignment scheme for laterally and totally dielectrically isolated integrated circuits |
| JPS5694741A (en) * | 1979-12-28 | 1981-07-31 | Fujitsu Ltd | Positioning mark for electronic beam exposure |
| US4356223A (en) * | 1980-02-28 | 1982-10-26 | Nippon Electric Co., Ltd. | Semiconductor device having a registration mark for use in an exposure technique for micro-fine working |
| US4419013A (en) * | 1981-03-30 | 1983-12-06 | Tre Semiconductor Equipment Corporation | Phase contrast alignment system for a semiconductor manufacturing apparatus |
-
1983
- 1983-05-20 JP JP58087542A patent/JPS59224123A/ja active Granted
-
1984
- 1984-05-16 EP EP84303326A patent/EP0126621B1/de not_active Expired
- 1984-05-16 DE DE8484303326T patent/DE3483063D1/de not_active Expired - Lifetime
- 1984-05-18 US US06/612,023 patent/US4824254A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0126621A2 (de) | 1984-11-28 |
| US4824254A (en) | 1989-04-25 |
| EP0126621A3 (en) | 1986-01-15 |
| JPH0463533B2 (de) | 1992-10-12 |
| EP0126621B1 (de) | 1990-08-29 |
| JPS59224123A (ja) | 1984-12-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE3483063D1 (de) | Ausrichtungsmarkierungen auf halbleiterscheiben und verfahren zum herstellen der markierungen. | |
| DE3575241D1 (de) | Halbleiteranordnung und verfahren zum herstellen derselben. | |
| DE3875463D1 (de) | Verfahren zum verkuerzen der formgebungstaktzeit. | |
| DE3381509D1 (de) | Verfahren zum herstellen von halbleiteranordnungen. | |
| DE3579681D1 (de) | Verfahren und vorrichtung zum waermebehandeln von schienen. | |
| DE3770239D1 (de) | Mundstueck und verfahren zum herstellen von diesem. | |
| DE3770318D1 (de) | Anisotrope elektrizitaetsleitende klebstoffzusammensetzung, verfahren zum verbinden von stromkreisen und die so erhaltenen stromkreise. | |
| DE68908326D1 (de) | Verfahren zum herstellen elektrochromer vorrichtungen. | |
| DE3585417D1 (de) | Verfahren und vorrichtung zum herstellen von glasgegenstaenden. | |
| DE3684676D1 (de) | Verfahren zum herstellen von halbleitersubstraten. | |
| DE3482523D1 (de) | Verfahren zum herstellen eines elektrets und anordnungen. | |
| DE3382563D1 (de) | Verfahren zum unterscheiden zwischen komplexen zeichenvorraeten. | |
| DE3876019D1 (de) | Verfahren und vorrichtung zum herstellen von pyramidenstumpffoermiger dosenzargen. | |
| DE3481412D1 (de) | Apparat zum herstellen von etiketten. | |
| DE58904461D1 (de) | Verfahren zum herstellen von schaumstoffpolstern. | |
| DE3784605D1 (de) | Verfahren zum herstellen einer halbleitervorrichtung und halbleitervorrichtung. | |
| DE3482530D1 (de) | Elektrisch programmierbare speicheranordnung und verfahren zum herstellen derselben. | |
| DE3587514D1 (de) | Verfahren und vorrichtung zum berechnen der beziehung zwischen der rohlinse und der brillenlinse. | |
| DE3578266D1 (de) | Verfahren zum herstellen von halbleiteranordnungen und dadurch hergestellte anordnungen. | |
| DE3577781D1 (de) | Ein festwertspeicher und ein verfahren zum herstellen desselben. | |
| DE3586019D1 (de) | Verfahren zum herstellen eines elektrostriktiven elementes. | |
| AT381875B (de) | Verfahren zum richten von eisenbahnschienen und durch das verfahren hergestellte eisenbahnschienen | |
| DE3481569D1 (de) | Verfahren zum herstellen von diamantwaermesenken. | |
| DE3483520D1 (de) | Verfahren zum herstellen bedruckter formkoerper. | |
| DE3781822D1 (de) | Leiter und verfahren zum herstellen desselben. |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |