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DE3480676D1 - Elektronenbildprojektor. - Google Patents

Elektronenbildprojektor.

Info

Publication number
DE3480676D1
DE3480676D1 DE8484201263T DE3480676T DE3480676D1 DE 3480676 D1 DE3480676 D1 DE 3480676D1 DE 8484201263 T DE8484201263 T DE 8484201263T DE 3480676 T DE3480676 T DE 3480676T DE 3480676 D1 DE3480676 D1 DE 3480676D1
Authority
DE
Germany
Prior art keywords
electronic image
image projector
projector
electronic
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8484201263T
Other languages
English (en)
Inventor
Thomas Vincent Elliston
Julian Portway Scott
Rodney Ward
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3480676D1 publication Critical patent/DE3480676D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/46—Control electrodes, e.g. grid; Auxiliary electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3175—Projection methods, i.e. transfer substantially complete pattern to substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/024—Moving components not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0473—Changing particle velocity accelerating
    • H01J2237/04735—Changing particle velocity accelerating with electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31779—Lithography by projection from patterned photocathode

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
DE8484201263T 1983-09-05 1984-09-04 Elektronenbildprojektor. Expired - Lifetime DE3480676D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08323769A GB2146168A (en) 1983-09-05 1983-09-05 Electron image projector

Publications (1)

Publication Number Publication Date
DE3480676D1 true DE3480676D1 (de) 1990-01-11

Family

ID=10548339

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484201263T Expired - Lifetime DE3480676D1 (de) 1983-09-05 1984-09-04 Elektronenbildprojektor.

Country Status (5)

Country Link
US (1) US4939373A (de)
EP (1) EP0136752B1 (de)
JP (1) JPS6074620A (de)
DE (1) DE3480676D1 (de)
GB (1) GB2146168A (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8422895D0 (en) * 1984-09-11 1984-10-17 Texas Instruments Ltd Electron beam apparatus
US5263073A (en) * 1991-12-20 1993-11-16 Board Of Supervisors Of Louisiana State University And Agricultural And Mechanical College Scanning systems for high resolution E-beam and X-ray lithography
JP3394602B2 (ja) * 1993-07-05 2003-04-07 株式会社荏原製作所 高速原子線を用いた加工方法
EP0969325B1 (de) * 1998-07-01 2003-01-15 ASML Netherlands B.V. Projektionsbelichtungsgerät
EP1498930A1 (de) * 2003-07-14 2005-01-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Vorrichtung mit Strahlen von geladenen Teilchen
KR101247218B1 (ko) * 2011-03-09 2013-03-25 주식회사 티옵시스 정보검출장치용 광학장치 및 이를 포함하는 정보검출장치
EP3707553B1 (de) 2017-11-06 2023-10-25 Magic Leap, Inc. Verfahren und system zur abstimmbaren gradientenmusterung unter verwendung einer schattenmaske

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2098522A5 (de) * 1970-07-17 1972-03-10 Electronique Appliquee
US3889144A (en) * 1971-11-24 1975-06-10 Electron Physics Ltd Image intensifier tube
US3849659A (en) * 1973-09-10 1974-11-19 Westinghouse Electric Corp Alignment of a patterned electron beam with a member by electron backscatter
US4039810A (en) * 1976-06-30 1977-08-02 International Business Machines Corporation Electron projection microfabrication system
DE2700357A1 (de) * 1977-01-04 1978-07-13 Siemens Ag Fotoelektronischer bildprojektor
JPS53132269A (en) * 1977-04-25 1978-11-17 Hitachi Ltd Electron beam pattern projector
DE2719799A1 (de) * 1977-04-28 1978-11-02 Siemens Ag Fotoelektronischer bildprojektor
NL184549C (nl) * 1978-01-27 1989-08-16 Philips Nv Halfgeleiderinrichting voor het opwekken van een elektronenstroom en weergeefinrichting voorzien van een dergelijke halfgeleiderinrichting.
JPS58145B2 (ja) * 1980-08-22 1983-01-05 浜松テレビ株式会社 電子ビ−ムシヤツタ装置
JPS58146B2 (ja) * 1980-10-14 1983-01-05 浜松テレビ株式会社 フレ−ミング管
US4419580A (en) * 1981-06-26 1983-12-06 Control Data Corporation Electron beam array alignment means
GB2147141A (en) * 1983-09-26 1985-05-01 Philips Electronic Associated Electron image projector
GB2157069A (en) * 1984-04-02 1985-10-16 Philips Electronic Associated Step and repeat electron image projector
GB2159322A (en) * 1984-05-18 1985-11-27 Philips Electronic Associated Electron image projector

Also Published As

Publication number Publication date
EP0136752A3 (en) 1986-12-30
GB8323769D0 (en) 1983-10-05
GB2146168A (en) 1985-04-11
EP0136752A2 (de) 1985-04-10
US4939373A (en) 1990-07-03
JPS6074620A (ja) 1985-04-26
EP0136752B1 (de) 1989-12-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee