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DE3332248A1 - System for discharging charges on test specimens in scanning electron microscope investigations - Google Patents

System for discharging charges on test specimens in scanning electron microscope investigations

Info

Publication number
DE3332248A1
DE3332248A1 DE19833332248 DE3332248A DE3332248A1 DE 3332248 A1 DE3332248 A1 DE 3332248A1 DE 19833332248 DE19833332248 DE 19833332248 DE 3332248 A DE3332248 A DE 3332248A DE 3332248 A1 DE3332248 A1 DE 3332248A1
Authority
DE
Germany
Prior art keywords
scanning electron
test specimen
electron microscope
vacuum
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19833332248
Other languages
German (de)
Inventor
Lutz-Achim Dipl.-Ing. 7000 Stuttgart Gäng
Armin Dipl.-Ing. 7150 Heiningen Soehnle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GAENG LUTZ ACHIM DIPL ING
Original Assignee
GAENG LUTZ ACHIM DIPL ING
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GAENG LUTZ ACHIM DIPL ING filed Critical GAENG LUTZ ACHIM DIPL ING
Priority to DE19833332248 priority Critical patent/DE3332248A1/en
Publication of DE3332248A1 publication Critical patent/DE3332248A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/026Means for avoiding or neutralising unwanted electrical charges on tube components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

The invention relates to a system which can easily be adapted to any scanning electron microscope and permits both electrically nonconductive and vacuum-sensitive test specimens to be imaged by means of backscatter electrons without any sort of preparation and free from artefacts with a quality not hitherto achieved. This is achieved by means of a finely meterable and pre-ionisable gas flow which flows around the test specimen surface in a pinpointed fashion in the test specimen chamber, in which it discharges the charges on the surface of the test specimen which cause image interference, and is finally once again extracted. A constant vacuum which is favourable for the test specimen is created in its immediate vicinity by means of a fine-metering valve and an electronic control without the vacuum being reduced to the same value in the entire test specimen chamber. By using such a system it is also possible for small living organisms to be imaged alive in the scanning electron microscope.

Description

SYSTEM ZUM ABLEITEN VON PROBENAUFLADUNGEN SYSTEM FOR DERIVING SAMPLE CHARGES

BEI RASTERELEKTRONENMIKROSKOPISCHEN UNTERSUCHUNGEN Die Erfindung betrifft ein System zur apparativen und anwendungstechnischen Ergänzung von Rasterelektronenmikroskopen, mit welchem die bei der Abbildung von elektrisch nichtleitenden Proben (z.B. Kunststoffen) auftretenden Oberflächenaufladungen gezielt abgeleitet werden können, ohne daß eine Behandlung der Probe vor Beginn der Untersuchung erforderlich ist, und ohne daß eine Schädigung der Probenoberfläche während der Untersuchung erfolgt. IN SCREENING ELECTRON MICROSCOPIC EXAMINATIONS The invention relates to a system to supplement the equipment and technical application of scanning electron microscopes, with which the imaging of electrically non-conductive samples (e.g. plastics) Occurring surface charges can be discharged in a targeted manner without a Treatment of the sample before the start of the test is required and without the sample surface is damaged during the examination.

Mit dem System können völlig unbehandelte und auch elektrisch nichtleitende Proben in einem für die Probe günstigen Vakuum rasterelektronenmikroskopisch artefaktfrei untersucht werden. Da die Proben weder vornoch nachbehandelt werden müssen, ist ein Weiterverwenden derselben nach der Untersuchung möglich. Es hat sich gezeigt, daß mit dem hier beschriebenen System unter gewissen Voraussetzungen auch Kleinlebewesen lebend rasterelektronenmikroskopisch abbildb ar sind.With the system completely untreated and also electrically non-conductive Samples in a vacuum that is favorable for the sample, free of artifacts from a scanning electron microscope to be examined. Since the samples do not have to be treated either beforehand or afterwards, is they can be used again after the examination. It has shown, that with the system described here, under certain conditions, also small organisms can be depicted alive with a scanning electron microscope.

Ublicherweise werden bisher elektrisch nichtleitende Proben zu rasterelektronenmikroskopischen Untersuchungen mit einer leitenden Schicht versehen, damit keine Bildstörungen infolge örtlicher Aufladungen entstehen. Dieses Beschichten kann aber ein Verändern oder ein Zerstören der Probenoberfläche bewirken.Usually, samples that were previously electrically non-conductive are converted to scanning electron microscopy Provide examinations with a conductive layer so that there are no image disturbances as a result local charges arise. However, this coating can change or cause destruction of the sample surface.

Zum Ableiten der Probenaufladungen ohne Probenbehandlung sind bisher zwei Methoden bekannt: Die erste Methode arbeitet mit aus Alkali- oder Erdalkalimetallen emittierten niederenergetischen positiven Ionen, mit denen die Probe beschossen wird.To derive the sample charges without sample treatment are so far two methods known: The first method works with from alkali or alkaline earth metals emitted low-energy positive ions with which the sample was bombarded will.

Dies ist derselbe Effekt wie beim Sputtern, es sollen jedoch normalerweise keine Niederschläge auf der Probe entstehen. Die lonenkanone der dazu notwendigen Apparatur muB in die Probenkammer eingebaut werden und schränkt im allgemeinen die Verschiebbarkeit der Probe erheblich ein. Das System ist nur bei geringen Aufladungen und niederen Vergrößerungen einsetzbar, da ansonsten ein "Schneesturm'! auf dem Bildschirm entsteht, der durch auf den Detektor prallende Alkali-Ionen verursacht wird (Literatur: Firmenmitteilung von Kimball Physics Inc.: System 2 Charge Neutralizer, 1980).This is the same effect as sputtering, but it is usually intended no deposits are formed on the sample. The ion cannon of the necessary Apparatus must be built into the sample chamber and generally limits the Shiftability of the sample significantly. The system is only on low charges and lower magnifications can be used, otherwise a "snow storm"! Screen is created by alkali ions hitting the detector (Literature: Company News from Kimball Physics Inc .: System 2 Charge Neutralizer, 1980).

Die zweite Methode arbeitet mit verschlechtertem Vakuum in der Proben kammer so daß durch den Primärelektronenstrahl nach der Townsend Entladung diffuse positive Gasionen erzeugt werden, die die Probenaufladung ableiten bzw. zu einem Ladungsgleichgewicht führen, was für Rüekstreuelektronenbilder ausreichend ist. Eine von ETP Sempra Pty. Ltd.The second method works with a deteriorated vacuum in the samples chamber so that diffuse through the primary electron beam after the Townsend discharge positive gas ions are generated, which derive the sample charge or to a Lead charge equilibrium, which is sufficient for backscattered electron images. One of ETP Sempra Pty. Ltd.

(Australien) angebotene Apparatur, die nach dem beschriebenen Prinzip arbeitet, erzeugt nach einer geringfügigen Modifikation am Rasterelektronenmikroskop ein steuerbares Vakuum im Probenraum, welches schwankt und schlechter als 10 2 Torr ist. Dies führt zu einer erheblichen Verkürzung der Lebensdauer der Glühkatoden und zu einer Streuung des Elektronenstrahls, so daß im allgemeinen nur Abbildungen mit VergroBerurlg;en kleiner als 1000fach möglich sind (Literatur: Honcrieff, D.A., V .N .E.(Australia) offered apparatus that works according to the principle described works, generated after a slight modification to the scanning electron microscope a controllable vacuum in the sample space, which fluctuates and is worse than 10 2 Torr is. This leads to a considerable shortening of the service life of the hot cathodes and to a scattering of the electron beam, so that generally only images with a magnification of less than 1000 times are possible (literature: Honcrieff, D.A., V .N .E.

Robinson and L .B. Harris: Charge neutralisation of insulating surfaces in the SEM by gas ionisation. J.Phys. D. Appl. Phys. 11, 2315-2325 (1978)).Robinson and L .B. Harris: Charge neutralization of insulating surfaces in the SEM by gas ionization. J.Phys. D. Appl. Phys. 11, 2315-2325 (1978)).

Der Erfindung liegt die Aufgabe zugrunde, unpräparierte elektrisch nichtleitende Proben mit dem Rasterelektronenmitroskop auch für Vergrößerungen über lOOOfach abbildbar zu machen. Des weiteren soll die Apparatur derart konzipiert sein, daß jederzeit ohne Umbauten, also auch während einer Untersuchung, von "Normalbetriebst auf "Betrieb bei aufladenden Proben" umgeschaltet werden kann.The invention is based on the object, electrically unprepared Non-conductive samples with the scanning electron microscope also for magnifications about To make it possible to map 100 times. Furthermore, the apparatus should be designed in this way be that at any time without modifications, including during an investigation, from "normal operating can be switched to "operation with charging samples".

Die Aufgabe wird erfindungsgemäß nach dem in der Zeichnung Fig, 1 dargestellten-Prinzip gelöst. Ein Îeindosierbalrer und vorionisierbarer Gasstrom (1) wird gezielt auf den abzubildenden Probenoberflächenbereich geleitet.The object is achieved according to the invention according to the FIG. 1 in the drawing -principle solved. A metered and pre-ionizable gas stream (1) is directed specifically to the sample surface area to be imaged.

Dort zerfallen die Gasmoleküle durch den Primärelektronenstrahl (2) nach dem Townsend-Effekt in positive Ionen (3) und niederenergetische Elektronen (4). Während diese durch Ionisation entstandenen Elektronen infolge der Coulombschen Kräfte von der Probenoberflächenaufladung (5) abgestoßen und mittels entsprechender Fanggitter (6) oder über die Probenkammerwandung abgeleitet werden, führen die positiven Gasionen zu der erwünschten Ableitung der Aufladung an der Probenoberfläche: Die positiven Gasionen werden zur negativ geladenen Probenoberfläche beschleunigt, nehmen dort beim Neutralisierungsvorgang Elektronen von der Probenoberfläche auf (7) und werden dann als neutrales Gas wieder von der Probenoberfläche abgesaugt (8). Eine elektronische Regelung sorgt für konstante Druckverhältnisse in unmittelbarer Umgebung der Probe, wodurch eine gute und reproduzierbare Qualität von Rückstreuelektronenbildern auch bei hohen Vergrößerungen ermöglicht wird.There the gas molecules disintegrate through the primary electron beam (2) into positive ions (3) and low-energy electrons according to the Townsend effect (4). While these electrons created by ionization are due to the Coulombs Forces from the sample surface charge (5) repelled and by means of corresponding Safety grid (6) or diverted over the sample chamber wall lead to the positive Gas ions for the desired discharge of the charge on the sample surface: The positive gas ions are accelerated to the negatively charged sample surface, take there during the neutralization process electrons from the sample surface onto (7) and are then sucked off the sample surface as a neutral gas (8). One electronic control ensures constant pressure conditions in the immediate vicinity of the sample, thus ensuring a good and reproducible quality of backscattered electron images is made possible even at high magnifications.

Ein schnelles, vakuum-einbruchsicheres und automatisches Umschalten von "Normalbetrieb" auf "Betrieb bei aufladenden Proben?? wird mittels einer Ventilsteuerung realisiert.Fast, vacuum-burglar-proof and automatic switching from "normal operation" to "operation with charging samples" is carried out by means of a valve control realized.

Die mit der Erfindung erzielten Vorteile bestehen insbesondere darin, daß beim Auftreten von Aufladungen das System zum Ableiten der Probenaufladungen durch Tastendruck eingeschaltet werden kann, ohne daß die Untersuchung unterbrochen werden muß. Dadurch, daß nur in naher Umgebung der Probe das Vakuum durch einen Gasstrom verschlechtert wird, und durch besondere Maßnahmen zur Regelung der Druckverhältnisse sind Abbildungen von unpräparierten Proben in bisher unerreichbarer Qualität möglich. Durch die Wahl des Vakuums im Probenbereich, der Vorionisation und der Probenbeflutungsart können auch vakuum-empfindliche Proben rasterelektronenmikroskopisch abgebildet werden.The advantages achieved with the invention are in particular: that when charges occur, the system for diverting the sample charges can be switched on by pressing a key without interrupting the examination must become. Because the vacuum is only applied in the vicinity of the sample Gas flow is deteriorated, and by special measures to regulate the pressure conditions images of unprepared samples are possible in a previously unattainable quality. By choosing the vacuum in the sample area, the pre-ionization and the type of sample flooding vacuum-sensitive samples can also be imaged using a scanning electron microscope will.

Ein Ausführungsbeispiel der Erfindung ist in der Zeichnung Fig.2 dargestellt: über ein elektronisch steuerbares Feinventil (9) wird der Gasstrom dosiert, der dann durch eine der Proben geometrie anpaßbare Düse (10) mit einer integrierten Vorionisationsstrecke und einem Druckmeßsensor über die Probenoberfläche strömt und anschließend durch einen Trichter (11) über ein zuschaltbares Vakuum abgesaugt wird. Bei notwendigem besonders schlechtem Vakuum (z.B. zur Untersuchung von lebenden biologischen Zellen) läßt sich mit dem Ventil (12) oder beim Vorhandensein einer Turbomolekularpumpe über eine Drehzahlregelung die Absaugung in der Probenkammer reduzieren. Mitverantwortlich für gute Rückstreuelektronenbilder ist ein entsprechender Detektor (13), der einen möglichst großen Raumwinkel erfaßt.An embodiment of the invention is shown in the drawing Fig.2: The gas flow is metered via an electronically controllable fine valve (9), the then through one of the sample geometry adaptable nozzle (10) with an integrated Preionization section and a pressure measuring sensor flows over the sample surface and then sucked off through a funnel (11) via a switchable vacuum will. If a particularly bad vacuum is required (e.g. for examining living biological cells) can be opened with the valve (12) or in the presence of a Turbomolecular pump controls the suction in the sample chamber via speed control to reduce. A corresponding one is jointly responsible for good backscattered electron images Detector (13) which detects the largest possible solid angle.

Claims (4)

Patentansprüche: (9 System zum Ableiten von Probenaufladungen bei rasterelektronenmikroskopischen Untersuchungen mit Hilfe von Gasionen, dadurch gekennzeichnet, daß ein fein dosierbarer Gasstrom gezielt über die Probenoberfläche strömt und kontinuierlich abgesaugt wird. Claims: (9 system for discharging sample charges at Scanning electron microscopic examinations with the help of gas ions, characterized in that that a finely adjustable gas stream flows specifically and continuously over the sample surface is sucked off. 2. System nach Anspruch 1, dadurch gekennzeichnet, daß der Gasstrom in der zuführenden Kapillare einstellbar vorionisierbar ist. 2. System according to claim 1, characterized in that the gas flow can be pre-ionized adjustable in the feeding capillary. 3. System nach Anspruch 1, dadurch gekennzeichnet, daß sich die Druckmeßsonde in der zuführenden Kapillare befindet und zur Vorionisation beiträgt. 3. System according to claim 1, characterized in that the pressure measuring probe is located in the supplying capillary and contributes to the pre-ionization. 4. System nach Anspruch 1, dadurch gekennzeichnet, daß wasserdampferzeugende Kammern zur Untersuchung von feuchtigkeitsempfindlichen Proben (z.B. biologische Zellen ) anschließbar sind. 4. System according to claim 1, characterized in that steam generating Chambers for the examination of moisture-sensitive samples (e.g. biological Cells) can be connected.
DE19833332248 1983-09-07 1983-09-07 System for discharging charges on test specimens in scanning electron microscope investigations Withdrawn DE3332248A1 (en)

Priority Applications (1)

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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0254128A2 (en) * 1986-07-25 1988-01-27 Siemens Aktiengesellschaft Method and arrangement for charge-free examination of a sample
EP0469314A2 (en) * 1990-07-31 1992-02-05 ICT Integrated Circuit Testing Gesellschaft für HalbleiterprÀ¼ftechnik mbH Method and apparatus for neutralizing electric charges built up on a specimen in a vacuum chamber
EP0969493A1 (en) * 1998-07-03 2000-01-05 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Apparatus and method for examining specimen with a charged particle beam
EP0969494A1 (en) * 1998-07-03 2000-01-05 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Apparatus and method for examining specimen with a charged particle beam
DE19851622A1 (en) * 1998-11-09 2000-05-18 Fraunhofer Ges Forschung Method for examining and / or modifying surface structures of a sample
DE10260601A1 (en) * 2002-12-23 2004-06-24 Infineon Technologies Ag Electron beam device for exposing a mask in production of integrated circuits comprises electron source for producing electron beam in closed vacuum chamber, and ion source for preparing positively charged ions
US20070176102A1 (en) * 2006-02-01 2007-08-02 Fei Company Particle optical apparatus with a predetermined final vacuum pressure
GB2455121A (en) * 2007-11-29 2009-06-03 Univ Sheffield Hallam Particle beam apparatus with means for reducing contamination in the particle beam column
DE102008040426A1 (en) 2008-07-15 2010-02-11 Carl Zeiss Nts Gmbh Method for examining surface of object using particle beam of particle beam device, involves arranging object in sample chamber, and supplying particle beam to predetermined location on surface of object
US7906762B2 (en) 2006-06-07 2011-03-15 Fei Company Compact scanning electron microscope
US8598524B2 (en) 2006-06-07 2013-12-03 Fei Company Slider bearing for use with an apparatus comprising a vacuum chamber
DE102015204091A1 (en) 2015-03-06 2016-09-08 Carl Zeiss Microscopy Gmbh Methods and apparatus for charge compensation
GB2537579A (en) * 2014-11-07 2016-10-26 Linkam Scient Instr Ltd Microscopic sample preparation

Cited By (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0254128A3 (en) * 1986-07-25 1990-01-03 Siemens Aktiengesellschaft Method and arrangement for charge-free examination of a sample
EP0254128A2 (en) * 1986-07-25 1988-01-27 Siemens Aktiengesellschaft Method and arrangement for charge-free examination of a sample
EP0469314A2 (en) * 1990-07-31 1992-02-05 ICT Integrated Circuit Testing Gesellschaft für HalbleiterprÀ¼ftechnik mbH Method and apparatus for neutralizing electric charges built up on a specimen in a vacuum chamber
EP0469314A3 (en) * 1990-07-31 1992-06-03 Siemens Aktiengesellschaft Method for neutralizing electric charges built up on a specimen in a vacuum chamber
EP1455379A2 (en) * 1998-07-03 2004-09-08 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Apparatus and method for examining specimen with a charged particle beam
EP0969493A1 (en) * 1998-07-03 2000-01-05 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Apparatus and method for examining specimen with a charged particle beam
EP0969494A1 (en) * 1998-07-03 2000-01-05 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Apparatus and method for examining specimen with a charged particle beam
EP1455379A3 (en) * 1998-07-03 2004-09-15 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Apparatus and method for examining specimen with a charged particle beam
US6555815B2 (en) 1998-07-03 2003-04-29 Applied Materials, Inc. Apparatus and method for examining specimen with a charged particle beam
DE19851622A1 (en) * 1998-11-09 2000-05-18 Fraunhofer Ges Forschung Method for examining and / or modifying surface structures of a sample
US6661005B1 (en) 1998-11-09 2003-12-09 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method of examining and/or modifying surface structures of a sample
WO2000028571A1 (en) * 1998-11-09 2000-05-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for examining and/or modifying surface structures of a sample
DE10260601A1 (en) * 2002-12-23 2004-06-24 Infineon Technologies Ag Electron beam device for exposing a mask in production of integrated circuits comprises electron source for producing electron beam in closed vacuum chamber, and ion source for preparing positively charged ions
US20070176102A1 (en) * 2006-02-01 2007-08-02 Fei Company Particle optical apparatus with a predetermined final vacuum pressure
US9153414B2 (en) 2006-02-01 2015-10-06 Fei Company Particle optical apparatus with a predetermined final vacuum pressure
US9025018B2 (en) 2006-06-07 2015-05-05 Fei Company User interface for an electron microscope
US7906762B2 (en) 2006-06-07 2011-03-15 Fei Company Compact scanning electron microscope
US8309921B2 (en) 2006-06-07 2012-11-13 Fei Company Compact scanning electron microscope
US8598524B2 (en) 2006-06-07 2013-12-03 Fei Company Slider bearing for use with an apparatus comprising a vacuum chamber
US9865427B2 (en) 2006-06-07 2018-01-09 Fei Company User interface for an electron microscope
GB2455121A (en) * 2007-11-29 2009-06-03 Univ Sheffield Hallam Particle beam apparatus with means for reducing contamination in the particle beam column
NL1037117C2 (en) * 2008-07-15 2012-01-24 Zeiss Carl Nts Gmbh Method and device for examining a surface of an object.
US8481933B2 (en) 2008-07-15 2013-07-09 Carl Zeiss Microscopy Gmbh Method and device for examining a surface of an object
DE102008040426A1 (en) 2008-07-15 2010-02-11 Carl Zeiss Nts Gmbh Method for examining surface of object using particle beam of particle beam device, involves arranging object in sample chamber, and supplying particle beam to predetermined location on surface of object
GB2537579A (en) * 2014-11-07 2016-10-26 Linkam Scient Instr Ltd Microscopic sample preparation
DE102015204091A1 (en) 2015-03-06 2016-09-08 Carl Zeiss Microscopy Gmbh Methods and apparatus for charge compensation
US10115558B2 (en) 2015-03-06 2018-10-30 Carl Zeiss Microscopy Gmbh Methods and devices for charge compensation
DE102015204091B4 (en) 2015-03-06 2023-06-07 Carl Zeiss Microscopy Gmbh Methods and devices for charge compensation

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