DE3268051D1 - Aqueous developable photopolymer compositions containing terpolymer binder - Google Patents
Aqueous developable photopolymer compositions containing terpolymer binderInfo
- Publication number
- DE3268051D1 DE3268051D1 DE8282109047T DE3268051T DE3268051D1 DE 3268051 D1 DE3268051 D1 DE 3268051D1 DE 8282109047 T DE8282109047 T DE 8282109047T DE 3268051 T DE3268051 T DE 3268051T DE 3268051 D1 DE3268051 D1 DE 3268051D1
- Authority
- DE
- Germany
- Prior art keywords
- compositions containing
- aqueous developable
- photopolymer compositions
- containing terpolymer
- terpolymer binder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/109—Polyester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/308,056 US4361640A (en) | 1981-10-02 | 1981-10-02 | Aqueous developable photopolymer compositions containing terpolymer binder |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3268051D1 true DE3268051D1 (en) | 1986-01-30 |
Family
ID=23192351
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8282109047T Expired DE3268051D1 (en) | 1981-10-02 | 1982-09-30 | Aqueous developable photopolymer compositions containing terpolymer binder |
Country Status (4)
Country | Link |
---|---|
US (1) | US4361640A (en) |
EP (1) | EP0076473B1 (en) |
JP (1) | JPS5872138A (en) |
DE (1) | DE3268051D1 (en) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3134123A1 (en) | 1981-08-28 | 1983-03-17 | Hoechst Ag, 6000 Frankfurt | RADIATION-POLYMERIZABLE MIXTURE AND MADE-UP PHOTOPOLYMERIZABLE COPY MATERIAL |
US4559293A (en) * | 1983-04-08 | 1985-12-17 | Kimoto & Co., Ltd. | Photosensitive recording material developable with aqueous neutral salt solution |
JPS60175044A (en) * | 1984-02-20 | 1985-09-09 | Toyobo Co Ltd | Photosensitive composition for duplicating picture image |
JPH0614185B2 (en) * | 1984-04-02 | 1994-02-23 | 日立化成工業株式会社 | Photosensitive resin composition and laminate using the same |
DE3427519A1 (en) * | 1984-07-26 | 1986-02-06 | Hoechst Ag, 6230 Frankfurt | POLYMERIZABLE MIXTURE BY RADIATION, MIXED POLYMERISATE CONTAINED therein, AND METHOD FOR PRODUCING THE MIXED POLYMER ISATE |
US4555473A (en) * | 1984-12-06 | 1985-11-26 | E. I. Dupont De Nemours And Company | Alkali developable photopolymer crystalline composition |
JPS61174541A (en) * | 1985-01-29 | 1986-08-06 | Toyobo Co Ltd | Sensitive composition for image reproducing material |
US4952482A (en) * | 1987-08-03 | 1990-08-28 | Hoechst Calanese Corporation | Method of imaging oxygen resistant radiation polymerizable composition and element containing a photopolymer composition |
US5026626A (en) * | 1987-08-03 | 1991-06-25 | Barton Oliver A | Oxygen resistant radiation-polymerizable composition and element containing a photopolymer composition |
US5019483A (en) * | 1989-09-13 | 1991-05-28 | 501 Industrial Technology Research Institute | Aqueous developable photoresist containing weak alkali soluble or dispersible thiol compounds |
US5045431A (en) * | 1990-04-24 | 1991-09-03 | International Business Machines Corporation | Dry film, aqueous processable photoresist compositions |
US5071730A (en) * | 1990-04-24 | 1991-12-10 | International Business Machines Corporation | Liquid apply, aqueous processable photoresist compositions |
TW353158B (en) * | 1994-03-09 | 1999-02-21 | Nat Starch Chem Invest | Aqueous photoresist composition, method for preparing the same and circuit board comprising thereof |
US5512607A (en) * | 1995-06-06 | 1996-04-30 | W. R. Grace & Co.-Conn. | Unsaturated epoxy ester with quaternary ammonium and phosphate groups |
WO1996041240A1 (en) * | 1995-06-07 | 1996-12-19 | W.R. Grace & Co.-Conn. | Water photoresist emulsions and methods of preparation thereof |
US5798019A (en) | 1995-09-29 | 1998-08-25 | E. I. Du Pont De Nemours And Company | Methods and apparatus for forming cylindrical photosensitive elements |
US5753414A (en) * | 1995-10-02 | 1998-05-19 | Macdermid Imaging Technology, Inc. | Photopolymer plate having a peelable substrate |
KR20000064468A (en) | 1995-12-21 | 2000-11-06 | 그래햄 이. 테일러 | Solder Mask Composition |
JP3912705B2 (en) * | 1998-03-05 | 2007-05-09 | 東京応化工業株式会社 | Negative photosensitive resin composition and photosensitive resin plate using the same |
US20010010893A1 (en) * | 1998-03-05 | 2001-08-02 | Hiroshi Takanashi | Negative-working photosensitive resin composition and photosensitive resin plate using the same |
DE19824546A1 (en) | 1998-06-03 | 1999-12-09 | Basf Drucksysteme Gmbh | Production of crosslinkable water-soluble or water-dispersible compositions and radiation-sensitive mixtures obtainable therefrom |
US6425327B1 (en) | 1999-08-12 | 2002-07-30 | E. I. Du Pont De Nemours And Company | Method for forming a cylindrical photosensitive element |
JP3769171B2 (en) * | 2000-05-17 | 2006-04-19 | 東京応化工業株式会社 | Multilayer photosensitive material for flexographic printing plate production |
CN1294167C (en) * | 2002-03-28 | 2007-01-10 | 亨斯迈先进材料(瑞士)有限公司 | Polymerisable composition |
US8142987B2 (en) * | 2004-04-10 | 2012-03-27 | Eastman Kodak Company | Method of producing a relief image for printing |
JP4342373B2 (en) * | 2004-04-30 | 2009-10-14 | 東京応化工業株式会社 | Photosensitive printing original plate for letterpress printing, method for producing letterpress printing plate, and shading ink for the method |
JP2006003570A (en) * | 2004-06-16 | 2006-01-05 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition for manufacturing printing plate, and laminate of photosensitive printing original plate and printing plate using same |
JP2007015147A (en) * | 2005-07-05 | 2007-01-25 | Tokyo Ohka Kogyo Co Ltd | Manufacturing method of photosensitive laminated printing original plate for letterpress printing, photosensitive laminated printing original plate and manufacturing method of letterpress printing plate |
US20070160935A1 (en) * | 2006-01-12 | 2007-07-12 | Keiichi Okajima | Lithographic printing plate material for CTP |
JP2007224093A (en) * | 2006-02-21 | 2007-09-06 | Tokyo Ohka Kogyo Co Ltd | Composition for forming adhesive layer, and letterpress plate using the composition, and method for producing letterpress plate |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2064080C3 (en) * | 1970-12-28 | 1983-11-03 | Hoechst Ag, 6230 Frankfurt | Photosensitive mixture |
DE2361041C3 (en) * | 1973-12-07 | 1980-08-14 | Hoechst Ag, 6000 Frankfurt | Photopolymerizable mixture |
CA1078098A (en) * | 1975-05-20 | 1980-05-20 | Rohm And Haas Company | Radiation curable coatings |
DE2720560A1 (en) * | 1977-05-07 | 1978-11-09 | Basf Ag | IMPROVED PHOTOPOLYMERIZABLE COMPOSITIONS FOR THE MANUFACTURE OF PRINT PLATES AND RELIEF SHAPES |
JPS53138492A (en) * | 1977-05-10 | 1978-12-02 | Japan Atom Energy Res Inst | Production of emulsion composition for baking coating |
GB1587476A (en) * | 1977-07-11 | 1981-04-01 | Du Pont | Photopolymerizable compositions and elements and methods of imaging |
-
1981
- 1981-10-02 US US06/308,056 patent/US4361640A/en not_active Expired - Fee Related
-
1982
- 1982-09-30 DE DE8282109047T patent/DE3268051D1/en not_active Expired
- 1982-09-30 EP EP82109047A patent/EP0076473B1/en not_active Expired
- 1982-10-01 JP JP57171071A patent/JPS5872138A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5872138A (en) | 1983-04-30 |
US4361640A (en) | 1982-11-30 |
EP0076473B1 (en) | 1985-12-18 |
EP0076473A1 (en) | 1983-04-13 |
JPH0146051B2 (en) | 1989-10-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |