DD291877A5 - METHOD FOR PRODUCING SELF-ADJUSTING SILICIDE CONTACTS ON SEMICONDUCTOR ARRANGEMENTS - Google Patents
METHOD FOR PRODUCING SELF-ADJUSTING SILICIDE CONTACTS ON SEMICONDUCTOR ARRANGEMENTSInfo
- Publication number
- DD291877A5 DD291877A5 DD33742290A DD33742290A DD291877A5 DD 291877 A5 DD291877 A5 DD 291877A5 DD 33742290 A DD33742290 A DD 33742290A DD 33742290 A DD33742290 A DD 33742290A DD 291877 A5 DD291877 A5 DD 291877A5
- Authority
- DD
- German Democratic Republic
- Prior art keywords
- silicide contacts
- producing self
- semiconductor arrangements
- adjusting
- adjusting silicide
- Prior art date
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD33742290A DD291877A5 (en) | 1990-01-31 | 1990-01-31 | METHOD FOR PRODUCING SELF-ADJUSTING SILICIDE CONTACTS ON SEMICONDUCTOR ARRANGEMENTS |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD33742290A DD291877A5 (en) | 1990-01-31 | 1990-01-31 | METHOD FOR PRODUCING SELF-ADJUSTING SILICIDE CONTACTS ON SEMICONDUCTOR ARRANGEMENTS |
Publications (1)
Publication Number | Publication Date |
---|---|
DD291877A5 true DD291877A5 (en) | 1991-07-11 |
Family
ID=5616162
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DD33742290A DD291877A5 (en) | 1990-01-31 | 1990-01-31 | METHOD FOR PRODUCING SELF-ADJUSTING SILICIDE CONTACTS ON SEMICONDUCTOR ARRANGEMENTS |
Country Status (1)
Country | Link |
---|---|
DD (1) | DD291877A5 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5502004A (en) * | 1992-10-05 | 1996-03-26 | Samsung Electronics Co., Ltd. | Method for manufacturing a semiconductor device with heat treated diffusion layers |
-
1990
- 1990-01-31 DD DD33742290A patent/DD291877A5/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5502004A (en) * | 1992-10-05 | 1996-03-26 | Samsung Electronics Co., Ltd. | Method for manufacturing a semiconductor device with heat treated diffusion layers |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RPI | Change in the person, name or address of the patentee (searches according to art. 11 and 12 extension act) | ||
ENJ | Ceased due to non-payment of renewal fee |