CN2907173Y - Large Area Parallel High Density Inductively Coupled Plasma Source - Google Patents
Large Area Parallel High Density Inductively Coupled Plasma Source Download PDFInfo
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- CN2907173Y CN2907173Y CN 200620069635 CN200620069635U CN2907173Y CN 2907173 Y CN2907173 Y CN 2907173Y CN 200620069635 CN200620069635 CN 200620069635 CN 200620069635 U CN200620069635 U CN 200620069635U CN 2907173 Y CN2907173 Y CN 2907173Y
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Abstract
The utility model discloses a large-area high-density inductively coupled plasma body source connected in parallel, comprising a radio-frequency power supply, a matching network (also called radio-frequency matcher), an outboard inductive antenna and a vacuum cavity, which is characterized in that a first induction is connected in series between the head of the inductive antenna and the output end of the matching network, a second induction is connected in series between the rear end and the earthing grip, and the induction volume of the first induction is larger than the induction volume of the second induction with the quality factors (Q value) of both inductions exceeding 50. Heavy and large dielectric-slab is not required because of the inductive antenna structure, which improves the coupling efficiency of the radio-frequency power, enhances the density of the plasma body and improves the homogeneousness of the inductively coupled plasma body. In addition, the utility model has simple structure and production, low cost, extensive industrial utilization value as a novel, advanced and practical design.
Description
Technical field
The utility model relates to a kind of plasma source, relates in particular to a kind of inductively coupled plasma (ICP) source.This device is applied to use as plasma producing apparatus in the manufacture fields such as semiconductor material growing, substrate etching and material surface modifying.
Background technology
Plasma is the ionized gas that the density of cation and electronics is quasi-electroneutrality about equally.High-density plasma source has been widely used in micro processing field such as material growth, substrate etching and material surface processing.At microelectronics and flat-panel display device manufacture field, develop a large tracts of land, uniformly the high-density plasma source technology is paid close attention to by people always.In recent years, develop several large-area high-density plasma sources in the world and be used for etching, material surface processing and thin-film material growth, mainly contained capacitively coupled plasma source (MECCP), microwave electron cyclotron resonance (ECR) plasma source, leaky antenna type microwave plasma source and inductively coupled plasma (ICP) source etc. that magnetic strengthens.
In above-mentioned several high-density plasma sources, magnetic enhancing CCP mainly uses in the source electronics in the axial magnetic field confined plasma, improves plasma density, but keeps away the damage that bombardment causes to substrate of unavoidable ion energy.The operating air pressure in microwave ECR source is low, etching injury is little and anisotropy is good, but because the existence in magnetic field makes the difficult effect that obtains even etching on large tracts of land more.The operating air pressure height of microwave leaky antenna type plasma source, after area enlarged, plasma density distribution can produce hollow type and distribute, and is difficult to substrate is carried out uniform surface treatment.Inductively coupled plasma (ICP) source is that radio-frequency power is added in the plasma producing apparatus that produces inductive discharge on the induction coil, and the typical plasma density of its generation is 10
11-10
12Cm
-3, than high one, two order of magnitude of plate electrode capacitive coupling type rf (discharge) plasma density of routine.Present this inductively coupled plasma source is owing to being applied to than having lower electron temperature and higher plasma density under the low air pressure condition that to handle diameter be 12 inches brilliant unit.Yet, this plasma source is amplified to can handles larger sized substrate, and be faced with sizable difficulty will keep desired performance such as plasma density, uniformity and power coupling efficiency the time.Basic reason is: expand single group induction antenna to total length that large scale must need to increase antenna, this will cause higher driving voltage, and antenna is carrying bigger ohmic loss simultaneously; Large tracts of land medium coupling window needs enough thickness bearing vacuum pressure, thereby can make the coupling efficiency between electromagnetic field and the plasma reduce, and is difficult to produce high-density plasma; In addition, more outstanding is, radio-frequency current is because the lengthening of antenna length will inevitably produce strong standing wave effect in antenna, and this has aggravated the inhomogeneities of space plasma.
In the technique known, realize that the method for large tracts of land inductively coupled plasma is the mode or the built-in mode of induction antenna of many days line parallels of multimedium window at present.But when adopting many antennas simply in parallel, the total inductance amount only is 1/4 of a single group coil, will cause the rapid reduction of coupling efficiency, thereby the plasma density that the induction coupling produces is often lower, has limited it in industrial practicability; And built-in aerial in discharge process since the existence of radio frequency automatic bias often take place induction antenna from the sputter behavior, pollute the plasma that is excited.
Summary of the invention
The technical problems to be solved in the utility model provides the parallel inductively coupled plasma source of large tracts of land of a kind of density height, good uniformity, not only bore is big, volume is big for the plasma that this device produces, and density height, good uniformity, but its treatment substrate diameter is up to 500mm.
In order to solve the problems of the technologies described above, large tracts of land of the present utility model high density induction in parallel coupled plasma source comprises radio-frequency power supply, matching network (or being called radio frequency adaptation), induction antenna and vacuum cavity.Induction antenna is made of the parallel connection of 2～4 groups of coil head and the tail, and every group of coil formed by the equidistant helically coiling in plane by 3～5 circles, and each is organized coil and evenly arranges in same plane; Vacuum cavity is a cavity body structure, and its cavity is provided with air inlet and bleeding point respectively as inlet channel and bleed-off passage; The coil quantity of corresponding induction antenna and position are provided with 2～4 medium windows on the cavity, and each medium window constitutes by the quartz medium plate greater than coil diameter, and induction antenna is floated and form external structure with this above the quartz medium plate.Of the present utility model being characterised in that: first inductance of connecting between induction antenna head end and the matching network output, second inductance of connecting between tail end and the earth terminal, the inductance value of first inductance is greater than the inductance value of second inductance, and the Q value of described first inductance and second inductance is all greater than 50, wherein:
Q＝ω·L/R
In the formula: ω is a discharge frequency;
L is an inductance value;
R is the inductance internal resistance.
Related content in the technique scheme is explained as follows:
1, in the such scheme, for obtaining the plasma of high density, good uniformity, the utility model is further adjusted the parameter configuration of antenna on the technical foundation of induction antenna parallel connection, make the radio-frequency power that is transferred to antenna maximize, in the structural design of induction antenna:
(1), the Q value of described first inductance of connecting with induction antenna, second inductance is all greater than 50, this Q value is to weigh the physical quantity of inductive discharge effect, is called quality factor, its numerical value is higher, the loss in loop is littler, discharging efficiency is then high more.The inductance component purpose that adopts high Q value is the internal resistance that reduces in the whole loop, improves radio-frequency current, increases the coupling efficiency of radio-frequency power, and then obtains highdensity plasma.
(2), the size of the size of the group number of described induction antenna and the concrete visual vacuum cavity of the number of turn and medium window and deciding.
(3), described induction antenna, first inductance and the second inductance surface all are electroplate with the silver of the low-resistivity of good bonding strength with it, silver thickness surpasses 500nm, so that produce best impedance conjugate impedance match, guarantee to obtain maximized radio-frequency current with its matching network that is connected.
(4), be further to reduce the capacitive coupling effect, induction antenna is an external structure, floats above the quartz medium plate, specifically can be designed to: the induction antenna about 1～2mm above outer surface posts the quartz medium plate of Faraday shield plate that floats.
2, in the such scheme,, avoid polluting plasma, between described induction antenna and quartz medium plate, the Faraday shield plate is set for reducing the sputter that radio-frequency potential causes dielectric-slab.The configuration of this structure can effectively suppress the capacitive coupling in the discharge process, reduces the shortcomings such as sputter of dielectric-slab.
3, in the such scheme, the gas that vacuum cavity inside is filled with adopts Ar gas usually, also can look customer requirements and change different discharge gas generation plasmas, to handle different types of sample.
The utility model operation principle is: start radio-frequency power supply, the output radio-frequency power, the output port feed-in of process matching network is by the induction antenna of inductance component series connection, induction antenna receives this radio-frequency power and obtains the radio-frequency current of certain frequency, this antenna current induces magnetic field by being set to the quartz medium plate of vacuum cavity upper side wall in vacuum cavity.According to Faraday's electromagnetic induction law, this magnetic field changes in time and causes induction field, utilizes this electric field to come accelerated electron, is excited the reacting gas in the vacuum cavity to produce ionization and form plasma, is inductively coupled plasma.This plasma is made up of charged electronics and ion, reacting gas in the vacuum cavity is under the bump of electronics, except being transformed into ion, can also absorb energy and form a large amount of active group (Radicals), active reactive group and substrate surface form chemical reaction, and under the bombardment effect of energy particle, producing volatile reaction product, this reaction product breaks away from substrate surface, extracts cavity out from bleeding point.
Because the utilization of such scheme, the utility model compared with prior art has the following advantages and effect:
1, because the utility model has adopted the induction antenna by the inductance component series connection, need not very thick large scale dielectric-slab, improved the coupling efficiency of radio-frequency power, strengthened plasma density, and improved the uniformity of inductively coupled plasma.
2, because the utility model is provided with the Faraday shield plate, and the configuration of this structure can effectively suppress the capacitive coupling in the discharge process, reduce the sputter that radio-frequency potential causes the quartz medium plate, avoid polluting shortcomings such as plasma.
3, the utility model structural design is simple, with low cost, practical with making.
Above-mentioned explanation only is the general introduction of technical solutions of the utility model, for can clearer understanding technological means of the present utility model, and can be implemented according to the content of specification, describe in detail with preferred embodiment of the present utility model and conjunction with figs. below as after.
Description of drawings
Accompanying drawing 1: structure principle chart of the present utility model;
Accompanying drawing 2: the induction antenna structure distribution figure of the utility model present embodiment one.
In the above accompanying drawing: 1, vacuum cavity; 2, Faraday shield plate; 3, substrate frame; 4, bleeding point; 5, quartz medium plate; 6, second inductance; 7, first inductance; 8, induction antenna; 9, matching network (or claiming radio frequency adaptation); 10, radio-frequency power supply.
Embodiment
Below in conjunction with accompanying drawing and preferred embodiment the utility model is further described:
Embodiment one: referring to shown in Figure 1, a kind of large tracts of land high density induction in parallel coupled plasma source comprises radio-frequency power supply 10, matching network 9 (or being called radio frequency adaptation 9), induction antenna 8 and vacuum cavity 1.Induction antenna 8 is made of the parallel connection of 4 groups of coil head and the tail, and every group of coil formed by the equidistant helically coiling in plane by 3 circles, and each is organized coil and evenly arranges in same plane.Vacuum cavity 1 is a cavity body structure, and its cavity is provided with air inlet and bleeding point 4 respectively as inlet channel and bleed-off passage, and the cavity bottom is provided with substrate frame 3; The coil quantity of corresponding induction antenna and position are provided with 2～4 medium windows on the cavity, and each medium window constitutes by the quartz medium plate 5 greater than coil diameter, and induction antenna 8 is floated and form external structure with this above quartz medium plate 5.Of the present utility model being characterised in that: first inductance 7 of connecting between induction antenna 8 head ends and matching network 9 outputs, second inductance 6 of connecting between tail end and the earth terminal, the inductance value of first inductance 7 is greater than the inductance value of second inductance 6, the Q value of described first inductance 7 and second inductance 6 is all greater than 50, wherein:
Q＝ω·L/R
In the formula: ω is a discharge frequency;
L is an inductance value;
R is the inductance internal resistance.
In the present embodiment, for obtaining the plasma of high density, good uniformity, the utility model is on the technical foundation of induction antenna 8 parallel connections, further adjust the parameter configuration of induction antenna 8, make the radio-frequency power maximization that is transferred to induction antenna 8, as shown in Figure 2, in the structural design of induction antenna 8:
(1), the inductance value of described induction antenna 8 is 3.9 μ H, adopt the equidistant helically coiling mode in plane evenly to arrange, its group number is 4 groups, and each is organized antenna element and is connected in parallel from beginning to end, every group of number of turn is 3 circles, the size of the quartz medium plate 5 that each coil diameter is all arranged less than correspondence.
(2), the Q value of described first inductance 7 of connecting with induction antenna 8, second inductance 6 is all greater than 50, this Q value is to weigh the physical quantity of inductive discharge effect, is called quality factor, its numerical value is higher, the loss in loop is littler, discharging efficiency is then high more.The inductance component purpose that adopts high Q value is the internal resistance that reduces in the whole loop, improves radio-frequency current, increases the coupling efficiency of radio-frequency power, and then obtains highdensity plasma.
(3), the inductance value of described first inductance 7 is 2.6 μ H, the inductance value of second inductance 6 is 0.9 μ H.
(4), described induction antenna 8, first inductance 7 and second inductance, 6 surfaces all are electroplate with the silver of the low-resistivity of good bonding strength with it, silver thickness surpasses 500nm, so that produce best impedance conjugate impedance match, guarantee to obtain maximized radio-frequency current with its matching network that is connected 9.
(5), be further to reduce the capacitive coupling effect, induction antenna 8 is an external structure, floats above quartz medium plate 5, specifically can be designed to: the induction antenna 8 about 1～2mm above outer surface posts the quartz medium plate 5 of Faraday shield plate 2 that floats.
In the present embodiment,, avoid polluting plasma, between described induction antenna 8 and quartz medium plate 5, the Faraday shield plate is set for reducing the sputter that radio-frequency potential causes quartz medium plate 5.The copper circuit board that covers that this Faraday shield plate 2 adopts thickness to be about 1.5mm is made, and the structure after the corrosion is the about tens microns metallic copper of thickness simultaneously as shown in Figure 1, in addition, is exactly common PCB insulation board.Parameters such as the number of spoke, inner and outer diameter are decided on the size of dielectric-slab in the metallic copper.The configuration of this structure can effectively suppress the capacitive coupling in the discharge process, reduces the shortcomings such as sputter of dielectric-slab.
In the present embodiment, the gas that vacuum cavity 1 inside is filled with adopts Ar gas usually, also can look customer requirements and change different discharge gas generation plasmas, to handle different types of sample.
The course of work of present embodiment is: start radio-frequency power supply 10, the output radio-frequency power, the output port feed-in of process matching network (or being called radio frequency adaptation) 9 is by the induction antenna 8 of inductance component series connection, obtain the radio-frequency current of certain frequency behind induction antenna 8 these radio-frequency powers of reception, this antenna current induces magnetic field by being set to the quartz medium plate 5 of vacuum cavity 1 upper side wall in vacuum cavity 1.According to Faraday's electromagnetic induction law, this magnetic field changes in time and causes induction field, utilizes this electric field to come accelerated electron, is excited the reacting gas in the vacuum cavity 1 to produce ionization and form plasma, is inductively coupled plasma.This plasma is made up of charged electronics and ion, reacting gas in the vacuum cavity 1 is under the bump of electronics, except being transformed into ion, can also absorb energy and form a large amount of active group (Radicals), active reactive group and substrate surface form chemical reaction, and produce volatile reaction product under the bombardment effect of energy particle, and this reaction product breaks away from substrate surface, extract vacuum cavity 1 out from bleeding point 4, thereby realize the purpose of this utility model.The plasma density height that utilizes this device to produce, good uniformity, but the treatment substrate diameter is up to 500mm.
Embodiment two: referring to shown in Figure 1, and a kind of large tracts of land high density induction in parallel coupled plasma source, be with embodiment one difference: the inductance value of (1), first inductance 7 is 2.3 μ H, the inductance value of second inductance 6 is 1.2 μ H; (2), the group number of induction antenna 8 is 2 groups, every group of number of turn is 5 circles (the induction antenna structure distribution figure of embodiment two omits and do not draw).Other is then identical with embodiment one, no longer is repeated in this description.
The above, it only is preferred embodiment of the present utility model, be not that the utility model is done any pro forma restriction, any personnel that are familiar with this technology may utilize the technology contents of above-mentioned announcement to be changed or be modified to the equivalent embodiment of equivalent variations.Every technical solutions of the utility model content that do not break away from, the equivalent embodiment according to technical spirit of the present utility model is done still belongs in the scope of technical solutions of the utility model.
Claims (3)
1, a kind of large tracts of land high density induction in parallel coupled plasma source comprises radio-frequency power supply, matching network, induction antenna [8] and vacuum cavity [1];
Induction antenna [8] is made of the parallel connection of 2～4 groups of coil head and the tail, and every group of coil formed by the equidistant helically coiling in plane by 3～5 circles, and each is organized coil and evenly arranges in same plane;
Vacuum cavity [1] is a cavity body structure, and its cavity is provided with air inlet and bleeding point respectively as inlet channel and bleed-off passage; The coil quantity of corresponding induction antenna [8] and position are provided with 2～4 medium windows on the cavity, and each medium window constitutes by the quartz medium plate [5] greater than coil diameter, and induction antenna [8] is floated and formed external structure in quartz medium plate [5] top with this;
It is characterized in that: first inductance [7] of connecting between induction antenna [8] head end and the matching network output, second inductance [6] of connecting between tail end and the earth terminal, the inductance value of first inductance [7] is greater than the inductance value of second inductance [6], the Q value of described first inductance [7] and second inductance [6] is all greater than 50, wherein:
Q＝ω·L/R
In the formula: ω is a discharge frequency;
L is an inductance value;
R is the inductance internal resistance.
2, large tracts of land according to claim 1 high density induction in parallel coupled plasma source, it is characterized in that: between induction antenna [8] and quartz medium plate [5] Faraday shield plate [2] is set, this Faraday shield plate [2] is attached on quartz medium plate [5] outer surface.
3, large tracts of land according to claim 1 high density induction in parallel coupled plasma source is characterized in that: described induction antenna [8], first inductance [7] and second inductance [6] surface all are coated with the silver layer that thickness surpasses 500nm.
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| CN 200620069635 CN2907173Y (en) | 2006-02-24 | 2006-02-24 | Large Area Parallel High Density Inductively Coupled Plasma Source |
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| CN 200620069635 CN2907173Y (en) | 2006-02-24 | 2006-02-24 | Large Area Parallel High Density Inductively Coupled Plasma Source |
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