CN222379073U - Level calibration device - Google Patents

Abstract

The utility model relates to the technical field of semiconductors and provides a horizontal calibration device which comprises a detection frame and a ranging unit, wherein the ranging unit is rotatably arranged on the detection frame around a datum line, the detection frame comprises a plurality of detection datum planes, each detection datum plane is circumferentially arranged around the datum line, the ranging unit is located on one side of the detection datum plane along the direction of the datum line, and when the ranging unit rotates around the datum line, the ranging unit passes through each detection datum plane and each light transmission zone. So configured, the ranging unit of the horizontal calibration device adopts contactless measurement, the levelness of the transmission device can be calculated through multiple groups of relative distances, and the measurement error caused by the position change of the ranging unit in the rotation process can be eliminated through the relative distance measurement, so that the measurement accuracy is improved.

Description

Horizontal calibration device

Technical Field

The utility model relates to the technical field of semiconductors, in particular to a horizontal calibration device.

Background

The epitaxial growth process is an indispensable process step for processing a wafer, and is a process for growing a single crystal layer which has complete crystal lattice and can have different impurity concentrations and thicknesses along the original crystal axis on a single crystal wafer by utilizing the principle of two-dimensional structural similarity nucleation on a crystal interface.

In the epitaxial growth process, the wafer is required to be transmitted into an epitaxial furnace through a transmission device, and the levelness of the transmission device influences the pose of the wafer, so that the epitaxial growth effect is influenced. The conventional bubble type level gauge is generally adopted in the horizontal calibration of the existing epitaxial furnace conveying device, the levelness of the conveying device is judged by visual observation of the position of bubbles in the level gauge, and the mechanical arm is horizontally adjusted according to visual results.

In the calibration process, the level gauge is required to be placed on the transmission device, so that on one hand, the self weight of the level gauge can influence the levelness of the transmission device and influence the calibration result, and on the other hand, the visual method is adopted for calibration, the calibration modes of all testers are inconsistent, the measurement result cannot be standardized, the measurement result has large phase difference, and the horizontal calibration precision is lower.

Disclosure of utility model

The utility model provides a horizontal calibration device which adopts a non-contact mode for calibration, is beneficial to measurement standardization and improves calibration precision.

The horizontal calibration device comprises a detection frame and a ranging unit;

The distance measuring unit is rotatably arranged on the detection frame around the datum line;

The detection frame comprises a plurality of detection reference surfaces, a light transmission area is arranged on the detection frame, and each detection reference surface is circumferentially arranged around the reference line;

The distance measuring unit is located on one side of the detection reference surface along the direction of the reference line, and when the distance measuring unit rotates around the reference line, the distance measuring unit passes through each detection reference surface and the light transmission area.

Optionally, the detection frame further comprises a reference seat, a light hole is formed in the reference seat, the area where the light hole is located is used as the light transmission area, and the detection reference surface is arranged on the reference seat.

Optionally, the detection frame further includes a plurality of reference plates, the reference plates are attached to the reference base, and a side of the reference plates opposite to the reference base is used as the detection reference surface.

Optionally, each of the detection reference planes is coplanar, and the reference line is perpendicular to the detection reference plane.

Optionally, the detection frame further comprises a mounting seat, the ranging unit is rotatably mounted on the mounting seat, and the reference seat is arranged on the mounting seat.

Optionally, a set distance is provided between the reference base and the mounting base, and the reference base is connected with the mounting base through a connecting piece.

Optionally, the reference base and the ranging unit are respectively disposed on two sides of the mounting base along the direction of the reference line, a plurality of through holes are formed in the mounting base, the through holes are in one-to-one correspondence with the detection reference surfaces, at least one part of the through holes and the detection reference surfaces are opposite to each other along the direction of the reference line, and at least one part of the through holes and the light transmission area are opposite to each other along the direction of the reference line.

Optionally, the mounting seat and/or the reference seat are/is in a plate structure, and when the mounting seat and the reference seat are in a plate structure, the mounting seat and the reference seat are arranged in parallel.

Optionally, the mounting base and the reference base are both circular and coaxially arranged, and the reference line is collinear with the central axis of the mounting base.

Optionally, the ranging unit is a laser range finder.

In summary, the horizontal calibration device comprises a detection frame and a ranging unit, wherein the ranging unit is rotatably arranged on the detection frame around a datum line, the detection frame comprises a plurality of detection datum planes, the detection frame is provided with a light transmission area, each detection datum plane is circumferentially arranged around the datum line, the ranging unit is located on one side of the detection datum plane along the direction of the datum line, and when the ranging unit rotates around the datum line, the ranging unit passes through each detection datum plane and each light transmission area.

So configured, the above-described level calibration device should maintain the level of each detection reference surface at the time of calibration. The wafer is carried by the transmission device of the epitaxial growth equipment and moves to one side of the horizontal calibration device along the direction of the datum line, and the distance measurement unit sequentially passes above each detection datum plane in the rotation process. The laser light emitted from the ranging unit is irradiated on the detection reference surface to measure a first distance from the detection reference surface. The laser light can also irradiate the surface of the wafer through the light transmission area, and a second distance from the surface of the wafer is measured. The relative distance between the upper surface of the wafer and the detection reference plane can be calculated through the difference value of the second distance and the first distance. Along with the rotation of the ranging unit, the ranging unit sequentially passes through the upper parts of the detection reference surfaces, multiple groups of relative distances can be measured, and the levelness of the transmission device can be calculated through the multiple groups of relative distances, so that the aim of horizontal calibration is fulfilled.

According to the device, the relative distance between the detection reference surface and the wafer is compared, so that the measurement error caused by the position change of the ranging unit in the rotation process can be eliminated, the measurement accuracy is improved, the normal wafer conveying environment can be simulated, and the measured data, the calibration transmission device level and the position are more accurate. The distance measuring unit adopts non-contact measurement, eliminates the influence of the weight of the measuring tool in the traditional contact measurement mode on the levelness of the transmission device, improves the measurement accuracy, has better consistency in the measurement mode, can normalize the measurement result and has higher horizontal calibration accuracy.

Drawings

FIG. 1 is a schematic top view of a horizontal calibration device according to some embodiments of the present utility model;

fig. 2 is a schematic cross-sectional view of a horizontal calibration device according to some embodiments of the present utility model.

Wherein, the reference numerals are as follows:

10-detecting frame, 101-detecting reference plane, 102-light transmission area, 11-mounting seat, 111-through hole, 12-reference seat, 121-light transmission hole, 13-reference sheet and 14-connecting piece;

20-a ranging unit;

30-bearing;

40-rotating a rod;

50-a control unit;

60-wafer;

a-datum line.

Detailed Description

The horizontal calibration device according to the present utility model will be described in further detail with reference to the accompanying drawings and specific examples. The advantages and features of the present utility model will become more apparent from the following description. It should be noted that the drawings are in a very simplified form and are all to a non-precise scale, merely for convenience and clarity in aiding in the description of embodiments of the utility model.

In the utility model, the outer diameter and the inner diameter correspond to the diameter size for a circular structure, the inner diameter refers to the diameter of an inscribed circle of the circular structure, the outer diameter refers to the diameter of an outsourced circle of the circular structure, the axial direction corresponds to the direction in which the axis is positioned for a cylindrical rod body, and the axial direction corresponds to the length direction of the rod body when the rod body is not cylindrical.

As used in this disclosure, the singular forms "a," "an," and "the" include plural referents, the term "or" are generally used in the sense of comprising "and/or" and the term "several" are generally used in the sense of comprising "at least one," the term "at least two" are generally used in the sense of comprising "two or more," and the term "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying any relative importance or number of features indicated. Thus, a feature defining "a first", "a second", "a third" may include one or at least two such features, either explicitly or implicitly. Furthermore, as used in this disclosure, "mounted," "connected," and "disposed" with respect to another element should be construed broadly to mean generally only that there is a connection, coupling, mating or transmitting relationship between the two elements, and that there may be a direct connection, coupling, mating or transmitting relationship between the two elements or indirectly through intervening elements, and that no spatial relationship between the two elements is to be understood or implied, i.e., that an element may be in any orientation, such as internal, external, above, below, or to one side, of the other element unless the context clearly dictates otherwise. The specific meaning of the above terms in the present utility model can be understood by those of ordinary skill in the art according to the specific circumstances. Furthermore, directional terms, such as above, below, upper, lower, upward, downward, left, right, etc., are used with respect to the exemplary embodiments as they are shown in the drawings, upward or upward toward the top of the corresponding drawing, downward or downward toward the bottom of the corresponding drawing.

In this embodiment, a horizontal calibration device is provided, which includes a detection frame 10 and a ranging unit 20.

As shown in fig. 1 and 2, the inspection rack 10 further includes a mounting base 11, a reference base 12, a reference plate 13, and a connector 14.

The mounting seat 11 is in a plate structure and is disc-shaped, and the ranging unit 20 is rotatably arranged on the detection frame 10 around a datum line a, wherein the datum line a is collinear with the axis of the mounting seat 11. The ranging unit 20 may be connected to the control unit 50 wirelessly or by wire, and the control unit 50 may be, for example, a control box of the ranging apparatus.

The center of the mounting seat 11 is provided with a mounting hole, a bearing 30 is arranged in the mounting hole, the ranging unit 20 is arranged on the L-shaped rotating rod 40, a right-angle side of the rotating rod 40 is inserted into an inner ring of the bearing 30 and is in rotating fit with the bearing 30, the side can be externally connected with a driving device for driving the rotating rod 40 to rotate around a datum line a, the other right-angle side of the rotating rod 40 is perpendicular to the datum line a and is connected with the ranging unit 20, the length of the right-angle side is smaller than the radius of the mounting seat 11, and the specific size of each right-angle side of the rotating rod 40 can be adjusted according to practical use requirements.

In this embodiment, the ranging unit 20 adopts a CMOS laser ranging device, for example, a ZG2 laser ranging device, and a laser emitting end of the laser ranging device faces the reference base 12. The CMOS laser range finder is adopted, the measurement result is dataized, the standard of the calibration and adjustment transmission device is facilitated to be formulated, and the periodic calibration of the machine is facilitated.

In other alternative embodiments, the ranging unit 20 may employ an ultrasonic rangefinder or other known non-contact ranging device.

With continued reference to fig. 1 and 2, in the present embodiment, the reference base 12 has a circular ring structure, the reference base 12 is coaxially disposed with the mounting base 11, and the outer periphery of the reference base 12 is connected with the lower surface of the mounting base 11 through the connecting member 14.

The connecting member 14 may be a number of connecting rods integrally formed with the datum base 12, or the connecting member 14 may be a connecting sleeve integrally formed with the datum base 12. In addition, the connecting piece 14 can be arranged separately from the reference base 12, and the connecting piece 14 can be connected with the mounting base 11 and the reference base 12 in an adhesive manner. The specific structure of the connecting member 14 and the connection manner with the reference base 12 and the mounting base 11 can be adaptively adjusted based on actual use requirements.

In this embodiment, the mounting seat 11 and the reference seat 12 are arranged in parallel, the mounting seat 11 and the reference seat 12 have a set distance along the direction of the reference line a, the set distance can be set to facilitate the mounting of the reference sheet 13, and the specific size of the set distance can be adjusted adaptively based on the actual use requirement.

With continued reference to fig. 2, the hollow position of the reference base 12 is used as a light hole 121, the region where the light hole 121 is located is used as the light-transmitting region 102, the reference sheet 13 is made of a non-transparent material, the reference sheet 13 is adhered to the upper surface of the reference base 12, and the upper surface of the reference sheet 13 (the side of the reference sheet 13 opposite to the connecting piece 14) is used as the detection reference plane 101. Thus, the detection reference surface 101 is radially adjacent to the light transmitting region.

In this embodiment, the reference sheet 13 is a silicon wafer, and the thickness of the silicon wafer is about 1 mm. In other alternative embodiments, other known non-transparent materials may be used for the reference plate 13, and the material and thickness of the reference plate 13 may be adapted based on the actual use requirements. In the present embodiment, the attaching position of the reference sheet 13 is not particularly limited, and for example, the reference sheet 13 may be aligned in a conforming manner with the inner peripheral surface of the reference base 12, aligned in a conforming manner with the outer peripheral surface of the reference base 12, or the reference sheet 13 may be attached on the upper surface of the reference base 12 between the inner peripheral surface and the outer peripheral surface thereof.

When the ranging unit 20 rotates above the detection reference surface 101, the distance from the detection reference surface 101 is measured when the laser light emitted from the ranging unit 20 irradiates downward on the detection reference surface 101.

With continued reference to fig. 1 and 2, in the present embodiment, the reference plates 13 are provided with four reference plates 13, so that the detection reference surface 101 is also in a fan shape, so that the measurement result is dataized and standardized, and the measurement data is more accurate. The four detection reference surfaces 101 are coplanar, and the reference line a is perpendicular to the detection reference surfaces 101. The detection reference surfaces 101 are uniformly arranged circumferentially around the reference line a, and pass over the four reference plates 13 in sequence during rotation of the ranging unit 20.

In this embodiment, the ranging unit 20 is located above the mounting base 11 along the direction of the reference line a, and the reference base 12 and the reference piece 13 are located below the mounting base 11 along the direction of the reference line a. Four through holes 111 are formed in the mounting seat 11 along the direction of the datum line a, and each through hole 111 corresponds to each detection datum plane 101 one by one. The hole shape of the through hole 111 is in a sector shape, the hole area of the through hole 111 is larger than the area of the detection reference surface 101, and here, the hole area of the through hole 111 refers to the cross-sectional area of the through hole 111 cut along the direction perpendicular to the reference line a.

As shown in fig. 2, in this embodiment, a part of the through hole 111 is disposed opposite to the corresponding detection reference plane along the direction in which the reference line a is located (up-down direction in fig. 2), and another part of the through hole is disposed opposite to the light-transmitting region 102 along the direction in which the reference line a is located (up-down direction in fig. 2).

The through-hole 111 is provided such that laser light emitted during rotation of the ranging unit 20 is irradiated downward through the through-hole 111. In this embodiment, it is preferable that the distance measuring unit 20 emits a linear laser beam, a part of the linear laser beam emitted downward from the distance measuring unit 20 is directed to the reference surface 101, the part of the laser beam is irradiated on the reference surface 101, the other part of the laser beam is directed to the light transmitting region 10, and the part of the laser beam passes downward through the light transmitting region 10.

In the present embodiment, the reference piece 13 and the through hole 111 are each provided with four. In other alternative embodiments, the number of reference plates 13 and through holes 111 may be two, three or more. In this embodiment, the reference plate 13 and the through hole 111 are both in the shape of a sector, and in other alternative embodiments, the reference plate 13 and the through hole 111 may be circular, rectangular, or other shapes.

In the present embodiment, the detection reference surface 101 is formed by a reference piece 13 attached to the reference base 12. In other alternative embodiments, the detection datum 101 may be formed by plating or coloring the datum pad 12. The formation of the detection reference surface 101 may be adaptively adjusted based on actual use requirements.

In this embodiment, the mounting base 11 and the reference base 12 are both circular. In other alternative embodiments, the shapes of the mounting seat 11 and the reference seat 12 may be square or other shapes, and the shapes of the mounting seat 11 and the reference seat 12 may be adaptively adjusted based on practical requirements.

In this embodiment, the mount 11 and the reference mount 12 are of a split type structure. In other alternative embodiments, the mounting 11 and reference 12 may be of unitary construction. Or the mounting base 11, the reference base 12 and the connecting member 14 may be of a unitary structure.

In this embodiment, in order to reduce the weight of the entire horizontal calibration device, the mounting base 11 and the reference base 12 may be made of acrylic plates, the connecting member 14 may be an acrylic rod, and the rotating rod 40 may be an acrylic rod. In other alternative embodiments, the materials of the components of the horizontal calibration device may be selected adaptively based on the structural strength and density of the device.

The horizontal calibration device described above should keep each detection reference plane 101 horizontal during calibration. The transfer device of the epitaxial growth apparatus moves under the horizontal alignment device in fig. 2 with the wafer 60, and the ranging unit 20 sequentially passes over each of the through holes 111 and the inspection reference surface 101 during rotation. A part of the laser beam emitted from the distance measuring unit 20 is irradiated onto the detection reference surface 101 through the through hole 111 to measure a first distance from the detection reference surface 101. Another portion of the laser beam emitted from the ranging unit 20 passes through the through hole 111 and then is irradiated onto the surface of the wafer 60 downward through the light-transmitting region 102, and a second distance from the surface of the wafer 60 is measured. The relative distance of the upper surface of the wafer 60 from the detection reference plane 101 can be calculated by the difference between the second distance and the first distance. Along with the rotation of the ranging unit 20 passing above each detection reference plane 101 in turn, multiple sets of relative distances can be measured, and the levelness of the transmission device can be calculated through the multiple sets of relative distances, so that the purpose of horizontal calibration is achieved.

The device can eliminate the measurement error caused by the position change of the ranging unit 20 in the rotation process by comparing the relative distance between the detection reference surface 101 and the wafer 60, is beneficial to improving the measurement precision, can simulate the normal slice transmission environment, and has more accurate measured data, calibration transmission device level and position. The ranging unit 20 adopts non-contact measurement, eliminates the influence of the weight of the measuring tool in the traditional contact measurement mode on the levelness of the transmission device, improves the measurement accuracy, has better consistency in the measurement mode, can normalize the measurement result and has higher horizontal calibration accuracy.

When the device is used, the device is placed at a Load lock position, so that the level and the position of the mechanical arms of the front and rear transmission devices of the epitaxial growth equipment at the transmission end point can be calibrated, and the calibration of the mechanical arms of all the transmission devices of the epitaxial growth equipment can be facilitated.

In this embodiment, the distance measuring unit 20 emits a linear laser beam, and in other alternative embodiments, the distance measuring unit 20 may be configured to emit two spot-shaped laser beams, where one laser beam is used to irradiate the detection reference plane 101 and the other laser beam is used to irradiate the upper surface of the wafer 60.

In the present embodiment, the connecting member 14 is attached to the upper surface of the reference base 12 at a position near the outer peripheral surface thereof. In other alternative embodiments, the connecting member 14 may be attached to the upper surface of the reference base 12 at a position in the middle or near the inner peripheral surface thereof. Further, in order to avoid interference of the connecting piece 14 with the reference piece 13, the connecting piece 14 and the reference piece 13 are staggered in the circumferential direction of the reference seat 12.

In this embodiment, the light-transmitting area 102 is formed by a light-transmitting hole 121 formed in the middle of the reference base 12, and the arrangement manner is such that the reference base 12 is annular as a whole. In other alternative embodiments, the light-transmitting region 102 may be formed of a plurality of openings, each of which is alternately arranged with each of the reference pieces 13 in the circumferential direction of the reference base 12. The distance measuring unit 20 is then rotated while passing through the reference plate 13 and the hole in turn. The light-transmitting area 102 may be arranged in other possible manners, which will not be described in detail herein.

The above description is only illustrative of the preferred embodiments of the present utility model and is not intended to limit the scope of the present utility model, and any changes and modifications made by those skilled in the art based on the above disclosure are intended to fall within the scope of the appended claims.

Claims (10)

1. The horizontal calibration device is characterized by comprising a detection frame and a ranging unit;

The distance measuring unit is rotatably arranged on the detection frame around the datum line;

The detection frame comprises a plurality of detection reference surfaces, a light transmission area is arranged on the detection frame, and each detection reference surface is circumferentially arranged around the reference line;

The distance measuring unit is located on one side of the detection reference surface along the direction of the reference line, and when the distance measuring unit rotates around the reference line, the distance measuring unit passes through each detection reference surface and the light transmission area.

2. The horizontal calibration device of claim 1, wherein the detection frame further comprises a reference base, the reference base is provided with a light hole, the light hole is used as the light transmission area, and the detection reference surface is arranged on the reference base.

3. The level calibration device of claim 2, wherein the test frame further comprises a plurality of reference pieces, the reference pieces being attached to the reference base, a side of the reference pieces opposite to the reference base being the test reference surface.

4. A level alignment device as claimed in any one of claims 1 to 3 wherein each of said sensing datum planes are coplanar, said datum lines being perpendicular to said sensing datum planes.

5. The level calibration device of claim 2, wherein the detection frame further comprises a mounting base, the ranging unit is rotatably mounted to the mounting base, and the reference base is disposed on the mounting base.

6. The level calibration device of claim 5, wherein the datum seat is a set distance from the mounting seat, the datum seat being connected to the mounting seat by a connector.

7. The horizontal calibration device according to claim 5, wherein the reference base and the distance measuring unit are respectively disposed on two sides of the mounting base along the direction of the reference line, a plurality of through holes are formed in the mounting base, each through hole corresponds to each detection reference surface one by one, at least one part of each through hole is disposed opposite to the detection reference surface along the direction of the reference line, and at least one part of each through hole is disposed opposite to the light transmitting area along the direction of the reference line.

8. The horizontal calibration device according to claim 6, wherein the mounting base and/or the reference base are/is of a plate type structure, and the mounting base and the reference base are arranged in parallel when both are of a plate type structure.

9. The horizontal alignment device of claim 6 wherein the mount and the datum mount are both circular and coaxially disposed, the datum line being collinear with a central axis of the mount.

10. The level calibration device of claim 1, wherein the ranging unit is a laser range finder.