CN221940662U - Conductive film copper plating system - Google Patents

Abstract

The utility model provides a conductive film copper plating system. It includes: a pre-treatment tank, a first double countercurrent water washing tank, a first water washing climbing overflow tank, at least one copper plating tank, at least one copper plating climbing overflow tank, a second double countercurrent water washing tank, a second water washing climbing overflow tank, a first antioxidant tank, a second antioxidant tank, a drying box, and a wind shear device connected in sequence; the technical scheme of the utility model greatly reduces the problem of water carrying on the film on the copper plating film drawing line, reduces the amount of liquid brought into the rear working tank by the front working tank liquid to the minimum, prolongs the service life of each working tank liquid, and creatively adds a pre-treatment tank and a wind shear device to the traditional film plating film drawing line, creatively adopts a pulse power supply with a variable polarity mode at the anode and cathode rollers, and adopts a dilute sulfuric acid roller washing device at the cathode, further avoiding membrane surface pollution, improving product quality, and reducing manufacturing costs.

Description

Conductive film copper plating system

Technical Field

The utility model relates to the technical field of film plating, in particular to a conductive film copper plating system.

Background Art

The double-sided water-plated copper plating process for various types of ultra-thin plastic films (PP or PET but not limited to these two types) is for single-roll magnetron films with a width of more than 1 meter (double-sided magnetron copper plating has been performed). When the electroplating line of this process is produced, when the plastic film is transferred from the previous slot to the next slot during the film drawing process, the front slot liquid will generally adhere to the plastic film, and the front slot liquid carried on the film will instantly contaminate the rear slot liquid. The front and rear slot liquids will react chemically, greatly reducing the concentration of the effective components and service life of each slot liquid, reducing product quality, and increasing production costs.

Utility Model Content

The utility model provides a conductive film copper plating system, which is used to solve the problem that the film carries water seriously during the film drawing process of the electroplating line, the front tank liquid will instantly pollute the rear tank liquid, and the product quality is reduced.

To solve the above technical problems, the technical solution of this novel invention is as follows:

A conductive film copper plating system, comprising: a pre-treatment tank, a first double countercurrent water washing tank, a first water washing climbing overflow tank, at least one copper plating tank, at least one copper plating climbing overflow tank, a second double countercurrent water washing tank, a second water washing climbing overflow tank, a first antioxidant tank, a second antioxidant tank, and a drying box connected in sequence;

A first water cut-off roller assembly is provided at the connection between the pre-treatment tank and the first double countercurrent water washing tank;

A second water cut-off roller assembly is provided at the connection between the first double countercurrent water washing tank and the first water washing climbing overflow tank;

A third water cut-off roller assembly is provided at the connection between the first water washing climbing overflow trough and the copper plating trough;

A fourth water cut-off roller assembly is provided at the connection between the copper plating tank and the copper plating climbing overflow tank;

A fifth water cut-off roller assembly is provided at the connection between the copper plating climbing overflow trough and the second double countercurrent water washing trough;

A sixth water cut-off roller assembly is provided at the connection between the second double countercurrent water washing tank and the second water washing climbing overflow tank;

A seventh water cut-off roller assembly is provided at the connection between the second water washing climbing overflow trough and the first anti-oxidation trough;

An eighth water cut-off roller assembly is provided at the connection between the first anti-oxidation groove and the second anti-oxidation groove;

A ninth water cut-off roller assembly is provided at the connection between the second anti-oxidation tank and the drying box;

A wind shear device is provided at one end of the ninth water cut-off roller assembly;

The installation height of the device in the conductive film copper plating system gradually increases from left to right.

Optionally, the structural height of the first water washing climbing overflow trough varies uniformly along the running direction of the conductive film.

Optionally, the first double countercurrent water washing tank includes a first water washing tank and a second water washing tank;

The first water washing tank is connected to the second water washing tank in sequence;

A tenth water-cutting roller assembly is provided at the connection between the first water washing tank and the second water washing tank.

Optionally, the height of the copper-plated climbing overflow trough structure changes uniformly along the running direction of the conductive film.

Optionally, the second double countercurrent water washing tank includes a third water washing tank and a fourth water washing tank;

The third water washing tank is connected to the fourth water washing tank in sequence;

An eleventh water cut-off roller assembly is provided at the connection between the third water washing tank and the fourth water washing tank.

Optionally, the structural height of the second water washing climbing overflow trough varies uniformly along the running direction of the conductive film.

Optionally, the structural height of the second anti-oxidation groove varies uniformly along the running direction of the conductive film.

Optionally, a cathode roller and an anode roller are arranged at intervals in the copper plating tank;

According to preset process requirements, the polarities of the cathode roller and the anode roller are adjusted through a pulse rectifier;

A twelfth water-cutting roller assembly is arranged on both sides of the cathode roller.

Optionally, spray devices are evenly arranged on the upper and lower parts of the cathode roller to remove floating copper plated on the surface of the cathode roller.

Optionally, the cathode roller is a copper roller, and the anode roller is an insoluble anode roller plated with iridium and titanium.

The above solution of the utility model includes at least the following beneficial effects:

The above scheme of the utility model includes: a pre-treatment tank, a first double countercurrent water washing tank, a first water washing climbing overflow tank, at least one copper plating tank, at least one copper plating climbing overflow tank, a second double countercurrent water washing tank, a second water washing climbing overflow tank, a first antioxidant tank, a second antioxidant tank, and a drying box connected in sequence; a first water cut-off roller assembly is provided at the connection between the pre-treatment tank and the first double countercurrent water washing tank; a second water cut-off roller assembly is provided at the connection between the first double countercurrent water washing tank and the first water washing climbing overflow tank; a third water cut-off roller assembly is provided at the connection between the first water washing climbing overflow tank and the copper plating tank; a third water cut-off roller assembly is provided at the connection between the copper plating tank and the copper plating climbing overflow tank A fourth water-cutting roller assembly is provided; a fifth water-cutting roller assembly is provided at the connection between the copper plating climbing overflow trough and the second double countercurrent water washing trough; a sixth water-cutting roller assembly is provided at the connection between the second double countercurrent water washing trough and the second water washing climbing overflow trough; a seventh water-cutting roller assembly is provided at the connection between the second water washing climbing overflow trough and the first antioxidant trough; an eighth water-cutting roller assembly is provided at the connection between the first antioxidant trough and the second antioxidant trough; a ninth water-cutting roller assembly is provided at the connection between the second antioxidant trough and the drying box; a wind shear device is provided at one end of the ninth water-cutting roller assembly, and the installation height of the device in the conductive film copper plating system gradually increases from left to right. The technical solution of the utility model greatly reduces the problem of water carrying in the membrane on the copper plating film drawing line, reduces the amount of liquid in the front working tank brought into the liquid in the rear working tank to a minimum, and extends the service life of the liquid in each working tank. In addition, a pretreatment tank and a wind cutting device are creatively added to the traditional film coating film drawing line, and a pulse power supply with changeable polarity mode is creatively adopted at the anode and cathode rollers, and a dilute sulfuric acid roller washing device is adopted at the cathode, which further avoids membrane surface contamination, improves product quality, and reduces manufacturing costs.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG1 is a side view of a conductive film copper plating system according to an embodiment of the present utility model;

FIG2 is a schematic diagram of the water cut-off roller assembly in FIG1 ;

FIG3 is a schematic diagram of the combined use of the cathode roller and the spray device in FIG1;

FIG4 is a schematic diagram of the wind cutting device in FIG1 ;

Description of reference numerals:

1. Pretreatment tank; 2. First double countercurrent water washing tank; 3. First water washing climbing overflow tank; 4. Copper plating tank; 5. Copper plating climbing overflow tank; 6. Second double countercurrent water washing tank; 7. Second water washing climbing overflow tank; 8. First antioxidant tank; 9. Second antioxidant tank; 10. Drying box; 11. First water cut-off roller assembly; 12. Second water cut-off roller assembly; 13. Third water cut-off roller assembly; 14. Fourth water cut-off roller assembly; 15. Fifth water cut-off roller assembly; 16. Six water-cutting roller assembly; 17, seventh water-cutting roller assembly; 18, eighth water-cutting roller assembly; 19, ninth water-cutting roller assembly; 20, wind cutting device; 21, first water washing tank; 22, second water washing tank; 23, tenth water-cutting roller assembly; 30, cathode roller; 31, anode roller; 32, twelfth water-cutting roller assembly; 33, spraying device; 61, third water washing tank 62, fourth water washing tank; 63, eleventh water-cutting roller assembly; 71, unwinding system; 72, winding system.

DETAILED DESCRIPTION

The exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although the exemplary embodiments of the present disclosure are shown in the accompanying drawings, it should be understood that the present disclosure can be implemented in various forms and should not be limited by the embodiments set forth herein. On the contrary, these embodiments are provided to enable a more thorough understanding of the present disclosure and to fully convey the scope of the present disclosure to those skilled in the art.

As shown in Figures 1 to 4, an embodiment of the utility model provides a conductive film copper plating system, comprising: a pretreatment tank 1, a first double countercurrent water washing tank 2, a first water washing climbing overflow tank 3, at least one copper plating tank 4, at least one copper plating climbing overflow tank 5, a second double countercurrent water washing tank 6, a second water washing climbing overflow tank 7, a first antioxidant tank 8, a second antioxidant tank 9, and a drying box 10 connected in sequence;

A first water cut-off roller assembly 11 is provided at the connection between the pre-treatment tank 1 and the first double countercurrent washing tank 2;

A second water cut-off roller assembly 12 is provided at the connection between the first double countercurrent water washing tank 2 and the first water washing climbing overflow tank 3;

A third water cut-off roller assembly 13 is provided at the connection between the first water washing climbing overflow trough 3 and the copper plating trough 4;

A fourth water cut-off roller assembly 14 is provided at the connection between the copper plating tank 4 and the copper plating climbing overflow tank 5;

A fifth water cut-off roller assembly 15 is provided at the connection between the copper plating climbing overflow trough 5 and the second double countercurrent water washing trough 6;

A sixth water cut-off roller assembly 16 is provided at the connection between the second double countercurrent water washing tank 6 and the second water washing climbing overflow tank 7;

A seventh water cut-off roller assembly 17 is provided at the connection between the second water washing climbing overflow trough 7 and the first anti-oxidation trough 8;

An eighth water cut-off roller assembly 18 is provided at the connection between the first anti-oxidation tank 8 and the second anti-oxidation tank 9;

A ninth water cut-off roller assembly 19 is provided at the connection between the second anti-oxidation tank 9 and the drying box 10;

A wind shear device 20 is provided at one end of the ninth water cut-off roller assembly 19;

The installation height of the device in the conductive film copper plating system gradually increases from left to right.

In this embodiment, the pretreatment tank 1, the first double countercurrent water washing tank 2, the first water washing climbing overflow tank 3, at least one copper plating tank 4, at least one copper plating climbing overflow tank 5, the second double countercurrent water washing tank 6, the second water washing climbing overflow tank 7, the first antioxidant tank 8, the second antioxidant tank 9, and the drying box 10 are connected in sequence;

During the operation of the film system, the water cut-off roller assemblies used in the utility model are shown in FIG. 2 , and the first water cut-off roller assembly 11, the second water cut-off roller assembly 12, the third water cut-off roller assembly 13, the fourth water cut-off roller assembly 14, the fifth water cut-off roller assembly 15, the sixth water cut-off roller assembly 16, the seventh water cut-off roller assembly 17, the eighth water cut-off roller assembly 18, and the ninth water cut-off roller assembly 19 are rotated synchronously to prevent the liquid on the film from flowing into the next process, thereby further ensuring the water cut-off effect;

The technical solution of the utility model is to set up a water-cutting roller assembly to further reduce the liquid on the film from entering the next process, greatly reduce the problem of water on the film during the film drawing process, and reduce the amount of liquid in the front working tank brought into the rear working tank along with the film to a minimum, thereby extending the service life of the liquid in each working tank, and creatively add a pretreatment tank 1 and a wind cutting device 20 to the traditional electroplating line. The pretreatment tank 1 adds a neutral pretreatment liquid and pure water to wash away impurities on the film surface; when the film is transmitted to the copper plating tank 4, it has been fully cleaned, and the wind cutting device 20 makes it easier to drain water from the film. The wind cutting device 20 is shown in Figure 4, and a plastic blowing hood can be selected to synchronously connect the gas filling device to the system. The plastic blowing hood has a small area of slanted surface and bevel, and at the same time, a pulse power supply with a changeable polarity mode is creatively adopted at the anode and cathode rollers, and a dilute sulfuric acid roller washing device is adopted at the cathode, which further avoids membrane surface pollution, improves product quality, and reduces manufacturing costs.

In an optional embodiment of the utility model, the structural height of the first water washing climbing overflow trough 3 changes uniformly along the running direction of the conductive film.

In this embodiment, the structural height of the first water washing climbing overflow trough 3 changes evenly along the running direction of the conductive film, which can further reduce the liquid on the conductive film.

In an optional embodiment of the present utility model, the first double countercurrent water washing tank 2 includes a first water washing tank 21 and a second water washing tank 22;

The first water washing tank 21 and the second water washing tank 22 are connected in sequence;

A tenth water-cutting roller assembly 23 is disposed at the connection between the first water washing tank 21 and the second water washing tank 22 .

In this embodiment, the first double countercurrent washing tank 2 includes a first washing tank 21 and a second washing tank 22; double washing is to configure two tanks in the same tank, and wash by circulating washing water between two different tanks, and countercurrent washing is to clean the surface of the workpiece by forcing water to flow in the reverse direction; by adopting the first double countercurrent washing, the film cleaning efficiency is higher, and the countercurrent washing can effectively reduce the amount of residue due to the high flow rate, and the tenth water cut-off roller assembly 23 is provided at the connection between the first washing tank 21 and the second washing tank 22, and the first washing tank 21 has a water outlet The opening is located at the position just entering the film, and the second water washing tank 22 has a pure water inlet. The film is generally first contacted with the tank liquid of the first water washing tank 21 for cleaning, and then contacted with the tank liquid of the second water washing tank 22 for cleaning. Generally, the tank liquid of the second water washing tank 22 is cleaner than the tank liquid of the first water washing tank 21. Although the washing water in the first water washing tank 21 and the second water washing tank 22 is recycled, a tenth water-cutting roller assembly 23 is also required to be arranged between the first water washing tank 21 and the second water washing tank 22 to reduce the film surface from carrying different liquids into subsequent processes during the operation of the first water washing tank 21 and the second water washing tank 22.

In an optional embodiment of the utility model, the structural height of the copper-plated climbing overflow trough 5 changes evenly along the running direction of the conductive film, which can further reduce the liquid on the conductive film.

In an optional embodiment of the present utility model, the second double countercurrent water washing tank 6 includes a third water washing tank 61 and a fourth water washing tank 62;

The third water washing tank 61 is connected to the fourth water washing tank 62 in sequence;

An eleventh water-cutting roller assembly 63 is disposed at the connection between the third water-washing tank 61 and the fourth water-washing tank 62 .

In this embodiment, the second double countercurrent water washing tank 6 includes a third water washing tank 61 and a fourth water washing tank 62; the double water washing is to configure two water tanks in the same tank, and wash by circulating washing water between two different water tanks, and the countercurrent water washing is to clean the surface of the workpiece by forcing the water flow to reverse through the workpiece; by adopting the first double countercurrent water washing, the film cleaning efficiency is higher, and the countercurrent water washing can effectively reduce the amount of residue due to the high flow rate, and the eleventh water cut-off roller assembly 63 is provided at the connection between the third water washing tank 61 and the fourth water washing tank 62. The third water washing tank 61 has a water outlet and is located just at the film entry position, and the fourth water washing tank 62 has a pure water inlet. The film is generally first contacted with the tank liquid of the third water washing tank 61 for cleaning, and then contacted with the tank liquid of the fourth water washing tank 62 for cleaning. Generally, the tank liquid of the fourth water washing tank 62 is cleaner than the tank liquid of the third water washing tank 61. Although the washing water in the third water washing tank 61 and the fourth water washing tank 62 is recycled, an eleventh water-cutting roller assembly 63 is also required to be arranged between the third water washing tank 61 and the fourth water washing tank 62, which can reduce the film surface from carrying different liquids into subsequent processes during the operation of the third water washing tank 61 and the fourth water washing tank 62.

In an optional embodiment of the utility model, the structural height of the second water washing climbing overflow trough 7 changes evenly along the running direction of the conductive film, which can further reduce the liquid on the conductive film.

In an optional embodiment of the present invention, the structural height of the second anti-oxidation groove 9 changes evenly along the running direction of the conductive film, which can further reduce the liquid on the conductive film.

In an optional embodiment of the utility model, a cathode roller 30 and an anode roller 31 are arranged in the copper plating tank 4 at intervals;

According to the preset process requirements, the polarities of the cathode roller 30 and the anode roller 31 are adjusted through a pulse rectifier;

Twelfth water-cutting roller assemblies 32 are disposed on both sides of the cathode roller 30 .

In an optional embodiment of the present invention, spray devices 33 are evenly arranged on the upper and lower parts of the cathode roller 30 to remove the floating copper plated on the surface of the cathode roller 30 .

In an optional embodiment of the present invention, the cathode roller 30 is a copper roller, and the anode roller 31 is an insoluble anode roller plated with iridium and titanium.

In this embodiment, the titanium-iridium-plated insoluble anode roller refers to a roller made of titanium-iridium material as an anode, and a layer of titanium-iridium film is formed on the surface through electroplating reaction. The titanium-iridium oxide film has the characteristics of excellent corrosion resistance, wear resistance and high-temperature stability; the cathode copper roller is a copper product used in the fields of electrolytic refining of copper and preparation of copper oxide; the cathode copper roller is usually made of high-purity oxygen-free copper as raw material, has good electrical conductivity, thermal conductivity and plasticity, and can withstand extreme environments such as high temperature and corrosion; cathode and anode materials of other materials can also be selected as needed; the power supply adopts a pulse power supply, and the polarity of the anode and cathode can be set to be interchanged at regular intervals according to process requirements.

The working principle of the utility model is that various types of plastic ultra-thin films (PP or PET but not limited to these two types) are unwound through the unwinding system 71, and the unwound film is deoiled and washed with water through the pre-treatment tank 1, and the film after passing through the pre-treatment tank 1 is transmitted to the first double countercurrent water washing tank 2, and the double water washing is to configure two water tanks in the same tank, and wash by circulating washing water between two different water tanks, and the countercurrent water washing is to force the water flow to reverse through the workpiece to clean the surface; by adopting the first double countercurrent water washing, the film cleaning efficiency is higher, and the countercurrent water washing can effectively reduce the amount of residue due to the high flow rate;

A first water-cutting roller assembly 11 is provided at the connection between the pre-treatment tank 1 and the first double countercurrent water washing tank 2; during the forward operation of the film, the use of the first water-cutting roller assembly 11 can prevent the liquid in the pre-treatment tank 1 from flowing into the subsequent process, thereby reducing the pollution of the subsequent process; the film is transferred to the first water washing climbing overflow tank 3 through the first double countercurrent water washing tank 2, and a second water-cutting roller assembly 12 is provided at the connection between the first double countercurrent water washing tank 2 and the first water washing climbing overflow tank 3. The structural height of the first water washing climbing overflow tank 3 changes evenly along the running direction of the conductive film, thereby better reducing the influence of the liquid in the previous process on the liquid in the subsequent process;

The film is transferred to the copper plating tank 4 through the first water washing climbing overflow tank 3. In the copper plating tank 4, the cathode roller 30 and the anode roller 31 are connected through a pulse rectifier, and the polarity of the positive and negative electrodes can be set to be exchanged at a fixed time according to the process requirements. When the pulse power supply supplies a positive pulse current, the anode roller 31 is connected to the positive electrode, and the cathode roller 30 is connected to the negative electrode. The conduction time is 5-10min, and the film can be copper plated; when the pulse power supply supplies a reverse pulse current, the cathode roller 30 is connected to the positive electrode, and the conduction time is 5-10s, and the copper on the cathode roller 30 can be electrolyzed, and the dilute sulfuric acid water washing spray device is assisted, so as to achieve the purpose of removing the floating copper on the cathode roller 30 and prevent the copper-plated film surface from being punctured by the accumulated copper on the cathode roller 30; the pulse power supply adopts a forward pulse and a reverse pulse to cross-circulate each other, so that the current is alternately positively plated and reversely plated according to the time ratio in the power supply mode, and the duration ratio can be adjusted according to the process requirements.

In order to prevent the cathode roller 30 from being repeatedly copper-plated (the film surface is easily punctured after copper is plated), the cathode roller 30 uses a water-cutting roller assembly to cut water, and a twelfth water-cutting roller assembly 32 is arranged at the upper and lower parts of the cathode roller 30. The cathode roller 30 adopts an independent liquid-passing tank, and 5%-20% dilute sulfuric acid solution is sprayed on the upper and lower parts to wash the roller to remove the floating copper plated on the surface of the cathode roller. In this way, the unit is repeated, and the segmented copper plating tank 4 can be connected with a connecting auxiliary tank to ensure that the main salt concentration of the tank liquid of the whole line is the same;

A third water-cutting roller assembly 13 is provided at the connection between the first water-washing climbing overflow trough 3 and the copper-plating trough 4; the film is transferred to the copper-plating climbing overflow trough 5 through the copper-plating climbing overflow trough, and the film is in the copper-plating climbing overflow trough, so that the water on the film fully flows back to the copper-plating climbing overflow trough 5, and a fourth water-cutting roller assembly 14 is provided at the connection between the copper-plating trough 4 and the copper-plating climbing overflow trough 5; then the film passes through the second double countercurrent water-washing trough 6, the second water-washing climbing overflow trough 7, and the copper-plating climbing overflow trough 5 in turn. A fifth water-cutting roller assembly 15 is provided at the connection between the slope overflow trough 5 and the second double countercurrent water washing trough 6, and a sixth water-cutting roller assembly 16 is provided at the connection between the second double countercurrent water washing trough 6 and the second water washing climbing overflow trough 7; the second double countercurrent water washing trough 6 includes a third water washing trough 61 and a fourth water washing trough 62; the third water washing trough 61 and the fourth water washing trough 62 are connected in sequence; an eleventh water-cutting roller assembly 63 is provided at the connection between the third water washing trough 61 and the fourth water washing trough 62.

The film passes through the first antioxidant trough 8, the second antioxidant trough 9, and the drying box 10 in sequence. The liquids in the first antioxidant trough 8 and the second antioxidant trough 9 perform multiple antioxidant treatments on the ultra-thin film. A seventh water-cutting roller assembly 17 is provided at the connection between the second water-washing climbing overflow trough 7 and the first antioxidant trough 8. An eighth water-cutting roller assembly 18 is provided at the connection between the first antioxidant trough 8 and the second antioxidant trough 9. A ninth water-cutting roller assembly 19 is provided at the connection between the second antioxidant trough 9 and the drying box 10. A wind shear device 20 is provided at one end of the ninth water-cutting roller assembly 19.

Wind shear devices 20 are installed before and after the ninth water-cutting roller assembly 19, which fully ensures that the film surface is air-dried and tries to avoid the film from carrying too much water when entering the drying box 10 section, which affects the drying effect. The drying box 10 is used to dry the ultra-thin film. After the above-mentioned process is completed, it is rolled up by the winding system 72 and transmitted to the next process.

The above is a preferred embodiment of the present invention. It should be pointed out that, for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present invention. These improvements and modifications should also be regarded as the protection scope of the present invention.

Claims (10)

1. A conductive film copper plating system, characterized in that it comprises: a pretreatment tank (1), a first double countercurrent water washing tank (2), a first water washing climbing overflow tank (3), at least one copper plating tank (4), at least one copper plating climbing overflow tank (5), a second double countercurrent water washing tank (6), a second water washing climbing overflow tank (7), a first antioxidant tank (8), a second antioxidant tank (9), and a drying box (10) connected in sequence; A first water cut-off roller assembly (11) is provided at the connection between the pre-treatment tank (1) and the first double countercurrent water washing tank (2); A second water cut-off roller assembly (12) is provided at the connection between the first double countercurrent water washing tank (2) and the first water washing climbing overflow tank (3); A third water cut-off roller assembly (13) is provided at the connection between the first water washing climbing overflow trough (3) and the copper plating trough (4); A fourth water cut-off roller assembly (14) is provided at the connection between the copper plating tank (4) and the copper plating climbing overflow tank (5); A fifth water cut-off roller assembly (15) is provided at the connection between the copper plating climbing overflow trough (5) and the second double countercurrent water washing trough (6); A sixth water cut-off roller assembly (16) is provided at the connection between the second double countercurrent water washing trough (6) and the second water washing climbing overflow trough (7); A seventh water cut-off roller assembly (17) is provided at the connection between the second water washing climbing overflow trough (7) and the first anti-oxidation trough (8); An eighth water cut-off roller assembly (18) is provided at the connection between the first anti-oxidation groove (8) and the second anti-oxidation groove (9); A ninth water cut-off roller assembly (19) is provided at the connection between the second anti-oxidation tank (9) and the drying box (10); A wind shear device (20) is provided at one end of the ninth water cut-off roller assembly (19); The installation height of the device in the conductive film copper plating system gradually increases from left to right. 2. The conductive film copper plating system according to claim 1 is characterized in that the structural height of the first water washing climbing overflow trough (3) changes uniformly along the running direction of the conductive film. 3. The conductive film copper plating system according to claim 1, characterized in that the first double countercurrent water washing tank (2) comprises a first water washing tank (21) and a second water washing tank (22); The first water washing tank (21) and the second water washing tank (22) are connected in sequence; A tenth water-cutting roller assembly (23) is provided at the connection between the first water-washing tank (21) and the second water-washing tank (22). 4. The conductive film copper plating system according to claim 1 is characterized in that the structural height of the copper plating climbing overflow trough (5) changes uniformly along the running direction of the conductive film. 5. The conductive film copper plating system according to claim 1, characterized in that the second double countercurrent water washing tank (6) comprises a third water washing tank (61) and a fourth water washing tank (62); The third water washing tank (61) and the fourth water washing tank (62) are connected in sequence; An eleventh water-cutting roller assembly (63) is provided at the connection between the third water-washing tank (61) and the fourth water-washing tank (62). 6. The conductive film copper plating system according to claim 1 is characterized in that the structural height of the second water washing climbing overflow trough (7) changes uniformly along the running direction of the conductive film. 7. The conductive film copper plating system according to claim 1 is characterized in that the structural height of the second anti-oxidation groove (9) changes uniformly along the running direction of the conductive film. 8. The conductive film copper plating system according to claim 1, characterized in that a cathode roller (30) and an anode roller (31) are arranged in the copper plating tank (4) at intervals; According to preset process requirements, the polarities of the cathode roller (30) and the anode roller (31) are adjusted by a pulse rectifier; A twelfth water-cutting roller assembly (32) is arranged on both sides of the cathode roller (30). 9. The conductive film copper plating system according to claim 8 is characterized in that spray devices (33) are evenly arranged on the upper and lower parts of the cathode roller (30) for removing floating copper plated on the surface of the cathode roller (30). 10. The conductive film copper plating system according to claim 8, characterized in that the cathode roller (30) is a copper roller, and the anode roller (31) is an insoluble anode roller plated with iridium and titanium.