CN221861629U - A device for preparing glass micropores - Google Patents

Abstract

The utility model discloses a glass micropore preparation device, comprising a liquid container, a laser scanning system and an ultrasonic generator; the liquid container contains a corrosive liquid; the laser scanning system is used to perform laser irradiation on the glass immersed in the liquid container; the ultrasonic generator is used to perform ultrasonic oscillation on the corrosive liquid in the liquid container. The utility model performs laser irradiation on the glass immersed in an acid or alkaline solution, and due to the effects of micro-bursting and photo-induced pressure dynamics, the fluidity and penetration depth of the corrosive liquid are improved, and a smaller pore diameter can be processed than the traditional method, and the micropore morphology is better.

Description

A device for preparing glass micropores

Technical Field

The utility model relates to the technical field of glass micropore manufacturing, in particular to a glass micropore preparation device.

Background Art

With the emergence of advanced circuit packaging and integration technology, a system-level circuit architecture method can be provided. There are multiple planar device layers stacked inside the chip circuit system, and interconnection is achieved in the vertical direction through silicon vias, which greatly reduces the chip size, increases the transistor density of the chip, improves the electrical interconnection performance between layers, increases the chip operation speed, and reduces the power consumption of the chip. Glass vias are a solution that can replace silicon vias. It has lower cost, excellent high-frequency electrical characteristics, and ultra-thin glass substrates are easier to obtain. However, the preparation of high-quality glass micropores still faces technical difficulties.

Common preparation methods for glass through holes include sandblasting, photosensitive glass method, focused discharge method, laser ablation method, etc. These methods still face problems such as high cost, complex process, low processing accuracy, and micro cracks. Patent CN112864026 discloses a process for processing TGV through holes by laser combined with HF wet etching. Laser is used to make small holes first, and then HF is used to expand the holes to process glass micropores. However, it still faces problems such as slow processing speed and high cost.

Utility Model Content

The purpose of the utility model is to provide a glass micropore preparation device to solve one or more technical problems existing in the prior art and at least provide a beneficial choice or create conditions.

The utility model adopts the following technical solutions to achieve the above utility model objectives:

The utility model provides a glass micropore preparation device, comprising a liquid container, a laser scanning system and an ultrasonic generating device;

The liquid container contains corrosive liquid;

The laser scanning system is used to perform laser irradiation on the glass immersed in the liquid container;

The ultrasonic generating device is used to perform ultrasonic oscillation on the corrosive liquid in the liquid container.

Further, the laser scanning system includes a laser and an optical path scanning system;

The laser is used to emit a pulsed laser beam, and the laser beam is scanned on the glass surface in the liquid container by the optical path scanning system to form a microhole array.

Furthermore, the laser is an infrared picosecond laser or an infrared femtosecond laser.

Furthermore, the wavelength of the pulsed laser beam output by the laser ranges from 1020 to 1080 nm.

Furthermore, the optical path scanning system comprises a reflector, a galvanometer and a field mirror arranged in sequence along the laser optical path;

The reflecting mirror, the galvanometer mirror and the field mirror are located above the liquid container.

Furthermore, the liquid container is provided with a support for fixing the glass, and when the glass is fixed on the support, the liquid level is at least 50 μm higher than the upper surface of the glass.

Furthermore, the preparation device also includes a machine vision system;

The machine vision system is located above the laser scanning system and is used for positioning the processing sample and the light beam.

Furthermore, the corrosive liquid in the liquid container is selected from HF or KOH solution.

The beneficial effects of the utility model are as follows:

The utility model performs laser irradiation on glass immersed in acid or alkali solution, and due to the effects of micro-burst and light-induced pressure dynamics, improves the fluidity and penetration depth of the etching liquid, and can process smaller pore diameters and better micropore morphology than the traditional method.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG1 is a schematic structural diagram of a device for preparing glass micropores according to an embodiment of the utility model.

In the figure: 10, liquid container; 20, laser scanning system; 21, laser; 22, galvanometer; 23, field lens; 24, reflector; 30, ultrasonic generator; 40, bracket; 50, machine vision system; 60, glass.

DETAILED DESCRIPTION

The present invention is further described below in conjunction with the accompanying drawings and specific implementation methods. It should be noted that, under the premise of no conflict, the various embodiments or technical features described below can be arbitrarily combined to form a new embodiment.

As shown in FIG1 , a device for preparing glass micropores includes a liquid container 10, a laser scanning system 20 and an ultrasonic generating device 30; the liquid container 10 contains a corrosive liquid; the laser scanning system 20 is used to perform laser irradiation on a glass 60 immersed in the liquid container 10; and the ultrasonic generating device 30 is used to perform ultrasonic oscillation on the corrosive liquid in the liquid container 10.

Based on the above structure, the laser scanning system 20 includes a laser 21 and an optical path scanning system; the laser 21 is used to emit a pulsed laser beam, and scan the laser beam on the surface of the glass 60 in the liquid container through the optical path scanning system to form a microhole array.

Based on the above structure, the ultrasonic generator 30 is controlled at 50kHz, the laser 21 uses an infrared picosecond laser or an infrared femtosecond laser with parameters of 10ps, 100kHz, and the wavelength of the output pulse laser beam ranges from 1020 to 1080nm.

Based on the above structure, the optical path scanning system includes a reflector 22, a galvanometer 23 and a field lens 24 arranged in sequence along the laser optical path; the reflector 22, the galvanometer 23 and the field lens 24 are located above the liquid container, and the reflector 22 is at an angle of 45° to the horizontal direction, so that the laser beam output by the laser 21 can be vertically projected onto the galvanometer 23.

Based on the above structure, the liquid container is provided with a bracket 40 for fixing the glass 60 . When the glass 60 is fixed on the bracket 40 , the liquid level is at least 50 μm higher than the upper surface of the glass 60 .

Based on the above structure, the preparation device also includes a machine vision system 50; the machine vision system 50 is located above the laser scanning system 20 and is used to position the processing sample and the light beam. Here, the machine vision system 50 uses auxiliary processing systems such as positioning cameras to cooperate with the galvanometer 22 to accurately adjust the position of the laser focus point with high precision.

Based on the above structure, the etching liquid in the liquid container 10 is selected from 10% HF or KOH solution.

The preparation method of glass micropores of the utility model comprises:

S10, completely immerse the glass 60 in the etching liquid in the liquid container 10, turn off the ultrasonic generator 30, and each aperture receives 100uJ of laser energy;

S20, focusing the laser beam onto the glass through the laser scanning system 20 for processing;

S30, after the laser scanning is completed, the laser scanning system 20 is turned off, and the ultrasonic generating device 30 is turned on to allow the ultrasonic wave to act for 20 minutes;

S40, repeatedly turning on and off the ultrasonic generator 30 and the laser scanning system 20 until the total energy received by each aperture is greater than 300uJ, thereby realizing a through-glass hole with a diameter of 10 microns on the glass 60, with a smooth hole wall without microcracks and a distribution density of 500,000 holes per square centimeter.

The above is only a preferred embodiment of the present invention. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the technical principles of the present invention. These improvements and modifications should also be regarded as the protection scope of the present invention.

Claims (8)

1. The preparation device of the glass micropore is characterized by comprising a liquid container, a laser scanning system and an ultrasonic wave generating device;

The liquid container is filled with corrosive liquid;

The laser scanning system is used for carrying out laser irradiation on the glass immersed in the liquid container;

The ultrasonic wave generating device is used for carrying out ultrasonic oscillation on the corrosive liquid in the liquid container.

2. The apparatus for preparing a glass micro-pore according to claim 1, wherein the laser scanning system comprises a laser and a laser scanning system;

The laser is used for emitting a pulsed laser beam and scanning the laser beam on the glass surface in the liquid container through the laser scanning system to form a micropore array.

3. The apparatus for preparing glass micro-holes according to claim 2, wherein the laser is an infrared skin second laser or an infrared femtosecond laser.

4. The apparatus for preparing a glass micro-pore according to claim 3, wherein the wavelength of the pulsed laser beam outputted from the laser has a value ranging from 1020 nm to 1080nm.

5. The apparatus according to claim 1, wherein the laser scanning system comprises a mirror, a galvanometer and a field lens arranged in sequence along a laser light path;

the reflector, the galvanometer and the field lens are positioned above the liquid container.

6. The apparatus for preparing a glass micro-pore according to claim 1, wherein the liquid container is provided with a holder for holding glass, and the liquid level is at least 50 μm above the upper surface of the glass when the glass is held on the holder.

7. The apparatus for preparing a glass micro-pore according to claim 1, wherein the apparatus further comprises a machine vision system;

the machine vision system is positioned above the laser scanning system for positioning the processed sample and the light beam.

8. The apparatus for preparing a glass micro-pore according to claim 1, wherein the etching solution in the liquid container is HF or KOH solution.