CN221822306U - Corrosion-resistant ceramic coating device of semiconductor wafer chuck - Google Patents

Abstract

The utility model discloses a corrosion-resistant ceramic coating device for a semiconductor wafer chuck, and specifically relates to the technical field of semiconductor wafer chuck production, including a base for support, on which a material guiding coating assembly is arranged, and the material guiding coating assembly includes a corrosion-resistant ceramic coating chamber arranged on the base for coating, and one side of the corrosion-resistant ceramic coating chamber is provided with a position-adjustable support seat. By arranging the material guiding coating assembly, the utility model enables the protective box to rotate along the axis point of the connection between the limiting rod and the protective box through the limiting of the limiting rod, and adjusts the angle of the protective box, thereby adjusting the angle of the workpiece during coating, and drives the L-plate to rotate through the third motor, so that the workpiece rotates again during coating, thereby realizing the function of multi-angle adjustment when coating the workpiece, so as to improve the convenience and diversity of the device during coating, and also improve the coating effect.

Description

A corrosion-resistant ceramic coating device for semiconductor wafer chuck

Technical Field

The utility model relates to the technical field of semiconductor wafer chuck production, and more specifically to a corrosion-resistant ceramic coating device for a semiconductor wafer chuck.

Background Art

The corrosion-resistant ceramic coating device for semiconductor wafer chuck is a device used for surface treatment of semiconductor wafer chuck. Wafer chuck is a device used to fix semiconductor wafers, and its surface needs to have good corrosion resistance to ensure that it is not corroded by chemical substances during the manufacturing process.

The corrosion-resistant ceramic coating device forms a corrosion-resistant ceramic coating on the surface of the wafer chuck through physical or chemical methods. This ceramic coating can provide good corrosion resistance, allowing the wafer chuck to maintain stable performance for a long time during chemical treatment. At the same time, the ceramic coating also has excellent surface flatness and smoothness, which helps to protect the wafer surface from scratches and contamination.

Among them, it was found through searching that the patent application number CN202222536481.0 discloses an electroplating edge washing device, including an edge washing chamber, a carrying unit, a nozzle unit and a nozzle rotating unit, the nozzle unit includes a nozzle, a nozzle fixing rod and a liquid supply pipe, and the nozzle rotating unit drives the nozzle fixing rod to reciprocate so that the nozzle is switched between a first deflection angle and a second deflection angle;

When the structure is in use, the wafer rotates counterclockwise when it is at the first deflection angle, and rotates clockwise when it is at the second deflection angle. This can completely remove the metal coating at the notch on the edge of the wafer, improve the wafer yield, facilitate direct modification of existing equipment, and save equipment costs. However, when etching the ceramic coating on the semiconductor wafer chuck, it is not easy to guide the chuck, and it is not easy to adjust the outside of the coating chuck, which results in an unsatisfactory coating effect.

Utility Model Content

In order to overcome the above-mentioned defects of the prior art, the utility model provides a corrosion-resistant ceramic coating device for a semiconductor wafer chuck, aiming to solve the problems raised in the above-mentioned background technology.

The utility model is implemented in this way. The utility model provides the following technical solutions: a corrosion-resistant ceramic coating device for a semiconductor wafer chuck, comprising a base for support, on which a material guide coating component is arranged;

The material guiding coating assembly comprises a corrosion-resistant ceramic coating chamber for coating arranged on a base, a position-adjustable support seat is arranged on one side of the corrosion-resistant ceramic coating chamber, and an angle-adjustable support arm is arranged on the support seat;

One end of the support arm is movably connected to a shaft pin seat, and a protection box is provided at the bottom of the shaft pin seat;

An angle-adjustable L-plate is provided on one side of the surface of the protection box, and two slots for limiting the workpiece are provided on the top of the L-plate, and support plates installed on the L-plate for support are provided on one side of the surface of the two slots, and displacement sensors are provided on each of the support plates, and limiting rods are provided on both sides of the protection box, one end of the limiting rod extends to the support seat and is movably connected to the support seat, and an axle pin bracket for support is provided at the end of the limiting rod and located in the protection box, and the axle pin bracket is detachably connected to the protection box;

It can be seen that in the above technical solution, the support arm rotates so that the protective box can rotate along the axis point of the connection between the limit rod and the protective box through the limit of the limit rod, so as to adjust the angle of the protective box, thereby adjusting the angle of the workpiece during coating, and the L-plate is driven to rotate by the third motor, so that the workpiece is rotated again during coating, thereby realizing the function of multi-angle adjustment when coating the workpiece, so as to improve the convenience and diversity of the device during coating, and also improve the coating effect.

Optionally, in a possible implementation, a first motor for driving the support arm to rotate is provided on the support seat, pulleys are provided on both sides of the bottom of the support seat, the bottoms of the two pulleys are slidably connected to slide bars installed on the base, a second motor installed on the base is provided between the two slide bars, a screw threadedly connected to the support seat is provided at the output end of the second motor, and a third motor for driving the L plate to rotate is provided inside the protective box;

Technical effects and advantages of the utility model:

By setting up the material guiding plating component, compared with the prior art, the overall design is simple and the structure is reasonable. Through the corresponding coordinated use of various structures, the support arm rotates so that the protection box can be limited by the limit rod and the axis point of the connection between the limit rod and the protection box to adjust the angle of the protection box, thereby adjusting the angle of the workpiece during plating;

The L plate is driven to rotate by the third motor, so that the workpiece is rotated again during the coating, thereby realizing the function of multi-angle adjustment during the coating of the workpiece, so as to improve the convenience and diversity of the device during the coating, and also improve the coating effect;

The second motor drives the screw rod to rotate and drive the support seat to move on the base along the guidance of the slide rod through the pulley, and the workpiece is transported to the corrosion-resistant ceramic coating chamber for corrosion-resistant ceramic coating, thereby improving the convenience of guiding materials.

BRIEF DESCRIPTION OF THE DRAWINGS

In order to more clearly illustrate the technical solutions in the present disclosure, the following briefly introduces the drawings required to be used in some embodiments of the present disclosure. Obviously, the drawings described below are only drawings of some embodiments of the present disclosure. For ordinary technicians in this field, other drawings can also be obtained based on these drawings. In addition, the drawings described below can be regarded as schematic diagrams, and are not limitations on the actual size of the products involved in the embodiments of the present disclosure, the actual process of the method, the actual timing of the signal, etc.

Fig. 1 is a front view of the overall structure of the utility model.

FIG. 2 is a side view of the material guide coating assembly of the present invention.

FIG3 is a front view of the utility model L-plate installed on the side of the protection box.

FIG. 4 is a front view of the material guide coating assembly of the present invention.

The accompanying drawings are marked as follows: 1. base; 2. corrosion-resistant ceramic coating chamber; 3. support seat; 4. support arm; 5. axle pin seat; 6. limit rod; 7. protection box; 8. axle pin frame; 9. L-plate; 10. slot; 11. support plate; 12. displacement sensor; 13. first motor; 14. pulley; 15. slide rod; 16. second motor; 17. screw rod; 18. third motor.

DETAILED DESCRIPTION

The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

As shown in Figures 1-4, a corrosion-resistant ceramic coating device for a semiconductor wafer chuck has a material guide coating component arranged on a base 1. Through the protection box 7, the protection box 7 can be limited by the limit rod 6 and rotated along the axis point of the connection between the limit rod 6 and the protection box 7 to adjust the angle of the protection box 7, thereby adjusting the angle of the workpiece during coating. The L plate 9 rotates, so that the workpiece is rotated again during coating, thereby realizing the function of multi-angle adjustment when coating the workpiece, so as to improve the convenience and diversity of the device during coating, and also improve the coating effect, and the specific structural arrangement of the component is as follows;

The material guiding coating assembly comprises a corrosion-resistant ceramic coating chamber 2 for coating arranged on a base 1, a position-adjustable support seat 3 is arranged on one side of the corrosion-resistant ceramic coating chamber 2, and an angle-adjustable support arm 4 is arranged on the support seat 3;

One end of the support arm 4 is movably connected to a shaft pin seat 5, and a protection box 7 is provided at the bottom of the shaft pin seat 5;

An angle-adjustable L-plate 9 is provided on one side of the surface of the protection box 7, and two slots 10 for limiting the workpiece are provided on the top of the L-plate 9. Support plates 11 installed on the L-plate 9 for support are provided on one side of the surface of the two slots 10, and displacement sensors 12 are provided on each support plate 11. Limit rods 6 are provided on both sides of the protection box 7, and one end of the limit rod 6 extends to the support seat 3 and is movably connected to the support seat 3. An axle pin bracket 8 for support is provided at the end of the limit rod 6 and is located in the protection box 7, and the axle pin bracket 8 is detachably connected to the protection box 7;

A first motor 13 for driving the support arm 4 to rotate is provided on the support seat 3, pulleys 14 are provided on both sides of the bottom of the support seat 3, the bottoms of the two pulleys 14 are slidably connected with slide rods 15 installed on the base 1, a second motor 16 installed on the base 1 is provided between the two slide rods 15, and a screw rod 17 threadedly connected to the support seat 3 is provided at the output end of the second motor 16, and a third motor 18 for driving the L plate 9 to rotate is provided inside the protective box 7.

According to the above structure, when in use, the staff installs the device at a designated position, and when coating the workpiece (semiconductor wafer chuck), the workpiece is placed on the L plate 9, and the L plate 9 is positioned by the card slot 10, and then the second motor 16 drives the screw rod 17 to rotate and drive the support seat 3 to move on the base 1 along the guide of the slide rod 15 through the pulley 14, and the workpiece is transported to the corrosion-resistant ceramic coating chamber 2 for corrosion-resistant ceramic coating;

At the same time, when the coating is being carried out, the support arm 4 is driven to rotate by the first motor 13. The support arm 4 rotates so that the protection box 7 can be limited by the limit rod 6 and rotate along the axis point of the connection between the limit rod 6 and the protection box 7, so as to adjust the angle of the protection box 7, thereby adjusting the angle of the workpiece during the coating;

And the L plate 9 is driven to rotate by the third motor 18, so that the workpiece is rotated again during the coating, thereby realizing the function of multi-angle adjustment when the workpiece is coated, so as to improve the convenience and diversity of the device during coating, and also improve the coating effect.

Different from the prior art, the present application discloses a corrosion-resistant ceramic coating device for a semiconductor wafer chuck, in which the protective box 7 can be rotated along the axis point of the connection between the limit rod 6 and the protective box 7 through the limit of the limit rod 6, and the angle of the protective box 7 is adjusted, thereby adjusting the angle of the workpiece during coating. The L plate 9 rotates, so that the workpiece is rotated again during coating, thereby realizing the function of multi-angle adjustment when coating the workpiece, so as to improve the convenience and diversity of the device during coating, and also improve the coating effect.

The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims (7)

1. A corrosion resistant ceramic coating device for a semiconductor wafer chuck, comprising a base (1) for support, characterized in that: a material guiding coating component is arranged on the base (1);

The material guiding coating component comprises a corrosion-resistant ceramic coating chamber (2) which is arranged on a base (1) and used for coating, one side of the corrosion-resistant ceramic coating chamber (2) is provided with a supporting seat (3) with an adjustable position, and the supporting seat (3) is provided with a supporting arm (4) with an adjustable angle;

One end of the supporting arm (4) is movably connected with a shaft pin seat (5), and a protective box (7) is arranged at the bottom of the shaft pin seat (5);

An angle-adjustable L plate (9) is arranged on one side of the surface of the protective box (7), and two clamping grooves (10) for limiting a workpiece are formed in the top of the L plate (9).

2. The corrosion resistant ceramic coating apparatus of a semiconductor wafer chuck as set forth in claim 1, wherein: a supporting plate (11) which is arranged on the L plate (9) and used for supporting is arranged on one side of the surface of each clamping groove (10), and a displacement sensor (12) is arranged on each supporting plate (11).

3. The corrosion resistant ceramic coating apparatus of a semiconductor wafer chuck as set forth in claim 1, wherein: both sides of the protective box (7) are provided with limit rods (6), and one ends of the limit rods (6) extend to the supporting seat (3) and are movably connected with the supporting seat (3).

4. A corrosion resistant ceramic coating apparatus for a semiconductor wafer chuck as set forth in claim 3, wherein: the end part of the limiting rod (6) is provided with a shaft pin frame (8) which is used for supporting and is positioned in the protective box (7), and the shaft pin frame (8) is detachably connected with the protective box (7).

5. The corrosion resistant ceramic coating apparatus of a semiconductor wafer chuck as set forth in claim 1, wherein: the support seat (3) is provided with a first motor (13) for driving the support arm (4) to rotate, and pulleys (14) are arranged on two sides of the bottom of the support seat (3).

6. The apparatus for corrosion resistant ceramic coating of a semiconductor wafer chuck as recited in claim 5, wherein: the bottoms of the two pulleys (14) are both connected with a sliding rod (15) arranged on the base (1) in a sliding way, and a second motor (16) arranged on the base (1) is arranged between the two sliding rods (15).

7. The apparatus for corrosion resistant ceramic coating of a semiconductor wafer chuck as set forth in claim 6, wherein: the output end of the second motor (16) is provided with a screw rod (17) in threaded connection with the supporting seat (3), and a third motor (18) for driving the L plate (9) to rotate is arranged in the protective box (7).