CN221708703U - Package substrate and package substrate assembly - Google Patents
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- CN221708703U CN221708703U CN202322548833.9U CN202322548833U CN221708703U CN 221708703 U CN221708703 U CN 221708703U CN 202322548833 U CN202322548833 U CN 202322548833U CN 221708703 U CN221708703 U CN 221708703U
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Abstract
Description
技术领域Technical Field
本申请涉及一种半导体封装技术,尤其涉及一种封装基板及封装基板组件。The present application relates to a semiconductor packaging technology, and more particularly to a packaging substrate and a packaging substrate assembly.
背景技术Background Art
随着电子技术的发展,用户对电子设备的性能要求越来越高,使得电子设备中晶体管数量一再增多,这就导致芯片封装的尺寸越来越大。但随着电子设备不断向集成化趋势发展,电子设备中的芯片封装也不得不向小型化发展。现有芯片封装采用3D-SiP(System-in-package)封装工艺将多个芯片堆叠封装于封装基板上来实现小型化。然而,该芯片封装的厚度较厚,不利于薄型化。With the development of electronic technology, users have higher and higher requirements for the performance of electronic devices, which has led to an increase in the number of transistors in electronic devices, which has led to the increasing size of chip packages. However, as electronic devices continue to develop towards integration, chip packages in electronic devices have to develop towards miniaturization. Existing chip packages use the 3D-SiP (System-in-package) packaging process to stack multiple chips on a packaging substrate to achieve miniaturization. However, the thickness of the chip package is relatively thick, which is not conducive to thinning.
实用新型内容Utility Model Content
有鉴于此,本申请提供一种利于薄型化的封装基板和封装基板组件。In view of this, the present application provides a packaging substrate and a packaging substrate assembly that are conducive to thinning.
本申请一实施方式提供一种封装基板,包括基板本体和中介层,基板本体包括介电层、第一外层导电线路层、第二外层导电线路层和内层导电线路层,内层导电线路层嵌埋于介电层内,内层导电线路层包括第一焊垫,介电层包括相对设置的第一表面和第二表面,第一外层导电线路层和第二外层导电线路层分别设置于第一表面和第二表面,介电层开设有贯通第二表面并显露第一焊垫的凹槽,中介层容纳于凹槽中并与第一焊垫电连接。An embodiment of the present application provides a packaging substrate, including a substrate body and an intermediary layer, the substrate body including a dielectric layer, a first outer conductive circuit layer, a second outer conductive circuit layer and an inner conductive circuit layer, the inner conductive circuit layer is embedded in the dielectric layer, the inner conductive circuit layer includes a first welding pad, the dielectric layer includes a first surface and a second surface arranged opposite to each other, the first outer conductive circuit layer and the second outer conductive circuit layer are arranged on the first surface and the second surface respectively, the dielectric layer is provided with a groove penetrating the second surface and exposing the first welding pad, the intermediary layer is accommodated in the groove and is electrically connected to the first welding pad.
在一些实施方式中,凹槽包括底面和侧面,底面和侧面包围形成凹槽,底面与第一焊垫的表面平齐。In some embodiments, the groove includes a bottom surface and side surfaces, the bottom surface and the side surfaces surround the groove, and the bottom surface is flush with the surface of the first pad.
在一些实施方式中,中介层与侧面不接触。In some embodiments, the interposer has no contact with the side surfaces.
在一些实施方式中,封装基板还包括粘结层,粘结层填充于中介层与凹槽之间的间隙中并粘结中介层和基板本体。In some embodiments, the package substrate further includes a bonding layer, which fills a gap between the interposer and the groove and bonds the interposer and the substrate body.
在一些实施方式中,中介层面向底面的表面设有第二焊垫,第一焊垫与第二焊垫焊接。In some embodiments, a second pad is disposed on a surface of the interposer facing the bottom surface, and the first pad is welded to the second pad.
在一些实施方式中,第一导电线路层包括第一连接垫,封装基板还包括第一防焊层,第一防焊层设置于第一导电线路层上并显露第一连接垫。In some embodiments, the first conductive circuit layer includes a first connection pad, and the package substrate further includes a first solder mask layer, and the first solder mask layer is disposed on the first conductive circuit layer and exposes the first connection pad.
在一些实施方式中,第二外层导电线路层包括第二连接垫,封装基板还包括第二防焊层,第二防焊层设置于第二外层导电线路层上并显露第二连接垫。In some embodiments, the second outer conductive circuit layer includes a second connection pad, and the package substrate further includes a second solder mask layer, and the second solder mask layer is disposed on the second outer conductive circuit layer and exposes the second connection pad.
在一些实施方式中,中介层显露于凹槽外的表面设有第三连接垫,第二连接垫的表面和第三连接垫的表面平齐。In some embodiments, a third connection pad is disposed on a surface of the interposer exposed outside the groove, and a surface of the second connection pad is flush with a surface of the third connection pad.
在一些实施方式中,介电层包括第一介电层、第二介电层、第三介电层和第四介电层,内层导电线路层包括第一内层导电线路层、第二内层导电线路层和第三内层导电线路层,第一介电层、第一内层导电线路层、第二介电层、第二内层导电线路层、第三介电层、第三内层导电线路层和第四介电层依次层叠设置。In some embodiments, the dielectric layer includes a first dielectric layer, a second dielectric layer, a third dielectric layer and a fourth dielectric layer, the inner conductive circuit layer includes a first inner conductive circuit layer, a second inner conductive circuit layer and a third inner conductive circuit layer, and the first dielectric layer, the first inner conductive circuit layer, the second dielectric layer, the second inner conductive circuit layer, the third dielectric layer, the third inner conductive circuit layer and the fourth dielectric layer are stacked in sequence.
本申请提供的封装基板,通过在基板本体开设凹槽,并将中介层容置于凹槽中,减小了封装基板组件整体的厚度,利于薄型化;且通过配置第二连接垫和第三连接垫,使一片封装基板可以承载多个电子元件,利于集成化。The packaging substrate provided in the present application reduces the overall thickness of the packaging substrate assembly by opening a groove in the substrate body and accommodating the intermediate layer in the groove, which is conducive to thinning; and by configuring the second connection pad and the third connection pad, a piece of packaging substrate can carry multiple electronic components, which is conducive to integration.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
图1-图6为本申请一实施方式提供的电路基板的制作流程的截面示意图。1 to 6 are cross-sectional schematic diagrams of a production process of a circuit substrate provided in one embodiment of the present application.
图7为在图6所示电路基板上形成凹槽后的截面示意图。FIG. 7 is a schematic cross-sectional view of the circuit substrate shown in FIG. 6 after a groove is formed.
图8为在图7所示电路基板上形成第二外层导电线路层后的截面示意图。FIG. 8 is a cross-sectional schematic diagram showing a circuit substrate shown in FIG. 7 after a second outer conductive circuit layer is formed.
图9为在本申请一实施方式提供的基板本体的截面示意图。FIG. 9 is a schematic cross-sectional view of a substrate body provided in one embodiment of the present application.
图10为在图9所示基板本体上设置中介层后的截面示意图。FIG. 10 is a cross-sectional schematic diagram showing a substrate body shown in FIG. 9 after an interposer is disposed on the substrate body.
图11为本申请一实施方式提供的封装基板组件的截面示意图。FIG. 11 is a cross-sectional schematic diagram of a packaging substrate assembly provided in accordance with an embodiment of the present application.
主要元件符号说明Main component symbols
载板 11Carrier board 11
离型膜 12Release film 12
金属层 13Metal layer 13
第一外层导电线路层 14First outer conductive circuit layer 14
第一连接垫 141First connection pad 141
第一介电层 21First dielectric layer 21
第一内层导电线路层 22First inner conductive circuit layer 22
第一导电孔 23First conductive via 23
第二介电层 31The second dielectric layer 31
第二内层导电线路层 32Second inner conductive circuit layer 32
第三介电层 41The third dielectric layer 41
第三内层导电线路层 42The third inner conductive circuit layer 42
第一焊垫 421First pad 421
第四介电层 51Fourth dielectric layer 51
第一表面 100aFirst surface 100a
第二表面 100bSecond surface 100b
凹槽 110Groove 110
底面 111Bottom 111
侧面 112Side 112
第二外层导电线路层 52Second outer conductive circuit layer 52
第一防焊层 61First solder mask 61
第二防焊层 62Second solder mask 62
基板本体 100Base body 100
第三连接垫 71Third connection pad 71
第二焊垫 72Second pad 72
粘结层 80Adhesive layer 80
封装基板 200Package substrate 200
封装基板组件 300Package Substrate Assembly 300
电子元件 310Electronic components 310
如下具体实施方式将结合上述附图进一步说明本申请。The following specific implementation methods will further illustrate the present application in conjunction with the above-mentioned drawings.
具体实施方式DETAILED DESCRIPTION
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本申请一部分实施例,而不是全部的实施例。The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments.
除非另有定义,本文所使用的所有的技术和科学术语与属于本申请的技术领域的技术人员通常理解的含义相同。本文中在本申请的说明书中所使用的术语只是为了描述具体的实施例的目的,不是旨在于限制本申请。Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art to which this application belongs. The terms used herein in the specification of this application are only for the purpose of describing specific embodiments and are not intended to limit this application.
下面结合附图,对本申请的一些实施方式作详细说明。在不冲突的情况下,下述的实施方式及实施方式中的特征可以相互组合或替换。Some embodiments of the present application are described in detail below in conjunction with the accompanying drawings. In the absence of conflict, the following embodiments and features in the embodiments may be combined or replaced with each other.
本申请一实施方式提供一种封装基板的制作方法,包括如下步骤。An embodiment of the present application provides a method for manufacturing a packaging substrate, comprising the following steps.
步骤S1,提供电路基板。Step S1, providing a circuit substrate.
请参阅图1至图6,电路基板的制作方法包括步骤:如图1所示,将离型膜12贴覆于载板11的表面,并在离型膜12远离载板11的表面形成金属层13;如图2所示,通过蚀刻工艺将金属层制作形成第一外层导电线路层14,第一外层导电线路层14包括多个第一连接垫141;如图3所示,将第一介电层21压合于第一外层导电线路层14的表面,在第一介电层21内形成多个第一导电孔23,并在第一介电层21背离第一外层导电线路层14的表面形成第一内层导电线路层22,每个第一导电孔23贯通第一介电层21并电连接第一内层导电线路层22和第一外层导电线路层14;如图4所示,将第二介电层31压合于第一内层导电线路层22的表面,在第二介电层31内形成多个第二导电孔(图未示),并在第二介电层31背离第一内层导电线路层22的表面形成第二内层导电线路层32,每个第二导电孔贯通第二介电层31并电连接第二内层导电线路层32和第一内层导电线路层22;如图5所示,将第三介电层41压合于第二内层导电线路层32的表面,在第三介电层41内形成多个第三导电孔43,并在第三介电层41背离第二内层导电线路层32的表面形成第三内层导电线路层42,每个第三导电孔43贯通第三介电层41并电连接第二内层导电线路层32和第三内层导电线路层42,第三内层导电线路层42包括多个第一焊垫421;请参阅图6,将第四介电层51压合于第三内层导电线路层42的表面,并去除载板11和离型膜12,形成电路基板101。Referring to FIGS. 1 to 6 , the method for manufacturing a circuit substrate includes the following steps: as shown in FIG. 1 , a release film 12 is attached to the surface of a carrier board 11, and a metal layer 13 is formed on the surface of the release film 12 away from the carrier board 11; as shown in FIG. 2 , a first outer conductive circuit layer 14 is formed by etching the metal layer, and the first outer conductive circuit layer 14 includes a plurality of first connection pads 141; as shown in FIG. 3 , a first dielectric layer 21 is pressed onto the surface of the first outer conductive circuit layer 14, a plurality of first conductive holes 23 are formed in the first dielectric layer 21, and a first inner conductive circuit layer 22 is formed on the surface of the first dielectric layer 21 away from the first outer conductive circuit layer 14, each first conductive hole 23 penetrates the first dielectric layer 21 and electrically connects the first inner conductive circuit layer 22 and the first outer conductive circuit layer 14; as shown in FIG. 4 , a second dielectric layer 31 is pressed onto the surface of the first inner conductive circuit layer 22, and a plurality of first conductive holes 23 are formed in the second dielectric layer 31; A second inner conductive circuit layer 32 is formed on the surface of the second dielectric layer 31 away from the first inner conductive circuit layer 22, each second conductive hole penetrates the second dielectric layer 31 and electrically connects the second inner conductive circuit layer 32 and the first inner conductive circuit layer 22; as shown in FIG. 5 , a third dielectric layer 41 is pressed onto the surface of the second inner conductive circuit layer 32, a plurality of third conductive holes 43 are formed in the third dielectric layer 41, and a third inner conductive circuit layer 42 is formed on the surface of the third dielectric layer 41 away from the second inner conductive circuit layer 32, each third conductive hole 43 penetrates the third dielectric layer 41 and electrically connects the second inner conductive circuit layer 32 and the third inner conductive circuit layer 42, and the third inner conductive circuit layer 42 includes a plurality of first pads 421; please refer to FIG. 6 , a fourth dielectric layer 51 is pressed onto the surface of the third inner conductive circuit layer 42, and the carrier 11 and the release film 12 are removed to form a circuit substrate 101.
请参阅图6,电路基板101包括介电层、嵌埋于介电层内的内层导电线路层和设置于介电层的表面的第一外层导电线路层14。介电层包括相对设置的第一表面100a和第二表面100b。第一外层导电线路层14设置于第一表面100a并包括多个第一连接垫141,第一连接垫141用于连接电路板(图未示)。本实施方式中,第一外层导电线路层14嵌埋于介电层中并外露于第一表面100a,第一外层导电线路层14背离内层导电线路层的表面与第一表面100a平齐。在其他实施方式中,第一外层导电线路层14凸设于第一表面100a。内层导电线路层通过导电孔与第一外层导电线路层14电连接。内层导电线路层包括多个第一焊垫421。Please refer to FIG. 6 , the circuit substrate 101 includes a dielectric layer, an inner conductive circuit layer embedded in the dielectric layer, and a first outer conductive circuit layer 14 disposed on the surface of the dielectric layer. The dielectric layer includes a first surface 100a and a second surface 100b disposed opposite to each other. The first outer conductive circuit layer 14 is disposed on the first surface 100a and includes a plurality of first connection pads 141, and the first connection pads 141 are used to connect to the circuit board (not shown). In this embodiment, the first outer conductive circuit layer 14 is embedded in the dielectric layer and exposed on the first surface 100a, and the surface of the first outer conductive circuit layer 14 facing away from the inner conductive circuit layer is flush with the first surface 100a. In other embodiments, the first outer conductive circuit layer 14 is convexly disposed on the first surface 100a. The inner conductive circuit layer is electrically connected to the first outer conductive circuit layer 14 through a conductive hole. The inner conductive circuit layer includes a plurality of first solder pads 421.
具体地,介电层包括第一介电层21、第二介电层31、第三介电层41和第四介电层51,内层导电线路层包括第一内层导电线路层22、第二内层导电线路层32、第三内层导电线路层42。第三内层导电线路层42包括多个第一焊垫421。第一介电层21、第一内层导电线路层22、第二介电层31、第二内层导电线路层32、第三介电层41、第三内层导电线路层42和第四介电层51依次层叠设置。第一介电层21背离第一内层导电线路层22的表面作为第一表面100a。第四介电层51背离第三内层导电线路层42的表面作为第二表面100b。第一内层导电线路层22和第一外层导电线路层14通过贯通第一介电层21的多个第一导电孔23电连接。第一内层导电线路层22和第二内层导电线路层32通过贯通第二介电层31的多个第二导电孔电连接。第二内层导电线路层32和第三内层导电线路层42通过贯通第三介电层41的多个第三导电孔43电连接。Specifically, the dielectric layer includes a first dielectric layer 21, a second dielectric layer 31, a third dielectric layer 41 and a fourth dielectric layer 51, and the inner conductive circuit layer includes a first inner conductive circuit layer 22, a second inner conductive circuit layer 32 and a third inner conductive circuit layer 42. The third inner conductive circuit layer 42 includes a plurality of first pads 421. The first dielectric layer 21, the first inner conductive circuit layer 22, the second dielectric layer 31, the second inner conductive circuit layer 32, the third dielectric layer 41, the third inner conductive circuit layer 42 and the fourth dielectric layer 51 are stacked in sequence. The surface of the first dielectric layer 21 facing away from the first inner conductive circuit layer 22 is used as the first surface 100a. The surface of the fourth dielectric layer 51 facing away from the third inner conductive circuit layer 42 is used as the second surface 100b. The first inner conductive circuit layer 22 and the first outer conductive circuit layer 14 are electrically connected through a plurality of first conductive holes 23 penetrating the first dielectric layer 21. The first inner conductive circuit layer 22 and the second inner conductive circuit layer 32 are electrically connected through a plurality of second conductive vias penetrating the second dielectric layer 31 . The second inner conductive circuit layer 32 and the third inner conductive circuit layer 42 are electrically connected through a plurality of third conductive vias 43 penetrating the third dielectric layer 41 .
第一介电层21、第二介电层31、第三介电层41和第四介电层51的材料均可选自聚酰亚胺(PI)、聚乙烯对苯二甲酸乙二醇酯(PET)、聚四氟乙烯(PTFE)、聚酰胺(PA)、聚丙烯(PP)、聚乙烯(PE)、液晶高分子聚合物(LCP)、聚氯乙烯(PVC)等中的至少一种。第一外层导电线路层14、第一内层导电线路层22、第二内层导电线路层32和第三内层导电线路层42的材料可以为铜、金、银等。The materials of the first dielectric layer 21, the second dielectric layer 31, the third dielectric layer 41 and the fourth dielectric layer 51 can be selected from at least one of polyimide (PI), polyethylene terephthalate (PET), polytetrafluoroethylene (PTFE), polyamide (PA), polypropylene (PP), polyethylene (PE), liquid crystal polymer (LCP), polyvinyl chloride (PVC), etc. The materials of the first outer conductive circuit layer 14, the first inner conductive circuit layer 22, the second inner conductive circuit layer 32 and the third inner conductive circuit layer 42 can be copper, gold, silver, etc.
步骤S2,请参阅图7,在介电层上形成贯通第二表面100b并显露多个第一焊垫421的凹槽110。具体地,凹槽110贯通第四介电层51,多个第一焊垫421显露于凹槽110中。凹槽110可以通过激光钻孔或机械钻孔工艺形成。凹槽110包括底面111和侧面112,底面111和侧面112包围形成凹槽110。第一焊垫421的表面与底面111平齐。Step S2, please refer to FIG. 7, a groove 110 is formed on the dielectric layer, which penetrates the second surface 100b and exposes a plurality of first pads 421. Specifically, the groove 110 penetrates the fourth dielectric layer 51, and a plurality of first pads 421 are exposed in the groove 110. The groove 110 can be formed by laser drilling or mechanical drilling. The groove 110 includes a bottom surface 111 and a side surface 112, and the bottom surface 111 and the side surface 112 surround the groove 110. The surface of the first pad 421 is flush with the bottom surface 111.
步骤S3,请参阅图8,在介电层的第二表面100b形成第二外层导电线路层52。具体地,可以在第二表面100b依次进行贴干膜、曝光显影和电镀铜,形成第二外层导电线路层52。第二外层导电线路层52包括多个第二连接垫521。Step S3, referring to FIG8 , forms a second outer conductive circuit layer 52 on the second surface 100b of the dielectric layer. Specifically, dry film lamination, exposure and development, and copper electroplating can be performed in sequence on the second surface 100b to form the second outer conductive circuit layer 52. The second outer conductive circuit layer 52 includes a plurality of second connection pads 521.
步骤S4,请参阅图9,在第一外层导电线路层14上形成第一防焊层61,并在第二外层导电线路层52上形成第二防焊层62,得到基板本体100。In step S4 , please refer to FIG. 9 , a first solder mask layer 61 is formed on the first outer conductive circuit layer 14 , and a second solder mask layer 62 is formed on the second outer conductive circuit layer 52 , to obtain the substrate body 100 .
请参阅图9,基板本体100包括介电层、内层导电线路层、第一外层导电线路层14、第二外层导电线路层52、第一防焊层61和第二防焊层62。内层导电线路层嵌埋于介电层内。第一外层导电线路层14设置于介电层的第一表面100a,第一防焊层61设置于第一外层导电线路层14背离介电层的表面,且第一外层导电线路层14的第一连接垫141显露于第一防焊层61外。第二外层导电线路层52设置于介电层的第二表面100b,第二防焊层62设置于第二外层导电线路层52背离介电层的表面,且第二外层导电线路层52的第二连接垫521显露于第二防焊层62外。Please refer to FIG. 9 , the substrate body 100 includes a dielectric layer, an inner conductive circuit layer, a first outer conductive circuit layer 14, a second outer conductive circuit layer 52, a first solder mask 61, and a second solder mask 62. The inner conductive circuit layer is embedded in the dielectric layer. The first outer conductive circuit layer 14 is disposed on the first surface 100a of the dielectric layer, the first solder mask 61 is disposed on the surface of the first outer conductive circuit layer 14 away from the dielectric layer, and the first connection pad 141 of the first outer conductive circuit layer 14 is exposed outside the first solder mask 61. The second outer conductive circuit layer 52 is disposed on the second surface 100b of the dielectric layer, the second solder mask 62 is disposed on the surface of the second outer conductive circuit layer 52 away from the dielectric layer, and the second connection pad 521 of the second outer conductive circuit layer 52 is exposed outside the second solder mask 62.
步骤S5,请参阅图10,将中介层70置于凹槽110中,并将中介层70与第一焊垫421电连接。中介层70与第二外层导电线路层52不接触。本实施方式中,中介层70与凹槽110的侧面112之间具有间隙。即,中介层70与凹槽110的侧面112不接触。Step S5, referring to FIG. 10 , the interposer 70 is placed in the groove 110, and the interposer 70 is electrically connected to the first pad 421. The interposer 70 is not in contact with the second outer conductive circuit layer 52. In this embodiment, there is a gap between the interposer 70 and the side surface 112 of the groove 110. That is, the interposer 70 is not in contact with the side surface 112 of the groove 110.
本实施方式中,中介层70为硅中介层。硅中介层具有多个导电硅穿孔(TSV)及线路重布层(RDL)。中介层70显露于凹槽110外的表面具有多个第三连接垫71,中介层70面向凹槽110的底面111的表面具有多个第二焊垫72,第三连接垫71和第二焊垫72通过线路重布层和导电硅穿孔电连接。第三连接垫71的表面和第二连接垫521的表面平齐。第二焊垫72与第一焊垫421焊接,实现中介层70与基板本体100电连接。In this embodiment, the interposer 70 is a silicon interposer. The silicon interposer has a plurality of conductive through silicon vias (TSVs) and a line redistribution layer (RDL). The surface of the interposer 70 exposed outside the groove 110 has a plurality of third connection pads 71, and the surface of the interposer 70 facing the bottom surface 111 of the groove 110 has a plurality of second pads 72, and the third connection pads 71 and the second pads 72 are electrically connected through the line redistribution layer and the conductive silicon through vias. The surface of the third connection pad 71 is flush with the surface of the second connection pad 521. The second pad 72 is welded to the first pad 421 to realize the electrical connection between the interposer 70 and the substrate body 100.
步骤S6,请参阅图10,在中介层70与凹槽110之间的间隙中注入粘结剂形成粘结层80,得到封装基板200。In step S6 , please refer to FIG. 10 , an adhesive is injected into the gap between the interposer 70 and the groove 110 to form an adhesive layer 80 , thereby obtaining a package substrate 200 .
请参阅图10,封装基板200包括基板本体100、中介层70和粘结层80。基板本体100开设有贯通第二表面100b和第二外层导电线路层52并显露第一焊垫421的凹槽110,中介层70容纳于基板本体100的凹槽110中并与第一焊垫421电连接,中介层70通过粘结层80与凹槽110的底面111和侧面112粘结。Please refer to Fig. 10, the package substrate 200 includes a substrate body 100, an interposer 70 and an adhesive layer 80. The substrate body 100 is provided with a groove 110 that penetrates the second surface 100b and the second outer conductive circuit layer 52 and exposes the first pad 421. The interposer 70 is accommodated in the groove 110 of the substrate body 100 and is electrically connected to the first pad 421. The interposer 70 is bonded to the bottom surface 111 and the side surface 112 of the groove 110 through the adhesive layer 80.
请参阅图11,本申请一实施方式提供一种封装基板组件300,包括封装基板200和多个电子元件310。每个电子元件310与第二连接垫521和第三连接垫71连接,实现电子元件310与基板本体100和中介层70的电连接。电子元件310为主动元件、被动元件或其二者组合,主动元件例如为半导体芯片,被动元件例如为电阻、电容及电感。Referring to FIG. 11 , an embodiment of the present application provides a package substrate assembly 300, including a package substrate 200 and a plurality of electronic components 310. Each electronic component 310 is connected to a second connection pad 521 and a third connection pad 71 to achieve electrical connection between the electronic component 310 and the substrate body 100 and the interposer 70. The electronic component 310 is an active component, a passive component, or a combination thereof, wherein the active component is, for example, a semiconductor chip, and the passive component is, for example, a resistor, a capacitor, and an inductor.
本申请实施方式提供的封装基板200,通过在基板本体100开设凹槽110,并将中介层70容置于凹槽110中,减小了封装基板组件300整体的厚度,利于薄型化;且通过配置第二连接垫521和第三连接垫71,使一片封装基板200可以承载多个电子元件310,利于集成化。The packaging substrate 200 provided in the embodiment of the present application reduces the overall thickness of the packaging substrate assembly 300 by opening a groove 110 in the substrate body 100 and accommodating the intermediate layer 70 in the groove 110, which is conducive to thinning; and by configuring the second connection pad 521 and the third connection pad 71, a piece of packaging substrate 200 can carry multiple electronic components 310, which is conducive to integration.
以上所述,仅是本申请的较佳实施方式而已,并非对本申请任何形式上的限制,虽然本申请已是较佳实施方式揭露如上,并非用以限定本申请,任何熟悉本专业的技术人员,在不脱离本申请技术方案范围内,当可利用上述揭示的技术内容做出些许更动或修饰为等同变化的等效实施方式,但凡是未脱离本申请技术方案内容,依据本申请的技术实质对以上实施方式所做的任何简单修改、等同变化与修饰,均仍属于本申请技术方案的范围内。The above is only the preferred implementation mode of the present application, and is not any form of limitation on the present application. Although the present application has been disclosed as the preferred implementation mode as above, it is not used to limit the present application. Any technician familiar with this profession can make some changes or modify the technical contents disclosed above into equivalent implementation modes without departing from the scope of the technical solution of the present application. However, any simple modification, equivalent change and modification made to the above implementation modes based on the technical essence of the present application without departing from the content of the technical solution of the present application are still within the scope of the technical solution of the present application.
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