CN221701329U - Annular channel low temperature plasma dual water purification device - Google Patents

Abstract

The utility model provides an annular channel low-temperature plasma dual water purifying device which comprises an active carbon cavity, a porous cavity cover, a porous cavity connecting sheet, an air inlet pipe, an electrode interface, a high-voltage electrode, a grounding electrode, a plasma water purifying cavity and a porous cavity water outlet sheet. The plasma water purifying cavity is internally provided with an inner hollow cylinder and four groups of symmetrical quartz tubes, the inner hollow cylinder and the four groups of symmetrical quartz tubes are fixed in the center, 8 through holes are symmetrically distributed on each quartz tube, and 4 through holes are symmetrically distributed on the side wall of the inner hollow cylinder. The water outlet sheets of the porous chamber are uniformly distributed with 27 through holes. The grounding electrode is electrically connected with the copper wires, the copper wires are wound on the outer side of the quartz tube and symmetrically distributed into four groups. The high-voltage electrode enters the quartz tube through the electrode interface. The gas enters the annular channel through the gas inlet pipe and then enters the quartz tube, and is discharged from the through hole on the quartz tube, and the high-voltage electric field forms arc discharge and dielectric barrier discharge in the gas to generate low-temperature plasma so as to achieve the effect of purifying water.

Description

Annular channel low temperature plasma dual water purification device

Technical Field

The utility model relates to the field of low-temperature plasma physics and applications, in particular to a ring-channel low-temperature plasma double water purification device.

Background Art

Carbon particles and activated carbon can initially separate, block and adsorb some solid particles such as sand particles and rust with slightly larger specific gravity, and remove impurities and foreign matter. Low-temperature plasma can remove various organic matter in water. This is because low-temperature plasma will produce high-energy electrons during the gas-liquid two-phase discharge process. The electrons collide with water or gas molecules to produce a large number of active species such as strong oxidizing active free radicals. The active species undergo redox reactions with organic matter in a gas phase environment or a liquid phase environment to degrade the organic matter and achieve the effect of removing pollutants. The discharge process is also accompanied by a variety of physical effects, such as ultraviolet radiation, high-energy electrons, shock waves, high-temperature pyrolysis, etc. These intermediate products can further accelerate the decomposition reaction process of pollutants and increase the purification speed. Therefore, the carbon particle and activated carbon treatment solutions can be combined with the low-temperature plasma technology treatment solution to improve drinking water treatment technology.

Utility Model Content

The purpose of the utility model is to provide a low-energy, green and environmentally friendly annular channel low-temperature plasma dual water purification device to address the existing problems, which can remove free chlorine in tap water (the water plant adds residual chlorine for disinfection and sterilization), and remove sediment, rust, heavy metals, odor, bacteria and various harmful substances in tap water. To achieve the above purpose, the utility model provides the following technical solutions:

A ring channel low temperature plasma dual water purification device includes an upper activated carbon cavity, a porous cavity cover, a porous cavity connection plate, an air inlet pipe, a high voltage electrode, a ground electrode, a plasma water purification cavity, and a porous cavity water outlet plate. The plasma water purification cavity is composed of a ring gas channel and four groups of symmetrical quartz tubes, and is fixed in the center. There are 8 through holes symmetrically distributed on the quartz tube, and 4 through holes symmetrically distributed on the inner side of the ring channel. There are 27 through holes evenly distributed on the porous cavity water outlet plate. The ground electrode is electrically connected to the spiral copper wire through the electrode interface. The spiral copper wire is wound on the quartz tube and symmetrically distributed into four groups. The high voltage electrode enters the interior of the quartz tube through the electrode interface.

A ring channel low-temperature plasma dual water purification device, characterized in that: the high-voltage electrode and the grounding electrode are both copper wires with a diameter of 2 mm, and the copper wire wrapped around the outside of the quartz tube has a diameter of 1 mm; the quartz tube is 30 mm long, 7.2 mm in outer diameter, and 6 mm in inner diameter; the air inlet pipe is 10 mm long, 6 mm in outer diameter, and 4.8 mm in inner diameter; the electrode interface is 10 mm long, 10 mm in outer diameter, and 8 mm in inner diameter; the porous cavity cover, the porous cavity connecting plate, and the cavity water outlet plate are all 2 mm thick, and the through hole diameter is 4 mm.

A ring channel low-temperature plasma dual water purification device, characterized in that: the outer diameter of the activated carbon cavity is 108 mm, the inner diameter is 104 mm, and the height is 80 mm; the outer diameter of the plasma water purification cavity is 108 mm, the inner diameter is 104 mm, and the height is 40 mm, and the outer diameter of the inner hollow cylinder is 84 mm, the inner diameter is 80 mm, and the height is 40 mm.

Compared with the prior art, the beneficial effects of the utility model are:

The annular channel low-temperature plasma dual water purification device provides an automatic water purification device with convenient treatment, simple structure and green environmental protection;

The annular channel low-temperature plasma double water purification device can double purify the water quality, making the treated water cleaner;

The annular channel low-temperature plasma dual water purification device can also be promoted and applied to other treatment fields.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG1 is an overall schematic diagram of a ring channel low temperature plasma dual water purification device;

FIG2 is a schematic diagram of the split structure of the annular channel low-temperature plasma dual water purification device;

FIG3 is a schematic diagram of the structure of the plasma water purification chamber 3;

FIG. 4 is a top view of the plasma water purification chamber 3 .

In the figure: 1. Activated carbon chamber; 2. Porous chamber cover; 3. Plasma water purification chamber; 4. Air inlet pipe; 5. Ground electrode; 6. High-voltage electrode; 7. Porous chamber connecting piece; 8. Porous chamber water outlet piece; 9. Electrode interface.

Implementation

In order to make the purpose, technical solution and advantages of the utility model more clear, the utility model is further described in detail through specific embodiments in conjunction with the accompanying drawings, wherein the same reference numerals represent the same components in each of the accompanying drawings. It should be understood that the specific embodiments described herein are only used to explain the utility model and are not used to limit the utility model.

In the embodiment of the present utility model, in order to make the description clearer, the "upper side" direction is consistent with the direction of the granular activated carbon cavity 1, and the "lower side" is consistent with the direction of the porous chamber water outlet sheet 8.

Figure 1 is an overall schematic diagram of the annular channel low-temperature plasma dual water purification device, and Figure 2 is a schematic diagram of the disassembled structure of the annular channel low-temperature plasma dual water purification device. The entire device includes 1 activated carbon chamber, 2 porous chamber cover, 3 plasma water purification chamber, 4 air inlet pipe, 5 grounding electrode, 6 high-voltage electrode, 7 porous chamber connecting piece, 8 porous chamber water outlet piece, and 9 electrode interface.

The activated carbon chamber 1 is used to load granular activated carbon. It is a hollow cylindrical chamber with an outer diameter of 108 mm, an inner diameter of 104 mm, and a height of 80 mm. The porous chamber cover 2 is 2 mm thick, with 27 through holes evenly distributed on it, and the through hole diameter is 4 mm. When installed, it is placed on the upper side of the chamber 1 to cover the activated carbon. The porous chamber connecting piece 7 is located at the bottom of the chamber 1 and is used to connect the chamber 1 and the chamber 3. The porous chamber connecting piece 7 is 2 mm thick, with 27 through holes evenly distributed on it, and the through hole diameter is 4 mm.

The plasma water purification chamber 3 has an outer diameter of 84 mm, an inner diameter of 80 mm, and a height of 40 mm. There is an air inlet pipe 4 on the side wall of the plasma water purification chamber 3, which is 10 mm long, 6 mm in outer diameter, and 4.8 mm in inner diameter. There is an electrode interface 9 on the side wall of the plasma water purification chamber 3, through which the discharge electrode enters the chamber 3. The discharge includes a high-voltage electrode 6 and a grounding electrode 5, both of which are copper wires with a diameter of 2 mm. The porous chamber water outlet sheet 8 is located at the bottom side of the plasma water purification chamber 3, is 2 mm thick, and has 27 through holes evenly distributed thereon, with a hole diameter of 4 mm.

FIG3 is a schematic diagram of the internal structure of the plasma water purification chamber 3, and FIG4 is a top view of the plasma water purification chamber 3. 3.1 is an inner hollow cylinder, and the space between 3.1 and the outer wall of the chamber 3 forms an annular gas channel. The outer diameter of the inner hollow cylinder 3.1 is 108 mm, the inner diameter is 104 mm, and the height is 40 mm. Four through holes 3.3 are symmetrically and evenly distributed on the side of the inner hollow cylinder 3.1, and the through hole diameter is 6 mm. Four quartz tubes 3.2 are placed in the internal space of the inner hollow cylinder. The quartz tubes 3.2 are installed on the through holes 3.3 and communicate with each other. The quartz tubes 3.2 are 30 mm long, 7.2 mm in outer diameter, and 6 mm in inner diameter. The four quartz tubes are symmetrically distributed and fixed in the center by a fixed cylinder 6.2. Each quartz tube has 8 through holes 3.4 of equal size and 2 mm in diameter evenly and symmetrically distributed. The gas enters the annular gas channel through the gas inlet pipe 4, then enters the inner side of the quartz tube 3.2 through the through hole 3.3, and is discharged through the through hole 3.4.

After entering 3.1, the ground electrode 5 is electrically connected to the copper wire 5.1 with a diameter of 1 mm. The copper wire 5.1 is wound around the outside of all quartz tubes 3.2 and symmetrically distributed into four groups. The copper wire should not cover the through hole 3.4 as much as possible. The copper wires on the outside of the four groups of quartz tubes are connected to each other. The high-voltage electrode 6 enters the interior of the quartz tube through the electrode interface and is electrically connected to the metal electrode 6.1. There are four metal electrodes 6.1, which are inserted into the center of the four quartz tubes respectively. The four metal electrodes 6.1 are electrically connected at the center of the fixed cylinder 6.2. The plasma-specific power supply used in the device has an output frequency of 5~30 kHz and a voltage of 5~10 kV AC or pulse voltage. The ground electrode 5 is connected to the ground terminal of the plasma discharge-specific power supply, and the high-voltage electrode 6 is connected to the high-voltage pole of the plasma-specific power supply.

Working principle: The tap water of the water supply system enters the activated carbon cavity 1 through the porous cavity cover 2. The cavity 1 is loaded with water carbon particles and activated carbon. After the tap water is filtered and adsorbed, the free chlorine in the tap water is removed (the water plant adds residual chlorine for disinfection and sterilization), and the silt, rust, heavy metals, odor, etc. in the tap water are removed for primary purification. Then it is buffered by the chamber connecting piece 7 and evenly enters the plasma water purification cavity 3. Different gases can enter the annular gas channel through the air inlet pipe 4 by an external air pump, and then enter the inner side of the quartz tube 3.2 through the through hole 3.3, and enter the primary purified tap water through the through hole 3.4, generating a large number of bubbles. The gas can be oxygen, air, helium and other gases, or a mixture thereof. Under the high voltage condition applied by the plasma dedicated power supply, a high voltage electric field is generated between the electrode 5.1 and the ground electrode 6.1, and the gas entering the quartz tube 3.2 from the air inlet pipe 4 will be ionized into plasma. Due to the barrier of the quartz tube medium, the discharge will not develop further, so the discharge type is atmospheric pressure dielectric barrier discharge, so the high voltage electric field forms arc discharge and dielectric barrier discharge in the gas. The plasma generated by the internal discharge of the quartz tube 3.2 is ejected through the through hole 3.4 and enters the preliminarily purified tap water, generating a large number of discharge bubbles, so that the low-temperature plasma is evenly mixed into the water. The large amount of active oxygen ions, high-energy free radicals and other components contained in the low-temperature plasma react with organic pollutants and bacteria in the tap water, playing a secondary water purification role. At the same time, the ultraviolet radiation accompanying the discharge plays a further purification role. There is no secondary pollution in the entire treatment process, and it has a fast and efficient purification effect.

Finally, it should be noted that although the present invention has been described through preferred embodiments, the present invention is not limited to the embodiments described herein, and also includes various changes and modifications without departing from the scope of the present invention.

Claims (3)

1. A ring channel low temperature plasma dual water purification device, characterized in that it comprises an activated carbon cavity, a porous cavity cover, a porous cavity connecting piece, an air inlet pipe, an electrode interface, a high voltage electrode, a grounding electrode, a plasma water purification cavity, and a porous cavity water outlet piece; the activated carbon cavity is a hollow cylindrical cavity, the porous cavity cover is located on the upper side of the activated carbon cavity, the porous cavity cover is 2 mm thick, and 27 through holes with a diameter of 4 mm are evenly distributed thereon; the porous cavity connecting piece is located at the bottom of the activated carbon cavity, the porous cavity connecting piece is 2 mm thick, and 27 through holes with a diameter of 4 mm are evenly distributed thereon; the air inlet pipe is located on the side wall of the plasma water purification cavity, the electrode interface is located on the side wall of the plasma water purification cavity, and the high voltage electrode and the grounding electrode are both copper wires with a diameter of 2 mm; the porous cavity water outlet piece is located on the bottom side of the plasma water purification cavity, the porous cavity water outlet piece is 2 mm thick, and 27 through holes with a diameter of 4 mm are evenly distributed thereon; The plasma water purification cavity has an inner hollow cylinder inside, and 4 through holes with a diameter of 6 mm are evenly distributed on the side of the inner hollow cylinder. Four quartz tubes are placed in the inner space of the inner hollow cylinder, and the quartz tubes are installed on the through holes on the side of the inner hollow cylinder and are connected. The four quartz tubes are fixed by a fixed cylinder, and each of the four quartz tubes has 8 through holes of equal size and a diameter of 2 mm evenly distributed on it; the grounding electrode is electrically connected to a copper wire with a diameter of 1 mm after entering the inner hollow cylinder, and the copper wire is wound around the outside of the four quartz tubes, and the high-voltage electrode is connected to a metal electrode. There are four metal electrodes, which are respectively inserted into the center of the four quartz tubes, and the four metal electrodes are electrically connected at the center of the fixed cylinder. 2. According to claim 1, a ring channel low-temperature plasma dual water purification device is characterized in that the four quartz tubes are 30 mm long, 7.2 mm in outer diameter, and 6 mm in inner diameter; the air inlet pipe is 10 mm long, 6 mm in outer diameter, and 4.8 mm in inner diameter; the electrode interface is 10 mm long, 10 mm in outer diameter, and 8 mm in inner diameter. 3. According to claim 1, a ring channel low-temperature plasma dual water purification device is characterized in that the outer diameter of the activated carbon cavity is 108 mm, the inner diameter is 104 mm, and the height is 80 mm; the inner hollow cylinder inside the plasma water purification cavity has an outer diameter of 84 mm, an inner diameter of 80 mm, and a height of 40 mm.