CN221466531U - Wafer wet cleaning device - Google Patents

Abstract

The utility model relates to the technical field of wafer processing, and discloses a wafer wet cleaning device. The utility model provides a wafer wet cleaning device which comprises a support frame, a washing barrel, a first motor, a placing table, an adjusting plate, liquid collecting boxes and air cylinders, wherein the washing barrel is placed on the support frame, the first motor is installed at the bottom of the washing barrel, the placing table is rotatably arranged in the washing barrel, an output shaft of the first motor penetrates into the washing barrel to be connected with the placing table, the adjusting plate is slidably arranged on the placing table, two liquid collecting boxes are installed on the outer side of the washing barrel, and the air cylinders are installed in the washing barrel. The output shaft of the second motor rotates to drive a stirring frame and a belt pulley set to rotate, so that the two stirring frames simultaneously rotate to stir water and chemical solution, the water and the chemical solution are fully mixed, and the cleaning effect is prevented from being influenced.

Description

Wafer wet cleaning device

Technical Field

The utility model relates to the technical field of wafer processing, and discloses a wafer wet cleaning device.

Background

Wet cleaning refers to effectively using chemical solution to remove the dust, metal ions and organic impurities remained on the wafer without damaging the surface and electrical properties of the wafer, and in the process of wafer manufacture, the RCA cleaning method in wet cleaning is commonly used to achieve the purpose of removing the contaminants on the wafer surface.

Patent grant publication number is CN216631781U, discloses a wafer belt cleaning device, including rotary machine platform and washing shower nozzle, rotary machine platform includes plummer and support piece, the surface of plummer has first recess. In the above patent, although the bearing table drives the wafer to rotate so that the cleaning solution in the second groove can shake along with the wafer to flow to the cavity to soak the back surface of the wafer, when the wafer is cleaned, the cleaning solution cannot be stirred by the liquid collecting box due to the fact that the stirring mechanism is not arranged, so that the cleaning solution is insufficiently mixed, and the cleaning effect is further affected.

Therefore, there is a need for a wafer wet cleaning apparatus that can agitate a cleaning solution.

Disclosure of utility model

In order to overcome the defect that the cleaning solution cannot be sufficiently mixed due to the fact that a stirring mechanism is not arranged when the wafer is cleaned, and the cleaning effect is affected, the utility model provides a wafer wet cleaning device capable of stirring the cleaning solution.

In order to achieve the purpose of stirring the cleaning liquid, the utility model provides the following technical scheme: the utility model provides a wafer wet cleaning device, including the support frame, wash bowl, first motor, place the platform, the regulating plate, the header tank, first catheter, first water pump, the honeycomb duct, shower nozzle and cylinder, wash bowl has been placed on the support frame, first motor is installed to wash bowl bottom, the inside rotation of wash bowl is provided with places the platform, the output shaft of first motor penetrates the inside and place the platform connection of wash bowl, place bench slidingtype and be provided with the regulating plate, two header tanks are installed in the wash bowl outside, connect and communicate on the header tank and have first catheter, install first water pump on the first catheter, be connected and communicate on the first water pump and have the honeycomb duct, wash bowl internally mounted has the cylinder, honeycomb duct end-to-end connection and intercommunication have the shower nozzle, and the telescopic link and the shower nozzle of cylinder are connected, still including the second motor, the stirring frame, the belt pulley group, the header tank top on wash bowl right side installs the second motor, the output shaft of second motor penetrates the inside connection of header tank has a stirring frame, the inside rotation of header tank is provided with another stirring frame, the output shaft of second motor and another belt on the other motor are connected with the first belt stirring frame, drive two wheelsets rotate simultaneously on the output shaft of second motor and another stirring frame jointly.

Further, the honeycomb duct is the hose.

Further, the device also comprises a first elastic piece, and the placing table is sleeved with the first elastic piece which enables the adjusting plate to reset.

Further, the bottom of the washing barrel is an inclined plane.

Further, still including header tank, filter pulp, second catheter and second water pump, wash bucket bottom fixedly connected with header tank is provided with the filter pulp that is used for adsorbing metal ion and organic matter impurity on the header tank, is connected and communicates on the header tank and has the second catheter, installs the second water pump on the second catheter, and the second catheter is connected with the header tank of wash bucket rear side, and the operation of second water pump is gone into the water pump in the header tank and is washed the header tank of bucket rear side.

Further, still including locating wheel, directional wheel, stay cord, annular guard plate, guide bar and second elastic component, the locating wheel is installed in the shower nozzle left side, and two guide bars of the inside fixedly connected with of washing bucket, left guide bar top fixedly connected with directional wheel, the stay cord has been wound on locating wheel and the directional wheel, and the common slidingtype is provided with annular guard plate on two guide bars, and the cover has the second elastic component that makes annular guard plate reset on the guide bar.

Further, still including mounting bracket, installing cabinet, heating pipe and fan, the inside fixedly connected with mounting bracket of washing bucket installs a plurality of installing cabinets on the mounting bracket, and installing cabinet internally connected has a plurality of heating pipes, and the heating pipe heats the air, and installing cabinet internally mounted has a plurality of fans, and the fan operation blows the air of heating to the wafer surface.

Further, a plurality of ventilation holes are formed in the installation cabinet.

Further, the belt pulley further comprises a protective sleeve, and the belt pulley group is sleeved with the protective sleeve.

Further, the dust-proof device also comprises a dust-proof net, and the dust-proof net is arranged on the liquid collecting box in an embedded mode.

Compared with the prior art, the utility model provides a wafer wet cleaning device, which has the following beneficial effects:

1. The output shaft of the second motor rotates to drive a stirring frame and a belt pulley set to rotate, so that the two stirring frames simultaneously rotate to stir water and chemical solution, the water and the chemical solution are fully mixed, and the cleaning effect is prevented from being influenced.

2. The filter cotton adsorbs impurities such as metal ions and organic matters carried in water, and the second water pump pumps the water into the liquid collecting tank at the rear side of the washing barrel, so that the water is reused, and the purpose of saving water resources is achieved.

3. The positioning wheel moves downwards to pull the annular protection plate to move upwards, so that the annular protection plate shields the solution, the solution is intensively sprayed onto the regulating plate, and the solution is prevented from being sprayed onto the inner wall of the washing barrel.

4. By starting the heating pipe and the fan, the heating pipe heats air, the fan blows the heated air onto the wafer, and then the water on the surface of the wafer is evaporated, so that the wafer is kept dry, and the next procedure is convenient to carry out.

Drawings

Fig. 1 is a schematic perspective view of the present utility model.

Fig. 2 is a schematic perspective sectional structure of the support frame, the washing bucket and the liquid collecting tank of the utility model.

Fig. 3 is a schematic perspective sectional view of the header tank, header tank and second motor of the present utility model.

Fig. 4 is a schematic perspective sectional structure of the washing bucket, the flow guide pipe and the air cylinder of the utility model.

Fig. 5 is an enlarged view of the utility model at a in fig. 4.

Fig. 6 is a schematic perspective sectional structure of the water collection tank, the filter cotton and the washing bucket of the present utility model.

Fig. 7 is a schematic perspective sectional structure of the positioning wheel, the orientation wheel and the pull rope of the utility model.

FIG. 8 is a schematic perspective cross-sectional view of the mounting bracket, mounting cabinet and heating tube of the present utility model.

Fig. 9 is an enlarged view of the present utility model at B in fig. 8.

Part names and serial numbers in the figure: 1-supporting frame, 2-washing bucket, 3-first motor, 4-placing table, 5-regulating plate, 6-first elastic piece, 7-header tank, 8-second motor, 9-stirring frame, 10-pulley group, 11-first catheter, 12-first water pump, 13-honeycomb duct, 14-shower nozzle, 15-cylinder, 16-header tank, 17-filter cotton, 18-second catheter, 19-second water pump, 20-positioning wheel, 21-directional wheel, 22-stay cord, 23-annular guard plate, 24-guide bar, 25-second elastic piece, 2501-mounting frame, 2502-mounting cabinet, 26-heating pipe, 27-fan, 28-lag, 29-dust screen.

Detailed Description

The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

Example 1

Referring to fig. 1-8, the wafer wet cleaning device comprises a supporting frame 1, a washing barrel 2, a first motor 3, a placing table 4, an adjusting plate 5, a liquid collecting box 7, a first liquid collecting pipe 11, a first water pump 12, a flow guide pipe 13, a spray head 14 and a pneumatic cylinder 15, wherein the washing barrel 2 is placed on the supporting frame 1, an observation window is embedded in the washing barrel 2, the wafer cleaning condition is seen through the observation window, the first motor 3 is arranged at the bottom of the washing barrel 2 in a bolt connection mode, the placing table 4 is arranged in the washing barrel 2 in a rotating mode, an output shaft of the first motor 3 penetrates into the washing barrel 2 to be connected with the placing table 4, the adjusting plate 5 is arranged on the placing table 4 in a sliding mode, two liquid collecting boxes 7 are arranged at the outer side of the washing barrel 2 in a bolt connection mode, the first liquid collecting pipe 11 is connected and communicated with the liquid collecting box 7, the first water pump 12 is arranged on the first liquid collecting pipe 11 in a bolt connection mode, the first water pump 12 is connected and communicated with a flow guide pipe 13, an air cylinder 15 is arranged in the washing barrel 2 in a bolt connection mode, the tail end of the flow guide pipe 13 is connected and communicated with a spray head 14, a telescopic rod of the air cylinder 15 is connected with the spray head 14, the water pump further comprises a second motor 8, a stirring frame 9, a belt pulley group 10, the top of a liquid collecting box 7 on the right side of the washing barrel 2 is provided with the second motor 8 in a bolt connection mode, an output shaft of the second motor 8 penetrates into the liquid collecting box 7 and is internally connected with the stirring frame 9, the other stirring frame 9 is rotatably arranged in the liquid collecting box 7 on the rear side of the washing barrel 2, the belt pulley group 10 is sleeved on the output shaft of the second motor 8 and the other stirring frame 9 together, the belt pulley group 10 consists of two belt pulleys and a belt, the other belt pulley is located on the stirring frame 9 of the rear side of the washing barrel 2, a belt is sleeved on the two belt pulleys jointly, the output shaft of the second motor 8 rotates to drive the two stirring frames 9 to rotate simultaneously, the guide pipe 13 is a hose and has elasticity, the telescopic rod of the air cylinder 15 stretches and contracts along with the telescopic rod of the air cylinder, the belt pulley further comprises a first elastic piece 6, the placing table 4 is sleeved with the first elastic piece 6 which enables the adjusting plate 5 to reset, two ends of the first elastic piece 6 are respectively connected with the adjusting plate 5 and the placing table 4, the belt pulley further comprises a protective sleeve 28, the protective sleeve 28 is sleeved on the belt pulley set 10, the belt pulley set 10 is completely shielded by the protective sleeve 28, foreign matters are prevented from being wound on the belt pulley set 10, the belt pulley set 29 further comprises a dust screen 29, and the dust screen 29 is arranged on the liquid collecting box 7 in an embedded mode.

When the wafer needs to be cleaned, a worker pours three chemical solutions and a proper amount of water into the liquid collecting box 7, then opens the cleaning barrel 2 and pulls the adjusting plate 5 upwards, the first elastic piece 6 is stretched along with the cleaning barrel, the wafer is placed on the adjusting plate 5, the worker releases the adjusting plate 5, the first elastic piece 6 is restored to be original to drive the adjusting plate 5 to move downwards for reset, the worker closes the cleaning barrel 2, then, the worker starts the first motor 3, the first water pump 12 and the air cylinder 15, the output shaft of the first motor 3 rotates to drive the adjusting plate 5 to rotate, the wafer is further rotated, the first water pump 12 operates to pump the cleaning solution into the first liquid guide tube 11, the telescopic rod of the air cylinder 15 is controlled to extend to enable the spray head 14 to move downwards, the chemical solution is sprayed onto the wafer, the wafer is further cleaned, the second motor 8 is started, the output shaft of the second motor 8 rotates to drive the stirring frame 9 and the belt pulley set 10 to rotate simultaneously, the two stirring frames 9 stir the water and the chemical solution, and the chemical solution are prevented from being fully mixed, and the cleaning effect is avoided.

Example 2

On the basis of embodiment 1, please refer to fig. 6, further include a water collection tank 16, a filter cotton 17, a second liquid guide tube 18 and a second water pump 19, the bottom of the washing tub 2 is fixedly connected with the water collection tank 16, the filter cotton 17 for adsorbing impurities such as metal ions and organic matters is disposed on the water collection tank 16, the water collection tank 16 is connected and communicated with the second liquid guide tube 18, the second liquid guide tube 18 is disposed with the second water pump 19 by means of bolting, and the second liquid guide tube 18 is connected with the liquid collection tank 7 at the rear side of the washing tub 2, the second water pump 19 operates to pump the water in the water collection tank 16 into the liquid collection tank 7 at the rear side of the washing tub 2, the bottom of the washing tub 2 is inclined, and the cleaned water flows into the water collection tank 16 along the inclined plane at the bottom of the washing tub 2, thereby facilitating water collection.

When the wafer is cleaned, the cleaned water flows into the water collecting tank 16 along the inclined surface at the bottom of the washing barrel 2, the filter cotton 17 adsorbs metal ions and organic matter impurities carried in the water, so that the water is collected, the second water pump 19 is started, the second water pump 19 pumps the filtered water into the water collecting tank 7 at the rear side of the washing barrel 2 through the second liquid guide tube 18, and the water is reused, so that the purpose of saving water resources is achieved.

Referring to fig. 7, the shower nozzle further comprises a positioning wheel 20, a directional wheel 21, a pull rope 22, an annular protection plate 23, guide rods 24 and a second elastic piece 25, wherein the positioning wheel 20 is arranged on the left side of the shower nozzle 14 in a bolt connection mode, two guide rods 24 are fixedly connected inside the shower nozzle 2, the directional wheel 21 is fixedly connected to the top of the guide rod 24 on the left side, the pull rope 22 is wound on the positioning wheel 20 and the directional wheel 21, the annular protection plate 23 is arranged on the two guide rods 24 in a sliding mode, the annular protection plate 23 is sleeved on the guide rod 24, a second elastic piece 25 for resetting the annular protection plate 23 is sleeved on the guide rod 24, and two ends of the second elastic piece 25 are respectively connected with the guide rod 24 and the annular protection plate 23.

When the spray head 14 moves downwards, the positioning wheel 20 is driven to move downwards to pull the annular protection plate 23 to move upwards, the second elastic piece 25 is compressed, the annular protection plate 23 shields the solution, the solution is enabled to be sprayed onto the adjusting plate 5 in a concentrated mode, the solution is prevented from being sprayed onto the inner wall of the washing bucket 2, and after spraying is completed, the second elastic piece 25 is restored to the original state to drive the annular protection plate 23 to move downwards to reset.

Referring to fig. 8 and 9, the cleaning apparatus further comprises a mounting frame 2501, a mounting cabinet 2502, heating pipes 26 and fans 27, wherein the mounting frame 2501 is fixedly connected to the inside of the cleaning barrel 2, a plurality of mounting cabinets 2502 are arranged on the mounting frame 2501 in a bolt connection mode, a plurality of heating pipes 26 are connected to the inside of the mounting cabinet 2502, the heating pipes 26 heat air, a plurality of fans 27 are arranged in the inside of the mounting cabinet 2502 in a bolt connection mode, the fans 27 are evenly spaced, the fans 27 are operated to blow the heated air to the surface of a wafer, a plurality of ventilation holes are formed in the mounting cabinet 2502, and the heated air is discharged through the ventilation holes.

After the wafer is cleaned, a worker starts the heating pipe 26 and the fan 27, the heating pipe 26 heats air, the fan 27 blows the heated air onto the wafer, and then water on the surface of the wafer is evaporated, so that the wafer is kept dry, and the next process is facilitated.

Although embodiments of the present utility model have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the utility model, the scope of which is defined in the appended claims and their equivalents.

Claims (10)

1. Wafer wet cleaning device, a serial communication port, including support frame (1), wash bowl (2), first motor (3), place platform (4), regulating plate (5), header tank (7), first catheter (11), first water pump (12), honeycomb duct (13), shower nozzle (14) and cylinder (15), place wash bowl (2) on support frame (1), first motor (3) are installed to wash bowl (2) bottom, wash bowl (2) inside rotation formula is provided with places platform (4), the output shaft of first motor (3) penetrates wash bowl (2) inside and places platform (4) and be connected, place bench (4) go up the slip and be provided with regulating plate (5), two header tanks (7) are installed in the wash bowl (2) outside, be connected and communicate on header tank (7) have first catheter (11), install first water pump (12) on first water pump (12) and be connected and communicate and have honeycomb duct (13), wash bowl (2) internally mounted has cylinder (15), honeycomb duct (13) end-to-connect and communicate, and connect with motor (14), still include shower nozzle (9) and expansion bracket (9) are connected with the second The second motor (8) is installed at the collection box (7) top on belt pulley group (10), washing bucket (2) right side, and the output shaft of second motor (8) penetrates collection box (7) internally connected with one stirring frame (9), and the inside rotation of collection box (7) of washing bucket (2) rear side is provided with another stirring frame (9), and the common cover is equipped with belt pulley group (10) on the output shaft of second motor (8) and another stirring frame (9), and the output shaft rotation of second motor (8) drives two stirring frames (9) and rotates simultaneously.

2. A wafer wet cleaning apparatus according to claim 1, characterized in that the flow guide tube (13) is a hose.

3. The wet wafer cleaning device according to claim 1, further comprising a first elastic member (6), wherein the placing table (4) is sleeved with the first elastic member (6) for resetting the adjusting plate (5).

4. A wafer wet cleaning apparatus according to claim 1, wherein the bottom of the washing tub (2) is a bevel.

5. The wafer wet cleaning device according to claim 1, further comprising a water collecting tank (16), filter cotton (17), a second liquid guide tube (18) and a second water pump (19), wherein the water collecting tank (16) is fixedly connected to the bottom of the washing barrel (2), the filter cotton (17) for adsorbing metal ions and organic matter impurities is arranged on the water collecting tank (16), the water collecting tank (16) is connected and communicated with the second liquid guide tube (18), the second water pump (19) is arranged on the second liquid guide tube (18), the second liquid guide tube (18) is connected with the liquid collecting tank (7) at the rear side of the washing barrel (2), and the second water pump (19) operates to pump water in the water collecting tank (16) into the liquid collecting tank (7) at the rear side of the washing barrel (2).

6. The wafer wet cleaning device according to claim 1, further comprising a positioning wheel (20), a positioning wheel (21), a pull rope (22), an annular protection plate (23), guide rods (24) and a second elastic piece (25), wherein the positioning wheel (20) is installed on the left side of the spray head (14), two guide rods (24) are fixedly connected inside the washing barrel (2), the positioning wheel (21) is fixedly connected to the top of the left guide rod (24), the pull rope (22) is wound on the positioning wheel (20) and the positioning wheel (21), the annular protection plate (23) is arranged on the two guide rods (24) in a sliding mode, and the second elastic piece (25) for resetting the annular protection plate (23) is sleeved on the guide rods (24).

7. The wet wafer cleaning device according to claim 1, further comprising a mounting frame (2501), a mounting cabinet (2502), heating pipes (26) and fans (27), wherein the mounting frame (2501) is fixedly connected to the inside of the washing barrel (2), a plurality of mounting cabinets (2502) are mounted on the mounting frame (2501), a plurality of heating pipes (26) are connected to the inside of the mounting cabinet (2502), the heating pipes (26) heat air, a plurality of fans (27) are mounted in the inside of the mounting cabinet (2502), and the fans (27) are operated to blow the heated air to the surface of the wafer.

8. The wafer wet cleaning apparatus according to claim 7, wherein the mounting cabinet (2502) is provided with a plurality of ventilation holes.

9. The wet wafer cleaning device according to claim 1, further comprising a protective sleeve (28), wherein the pulley set (10) is sleeved with the protective sleeve (28).

10. The wet wafer cleaning device according to claim 1, further comprising a dust screen (29), wherein the dust screen (29) is embedded in the liquid collecting tank (7).