CN220970269U - Semiconductor cleaning tank and semiconductor cleaning equipment - Google Patents
Semiconductor cleaning tank and semiconductor cleaning equipment Download PDFInfo
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- CN220970269U CN220970269U CN202322171792.6U CN202322171792U CN220970269U CN 220970269 U CN220970269 U CN 220970269U CN 202322171792 U CN202322171792 U CN 202322171792U CN 220970269 U CN220970269 U CN 220970269U
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- 238000004140 cleaning Methods 0.000 title claims abstract description 131
- 239000004065 semiconductor Substances 0.000 title claims abstract description 38
- 239000007788 liquid Substances 0.000 claims abstract description 231
- 239000003814 drug Substances 0.000 claims abstract description 174
- 238000000034 method Methods 0.000 claims abstract description 116
- 230000008569 process Effects 0.000 claims abstract description 115
- 238000005303 weighing Methods 0.000 claims abstract description 70
- 238000002347 injection Methods 0.000 claims abstract description 66
- 239000007924 injection Substances 0.000 claims abstract description 66
- 229940079593 drug Drugs 0.000 claims abstract description 23
- 230000007246 mechanism Effects 0.000 claims abstract description 16
- 238000002156 mixing Methods 0.000 claims abstract description 6
- 239000000126 substance Substances 0.000 claims description 34
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 6
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- -1 polytetrafluoroethylene Polymers 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 7
- 238000001514 detection method Methods 0.000 description 21
- 239000010453 quartz Substances 0.000 description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 19
- 239000000243 solution Substances 0.000 description 12
- 235000012431 wafers Nutrition 0.000 description 10
- 238000003860 storage Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000010327 methods by industry Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
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Abstract
The utility model discloses a semiconductor cleaning tank and a semiconductor cleaning device, wherein the cleaning tank comprises: the cleaning process tank is internally provided with an inner tank and an outer tank which are isolated from each other, the cleaning process tank is provided with a plurality of liquid medicine injection pipelines extending to the inner tank, and the liquid medicine injection pipelines are used for respectively injecting different cleaning liquid medicines into the inner tank; the weighing mechanism is arranged at the bottom of the cleaning process tank and is used for measuring the weight of each cleaning liquid medicine injected into the cleaning process tank; the liquid medicine circulation pipeline is communicated with the inner tank and the outer tank and is used for mixing different cleaning liquid medicines injected into the cleaning process tank. The utility model can realize the accurate proportioning of the process liquid medicine and enhance the wafer cleaning effect.
Description
Technical Field
The utility model belongs to the field of semiconductor equipment, and particularly relates to a semiconductor cleaning tank and semiconductor cleaning equipment.
Background
Along with the continuous improvement of the wafer process, as an important ring in the wafer process, the requirements for the cleaning process are also continuously improved. The groove type wet process equipment widely applied to the processes of batch wafer wet cleaning, etching, photoresist removing and the like in the field of integrated circuits is also required to be continuously updated, and the performance of the groove type wet process equipment is continuously improved so as to ensure increasingly strong market competition.
At present, different liquid medicines are proportioned according to the technological requirements in a cleaning process tank by tank type wet equipment so as to clean wafers, and a liquid level detection system is adopted to measure the volume of the injected liquid medicines when the process liquid medicines are proportioned in the current cleaning process tank, but the liquid level calibrated by the liquid level detection system belongs to rough positioning, so that the actual liquid medicine proportion is deviated, the liquid medicine proportioning precision is influenced, and the wafer cleaning effect is poor.
Disclosure of utility model
The utility model aims to provide a semiconductor cleaning tank and semiconductor cleaning equipment, which realize accurate proportioning of process liquid medicine and enhance the cleaning effect of a wafer.
To achieve the above object, a first aspect of the present utility model provides a semiconductor cleaning tank, comprising:
The cleaning process tank is internally provided with an inner tank and an outer tank which are isolated from each other, the cleaning process tank is provided with a plurality of liquid medicine injection pipelines extending to the inner tank, and the liquid medicine injection pipelines are used for respectively injecting different cleaning liquid medicines into the inner tank;
The weighing mechanism is arranged at the bottom of the cleaning process tank and is used for measuring the weight of each cleaning liquid injected into the cleaning process tank;
The liquid medicine circulation pipeline is communicated with the inner tank and the outer tank and is used for mixing different cleaning liquid medicines injected into the cleaning process tank.
Optionally, the liquid medicine circulation pipeline comprises an inner tank circulation pipeline, an outer tank circulation pipeline and a circulation pump;
One end of the inner groove circulating pipeline is communicated with the bottom of the inner groove, the other end of the inner groove circulating pipeline is connected with a water outlet port of the circulating pump, one end of the outer groove circulating pipeline is communicated with the bottom of the outer groove, and the other end of the outer groove circulating pipeline is connected with a water inlet port of the circulating pump;
Optionally, a first stop valve is arranged at one end of the inner tank circulation pipeline, which is close to the bottom of the inner tank, and a second stop valve is arranged at one end of the outer tank circulation pipeline, which is close to the bottom of the outer tank.
Optionally, a plurality of liquid medicine injection pipelines are respectively provided with a liquid medicine concentration measuring part, and the liquid medicine concentration measuring parts are used for measuring the concentration of the cleaning liquid medicine in the corresponding liquid medicine injection pipelines.
Optionally, the weighing mechanism includes two scales, two scales set up respectively in the both ends of cleaning process groove bottom, two be equipped with the interval region between the scales, the interval region exposes the partial bottom surface of cleaning process groove.
Optionally, the weighing device comprises a shell, wherein a weighing control unit and a weighing sensor are arranged in the shell, and a weighing plane is arranged on the weighing sensor;
The bottom surfaces of the two ends of the cleaning process groove are respectively erected on the weighing planes of the two weighing devices.
Optionally, the scale further comprises a fixed bracket, and the fixed bracket is arranged on the weighing plane;
the bottoms of the two ends of the cleaning process groove are respectively embedded into the fixed brackets of the two weighing devices.
Optionally, the weighing plane is rectangular, and the section of the cleaning process tank in the horizontal direction is rectangular;
The fixed support comprises a first side plate, a second side plate and a third side plate which are longitudinally arranged, the first side plate and the second side plate are oppositely arranged at the edges of the two ends of the weighing plane, the third side plate is arranged at the edge of one side of the weighing plane, and the two ends of the third side plate are respectively connected with the first side plate and the second side plate;
The bottom of the cleaning process groove is embedded in the fixing support and is in interference fit with the fixing support.
Optionally, the material of the shell and the fixing bracket is polytetrafluoroethylene.
A second aspect of the present utility model proposes a semiconductor cleaning apparatus comprising the semiconductor cleaning tank according to any one of the first aspects.
The utility model has the beneficial effects that:
According to the semiconductor cleaning tank disclosed by the utility model, the weighing mechanism is arranged at the bottom of the cleaning process tank, the weight of various cleaning liquid medicines injected into the cleaning process tank can be accurately measured through the weighing mechanism, and the accurate proportioning of different liquid medicines according to the weight is realized, so that the proportion of the final mixed liquid medicines is ensured to meet the process requirements, the cleaning effect of a wafer is enhanced, and the yield of the wafer process is improved.
Furthermore, the stop valves are respectively arranged at one ends of the inner tank circulation pipeline and the outer tank circulation pipeline, which are close to the bottom of the inner tank, so that the liquid medicine injected into the process tank can be prevented from flowing into the circulation pipeline, and the liquid medicine quantity error caused by liquid storage of the circulation pipeline is reduced; meanwhile, the corresponding liquid medicine concentration measuring parts are respectively arranged on the liquid medicine injection pipelines of the cleaning tank, so that the concentration of each injected liquid medicine can be monitored in real time, and further the cleaning process is ensured not to be reduced due to the fluctuation error of the liquid medicine concentration.
The system of the present utility model has other features and advantages which will be apparent from or are set forth in detail in the accompanying drawings and the following detailed description, which are incorporated herein, and which together serve to explain certain principles of the utility model.
Drawings
The foregoing and other objects, features and advantages of the utility model will be apparent from the following more particular descriptions of exemplary embodiments of the utility model as illustrated in the accompanying drawings wherein like reference numbers generally represent like parts throughout the exemplary embodiments of the utility model.
Fig. 1 shows a schematic diagram of a process tank and a chemical solution proportioning mechanism of a conventional tank type cleaning machine.
Fig. 2 to 5 are schematic diagrams showing a process tank of a conventional tank type cleaning machine for carrying out a chemical solution proportioning process.
Fig. 6 shows a schematic structural view of a semiconductor cleaning tank of embodiment 1.
Fig. 7 and 8 show a front view and a top view, respectively, of a scale in a semiconductor cleaning tank of embodiment 1.
Fig. 9 to 13 are schematic diagrams showing a chemical matching process performed by the semiconductor cleaning tank of example 1.
Detailed Description
The technological tank and the liquid medicine proportioning mechanism of the conventional seed tank type cleaning machine are shown in figure 1, and comprise a Chem A liquid medicine injection pipeline 1, a Chem B liquid medicine injection pipeline 2, a Chem C liquid medicine injection pipeline 3, a Chem A liquid medicine liquid level detection system 4, a Chem B liquid medicine liquid level detection system 5, a Chem C liquid medicine liquid level detection system 6, a technological tank quartz inner tank 7 and a technological tank quartz outer tank 8; a process tank bracket 9, an inner tank circulation pipeline 10, an outer tank circulation pipeline 11 and a circulation pump 12.
The technological liquid medicine is prepared by the following principle: assume Chem a: chem B: the proportion of the three liquid medicines of Chem C is a: b: and c, the total volume of the process quartz tank is V. Therefore, the total injection amount of Chem A liquid medicine is Va=a/(a+b+c) x V, the total injection amount of Chem B liquid medicine is vb=b/(a+b+c) x V, the total injection amount of Chem C liquid medicine is Vc=c/(a+b+c) x V, the detection position of the liquid medicine liquid level detection system is calibrated at the corresponding height position of the process quartz tank according to the volume of each liquid medicine (the section of the quartz tank inner tank and the section of the quartz tank outer tank are approximately rectangular, and three liquid medicine injection amounts can be roughly calibrated by means of the height), therefore, when the liquid medicine is injected to the corresponding height position, the liquid level detection system can be triggered to stop injecting liquid medicine, and finally, after the three liquid medicine injection is completed, the circulating pump is started to mix, and finally, the mixed liquid medicine is obtained for subsequent processes.
The liquid medicine proportioning process is as follows:
As shown in fig. 2, chem a liquid medicine injection stage: the module is used for injecting liquid into the quartz inner groove 7 of the process groove through the CHEM A liquid medicine injection pipeline 1 until the liquid level reaches the liquid level height calibrated by the CHEM A liquid medicine liquid level detection system 4, the module stops injecting liquid, and the CHEM A liquid medicine injection is completed.
As shown in fig. 3, chem B liquid medicine injection stage: the module is used for injecting liquid into the quartz inner groove 7 of the process groove through the CHEM B liquid medicine injection pipeline 2 until the liquid level reaches the liquid level height calibrated by the CHEM B liquid medicine liquid level detection system, the module stops injecting liquid, and the CHEM B liquid medicine injection is completed.
As shown in fig. 4, chem C liquid medicine injection stage: the module is used for injecting liquid into the quartz inner groove 7 of the process groove through the liquid medicine injection pipeline 3 with the sequence number of 3CHEM C, after the process quartz inner groove 7 is filled, the liquid medicine flows into the process quartz outer groove 8 until the liquid level reaches the liquid level height calibrated by the liquid level detection system 6 of the CHEM C, the injection of the liquid medicine is stopped by the module, and the injection of the chemical liquid medicine of the Chem C is completed.
As shown in fig. 5, the mixing and proportioning stage: after the injection of the liquid medicine is completed, the circulating pump is started, the liquid medicine is extracted from the process quartz outer tank and injected into the quartz process inner tank 7, and in the process, the three liquid medicines can be fully mixed.
The existing tank type cleaning machine liquid medicine proportioning mechanism has the following problems:
1. The injection quantity of the three liquid medicines completely depends on the calibration of a liquid level detection system, the calibration position of the liquid level detection system is rough positioning, and the proportion of the actual liquid medicines is deviated;
2. Because the circulation pipeline is connected with the process quartz tank, when the liquid medicine is injected, part of the liquid medicine can enter the circulation pipeline, and the part of the liquid medicine cannot be measured, for example, when the Chem A liquid medicine is injected, part of the Chem A liquid medicine can enter the inner tank circulation pipeline 10, when the Chem A liquid medicine reaches the calibrated liquid level of the Chem A liquid medicine liquid level detection system 4, the actual injection amount of the Chem A liquid medicine is larger than the required liquid medicine amount, and when the Chem C liquid medicine is injected, part of the Chem C liquid medicine can enter the outer tank circulation pipeline 11, and when the Chem C liquid medicine reaches the calibrated liquid level of the Chem C liquid medicine liquid level detection system 6, the actual injection amount of the Chem C liquid medicine is larger than the required liquid medicine amount, so that the Chem A liquid medicine amount and the Chem C liquid medicine amount in the three liquid medicine are larger than the theoretical values, and the mixed liquid medicine ratio has errors.
The utility model provides a semiconductor cleaning tank and semiconductor cleaning equipment, which can determine the injection quantity of liquid medicine in a more accurate metering mode (relative mass), reduce the liquid medicine proportion error caused by a detection mode, and reduce the liquid medicine quantity error caused by the liquid storage of a circulating pipeline by improving the connection mode of a process quartz tank and the circulating pipeline.
The utility model will be described in more detail below with reference to the accompanying drawings. While the preferred embodiments of the present utility model are illustrated in the drawings, it should be understood that the present utility model may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the utility model to those skilled in the art.
Example 1
As shown in fig. 6, a semiconductor cleaning tank includes:
A cleaning process tank 102, wherein an inner tank 103 and an outer tank 104 which are isolated from each other are arranged in the cleaning process tank 102, a plurality of liquid medicine injection pipelines extending to the inner tank 103 are arranged on the cleaning process tank 102, and the liquid medicine injection pipelines are used for respectively injecting different cleaning liquid medicines into the inner tank 103;
The weighing mechanism is arranged at the bottom of the cleaning process tank 102 and is used for measuring the weight of each cleaning liquid medicine injected into the cleaning process tank 102;
And the liquid medicine circulation pipeline is communicated with the inner tank 103 and the outer tank 104 and is used for mixing different cleaning liquid medicines injected into the cleaning process tank 102.
Compared with the prior rough measurement mode of determining the injection quantity of the liquid medicine by adopting liquid level detection, the method adopts a more accurate weight proportioning mode, and the weighing mechanism is arranged at the bottom of the cleaning process tank, so that the weight of each cleaning liquid medicine injected into the cleaning process tank can be accurately measured by the weighing mechanism, and the accurate proportioning of different liquid medicines according to the weight is realized, thereby ensuring that the proportion of the finally mixed liquid medicine meets the process requirements.
The embodiment also comprises a process tank bracket 101, a cleaning process tank 102 is arranged on the process tank bracket 101, and a weighing mechanism is arranged between the bottom of the cleaning process tank 102 and the process tank bracket 101.
In this embodiment, the liquid medicine circulation pipeline includes an inner tank circulation pipeline 105, an outer tank circulation pipeline 106 and a circulation pump 107;
One end of the inner tank circulation pipeline 105 is communicated with the bottom of the inner tank 103, the other end of the inner tank circulation pipeline 105 is connected to an outlet of the circulation pump 107, one end of the outer tank circulation pipeline 106 is communicated with the bottom of the outer tank 104, and the other end of the outer tank circulation pipeline 106 is connected to an inlet of the circulation pump 107.
In this embodiment, a first stop valve 108 is disposed at an end of the inner tank circulation line 105 near the bottom of the inner tank 103, and a second stop valve 109 is disposed at an end of the outer tank circulation line 106 near the bottom of the outer tank 104. Preferably, the first shut-off valve 108 and the second shut-off valve 109 are both anti-corrosive pneumatic diaphragm valves.
The stop valves are respectively arranged at the ends of the inner tank circulation pipeline 105 and the outer tank circulation pipeline 106, which are close to the bottom of the inner tank 103, so that the liquid medicine injected into the process tank can be prevented from flowing into the circulation pipeline, and the liquid medicine quantity error caused by the liquid storage of the circulation pipeline is reduced.
In this embodiment, a plurality of the liquid medicine injection pipelines are respectively provided with a liquid medicine concentration measuring member, and the liquid medicine concentration measuring members are used for measuring the concentration of the cleaning liquid medicine in the corresponding liquid medicine injection pipeline. Preferably, the chemical concentration measuring member is a chemical concentration detector.
Specifically, the plurality of liquid medicine injection pipelines in the present embodiment include a first liquid medicine injection pipeline 111, a second liquid medicine injection pipeline 112 and a third liquid medicine injection pipeline 113, and correspondingly, the first liquid medicine injection pipeline 111 is provided with a first liquid medicine concentration detecting member 114, the second liquid medicine injection pipeline 112 is provided with a second liquid medicine concentration detecting member 115, and the third liquid medicine injection pipeline 113 is provided with a third liquid medicine concentration detecting member 116. Wherein, the first liquid medicine injection pipeline 111 is used for injecting the CHEM A liquid medicine, and the first liquid medicine concentration detection part 114 is used for detecting the concentration of the CHEM A liquid medicine in real time; the second chemical liquid injection pipeline 112 is used for injecting the chemical liquid of the CHEM B, and the second chemical liquid concentration detection part 115 is used for detecting the concentration of the chemical liquid of the CHEM B in real time; the third liquid medicine injection line 113 is used for injecting the CHEM C liquid medicine, the third chemical concentration detecting member 116 is used for detecting the concentration of the CHEM C chemical in real time. The concentration of each injected liquid medicine can be detected in real time through each liquid medicine concentration detection part, so that the cleaning process is guaranteed not to be reduced due to the fluctuation error of the liquid medicine concentration.
Preferably, in this embodiment, the weighing mechanism includes two scales 110, two scales 110 are respectively disposed at two ends of the bottom of the cleaning process tank 102, a spacing area is disposed between two scales 110, and the spacing area exposes the middle pressure area of the bottom of the cleaning process tank 102.
As shown in fig. 7 and 8, the scale 110 includes a housing 201, a weighing control unit 203 and a weighing sensor 202 are disposed in the housing 201, and a weighing plane 204 is disposed on the weighing sensor 202; the bottom surfaces of the two ends of the cleaning process tank 102 are respectively arranged on the weighing planes 204 of the two weighing machines 110.
Specifically, the structure and principle of the weighing device 110 are basically consistent with those of the existing electronic scale, namely, a weighing control unit 203 and a weighing sensor 202 are arranged in a shell, wherein the weighing sensor 202 can be a stress sensor, the bottom end of the weighing sensor 202 is fixed at the bottom of the shell 201, the top end of the stress sensor is in contact with the bottom surface of a weighing plane 204, when the weighing plane 204 bears load, the weighing sensor 202 can sense the pressure borne by the weighing plane 204 and convert the pressure into an electric signal to be output to the weighing control unit 203, and the weighing control unit 203 arranged in the shell 201 converts the electric signal into a weight value and transmits the weight value to a control system interface to be displayed.
In this embodiment, the scale 110 further includes a fixing bracket 205, where the fixing bracket 205 is disposed on the weighing plane 204; the bottoms of the two ends of the cleaning process tank 102 are respectively embedded in the fixing brackets 205 of the two scales 110.
The weighing plane 204 is rectangular, and the section of the cleaning process tank 102 along the horizontal direction is rectangular; the area of the weighing plane 204 corresponds to the area of the bottom surface of the portion of the cleaning process tank 102 that is embedded in the fixed support 205, and to ensure that the two scale 110 supports have sufficient spacing, the area of the weighing plane 204 should be less than 50% of the area of the bottom surface of the cleaning process tank 102.
The cross section of the whole fixing support 205 is 匚, and the fixing support comprises a first side plate, a second side plate and a third side plate, wherein the first side plate, the second side plate and the third side plate are perpendicular to the weighing plane 204, the first side plate and the second side plate are oppositely arranged at the edges of the two ends of the weighing plane 204, the third side plate is arranged at the edge of one side of the weighing plane 204, and the two ends of the third side plate are respectively connected with the first side plate and the second side plate; the portion of the bottom of the cleaning process tank 102 embedded in the fixing support 205 is in interference fit with the fixing support 205.
Preferably, the material of the housing 201 and the fixing bracket 205 is Polytetrafluoroethylene (PTFE).
Specifically, scale 110 is preferably a high precision corrosion resistant scale, housing 201 is a corrosion resistant PTFE material housing 201, and a seal design is employed. The inner diameter of the fixing support 205 (the distance between the first side plate and the second side plate) is slightly smaller than the width of the corresponding part of the sleeved cleaning process groove 102, and meanwhile, the fixing support 205 is made of PTFE material and has self-wettability and softer texture, so that when the bottom of the cleaning process groove 102 is arranged in the two fixing supports 205, two ends of the bottom of the quartz cleaning process groove 102 can be smoothly embedded into the fixing supports 205 and fixed with the fixing supports 205 in an interference fit manner, and the mounting and dismounting can be ensured, and the relative movement of the two can be prevented.
It should be noted that, in order to ensure measurement accuracy, the number of scales 110 needs to be as small as possible, but if a single scale is used, in order to ensure the fixed support for cleaning the process tank, the corresponding fixing support should be a closed structure including four side walls, i.e. the cross section of the fixing support is rectangular, and the fixing support structure can cause that acid mist emitted from the process quartz tank cannot be effectively discharged from the acid solution formed by condensation on the inner wall of the fixing support of the scale, resulting in liquid collection. Therefore, the weighing mechanism in this embodiment uses two weighing devices 110 in total, and the weighing devices 110 are arranged at two ends of the bottom of the cleaning process tank 102, and the two weighing devices 110 are used to support the two ends of the bottom of the cleaning process tank, so that the above-mentioned fixed support structure with a semi-enclosed structure including three side walls can be adopted, and the space area formed between the two weighing devices 110 can be convenient for discharging the acid solution formed by condensation, thereby avoiding the above-mentioned effusion problem. And the two scales 110 are convenient to install, replace, maintain and debug, and related work can be performed without dismantling the quartz tank.
The cleaning process tank 102 is received by the weighing planes 204 of the two scales 110, and the weighing cells 202 of the scales 110 detect the mass of the cleaning process tank 102 and measure it by the control unit of the scales 110.
The precise proportioning principle of the process liquid medicine of the semiconductor cleaning tank in the embodiment is as follows:
Assume Chem a: chem B: the proportion of the three liquid medicines of Chem C is a: b: and c, the total amount of the required liquid medicine is M. The total mass of the quartz tank of the process when liquid injection is not carried out is M Groove(s) . When Chem A liquid medicine is injected, the Chem A liquid medicine concentration detector detects that the liquid medicine concentration is CM a (whether the liquid medicine concentration is in error with the process requirement or not is detected through the data, the process quality is ensured), and the total mass of the cleaning process tank 102 and the liquid medicine is M a. The concentrations of Chem B and Chem C injected in the same way were CM b/CMc and the total mass was M a+b/Ma+b+c, respectively. Therefore, the total injection amount of Chem a liquid medicine is M a-M Groove(s) =a/(a+b+c) ×m. The total injection amount of Chem B liquid medicine is M a+b-Ma =b/(a+b+c) x M, the total injection amount of Chem C liquid medicine is M a+b+c-Ma+b =c/(a+b+c) x M, the injection amount of each liquid medicine is the accurate mass of the liquid medicine, after the injection of three liquid medicines is finished finally, two stop valves are opened, the circulating pump 107 is started to operate and mix subsequently, a process tank structure with an inner tank structure and an outer tank structure is adopted, complete circulation can be formed, the liquid medicine is circulated more thoroughly, the mixed liquid medicine is more uniform, and the circulation process is as follows: the circulation pump 107 pumps the chemical liquid in the outer tank 104 into the inner tank 103, the chemical liquid in the inner tank 103 overflows from the top to the outer tank 104, and the circulation process is repeated, so that the mixed chemical liquid is finally obtained for subsequent processes.
The specific liquid medicine proportioning flow is as follows:
As shown in fig. 9, chem a liquid medicine injection stage: the first chemical solution injection line 111 injects the chemical solution into the inner tank 103 of the process tank, and the first chemical solution concentration detector 114 detects whether the CHEM a chemical solution concentration CM a is normal. Until the weighing machine 110 detects that the quality of the chemical liquid injected into the CHEM a meets the requirement of M a-M Groove(s) = a/(a+b+c) x M, stopping the injection of the chemical liquid, and completing the injection of the chemical liquid of CHEM a.
As shown in fig. 10, chem B liquid medicine injection stage: the inner tank 103 of the process tank is filled with liquid through the second liquid medicine filling pipe 112, and at the same time, the second liquid medicine concentration detector detects whether the CHEM B liquid medicine concentration CM b is normal. Until the weighing device 110 detects that the quality of the injected CHEM B liquid medicine meets the requirement of M a+b-Ma =b/(a+b+c) x M, stopping the liquid injection, and completing the CHEM B liquid medicine injection.
As shown in fig. 11, chem C liquid medicine injection stage: the third chemical solution is injected into the inner tank 103 of the process tank through the third chemical solution injection line 113, and the third chemical solution concentration detector detects whether the CHEM C chemical solution concentration CM c is normal. When the inner tank 103 is full, the chemical liquid flows into the outer tank 104 of the process tank until the scale 110 detects that the quality of the chemical liquid injected into CHEM C meets the requirements of M a+b+c-Ma+b =c/(a+b+c) x M, the chemical liquid injection is stopped, and the chemical liquid injection into CHEM C is completed.
As shown in fig. 12 and 13, the mixing ratio stage: after the injection of the liquid medicine is completed, the first stop valve 108 on the inner tank circulation pipeline 105 and the second stop valve 109 on the outer tank circulation pipeline 106 are opened, the liquid medicine enters the circulation pipeline, then the circulation pump 107 is started after 5-10 seconds, the liquid medicine is extracted from the outer tank 104 and injected into the inner tank 103, and in the process, the three liquid medicines can be fully mixed.
In summary, the semiconductor cleaning tank of the embodiment can accurately measure the injection amount of the liquid medicine through the high-precision anti-corrosion weighing device, and reduce the liquid medicine proportion error caused by rough detection, so that the process liquid medicine proportion meets the process requirements better, and the cleaning effect is improved; meanwhile, the pneumatic diaphragm valve is added to the circulating pipeline to prevent liquid medicine amount errors caused by liquid storage of the circulating pipeline, so that each liquid medicine amount in the process engineering meets theoretical requirements; the concentration of the injected liquid medicine can be detected in real time through the added liquid medicine concentration detector, so that the cleaning effect of the cleaning process is ensured not to be reduced due to the fluctuation error of the liquid medicine concentration.
Example 2
The present embodiment proposes a semiconductor cleaning apparatus including the semiconductor cleaning tank of embodiment 1.
The semiconductor cleaning device of this embodiment is a tank wet cleaning device, and since the semiconductor cleaning tank of embodiment 1 is used to accurately mix various process liquid medicines, the wafer cleaning effect is enhanced, and the wafer process yield is improved.
The foregoing description of embodiments of the utility model has been presented for purposes of illustration and description, and is not intended to be exhaustive or limited to the embodiments disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the various embodiments described.
Claims (10)
1. A semiconductor cleaning tank, comprising:
The cleaning process tank is internally provided with an inner tank and an outer tank which are isolated from each other, the cleaning process tank is provided with a plurality of liquid medicine injection pipelines extending to the inner tank, and the liquid medicine injection pipelines are used for respectively injecting different cleaning liquid medicines into the inner tank;
The weighing mechanism is arranged at the bottom of the cleaning process tank and is used for measuring the weight of each cleaning liquid injected into the cleaning process tank;
The liquid medicine circulation pipeline is communicated with the inner tank and the outer tank and is used for mixing different cleaning liquid medicines injected into the cleaning process tank.
2. The semiconductor cleaning tank of claim 1, wherein the chemical circulation line comprises an inner tank circulation line, an outer tank circulation line, and a circulation pump;
One end of the inner groove circulating pipeline is communicated with the bottom of the inner groove, the other end of the inner groove circulating pipeline is connected to the outlet of the circulating pump, one end of the outer groove circulating pipeline is communicated with the bottom of the outer groove, and the other end of the outer groove circulating pipeline is connected to the inlet of the circulating pump.
3. The semiconductor cleaning tank according to claim 2, wherein a first shut-off valve is provided at an end of the inner tank circulation line near the bottom of the inner tank, and a second shut-off valve is provided at an end of the outer tank circulation line near the bottom of the outer tank.
4. The semiconductor cleaning tank according to claim 1, wherein a plurality of the liquid chemical filling lines are provided with liquid chemical concentration measuring members, respectively, for measuring the concentration of the cleaning liquid in the corresponding liquid chemical filling line.
5. The semiconductor cleaning tank of claim 1, wherein the weighing mechanism comprises two scales, the two scales are respectively arranged at two ends of the bottom of the cleaning process tank, a spacing area is arranged between the two scales, and the spacing area exposes a central area of the bottom of the cleaning process tank.
6. The semiconductor cleaning tank of claim 5, wherein the scale comprises a housing, a weighing control unit and a weighing sensor are arranged in the housing, and a weighing plane is arranged on the weighing sensor;
The bottom surfaces of the two ends of the cleaning process groove are respectively erected on the weighing planes of the two weighing devices.
7. The semiconductor cleaning tank of claim 6, wherein the scale further comprises a fixed support, the fixed support being disposed on the weighing plane;
the bottoms of the two ends of the cleaning process groove are respectively embedded into the fixed brackets of the two weighing devices.
8. The semiconductor cleaning tank of claim 7, wherein the weighing plane is rectangular, and the cleaning process tank is rectangular in cross section in a horizontal direction;
The fixed support comprises a first side plate, a second side plate and a third side plate which are perpendicular to the weighing plane, the first side plate and the second side plate are oppositely arranged at the edges of the two ends of the weighing plane, the third side plate is arranged at the edge of one side of the weighing plane, and the two ends of the third side plate are respectively connected with the first side plate and the second side plate;
The bottom of the cleaning process groove is embedded in the fixing support and is in interference fit with the fixing support.
9. The semiconductor cleaning tank of claim 7, wherein the material of the housing and the fixing bracket is polytetrafluoroethylene.
10. A semiconductor cleaning apparatus comprising the semiconductor cleaning tank of any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322171792.6U CN220970269U (en) | 2023-08-11 | 2023-08-11 | Semiconductor cleaning tank and semiconductor cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322171792.6U CN220970269U (en) | 2023-08-11 | 2023-08-11 | Semiconductor cleaning tank and semiconductor cleaning equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220970269U true CN220970269U (en) | 2024-05-17 |
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