CN220381449U - Exposure apparatus - Google Patents

Abstract

The application provides an exposure device relates to the field of photovoltaic manufacture. The exposure device comprises a conveying component, a mask plate and an exposure component. The conveying assembly is provided with a bearing surface for conveying the substrate along the conveying path, and the bearing surface is provided with a plurality of adsorption components which are used for adsorbing the substrate; the mask plate is provided with a mask plate pattern, and the relative position and the relative angle between the mask plate and the conveying assembly are adjustable; the exposure assembly is located one side that the mask deviates from the conveying assembly, and the exposure assembly is configured to keep unchanged with the relative position between the conveying assembly under the running state of the exposure assembly, and the exposure assembly is used for transferring the mask pattern on one side of the substrate deviating from the adsorption component, so that the technical problems of long exposure time and low transfer efficiency of the existing substrate can be improved.

Description

Exposure apparatus

Technical Field

The present application relates to the field of photovoltaic manufacturing, and in particular, to an exposure apparatus.

Background

In the preparation process of the solar cell, the patterning scheme of the copper electroplating technology mainly takes exposure as a main part, the battery piece to be printed is firstly placed on a printing platform by the current patterning technical scheme, the offset angle and the position of the battery piece are identified by a positioning camera, then the platform is finely adjusted by an internal algorithm, finally the moving platform moves to the lower part of a laser printing lens to expose, the pattern is transferred onto a silicon wafer by a mask, the printing of one battery piece is completed, the whole process is long in time consumption, the transfer efficiency is low, and the requirement of large-scale production of the solar cell is not met.

Disclosure of Invention

An object of the embodiments of the present application is to provide an exposure apparatus, which can solve the technical problems of longer exposure time and low transfer efficiency of the existing substrate.

The embodiment of the application provides an exposure device, which comprises a conveying component, a mask plate and an exposure component.

The conveying assembly is provided with a bearing surface for conveying the substrate along the conveying path, and the bearing surface is provided with a plurality of adsorption components which are used for adsorbing the substrate; the mask plate is provided with a mask plate pattern, and the relative position and the relative angle between the mask plate and the conveying assembly are adjustable; the exposure assembly is located one side of mask plate deviating from the conveying assembly, the relative position between the exposure assembly and the conveying assembly is kept unchanged under the operation state of the exposure assembly, and the exposure assembly is used for transferring the mask plate pattern to one side of the substrate deviating from the adsorption component.

In the implementation process, the conveying assembly is utilized to continuously convey a plurality of substrates along the conveying path, so that the continuity of substrate conveying is realized, the substrates possibly shift but shift slightly in the conveying process, therefore, in the operation process of the exposure assembly, the positions of the mask and the substrates to be exposed can be quickly calibrated only by adjusting the positions and angles of the mask through the relative positions of the conveying assembly and the exposure assembly, the mask pattern is transferred onto the substrates by the exposure assembly after calibration, the continuity of substrate conveying and transferring is realized, and the working efficiency is effectively improved.

In one possible embodiment, the transfer assembly has a target position corresponding to the exposure assembly, with the substrate transported to the target position as a target substrate; the exposure device includes: the alignment camera is configured to photograph the mask plate and the target substrate before exposing the target substrate and obtain photographing data, and the mask plate is configured to adjust and calibrate the center position and angle of the mask plate relative to the target substrate according to the photographing data.

In the implementation process, the mask plate and the target substrate are photographed by using the alignment camera and photographic data are obtained, so that the relative positions and angles of the mask plate and the target substrate are determined, then the mask plate is configured to adjust and calibrate the center positions and angles of the mask plate relative to the target substrate according to the photographic data until the angles and the center positions of the mask plate and the target substrate coincide to complete calibration, the transfer printing accuracy is realized, and the mass production is met.

In one possible embodiment, the reticle and the substrate are rectangular, and the number of alignment cameras is two, and the two alignment cameras are arranged along the intersection line of the reticle.

In the implementation process, since the mask plate and the substrate are rectangular, the mask plate and the substrate are provided with four edges, at the moment, two alignment cameras are utilized to be arranged along the alignment line of the mask plate, and each alignment camera can accurately obtain the central position and the angle offset of the two adjacent edges of the mask plate and the edge of the substrate, the setting is simple, the exposure accuracy is improved, and the product yield is improved.

In one possible embodiment, the exposure apparatus further comprises a sensor configured to monitor whether the transfer assembly has a target substrate attached to the target location prior to photographing with the alignment camera, and the alignment camera is configured to photograph the reticle and the target substrate after the target location has the target substrate attached thereto.

In the implementation process, the setting of the sensor is utilized, the target substrate can be adsorbed on the target position of the conveying component, the mask plate and the target substrate can be photographed by the alignment camera, the subsequent calibration and exposure are carried out, and when the target substrate is not adsorbed on the target position, the subsequent operation is not carried out, so that the energy consumption is saved, and the accurate, automatic and continuous transfer printing operation of the exposure device is realized.

In one possible embodiment, the reticle is positioned below the transfer assembly.

In the implementation process, the printing is performed in a mode of from bottom to top, so that the operation is convenient.

In one possible embodiment, the conveyor assembly includes a conveyor belt having a bearing surface and a stepper drive mechanism drivingly connected to the conveyor belt to drive the conveyor belt for stepwise movement.

In the implementation process, the substrates are conveyed in a stepping moving mode, so that each substrate has enough time to calibrate and expose before and after exposure by controlling the stepping rate, the mask pattern is accurately and continuously transferred on the substrate, and the transfer efficiency is improved.

In one possible embodiment, the adsorbent member is a vacuum adsorption port opened in the bearing surface.

In the implementation process, the vacuum adsorption holes are arranged, so that the substrate is prevented from being damaged in the conveying process, the substrate can be kept relatively static with the bearing surface under the action of vacuum adsorption force in the transfer printing process, the transfer printing stability is improved, and the transfer printing quality is improved.

In one possible embodiment, the exposure apparatus includes: the first driving mechanism is in transmission connection with the mask plate and is used for driving the mask plate to translate; the second driving mechanism is in transmission connection with the mask plate and is used for driving the mask plate to rotate.

In the implementation process, the mask plate is configured to be adjustable in relative position and relative angle with the conveying assembly on the plane by utilizing the cooperation of the first driving mechanism and the second driving mechanism.

In one possible embodiment, the exposure apparatus further includes: and the third driving mechanism is in transmission connection with the mask plate and is used for driving the mask plate to lift.

In the implementation process, the third driving mechanism is used for realizing that the relative distance between the mask plate and the conveying assembly in the height direction is adjustable.

In one possible embodiment, the substrate is a battery plate.

In the implementation process, the substrate is used as a battery piece, and the patterning of the copper electroplating technology is realized in the preparation process of the solar battery.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the embodiments will be briefly described below, it being understood that the following drawings only illustrate some embodiments of the present application and therefore should not be considered limiting the scope, and that other related drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

FIG. 1 is a schematic view of an exposure apparatus according to the present disclosure at a first view angle;

fig. 2 is a schematic structural diagram of a second view angle of the exposure apparatus provided in the present application.

Icon: 1000-an exposure device; 10-a transfer assembly; 100-conveyor belt; 101-a bearing surface; 20-masking plate; 200-a first drive mechanism; 210-a second drive mechanism; 220-a third drive mechanism; 30-an exposure assembly; 300-printing a laser head; 310-fourth drive mechanism; 40-feeding mechanism; 50, a correction mechanism; 60-a discharging mechanism; 70-aligning the camera; 80-substrate.

Detailed Description

For the purposes of making the objects, technical solutions and advantages of the embodiments of the present application more clear, the technical solutions of the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is apparent that the described embodiments are some embodiments of the present application, but not all embodiments. The components of the embodiments of the present application, which are generally described and illustrated in the figures herein, may be arranged and designed in a wide variety of different configurations.

Thus, the following detailed description of the embodiments of the present application, as provided in the accompanying drawings, is not intended to limit the scope of the application, as claimed, but is merely representative of selected embodiments of the application. All other embodiments, which can be made by one of ordinary skill in the art based on the embodiments herein without making any inventive effort, are intended to be within the scope of the present application.

It should be noted that: like reference numerals and letters denote like items in the following figures, and thus once an item is defined in one figure, no further definition or explanation thereof is necessary in the following figures.

In the description of the present application, it should be noted that, directions or positional relationships indicated by terms such as "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., are directions or positional relationships based on those shown in the drawings, or are directions or positional relationships that are conventionally put in use of the product of the application, are merely for convenience of description of the present application and simplification of description, and are not indicative or implying that the apparatus or element to be referred to must have a specific direction, be configured and operated in a specific direction, and therefore should not be construed as limiting the present application. Furthermore, the terms "first," "second," "third," and the like are used merely to distinguish between descriptions and should not be construed as indicating or implying relative importance.

Furthermore, the terms "horizontal," "vertical," "overhang," and the like do not denote a requirement that the component be absolutely horizontal or overhang, but rather may be slightly inclined. As "horizontal" merely means that its direction is more horizontal than "vertical", and does not mean that the structure must be perfectly horizontal, but may be slightly inclined.

In the description of the present application, it should also be noted that, unless explicitly specified and limited otherwise, the terms "disposed," "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the terms in this application will be understood by those of ordinary skill in the art in a specific context.

Examples

Referring to fig. 1 and 2, the present application provides an exposure apparatus 1000 for transferring a pattern of a mask 20 onto a substrate 80 by using a mask and an exposure assembly 30 to complete printing of a substrate 80.

The substrate 80 may be selected according to practical requirements, and in this embodiment, the substrate 80 is a battery plate.

Referring to fig. 1 and 2, an exposure apparatus 1000 includes a transfer assembly 10, a mask 20, and an exposure assembly 30.

The transfer assembly 10 has a carrying surface 101 for conveying the substrate 80 along a conveying path, the carrying surface 101 being provided with a plurality of adsorbing members (not shown) for adsorbing the substrate 80; mask 20 has a mask 20 pattern, mask 20 being configured to be adjustable in relative position and relative angle to transfer assembly 10; the exposure assembly 30 is located on a side of the reticle 20 facing away from the transfer assembly 10, the exposure assembly 30 being configured to maintain a constant relative position with respect to the transfer assembly 10 in an operational state of the exposure assembly 30, the exposure assembly 30 being configured to transfer a pattern of the reticle 20 to a side of the substrate 80 facing away from the transfer assembly 10.

The relative position of the exposure module 30 configured to be in the operating state of the exposure module 30 and the transfer module 10 remains unchanged means that: since the position deviation correction aims at the position and the angle deviation generated for the XY plane, in the process of performing exposure by the operation of the exposure device 1000, the relative position between the exposure component 30 and the orthographic projection on the XY plane between the transmission component 10 is kept unchanged, the relative position between the exposure component 30 and the transmission component 10 in the Y direction is kept unchanged, and in the non-operation state, the relative position between the exposure component 30 and the transmission component 10 can be adjusted according to actual requirements, such as mounting and dismounting requirements.

It can be understood that, by using the fact that the plane position between the exposure module 30 and the transfer module 10 remains relatively unchanged during the operation process, and the mask 20 is configured to be set with an adjustable relative position and an adjustable relative angle with the transfer module 10, the relative position between the substrate 80 and the transfer module 10 is fixed during the production process because the substrate 80 is adsorbed on the transfer module 10, and the relative position between the exposure module 30 and the transfer module 10 is fixed, at this time, the calibration of the position and the angle between the mask 20 and the substrate 80 can be realized by adjusting the center position and the angle of the mask 20 relative to the transfer module 10, thereby improving the transfer accuracy.

In the above implementation process, the conveying assembly 10 is utilized to continuously convey the plurality of substrates 80 along the conveying path, so that the continuity of conveying the substrates 80 is realized, the substrates 80 may deviate but deviate less in the conveying process, therefore, the positions of the substrates 80 to be exposed can be quickly calibrated by only adjusting the positions and angles of the mask 20 through the relative positions of the conveying assembly 10 and the exposure assembly 30, the mask 20 is transferred onto the substrates 80 by adopting the exposure assembly 30 after calibration, the continuity of conveying and transferring the substrates 80 is realized, and the working efficiency is effectively improved.

The exposure apparatus 1000 further includes a feeding mechanism 40 located upstream of the transfer assembly 10, and a discharging mechanism 60 located downstream of the transfer assembly 10, with the upstream-to-downstream direction being the conveying direction (i.e., the X direction in fig. 1), wherein the feeding mechanism 40 is used to convey the substrate 80 to be transferred to the transfer assembly 10, and the discharging mechanism 60 is used to acquire the substrate 80 transferred on the transfer assembly 10. Wherein the exposure apparatus 1000 may further comprise a de-skew mechanism 50 positioned upstream and cooperating with the feed mechanism 40, the de-skew mechanism 50 being configured to de-skew the substrate 80 and to limit the transport of the substrate 80 to the transport assembly 10 substantially in a predetermined direction and angle.

The conveyor assembly 10 includes, but is not limited to, a belt or the like.

In this embodiment, the conveying assembly 10 includes a conveying belt 100 having a bearing surface 101, and a step-driving mechanism (not shown) drivingly connected to the conveying belt 100 to drive the conveying belt 100 to move stepwise.

The substrate 80 is conveyed in a stepping moving mode, so that each substrate 80 has enough time to calibrate and expose before and after exposure by controlling the stepping rate, accurate and continuous transfer printing of the pattern of the mask 20 on the substrate 80 is realized, and the transfer printing efficiency is improved.

The number of the conveyor belts 100 may be one, in this embodiment, the number of the conveyor belts 100 is multiple, the conveying direction of each conveyor belt 100 is consistent, multiple conveyor belts 100 are arranged at intervals in parallel, that is, gaps exist between two adjacent conveyor belts 100, the carrying area 101 of the conveying assembly 10 is increased by using the manner of arranging the multiple conveyor belts 100 at intervals in parallel, so as to realize stable conveying of the substrate 80, in order to further improve conveying stability and accuracy of the substrate 80, and in order to avoid damaging the substrate 80 during conveying, optionally, the conveyor belts 100 are belts, at this time, the conveying assembly 10 may further include a tensioning mechanism which is matched with each conveying assembly 10 and makes the conveyor belts 100 tensioned, and the tensioning mechanism may refer to related technology and will not be described herein.

The conveying assembly 10 includes a driving wheel (not shown) and a driven wheel (not shown) which are driven by a belt 100, and a step driving mechanism is connected with the driving wheel in a driving way.

The suction member is for sucking the substrate 80, and includes, but is not limited to, a suction cup provided on the carrying surface 101.

In some alternative embodiments, the adsorbent member is a vacuum adsorption port formed in the bearing surface 101.

By adopting the arrangement mode of the vacuum adsorption holes, the substrate 80 can be prevented from being damaged in the conveying process, the substrate 80 can be kept relatively static with the bearing surface 101 under the action of the vacuum adsorption force in the transfer printing process, the stability of transfer printing is improved, and the transfer printing quality is improved.

The aperture of the vacuum adsorption hole may be kept unchanged along the end of the vacuum adsorption hole facing away from the substrate 80 to the end of the vacuum adsorption hole near the substrate 80, or may be gradually increased along the end of the vacuum adsorption hole facing away from the substrate 80 to the end of the vacuum adsorption hole near the substrate 80, so as to increase the contact area and improve the adsorption stability.

It can be understood that, no matter the adsorption component is a vacuum adsorption hole or a sucker, the adsorption component is realized by utilizing a vacuum adsorption technology, that is, the adsorption component is required to be connected with a vacuum pumping device, and specific arrangement can refer to the related technology and is not described herein.

Reticle 20 patterns may be selected according to practical requirements, including but not limited to gate line patterns.

The fact that the mask 20 is configured to be adjustable in relative position and relative angle to the transfer assembly 10 means that the adjustment of the relative position and relative angle to the transfer assembly 10 is achieved by adjusting the position and angle of the mask 20.

Referring to fig. 1 and 2, the exposure apparatus 1000 includes: the first driving mechanism 200 and the second driving mechanism 210, wherein the first driving mechanism 200 is in transmission connection with the mask 20, and the first driving mechanism 200 is used for driving the mask 20 to translate; the second driving mechanism 210 is in transmission connection with the mask 20, and the second driving mechanism 210 is used for driving the mask 20 to rotate.

In the above implementation, the mask 20 is configured to be adjustable in relative position and relative angle to the conveying assembly 10 on a plane by using the cooperation of the first driving mechanism 200 and the second driving mechanism 210.

Specifically, the first driving mechanism 200 includes: the first motor, the second motor and the platform that are used for installing mask 20 are arranged along the X direction to the base, and second actuating mechanism 210 includes rotary platform and third motor.

The first screw rod mechanism is installed on the base, the second screw rod mechanism is connected with the first screw rod mechanism, the first motor is in transmission connection with the first screw rod mechanism to drive the second screw rod mechanism to linearly move along the X direction, the rotating platform is connected with the second screw rod mechanism through the rotating shaft, the second motor is connected with the second screw rod mechanism to drive the rotating platform to move along the Y direction, the third motor is in transmission connection with the rotating platform to drive the rotating platform to rotate along the rotating shaft, namely, the first driving mechanism 200 drives the mask plate 20 to translate along the XY plane.

The exposure apparatus 1000 further includes: and the third driving mechanism 220, the third driving mechanism 220 is in transmission connection with the mask 20, and the third driving mechanism 220 is used for driving the mask 20 to lift.

In the above implementation, the third driving mechanism 220 is used to implement that the relative distance between the mask plate 20 and the conveying assembly 10 in the height direction is adjustable.

The third driving mechanism 220 may be a lifting rod disposed on the rotary platform, a third screw rod mechanism and a fourth motor, the third screw rod mechanism extends along the Z direction, the third screw rod mechanism is connected with the rotary platform, the mask 20 is connected with the third screw rod mechanism, and the fourth motor is connected with the third screw rod mechanism to drive the mask 20 to lift along the Z direction. When the mask needs to be replaced or cleaned, the replacement and rapid cleaning of the mask can be facilitated by lowering the mask height by the third driving mechanism 220.

In the production process, the mask plate 20 is located above the conveying assembly 10, and the exposure assembly 30 is located above the mask plate 20, under the condition that the exposure assembly 30 adopts laser emitted from top to bottom to realize exposure.

In this embodiment, the mask plate 20 is located below the transfer assembly 10, and the exposure assembly 30 is located below the mask plate 20, where the exposure assembly 30 uses a laser emitted from bottom to top to implement exposure.

Wherein the transfer assembly 10 has a target position corresponding to the exposure assembly 30 to convey the substrate 80 to the target position as a target substrate 80; the exposure apparatus 1000 includes: alignment camera 70, alignment camera 70 is configured to photograph reticle 20 and target substrate 80 and obtain photographic data before target substrate 80 is exposed, reticle 20 is configured to adjust and calibrate the center position and angle of reticle 20 relative to target substrate 80 based on the photographic data.

The alignment camera 70 is utilized to photograph the mask plate 20 and the target substrate 80 and obtain photographing data, so that the relative positions and angles of the mask plate 20 and the target substrate 80 are determined, then the mask plate 20 is configured to adjust and calibrate the center positions and angles of the mask plate 20 relative to the target substrate 80 according to the photographing data until the angles and the center positions of the mask plate 20 and the target substrate 80 coincide to complete calibration, the transfer printing accuracy is realized, and the mass production is met.

Wherein, in order to avoid the conveyor belts 100 interfering with the alignment cameras 70, optionally, the orthographic projection of each alignment camera 70 is located at the gap of two adjacent conveyor belts 100.

Wherein the number of alignment cameras 70 is one or more, a plurality refers to two, three, four, or five, etc.

Alternatively, reticle 20 and substrate 80 are each rectangular, with two alignment cameras 70, and two alignment cameras 70 are disposed along the intersection of reticle 20.

Because mask 20 and substrate 80 all are the rectangle, and both have four limits, utilize two to aim at camera 70 to arrange along the line of intersecting of mask 20 this moment, every is aimed at the central point that can be accurate to obtain two adjacent limits of mask 20 and the edge of substrate 80 and the angular offset, and the setting is simple, and is favorable to improving the precision of exposing, improves the product yield.

The exposure assembly 30 includes a printing laser head 300 facing the mask 20 and a fourth driving mechanism 310, and the fourth driving mechanism 310 drives the printing laser head 300 to lift in the Z direction, so that when the exposure device 1000 does not perform the transfer operation (i.e., stops running), the printing laser head 300 can be adjusted to descend in the Z direction, increasing the distance between the printing laser head 300 and the mask 20, and facilitating cleaning of the surface of the printing laser head 300.

The exposure apparatus 1000 further includes a sensor (not shown) configured to monitor whether the transfer module 10 adsorbs the target substrate 80 at the target position before photographing the target position by the alignment camera 70, and the alignment camera 70 is configured to photograph the reticle 20 and the target substrate 80 after the target substrate 80 is adsorbed at the target position.

By means of the arrangement of the sensor, when the conveying assembly 10 is monitored to adsorb the target substrate 80 at the target position, the alignment camera 70 can photograph the mask 20 and the target substrate 80, subsequent calibration and exposure are performed, and when the target position is not monitored to adsorb the target substrate 80, subsequent operation is not performed, so that energy consumption is saved, and accurate, automatic and continuous transfer printing operation of the exposure device 1000 is realized.

To avoid the conveyor belts 100 interfering with the sensors, optionally, the orthographic projection of each sensor is located at the gap between two adjacent conveyor belts 100.

Wherein, a PLC control system (not shown) can be adopted to realize the configuration operation of each component.

That is, the exposure apparatus 1000 includes a PLC control system, which is respectively connected to the sensor, the alignment camera 70, the first driving mechanism 200, the second driving mechanism 210, the third driving mechanism 220, and the exposure module 30, such that when the substrate 80 is transported to the target position by the transfer module 10, and the information of the target substrate 80 is absorbed by the PLC control system according to the target position fed back by the sensor, the PLC control system controls the alignment camera 70 to photograph the mask plate 20 and the target substrate 80 and obtain photographing data, and the PLC control system drives the first driving mechanism 200, the second driving mechanism 210, and the third driving mechanism 220 according to the photographing data, thereby realizing adjustment of the center position and the angle of the mask plate 20, so as to calibrate the center position and the angle of the mask plate 20 and the target substrate 80 until the center position and the angle of the mask plate 20 and the target substrate 80 coincide, and complete the calibration, and then controls the exposure module 30 to expose, and transfer the pattern of the mask plate 20 to the side of the target substrate 80 absorbed by the transfer module 10 facing away from the transfer module 10.

The exposure device that this application provided utilizes the conveying subassembly to carry a plurality of substrates along the conveying route continuously, realizes the continuity of substrate transportation, and the substrate can take place the skew but the skew is less in the transportation, consequently utilizes the relative position of conveying subassembly and exposure subassembly unchangeable, only need adjust the position and the angle of mask version can calibrate its and the substrate position of waiting to expose fast, adopt the exposure subassembly after the calibration with mask version figure rendition in the substrate surface can, realize the continuity of substrate transportation and rendition, effectively promote work efficiency.

The foregoing is merely a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and variations may be made to the present application by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application should be included in the protection scope of the present application.

Claims (10)

1. An exposure apparatus, comprising:

the conveying assembly is provided with a bearing surface for conveying the substrate along the conveying path, the bearing surface is provided with a plurality of adsorption components, and the adsorption components are used for adsorbing the substrate;

the mask plate is provided with a mask plate pattern and is configured to be adjustable in relative position and relative angle with the conveying assembly; and

the exposure assembly is positioned at one side of the mask plate, which is away from the conveying assembly, and the relative position between the exposure assembly and the conveying assembly is kept unchanged in the running state of the exposure assembly, and the exposure assembly is used for transferring the mask plate pattern to one side of the substrate, which is away from the adsorption component.

2. The exposure apparatus according to claim 1, wherein the transfer assembly has a target position corresponding to the exposure assembly, and the substrate conveyed to the target position is taken as a target substrate;

the exposure apparatus includes: the alignment camera is configured to photograph the mask plate and the target substrate before the target substrate is exposed, and obtain photographing data, and the mask plate is configured to adjust and calibrate the center position and angle of the mask plate relative to the target substrate according to the photographing data.

3. The exposure apparatus according to claim 2, wherein the reticle and the substrate are rectangular, the number of the alignment cameras is two, and the two alignment cameras are arranged along an intersection line of the reticles.

4. The exposure apparatus according to claim 2, further comprising a sensor configured to monitor whether the transfer member adsorbs the target substrate at the target position before photographing by the alignment camera, the alignment camera being configured to photograph the reticle and the target substrate after the target substrate is adsorbed at the target position.

5. The exposure apparatus according to any one of claims 1 to 4, wherein the reticle is located below the transfer assembly.

6. The exposure apparatus according to any one of claims 1 to 4, wherein the conveyance assembly includes a conveyance belt having the bearing surface, and a stepwise driving mechanism drivingly connected with the conveyance belt to drive the conveyance belt to move stepwise.

7. The exposure apparatus according to any one of claims 1 to 4, wherein the suction member is a vacuum suction hole provided on the bearing surface.

8. The exposure apparatus according to any one of claims 1 to 4, characterized in that the exposure apparatus comprises:

the first driving mechanism is in transmission connection with the mask plate and is used for driving the mask plate to translate; and

the second driving mechanism is in transmission connection with the mask plate and is used for driving the mask plate to rotate.

9. The exposure apparatus according to claim 8, characterized in that the exposure apparatus further comprises: and the third driving mechanism is in transmission connection with the mask plate and is used for driving the mask plate to lift.

10. The exposure apparatus according to any one of claims 1 to 4, wherein the substrate is a battery sheet.