CN220197470U

CN220197470U - Wafer detection platform

Info

Publication number: CN220197470U
Application number: CN202321890751.6U
Authority: CN
Inventors: 张鑫泉; 任明俊; 张哲�
Original assignee: Linding Optics Shanghai Co ltd
Current assignee: Linding Optics Shanghai Co ltd
Priority date: 2023-07-18
Filing date: 2023-07-18
Publication date: 2023-12-19
Anticipated expiration: 2033-07-18

Abstract

The utility model relates to the technical field of wafer detection equipment, in particular to a wafer detection platform. Comprising the following steps: the first slide rail, first slider, the slip cap is located on the first slide rail. The first linear motor is connected between the first sliding block and the first sliding rail. An air gap assembly is arranged on one side, close to the first sliding plane, of the first load cover plate. The device is used for forming an air floatation structure between the first load cover plate and the first sliding rail. In the utility model, an air floatation structure is formed between the first sliding block and the first sliding rail. Meanwhile, the stator of the first linear motor is not in contact with the rotor. Therefore, the first sliding block and the first sliding rail can move in a non-contact mode. The problem that the stability of the detection platform in the working process is poor due to the fact that the existing contact type moving mechanism can be avoided through the arrangement, and the detection precision is improved.

Description

Wafer detection platform

Technical Field

The utility model relates to the technical field of wafer detection equipment, in particular to a wafer detection platform.

Background

Wafer refers to a silicon wafer used for manufacturing silicon semiconductor circuits, the original material of which is silicon. The high-purity polycrystalline silicon is dissolved and then doped with silicon crystal seed, and then slowly pulled out to form cylindrical monocrystalline silicon. The silicon ingot is ground, polished, and sliced to form a silicon wafer, i.e., a wafer.

After the wafer processing is completed, it is required to perform corresponding quality inspection. And the position and the posture of the wafer need to be changed in the detection process. The stability of the detection platform in the prior art is poor, so that detection errors are easily caused by instability of the detection platform in the detection process, and the detection precision is reduced.

Disclosure of Invention

Accordingly, the present utility model is directed to a wafer inspection platform that at least partially solves the problems of the prior art.

According to an aspect of the present utility model, there is provided a wafer inspection platform, comprising: the first sliding mechanism is used for driving the wafer to move in a first direction. The first slide mechanism includes:

the first slide rail has a first sliding plane.

The first sliding block is sleeved on the first sliding rail in a sliding way.

The first linear motor is connected between the first sliding block and the first sliding rail and used for driving the first sliding block to move on the first sliding rail.

The first sliding block comprises a first load cover plate and two first side limiting sliding plates, wherein the two first side limiting sliding plates are respectively and fixedly connected to two side ends of the first load cover plate, and form a first U-shaped accommodating cavity. The first sliding rail is arranged in the first U-shaped arranging cavity in a penetrating mode.

An air gap assembly is arranged on one side, close to the first sliding plane, of the first load cover plate. The device is used for forming an air floatation structure between the first load cover plate and the first sliding rail. The air gap assembly includes:

the air gap boss is arranged on one side of the first load cover plate, which is close to the first sliding plane.

The exhaust groove is arranged on the air gap boss, and an exhaust hole is arranged in the exhaust groove. And

The air supply holes are arranged on the air gap boss and are arranged at positions around the exhaust groove.

Further, the air gap assembly further comprises:

the air pressure balancing groove is arranged on the air gap boss and communicated with the air supply holes.

Further, the air gap boss is provided with two air pressure balancing grooves.

The air supply holes are evenly distributed at the positions of the two air pressure balancing grooves.

And the exhaust grooves are distributed at positions between the two air pressure balance grooves.

Further, a plurality of air supply holes are formed in one side, close to the first sliding rail, of the first side limiting sliding plate, a plurality of air supply channels are formed in the first side limiting sliding plate and the first load cover plate, the air supply channels in the first side limiting sliding plate and the first load cover plate are communicated, and the air supply channels are used for conveying air for the corresponding air supply holes.

Further, the wafer processing device also comprises a second sliding mechanism for driving the wafer to move in a second direction. The second direction is perpendicular to the first direction. The second slip mechanism includes:

the second load cover plate and the two second side limiting slide plates are respectively and fixedly connected to two side ends of the second load cover plate to form a second U-shaped installation cavity. The first load cover plate is arranged in the second U-shaped arranging cavity in a sliding way.

The second linear motor is connected between the second load cover plate and the first load cover plate.

Further, an air gap assembly is arranged on one side, close to the first sliding plane, of the second side limiting slide plate;

the second side limiting slide plate is provided with the air gap subassembly near one side of first load apron.

Further, the wafer processing device also comprises a rotating mechanism for driving the wafer to rotate. The rotating mechanism is fixedly arranged on the second load cover plate.

Further, two air gap components are symmetrically arranged on one side, close to the first sliding plane, of the first load cover plate.

Further, a motor placement groove is formed in the first load cover plate, and the second linear motor is fixedly arranged in the motor placement groove.

Further, the anti-collision device also comprises a plurality of anti-collision heads which are fixedly arranged on the first sliding rail and the first load cover plate.

The beneficial effects of the utility model are as follows:

in the utility model, when the first sliding block slides on the first sliding rail, an air floatation structure is formed between the first sliding block and the first sliding rail. Simultaneously, the stator and the rotor of the first linear motor are respectively connected with the first sliding rail and the first sliding block, and the stator and the rotor of the first linear motor are not contacted when the motor works. Therefore, the first sliding block and the first sliding rail can move in a non-contact mode. The problem that the stability of the detection platform in the working process is poor due to the fact that the existing contact type moving mechanism can be avoided through the arrangement, and the detection precision is improved.

In addition, the air gap component arranged on the first load cover plate is provided with an air supply hole and an exhaust groove, and redundant air which is easy to accumulate in the middle of the air floatation structure can be timely discharged through the exhaust groove. Meanwhile, the air gap boss is higher than the original plane of the first load cover plate, so that air close to the outer side of the air floatation structure can be timely discharged. Therefore, the smoothness of the gas flow of the air floatation structure formed between the first sliding block and the first sliding rail can be ensured, and the situation that the gas pressure at the position where the gas is easy to accumulate in the air floatation structure is different due to gas accumulation is further reduced. Therefore, the stability of the air floatation structure can be ensured, and the detection precision is improved.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the drawings that are needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present utility model, and that other drawings can be obtained according to these drawings without inventive effort for a person skilled in the art.

Fig. 1 is a schematic general structure of a wafer inspection platform according to an embodiment of the present application.

Fig. 2 is a schematic diagram illustrating a partial exploded structure of a wafer inspection platform according to an embodiment of the present application.

Fig. 3 is a schematic general structural diagram of a first sliding mechanism according to another embodiment of the present application.

Fig. 4 is a schematic general structural diagram of a first load cover plate in another embodiment of fig. 3.

Fig. 5 is a schematic general structural diagram of a second sliding mechanism according to another embodiment of the present application.

Fig. 6 is a schematic cross-sectional view of a rotating mechanism according to another embodiment of the present application.

Fig. 7 is an exploded view of a rotating mechanism according to another embodiment of the present application.

Reference numerals

10. A first slide rail; 11. a first slider; 111. a first load cover plate; 112. a first side limit slide plate; 113. an air supply hole; 114. an exhaust groove; 115. an exhaust hole; 116. an air pressure balancing groove; 117. a gas supply channel; 118. a motor mounting groove; 119. a first linear motor; 12. an air gap boss; 2. a second slip mechanism; 21. a second load cover plate; 22. a second side limit slide plate; 23. a second linear motor; 3. a rotation mechanism; 31. a housing main body; 32. an annular driving motor; 33. a primary connecting ring sleeve; 34. a secondary connecting ring sleeve; 35. a third-stage connecting ring sleeve; 36. rotating the end cap; 37. an air gap generating ring sleeve; 38. an annular grating ruler; 39. a grating reading head; 4. a guard rail; 5. a sensor; 6. an anti-collision head.

Detailed Description

Embodiments of the present utility model will be described in detail below with reference to the accompanying drawings.

It should be noted that the following embodiments and features in the embodiments may be combined with each other without conflict. And, based on the embodiments in this disclosure, all other embodiments that may be made by one of ordinary skill in the art without inventive effort are within the scope of the present disclosure.

It is noted that various aspects of the embodiments are described below within the scope of the following claims. It should be apparent that the aspects described herein may be embodied in a wide variety of forms and that any specific structure and/or function described herein is merely illustrative. Based on the present disclosure, one skilled in the art will appreciate that one aspect described herein may be implemented independently of any other aspect, and that two or more of these aspects may be combined in various ways. For example, an apparatus may be implemented and/or a method practiced using any number of the aspects set forth herein. In addition, such apparatus may be implemented and/or such methods practiced using other structure and/or functionality in addition to one or more of the aspects set forth herein.

According to an aspect of the present utility model, as shown in fig. 1 and 2, there is provided a wafer inspection platform, including: the first sliding mechanism is used for driving the wafer to move in a first direction. As shown in fig. 3 and 4, the first sliding mechanism includes:

the first slide rail 10, the first slide rail 10 has a first sliding plane.

The first sliding block 11 is slidably sleeved on the first sliding rail 10.

The first linear motor 119 is connected between the first slider 11 and the first sliding rail 10, and is used for driving the first slider 11 to move on the first sliding rail 10.

Preferably, two first linear motors 119 are provided and are respectively connected to two corresponding two side surfaces of the two first side limiting slide plates 112 and the first slide block 11. The bearing capacity of the first sliding mechanism can be increased.

The first slider 11 includes a first load cover 111 and two first side limiting sliding plates 112, where the two first side limiting sliding plates 112 are respectively and fixedly connected to two side ends of the first load cover 111, and enclose a first U-shaped installation cavity. The first slide rail 10 is arranged in the first U-shaped arranging cavity in a penetrating way.

In the present utility model, when the first slider 11 slides on the first slide rail 10, an air-floating structure is formed between the first slider 11 and the first slide rail 10. Meanwhile, the stator and the mover of the first linear motor 119 are respectively connected with the first slide rail 10 and the first slider 11, and the stator and the mover of the first linear motor 119 do not contact each other when the motor is operated. Thus, the first slider 11 and the first slide rail 10 can be moved in a noncontact manner. The problem that the stability of the detection platform in the working process is poor due to the fact that the existing contact type moving mechanism can be avoided through the arrangement, and the detection precision is improved.

An air gap assembly is provided on a side of the first load cover plate 111 adjacent to the first slip plane. For forming an air-bearing structure between the first load cover 111 and the first slide rail 10. The air gap assembly includes:

the air gap boss 12 is disposed on a side of the first load cover 111 near the first sliding plane. The height of the air gap boss 12 is greater than the original surface of the first load cover plate 111.

The exhaust groove 114 is disposed on the air gap boss 12, and an exhaust hole 115 is disposed in the exhaust groove 114.

And

The air feed holes 113 are provided in the air gap boss 12, and the air feed holes 113 are provided at positions around the exhaust groove 114.

Preferably, as shown in fig. 3 and 4, the air gap assembly further comprises:

the air pressure balancing groove 116 is disposed on the air gap boss 12 and is in communication with the plurality of air supply holes 113. When the air is discharged from each air supply hole 113, the air may be mixed in the air pressure balancing groove 116, and the air pressure in each air pressure balancing groove 116 may be substantially uniform during this process.

Further, two air gap assemblies are symmetrically arranged on one side of the first load cover plate 111, which is close to the first sliding plane. The air gap boss 12 in each air gap assembly is provided with two air pressure balancing grooves 116. The air feed holes 113 are evenly distributed at the positions of the two air pressure balancing grooves 116. The exhaust grooves 114 are distributed at positions between the two air pressure balance grooves 116.

Through the above structure arrangement, two air-float structures can be formed at both sides of the first load cover plate 111 having a large length span, whereby the supporting stability of the air-float structures to the first load cover plate 111 can be improved.

In addition, the air gap assembly provided on the first load cover plate 111 has both an air feed hole 113 and an air discharge groove 114, and the air discharge groove 114 can discharge the excessive air easily accumulated in the middle of the air-floating structure in time. Meanwhile, the air gap boss 12 is higher than the original plane of the first load cover plate 111, so that air which is easy to accumulate between two air gap components can be smoothly discharged in time. This ensures the smoothness of the gas flow forming the air-floating structure between the first slider 11 and the first slide rail 10, and further reduces the difference in gas pressure at the position where the gas is likely to be deposited in the air-floating structure due to the gas deposition. Therefore, the stability of the air floatation structure can be ensured, and the detection precision is improved.

As another possible embodiment of the present utility model, as shown in fig. 3 and 4, a plurality of air supply holes 113 are formed on a side of the first side limiting slide plate 112, which is close to the first sliding rail 10, and a plurality of air supply channels 117 are formed on both the first side limiting slide plate 112 and the first load cover plate 111, and the air supply channels 117 on the first side limiting slide plate 112 and the first load cover plate 111 are communicated, and the plurality of air supply channels 117 respectively supply air to the corresponding air supply holes 113.

By this arrangement, the number of external air supply lines can be reduced, and by providing a small number of air supply lines, the air supply holes 113 in the first side limit slide plate 112 and the first load cover plate 111 can be ensured to be able to discharge air. The external cleanliness of the first transfer structure is improved, and the influence of the external air supply pipeline on the stability of the first slider 11 during movement can be reduced. In addition, the number of air supply pipelines is reduced, and if only one air supply pipeline is used for carrying out full-structure air supply, the consistency of air supply pressure can be greatly improved.

The structures for forming the air-floating structures on the two first side limiting sliding plates 112 are the same, so that the air-floating structures formed on the two first side limiting sliding plates 112 are completely consistent, and then an equilibrium state is achieved.

The size of the air-bearing structure formed by the first load cover 111 requires a responsive arrangement according to the weight of a particular load. Meanwhile, in the air gap assembly of the present embodiment, there are both the air feed hole 113, the air discharge groove 114 and the air discharge hole 115. Thereby, a stable air-floating structure capable of bearing different weights can be formed by adjusting the air supply pressure of the air supply hole 113 and the air exhaust pressure in the air exhaust groove 114. The adaptability of the structure is higher.

In addition, the air gap assembly in this embodiment may be further configured as a magnet, so as to ensure stability of the air-floating structure by attractive force between the magnet and the first slide rail 10.

As another embodiment of the present utility model, as shown in fig. 1 and 2, the wafer inspection platform further includes a second sliding mechanism 2 for driving the wafer to move in a second direction. The second direction is perpendicular to the first direction.

As shown in fig. 5, the second slider mechanism 2 includes:

the second load cover plate 21 and the two second side limiting slide plates 22 are respectively fixedly connected to two side ends of the second load cover plate 21, and a second U-shaped installation cavity is formed by enclosing the two second side limiting slide plates 22. The first load cover 111 is slidably disposed in the second U-shaped receiving cavity. Further, the second side limiting slide 22 is provided with an air gap assembly on a side thereof adjacent to the first sliding plane. And the second side limiting slide 22 is provided with an air gap assembly on the side adjacent to the first load cover 111.

Preferably, as shown in fig. 1 and 2, the first load cover 111 is provided with a motor mounting groove 118, and the second linear motor 23 is fixedly disposed in the motor mounting groove 118. The arrangement can further reduce the structural components of the wafer detection platform, thereby reducing the volume of the wafer detection platform.

The second linear motor 23 is connected between the second load cover 21 and the first load cover 111.

The second slider mechanism 2 has the same structural shape as the first slider 11, except for the arrangement position of the air gap assembly.

Further, the wafer inspection platform further comprises a rotating mechanism 3 for driving the wafer to rotate. The rotation mechanism 3 is fixedly provided on the second load cover plate 21.

Specifically, as shown in fig. 6 and 7, the rotation mechanism 3 includes: the housing body 31, the annular drive motor 32, the primary connection collar 33, the secondary connection collar 34, the tertiary connection collar 35, the rotary end cap 36 and the air gap generating collar 37.

The stator portion of the ring-shaped driving motor 32 is connected with the housing main body 31 to achieve a fixed mounting of the driving motor. The primary connecting ring 33 is fixedly connected with the mover part of the ring motor. And the second-stage connecting ring sleeve 34 is fixedly connected to the first-stage connecting ring sleeve 33, the third-stage connecting ring sleeve 35 is fixedly connected to the second-stage connecting ring sleeve 34, and the third-stage connecting ring sleeve 35 is fixedly connected with the rotating end cover 36. Thus, when the annular driving motor 32 rotates, the primary connecting ring sleeve 33, the secondary connecting ring sleeve 34, the tertiary connecting ring sleeve 35 and the rotating end cover 36 can be driven to synchronously rotate.

The primary connecting ring sleeve 33, the secondary connecting ring sleeve 34 and the tertiary connecting ring sleeve 35 are all annular parts, and the outer diameter of the secondary connecting ring sleeve 34 is smaller than the outer diameters of the primary connecting ring sleeve 33 and the tertiary connecting ring sleeve 35 respectively. Thus, an annular placement groove can be formed by surrounding the upper and lower end surfaces of the primary connection collar 33 and the tertiary connection collar 35, and the outer circumferential wall of the secondary connection collar 34.

The air gap generating ring 37 is sleeved outside the three-stage connecting ring 35, and the outer side wall of the air gap generating ring 37 is fixedly connected with the shell main body 31. And the air gap generating collar 37 is just embedded in the annular placement groove. Meanwhile, a plurality of air feed holes 113 are provided on the inner circumferential wall, the upper end face and the lower end face of the air gap generating ring 37, and the plurality of air feed holes 113 are respectively communicated through a plurality of air pressure balancing grooves 116. The outer circumferential wall of the air gap generating ring 37 is provided with a plurality of gas supply passages 117, and the gas is supplied to the gas supply holes 113 through the gas supply passages 117. Therefore, an air-floating structure can be formed between the air gap generating ring sleeve 37 and the primary connecting ring sleeve 33, the secondary connecting ring sleeve 34 and the tertiary connecting ring sleeve 35, so that the precision of the rotary mechanism 33 in the rotating process is improved.

In addition, an annular grating ruler 38 is sleeved on the rotary end cover 36, and a plurality of grating reading heads 39 are arranged on the shell main body 31 and used for reading scales on the annular grating ruler 38 so as to obtain rotary information of the rotary end cover 36.

Further, the anti-collision device further comprises a plurality of anti-collision heads 6 fixedly arranged on the first sliding rail 10 and the first load cover plate 111. By providing a plurality of the impact heads 6, the probability of collision damage of each moving member during movement can be reduced. The first rail 10 is also connected to a guard rail 4. And a sensor 5 is provided between the members having relative movements for detecting the relative positional relationship. The sensor 5 may be a light sensor 5.

The present utility model is not limited to the above embodiments, and any changes or substitutions that can be easily understood by those skilled in the art within the technical scope of the present utility model are intended to be included in the scope of the present utility model. Therefore, the protection scope of the utility model is subject to the protection scope of the claims.

Claims

1. The wafer detection platform is characterized by comprising: the first sliding mechanism is used for driving the wafer to move in a first direction; the first slide mechanism includes:

the first sliding rail is provided with a first sliding plane;

the first sliding block is sleeved on the first sliding rail in a sliding way;

the first linear motor is connected between the first sliding block and the first sliding rail and used for driving the first sliding block to move on the first sliding rail;

the first sliding block comprises a first load cover plate and two first side limiting sliding plates, the two first side limiting sliding plates are respectively and fixedly connected to two side ends of the first load cover plate, and a first U-shaped installation cavity is formed by enclosing the first load cover plate; the first sliding rail is arranged in the first U-shaped arranging cavity in a penetrating manner;

an air gap assembly is arranged on one side, close to the first sliding plane, of the first load cover plate; the first sliding rail is used for forming a first sliding rail and a first load cover plate; the air gap assembly includes:

the air gap boss is arranged on one side of the first load cover plate, which is close to the first sliding plane;

the exhaust groove is arranged on the air gap boss, and an exhaust hole is arranged in the exhaust groove; and

the air supply holes are arranged on the air gap boss, and the air supply holes are arranged at positions around the exhaust groove.

2. The wafer inspection platform of claim 1, wherein the air gap assembly further comprises:

3. A wafer inspection platform according to claim 2, wherein,

the air gap boss is provided with two air pressure balancing grooves;

the air supply holes are evenly distributed at the positions of the two air pressure balancing grooves;

the exhaust grooves are distributed at positions between the two air pressure balance grooves.

4. The wafer inspection platform of claim 1, wherein a plurality of air supply holes are formed in a side, close to the first slide rail, of the first side limiting slide plate, a plurality of air supply channels are formed in the first side limiting slide plate and the first load cover plate, the air supply channels in the first side limiting slide plate and the first load cover plate are communicated, and the air supply channels are used for conveying air for the corresponding air supply holes respectively.

5. A wafer inspection platen according to claim 3, further comprising a second slip mechanism for moving the wafer in a second direction; the second direction is perpendicular to the first direction; the second slip mechanism includes:

the second load cover plate and the two second side limiting slide plates are respectively and fixedly connected to two side ends of the second load cover plate to form a second U-shaped accommodating cavity; the first load cover plate is arranged in the second U-shaped arranging cavity in a sliding way;

and the second linear motor is connected between the second load cover plate and the first load cover plate.

6. The wafer inspection platform of claim 5, wherein,

the air gap assembly is arranged on one side, close to the first sliding plane, of the second side limiting slide plate; and

7. The wafer inspection platform of claim 5, further comprising a rotation mechanism for rotating the wafer; the rotating mechanism is fixedly arranged on the second load cover plate.

8. The wafer inspection platform of claim 1, wherein two of the air gap assemblies are symmetrically disposed on a side of the first load cover plate adjacent to the first slip plane.

9. The wafer inspection platform of claim 5, wherein the first load cover plate is provided with a motor mounting groove, and the second linear motor is fixedly arranged in the motor mounting groove.

10. The wafer inspection platform of claim 1, further comprising a plurality of anti-collision heads fixedly disposed on the first rail and the first load cover plate.