CN220105331U - High contrast grating polaroid - Google Patents
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- CN220105331U CN220105331U CN202320727647.9U CN202320727647U CN220105331U CN 220105331 U CN220105331 U CN 220105331U CN 202320727647 U CN202320727647 U CN 202320727647U CN 220105331 U CN220105331 U CN 220105331U
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- 229910052751 metal Inorganic materials 0.000 claims abstract description 73
- 239000002184 metal Substances 0.000 claims abstract description 73
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 230000010287 polarization Effects 0.000 claims abstract description 20
- 239000004065 semiconductor Substances 0.000 claims abstract description 7
- 239000010410 layer Substances 0.000 claims description 33
- 239000012790 adhesive layer Substances 0.000 claims description 18
- 239000011241 protective layer Substances 0.000 claims description 10
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 11
- 239000000463 material Substances 0.000 abstract description 5
- 239000003989 dielectric material Substances 0.000 abstract description 3
- 239000007769 metal material Substances 0.000 abstract description 3
- 230000005693 optoelectronics Effects 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 19
- 230000005684 electric field Effects 0.000 description 10
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 5
- 238000000231 atomic layer deposition Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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Abstract
The present disclosure provides a high contrast grating polarizer, which relates to the technical field of optoelectronic devices. The polarizing plate includes a substrate; the high-contrast grating is positioned on the substrate and is staggered with the plasma metal antenna structure, and the high-contrast grating comprises a semiconductor grating or a dielectric grating; the high contrast grating is configured to transmit light in a first polarization direction, and the plasmonic metal antenna structure is configured to reflect light in a second polarization direction, the first polarization direction being opposite to the second polarization direction. The high-contrast grating in the polaroid is made of semiconductor materials or dielectric materials, so that most metal materials can be replaced, and the production cost can be greatly reduced; and the plasma metal antenna structure which is staggered with the high-contrast grating is arranged, so that the thickness of the grating can be reduced, the structure is simple, the manufacture is convenient, and the performance is still very similar to that of a traditional wire grid polaroid.
Description
Technical Field
The present disclosure relates generally to the field of optoelectronic device technology, and in particular to a high contrast grating polarizer.
Background
A polarizer is a filter that allows light waves of a particular polarization to pass while blocking light waves of other polarization. Commercial polarizers can be classified into thin film polarizers and wire grid polarizers according to the operating principle. The thin film polarizer is a structure in which molecular chains of organic compounds are aligned in a specific direction, and the wire grid polarizer is a structure in which metal gratings are etched periodically on glass and boundary conditions of the structure are solved using maxwell's equations. Wire grid polarizers have higher transmittance, higher extinction ratios, and a greater operating temperature range than thin film polarizers.
However, the wire grid polarizer in the related art is difficult and expensive to manufacture, which seriously affects mass production. According to the action principle of metal on electromagnetic waves, the electromagnetic waves can only interact with the metal surface, and the penetration depth is about 10nm for most metals, but in order to support the specific structure of the grating, the thickness of the metal grating is generally 100-300 nm, so that the metal positioned in the grating has no photoelectric effect, the material waste is great, and the manufacturing difficulty is greatly increased.
Disclosure of Invention
In view of the above-described drawbacks or shortcomings of the related art, it is desirable to provide a high-contrast grating polarizer that is simple in structure and at the same time inexpensive.
The present disclosure provides a high contrast grating polarizer comprising:
a substrate;
the high-contrast grating is positioned on the substrate and is staggered with the plasma metal antenna structure, and the high-contrast grating comprises a semiconductor grating or a dielectric grating; the high contrast grating is configured to transmit light in a first polarization direction, and the plasmonic metal antenna structure is configured to reflect light in a second polarization direction, the first polarization direction being opposite to the second polarization direction.
Optionally, in some embodiments of the present disclosure, the plasmonic metal antenna structure is located at least one of a bottom, a left sidewall, and a right sidewall of the high contrast grating gap.
Optionally, in some embodiments of the present disclosure, the plasmonic metal antenna structure is located at the top, left side wall, and right side wall of each high contrast grating strip; alternatively, the plasmonic metal antenna structure is located on top of each high contrast grating strip.
Optionally, in some embodiments of the present disclosure, a first adhesive layer is further disposed between the substrate and the high contrast grating, and/or between the substrate and the plasmonic metal antenna structure, respectively.
Optionally, in some embodiments of the present disclosure, the first bonding layer comprises a SiN layer, al 2 O 3 Layer and SiO 2 Any one of the layers.
Optionally, in some embodiments of the present disclosure, a second adhesive layer is further disposed between the plasmonic metal antenna structure and the high contrast grating, and/or between the plasmonic metal antenna structure and the first adhesive layer, respectively.
Optionally, in some embodiments of the present disclosure, the second adhesion layer includes any one of a Ti layer, a Ge layer, and an Al layer.
Optionally, in some embodiments of the present disclosure, an outer surface of the high contrast grating and an outer surface of the plasmonic metal antenna structure are covered with a protective layer.
Optionally, in some embodiments of the present disclosure, the grooves of the plasmonic metal antenna structure and/or the grooves surrounded by the plasmonic metal antenna structure and the high-contrast grating gap are further filled with the protective layers, respectively.
Optionally, in some embodiments of the present disclosure, the protective layer includes a SiN layer, al 2 O 3 Layer and SiO 2 Any one of the layers.
From the above technical solutions, the embodiments of the present disclosure have the following advantages:
the embodiment of the disclosure provides a high-contrast grating polaroid, wherein a high-contrast grating is made of a semiconductor material or a dielectric material, so that most metal materials can be replaced, and the production cost can be greatly reduced; and the plasma metal antenna structure which is staggered with the high-contrast grating is arranged, so that the thickness of the grating can be reduced, the structure is simple, the manufacture is convenient, and the performance is still very similar to that of a traditional wire grid polaroid.
Drawings
Other features, objects and advantages of the present disclosure will become more apparent upon reading of the detailed description of non-limiting embodiments, made with reference to the following drawings:
FIG. 1 is a schematic diagram of a high contrast grating polarizer according to an embodiment of the present disclosure;
FIG. 2 is a schematic diagram of S-polarized light incident on a high contrast grating polarizer according to an embodiment of the present disclosure;
FIG. 3 is a schematic diagram of electric field simulation of S-polarized light with θ equal to 0 and φ equal to 90 according to embodiments of the present disclosure;
FIG. 4 is a schematic illustration of P-polarized light incident on a high contrast grating polarizer according to an embodiment of the present disclosure;
FIG. 5 is a schematic diagram of electric field simulation of P polarized light with θ equal to 0 and φ equal to 90 according to embodiments of the present disclosure;
FIG. 6 is an electron microscope image of a polarizer provided in an embodiment of the present disclosure;
FIG. 7 is a schematic diagram of a structure of yet another high contrast grating polarizer provided in an embodiment of the present disclosure;
FIG. 8 is a schematic structural diagram of yet another high contrast grating polarizer provided by embodiments of the present disclosure;
FIG. 9 is a schematic structural diagram of yet another high contrast grating polarizer provided by embodiments of the present disclosure;
FIG. 10 is a schematic diagram of another high contrast grating polarizer provided in an embodiment of the present disclosure;
FIG. 11 is a schematic diagram of another high contrast grating polarizer provided in an embodiment of the present disclosure;
FIG. 12 is a schematic diagram of another high contrast grating polarizer provided in an embodiment of the present disclosure;
FIG. 13 is a schematic structural view of yet another high contrast grating polarizer provided by an embodiment of the present disclosure;
FIG. 14 is a schematic structural view of yet another high contrast grating polarizer provided by an embodiment of the present disclosure;
FIG. 15 is a schematic diagram of a high contrast grating polarizer according to another embodiment of the present disclosure;
FIG. 16 is a schematic structural view of yet another high contrast grating polarizer according to another embodiment of the present disclosure;
FIG. 17 is a schematic diagram of a structure of yet another high contrast grating polarizer according to another embodiment of the present disclosure;
FIG. 18 is a schematic structural view of yet another high contrast grating polarizer provided in accordance with another embodiment of the present disclosure;
FIG. 19 is a schematic diagram of a high contrast grating polarizer according to yet another embodiment of the present disclosure;
FIG. 20 is a schematic diagram of another high contrast grating polarizer according to yet another embodiment of the present disclosure;
fig. 21 is a schematic structural view of yet another high contrast grating polarizer according to another embodiment of the present disclosure.
Reference numerals:
100-high contrast grating polarizer, 101-substrate, 102-high contrast grating, 103-plasmonic metal antenna structure, 104-first bonding layer, 105-second bonding layer, 106-protective layer, 107-slit, 108-air hole.
Detailed Description
In order that those skilled in the art will better understand the present disclosure, a technical solution in the embodiments of the present disclosure will be clearly and completely described below with reference to the accompanying drawings in which it is apparent that the described embodiments are only some embodiments of the present disclosure, not all embodiments. Based on the embodiments in this disclosure, all other embodiments that a person of ordinary skill in the art would obtain without making any inventive effort are within the scope of protection of this disclosure.
The terms "first," "second," "third," "fourth" and the like in the description and in the claims and in the above-described figures, if any, are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used may be interchanged where appropriate such that the described embodiments of the disclosure may be capable of operation in sequences other than those illustrated or described herein.
Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or modules is not necessarily limited to those steps or modules that are expressly listed or inherent to such process, method, article, or apparatus.
For ease of understanding and explanation, the high contrast grating polarizer provided by embodiments of the present disclosure is described in detail below with reference to fig. 1-21.
Fig. 1 is a schematic structural diagram of a high-contrast grating polarizer according to an embodiment of the disclosure. The high contrast grating polarizer 100 comprises a substrate 101, a high contrast grating (High Contrast Grating, HCG) 102 disposed on the substrate 101, and a plasmonic metal antenna structure 103 disposed across the high contrast grating 102, wherein the high contrast grating 102 is capable of transmitting light of a first polarization direction, the plasmonic metal antenna structure 103 is capable of reflecting light of a second polarization direction, the first polarization direction being opposite to the second polarization direction, such as polarized light including but not limited to S-polarized light, P-polarized light, circularly polarized light, or elliptically polarized light, and the like, and the transmitted light is predominantly linear polarization parallel to the high contrast grating, and the reflected light is predominantly polarization perpendicular to the high contrast grating.
Further, as shown in fig. 2, which is a schematic diagram of the incident of S polarized light on the high contrast grating polarizer according to the embodiment of the present disclosure, the polarized light is incident on the grating at an angle θ, where Φ is 90 degrees, and the S polarized light with Φ equal to 90 degrees means that the electric field direction of the light is parallel to the grating. In this case, when light interacts with the high contrast grating 102, by designing a specific period, duty ratio, and grating thickness such that the reflection phase from the top of the grating is different from the reflection phase from the bottom of the grating, a function of suppressing light reflection can be achieved, and since the electric field direction of light is parallel to the grating and the space between the gratings is filled with air, the influence of metal on light is small, and most of S-polarized light with Φ equal to 90 degrees can pass through the structure. As shown in fig. 3, an electric field simulation diagram of S polarized light with θ equal to 0 degrees and Φ equal to 90 degrees is provided in an embodiment of the present disclosure, and it can be seen from fig. 3 that light passes through the grating.
As shown in fig. 4, which is a schematic diagram of P polarized light incident on a high contrast grating polarizer according to an embodiment of the present disclosure, the polarized light is incident on the grating at an angle θ, where Φ is 90 degrees, and P polarized light with Φ equal to 90 degrees means that the electric field direction of the light is perpendicular to the grating. In this case the light will interact so much with the metal, in particular the metal of both side walls, that the electric field cannot penetrate the metal and be reflected, and since both side walls reflect the electric field, the two electric fields will interfere, the cavity works as an antenna resonator and eventually the light is reflected out and cannot pass through the structure. As shown in fig. 5, which is a schematic diagram of electric field simulation of P polarized light with θ equal to 0 degrees and Φ equal to 90 degrees according to an embodiment of the present disclosure, it can be seen from fig. 5 that light cannot pass through the grating.
It should be noted that in embodiments of the present disclosure, the substrate 101 may be made of one or more materials that are substantially transparent at the operating wavelength of the polarizer, such as, but not limited to, EUV (extreme ultraviolet), DUV (deep ultraviolet), UV (ultraviolet), VIS (visible), NIR (near infrared), MIR (mid infrared), FIR (far infrared), THz (terahertz), etc., including but not limited to SiO (ultra violet), or the like 2 (silica), al 2 O 3 (aluminum oxide) or Si (silicon) or the like, or the substrate 101 may be a glass substrate of various types, notA crystalline substrate, a polycrystalline substrate, a crystalline substrate, or the like; high contrast grating 102 includes, but is not limited to, a semiconductor grating or a dielectric grating, such as Si (silicon), siN (silicon nitride), al 2 O 3 (alumina) or any other kind of non-conductive material; the plasmonic metal antenna structure 103 may be any kind of metal, such as Au (gold), ag (silver), al (aluminum), fe (iron), alloys or other conductive materials.
Alternatively, the high contrast grating polarizer 100 in embodiments of the present disclosure may be of periodic or non-periodic structure. And, the high contrast grating polarizer 100 in other embodiments of the present disclosure may be a one-dimensional structure or a two-dimensional structure.
Illustratively, the following describes the plasmonic metal antenna structure 103 in detail in embodiments of the present disclosure. For example, the plasmonic metal antenna structure 103 is located at least one of the bottom, left side wall, and right side wall of the high contrast grating gap. Such as shown in fig. 1, where fig. 6 is an electron microscope image of a polarizer provided by an embodiment of the present disclosure, where dark areas represent high contrast gratings 102 and bright areas represent plasmonic metal antenna structures 103, where plasmonic metal antenna structures 103 are located at the bottom, left side and right side of the high contrast grating gap; as further shown in fig. 7, plasmonic metal antenna structures 103 are located at the bottom and left sidewalls of the high contrast grating gap; as further shown in fig. 8, plasmonic metal antenna structures 103 are located at the bottom and right sidewalls of the high contrast grating gap; as further shown in fig. 9, the plasmonic metal antenna structure 103 is located at the bottom of the high contrast grating gap; as further shown in fig. 10, plasmonic metal antenna structures 103 are located on the left and right sidewalls of the high contrast grating gap; as further shown in fig. 11, the plasmonic metal antenna structure 103 is located on the left side wall of the high contrast grating gap; as also shown in fig. 12, the plasmonic metal antenna structure 103 is located on the right side wall of the high contrast grating gap.
As another example, a plasmonic metal antenna structure 103 is shown in fig. 13 at the top, left side wall and right side wall of each high contrast grating. Alternatively, a plasmonic metal antenna structure 103 shown in fig. 14 is located on top of each high contrast grating strip.
Optionally, in the embodiment of the present disclosure, a first adhesive layer 104 is further disposed between the substrate 101 and the high-contrast grating 102 and/or between the substrate 101 and the plasmonic metal antenna structure 103, so that the adhesion of the high-contrast grating 102 can be enhanced. For example, as shown in FIG. 15, a first adhesive layer 104 is disposed between the substrate 101 and the high contrast grating 102 and between the substrate 101 and the plasmonic metal antenna structure 103, and the first adhesive layer 104 may comprise a SiN layer, al 2 O 3 Layer and SiO 2 Any one of the layers. In actual production, the first adhesive layer 104 may be deposited by ALD (Atomic Layer Deposition ), PECVD (Plasma Enhanced Chemical Vapor Deposition, plasma-enhanced chemical vapor deposition), CVD (Chemical Vapor Deposition ), or PVD (Physical Vapor Deposition, physical vapor deposition).
Optionally, in the embodiment of the present disclosure, a second adhesive layer 105 is further disposed between the plasmonic metal antenna structure 103 and the high contrast grating 102 and/or between the plasmonic metal antenna structure 103 and the first adhesive layer 104, so as to enhance the adhesion of the metal surface. For example, as shown in fig. 16, a second adhesive layer 105 is disposed between the plasmonic metal antenna structure 103 and the first adhesive layer 104, and the second adhesive layer 105 may include any one of a Ti (titanium) layer, a Ge (germanium) layer, and an Al (aluminum) layer. In actual production, the second adhesive layer 105 may be deposited by ALD, PECVD, CVD, PVD or sputtering, etc.
Optionally, as shown in fig. 17, the outer surface of the high-contrast grating 102 and the outer surface of the plasmonic metal antenna structure 103 in the embodiments of the present disclosure are covered with the protective layer 106, while in the grooves of the plasmonic metal antenna structure 103 in other embodiments of the present disclosure, and/or, as shown in fig. 18, the grooves surrounded by the plasmonic metal antenna structure 103 and the high-contrast grating gap are respectively filled with the protective layer 106, so that the surface of the entire polarizer can be protected, the service life can be prolonged, and the reliability is high. For example, the protective layer may include a SiN layer, al 2 O 3 Layer and SiO 2 Any of the layers may be deposited by ALD, PECVD, CVD or PVD, etc.
It should be further noted that, as shown in fig. 19, the metal adjacent to one grating sidewall, the metal adjacent to the other grating sidewall, the metal at the bottom of the grating gap, and the metal at the top of the grating may have different thicknesses in the embodiments of the disclosure. In polarizers where the plasmonic metal antenna structure 103 is located at the bottom, left side wall, and right side wall of the high contrast grating gap, the ratio of the sidewall metal thickness divided by the bottom metal thickness may be greater than 0.2 and less than 3. As shown in fig. 20, there may be a gap 107 between the metal and the high contrast grating 102 and/or between the metal and the substrate 101, which gap 107 should be less than 30nm. And as shown in fig. 21, there may be discontinuities in the metal layer, i.e., the presence of air holes 108, and the size of such discontinuities should be less than the distance between the two gratings.
The high-contrast grating polaroid provided by the embodiment of the disclosure is made of semiconductor materials or dielectric materials, so that most metal materials can be replaced, and the production cost can be greatly reduced; and the plasma metal antenna structure which is staggered with the high-contrast grating is arranged, so that the thickness of the grating can be reduced, the structure is simple, the manufacture is convenient, and the performance is still very similar to that of a traditional wire grid polaroid.
It should be noted that the above embodiments are merely for illustrating the technical solution of the disclosure, and are not limiting; although the present disclosure has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present disclosure.
Claims (10)
1. A high contrast grating polarizer, the polarizer comprising:
a substrate;
the high-contrast grating is positioned on the substrate and is staggered with the plasma metal antenna structure, and the high-contrast grating comprises a semiconductor grating or a dielectric grating; the high contrast grating is configured to transmit light in a first polarization direction, and the plasmonic metal antenna structure is configured to reflect light in a second polarization direction, the first polarization direction being opposite to the second polarization direction.
2. The polarizer of claim 1 wherein the plasmonic metal antenna structure is located in at least one of the bottom, left side wall and right side wall of the high contrast grating gap.
3. The polarizer of claim 1 wherein the plasmonic metal antenna structure is located on top of, left side wall and right side wall of each high contrast grating strip; alternatively, the plasmonic metal antenna structure is located on top of each high contrast grating strip.
4. A polarizer according to any one of claims 1-3, wherein a first adhesive layer is further provided between the substrate and the high contrast grating and/or between the substrate and the plasmonic metal antenna structure, respectively.
5. The polarizer of claim 4 wherein the first adhesive layer comprises a SiN layer, al 2 O 3 Layer and SiO 2 Any one of the layers.
6. The polarizer of claim 4, wherein a second adhesive layer is further disposed between the plasmonic metal antenna structure and the high contrast grating and/or between the plasmonic metal antenna structure and the first adhesive layer, respectively.
7. The polarizing plate according to claim 6, wherein the second adhesive layer comprises any one of a Ti layer, a Ge layer, and an Al layer.
8. The polarizer of claim 6 wherein the outer surface of the high contrast grating and the outer surface of the plasmonic metal antenna structure are covered with a protective layer.
9. The polarizer of claim 8, wherein the grooves of the plasmonic metal antenna structure and/or the grooves defined by the plasmonic metal antenna structure and the high contrast grating gap are each further filled with the protective layer.
10. The polarizing plate according to claim 8, wherein the protective layer comprises a SiN layer, al layer 2 O 3 Layer and SiO 2 Any one of the layers.
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| CN202320727647.9U CN220105331U (en) | 2023-03-31 | 2023-03-31 | High contrast grating polaroid |
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