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CN218404367U - Plasma spraying device and plasma spraying deposition system - Google Patents

Plasma spraying device and plasma spraying deposition system Download PDF

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Publication number
CN218404367U
CN218404367U CN202222756828.2U CN202222756828U CN218404367U CN 218404367 U CN218404367 U CN 218404367U CN 202222756828 U CN202222756828 U CN 202222756828U CN 218404367 U CN218404367 U CN 218404367U
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plasma
water
unit
power supply
plasma spray
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何箐
王锦江
葛超
崔亮
杨明超
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Beijing Golden Wheel Special Machine Co ltd
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Beijing Golden Wheel Special Machine Co ltd
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Abstract

The utility model provides a plasma spraying device and a plasma spraying deposition system; the power supply module in the device comprises an integrated control unit, a power supply control unit and a power supply unit which are sequentially arranged, wherein the power supply unit comprises a plurality of plasma power supplies which are connected in parallel; the plasma power supplies are connected with the anode of the plasma spray gun through the anode control connecting unit and the first hydroelectric cluster connecting unit and connected with the cathode of the plasma spray gun through the cathode control connecting unit and the second hydroelectric cluster connecting unit, and the plasma power supplies in the device adopt a parallel control mode and balance loads through distributed logic self-rectification control; meanwhile, integrated control is realized through the integrated control unit and the power supply control unit, so that absolute balance of multiple power supplies for outputting loads at the same time is ensured; and the output mode can be set through the connecting module, the requirements of different plasma spraying processes and plasma spray guns are met, and the universality of the power supply module and the replaceability of different types of system equipment are realized.

Description

Plasma spraying device and plasma spraying deposition system
Technical Field
The utility model belongs to the technical field of hot protective coating preparation technology and specifically relates to a plasma spraying device and plasma spraying deposition system are related to.
Background
The main process technologies for preparing the high-temperature protective coating include slurry infiltration, vapor infiltration, chemical Vapor Deposition (CVD), physical Vapor Deposition (PVD), thermal Spraying (TS), and the like; the thermal Spraying technology has the advantages of low cost, high efficiency and the like, and is widely applied to various aspects such as High-temperature oxidation resistant coatings, thermal barrier coatings, environmental barrier coatings and the like, such as a supersonic flame Spraying technology (HVOF), a High-velocity oxygen-fuel Spraying process (HVOF), a Plasma Spraying technology (PS) and the like, metal and ceramic powder are deposited by High-energy jet melting, softening and semi-melting coupling, and the thermal Spraying technology is widely applied to the fields of aviation, aerospace, metallurgy, petrifaction, heavy industry and the like. In practical application, the Plasma Spraying system requires a main power supply to have a low current ripple rate and a fast dynamic response characteristic so as to quickly adjust output voltage and maintain a constant current output state when Plasma arc impedance changes, thereby maintaining the stability of Plasma arc flame and obtaining a high-quality coating.
The different plasma processes have different working parameter ranges, for example, different plasma generators exist in the APS process, the working current range is 100A-1000A, and the working voltage range is 30V-200V; there are also modes of operation with a single plasma power supply and three plasma power supplies (three electrode plasma spray). And the PS-PVD process also adopts a power supply mode of three plasma power supplies due to higher working current (less than or equal to 3000A) so as to adapt to a spraying mode with high output current. Thus, there are two main types of outputs of plasma power sources: (1) the high voltage and the low current are adopted, the heat enthalpy value is improved, meanwhile, the lower plasma current is used for retarding the hot corrosion and the loss of a cathode and an anode, and the high-power high-heat enthalpy plasma spray gun generally adopts the mode; (2) the low-voltage and high-current working mode is a common working mode of a conventional plasma spray gun, the cathode and the anode of the plasma spray gun are generally short in service life, the cathode and the anode are easy to ablate due to high load current, the working current of the plasma spray gun is 500A-1000A conventionally, and the maximum limit is 3000A of the current of a PS-PVD spray gun.
Aiming at the requirements of different plasma spraying processes, power supplies with rated power of 80 kW-200 kW emerge endlessly to meet the requirements of different preparation companies, which causes difficulty, period and expense of design and development, and aiming at different plasma spraying systems, the power supplies have no mutual replaceability basically, thereby causing great waste for engineering application and user use. Therefore, the generalization of plasma power supplies (low ripple, high dynamic characteristics, high stability and high power) is of great significance. The plasma power supply is generalized, stability optimization and high-frequency output are carried out on different loads, interference and influence of power supply output frequency and waveform of a power grid on a traditional thyristor power supply and a traditional silicon controlled rectifier power supply are reduced, output stability of plasma is improved, and energy utilization rate is improved.
Because the plasma spraying system is also oriented to integrated design and manufacture (main equipment, auxiliary equipment and device integration), multi-functionalization (one machine has multiple functions) and system modularization integration (the system is divided into different modules and different spraying processes are controlled by an integrated control system), and a plasma power supply is taken as a core power supply device of the integrated multifunctional equipment, particularly, the plasma power supply is critical and is adaptive to different types of plasma spraying processes (vacuum, inner hole, rotation, atmosphere and the like) and different characteristic spray guns for atmospheric plasma spraying and a combined control technology thereof, and the problem to be solved is urgently needed.
SUMMERY OF THE UTILITY MODEL
In view of this, the utility model aims at providing a plasma spraying device and plasma spraying deposition system to alleviate above-mentioned technical problem, not only ensured the absolute equilibrium of many power supply simultaneous output load, still satisfied the demand of different plasma spraying technologies and plasma spray gun, realized power module's commonality and the replaceability that different grade type system equipped.
In a first aspect, an embodiment of the present invention provides a plasma spraying device, including: the device comprises a power supply module, a connecting module, a water and electricity transfer box, a water cooling machine and a plasma spray gun; the plasma power supply comprises a power supply module, a plasma power supply module and a power supply module, wherein the power supply module comprises an integrated control unit, a power supply control unit and a power supply unit which are sequentially arranged, and the power supply unit comprises a plurality of plasma power supplies which are connected in parallel; the connecting module comprises a positive control connecting unit and a negative control connecting unit; the water and electricity adaptor box includes: the water-electricity cluster connecting device comprises a first water-electricity cluster connecting unit and a second water-electricity cluster connecting unit; the positive electrodes of the plurality of plasma power supplies are connected with one end of the positive electrode control connecting unit, and the negative electrodes of the plurality of plasma power supplies are connected with one end of the negative electrode control connecting unit; the other end of the positive control connecting unit is connected with one end of the first hydroelectric cluster connecting unit, the other end of the negative control connecting unit is connected with one end of the second hydroelectric cluster connecting unit, the other end of the first hydroelectric cluster connecting unit is connected with the anode of the plasma spray gun, the other end of the second hydroelectric cluster connecting unit is connected with the cathode of the plasma spray gun, and the first hydroelectric cluster connecting unit and the second hydroelectric cluster connecting unit are both connected with the water-cooled machine.
Preferably, the plasma power supply is a high power inverter power supply or a high frequency chopper power supply.
Preferably, each plasma power supply is configured with a first output mode and a second output mode; the first output mode is a high-current low-voltage output mode, and the second output mode is a low-current high-voltage output mode.
Preferably, the number of plasma power sources is 3.
Preferably, the water cooling machine comprises a water outlet and a water return port; the water outlet is connected with the first water-electricity cluster connecting unit through a first pipeline, and the water return port is connected with the second water-electricity cluster connecting unit through a second pipeline.
Preferably, the device further comprises an acquisition module; the acquisition module comprises a first acquisition unit and a second acquisition unit, the first acquisition unit is arranged on the first pipeline, and the second acquisition unit is arranged on the second pipeline.
Preferably, the first collecting unit includes: the water outlet pressure sensor, the water outlet temperature sensor and the water outlet flow sensor; the second acquisition unit includes: a backwater pressure sensor, a backwater temperature sensor and a backwater flow sensor.
Preferably, the plasma torch further comprises an anode water cable and a cathode water cable; one end of the anode water cable is connected with the anode, the other end of the anode water cable is connected with the other end of the first hydroelectric bundling connecting unit, one end of the cathode water cable is connected with the cathode, and the other end of the cathode water cable is connected with the other end of the second hydroelectric bundling connecting unit.
Preferably, the plasma torch comprises one of: an inner hole plasma spray gun, a rotary plasma spray gun, a single cathode and anode cascade plasma spray gun, a three-cathode plasma spray gun, a three-anode plasma spray gun, a three-electrode plasma spray gun and a vacuum plasma spray gun.
In a second aspect, embodiments of the present invention further provide a plasma spray deposition system, which includes the plasma spray device of the first aspect.
The embodiment of the utility model provides a following beneficial effect has been brought:
the embodiment of the utility model provides a plasma spraying device and plasma spraying deposition system, a plurality of plasma power supply are connected with the positive pole of plasma spray gun through positive control linkage unit and first hydroelectric connection unit tied in a bundle, are connected with the negative pole of plasma spray gun through negative control linkage unit and second hydroelectric connection unit tied in a bundle, and a plurality of plasma power supply adopt the parallel control mode in the device, through the balanced load of distributed logic self-rectification control; meanwhile, integrated control is realized through the integrated control unit and the power supply control unit, so that absolute balance of multiple power supplies for outputting loads at the same time is ensured; and the output mode can be set through the connecting module, so that the stable current output is realized, and the requirements of different plasma spraying processes and plasma spray guns are met, thereby greatly improving the adaptability of the power supply module, and realizing the universality of the power supply module and the replaceability of different types of system equipment.
Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by the practice of the invention. The objectives and other advantages of the invention will be realized and attained by the structure particularly pointed out in the written description and drawings.
In order to make the aforementioned and other objects, features and advantages of the present invention comprehensible, preferred embodiments accompanied with figures are described in detail below.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the technical solutions in the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a plasma spraying apparatus according to an embodiment of the present invention.
Detailed Description
To make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions of the present invention will be described clearly and completely with reference to the accompanying drawings, and obviously, the described embodiments are some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
To facilitate an understanding of the present embodiment, the following detailed description is provided to illustrate embodiments of the present invention.
The embodiment of the utility model provides a plasma spraying device, the device includes at least: the device comprises a power module, a connecting module, a water and electricity transfer box, a water cooling machine and a plasma spray gun.
As shown in fig. 1, the power supply module includes an integrated control unit 11, a power supply control unit 12 and a power supply unit, which are sequentially arranged; the power supply unit includes a plurality of plasma power supplies 13 connected in parallel, preferably, the plasma power supplies 13 are high-power inverter power supplies or multiphase interleaving high-frequency chopper power supplies, and a corresponding power supply control dedicated circuit 131 is further disposed between each plasma power supply 13 and the power supply control unit 12, so that the power supply control unit 12 controls the plurality of plasma power supplies 13 in parallel. Specifically, if the plasma power supplies 13 are high-power inverter power supplies, the rated power of each plasma power supply 13 is 120kW, and each plasma power supply 13 is configured with a first output mode and a second output mode; the first output mode is a high-current low-voltage output mode, namely the output current range is 100A-1000A, and the voltage range is 12V-120V, and the second output mode is a low-current high-voltage output mode, namely the output current range is 50A-600A, and the voltage range is 30V-200V, so as to adapt to different process requirements. If the plasma power supply 13 is a multi-phase interleaved parallel high-frequency chopping power supply, preferably three-phase interleaved or four-phase interleaved high-frequency chopping, here, taking three-phase interleaving as an example, three independent power supply sub-modules are arranged inside each plasma power supply 13, the rated power of each power supply sub-module is 70kW, three-phase interleaved output of the three power supply sub-modules is achieved, high-frequency chopping with the frequency of 8kHZ is achieved, and meanwhile, capacitance filtering is adopted for each phase, so that low ripple rate and stable output of current are achieved.
In practical applications, the number of the plasma power supplies 13 is 3, and the control is performed in a parallel control manner. Specifically, the parallel control mode means that the three plasma power supplies 13 can output loads at the same time, and can also flexibly select a single power supply, a double power supply and three power supplies to output at the same time; that is, each plasma power supply 13 has an independent power supply output function, the integrated control unit 11 monitors and calculates the output of the plasma torch, determines the output form of the power load according to the plasma torch and the spraying process, and distributes the power output to the power control unit 12 so that the power control unit 12 controls the output of the three plasma power supplies 13, wherein the power control unit 12 controls the output of the three power loads by using a Modbus protocol, mainly controls whether the output mode of the total spraying current (It) is a single power supply, a double output or a three group output, and controls the output mode of a single plasma power supply 13, for example, the maximum output It is 2800A, and when It is less than 500A, the single power supply output is used and the output mode of the single plasma power supply 13 is switched according to the voltage of the plasma torch; when It is more than or equal to 500A and less than or equal to 1200A, the average output current mode of the two groups of power supplies is adopted; when the It is more than 1200A and less than or equal to 2800A, a mode of average output current of three groups of power supplies is adopted; when the single plasma power supply 13 is switched to the output mode, the output mode is automatically switched when the maximum output current or the maximum output voltage of the plasma power supply reaches 80%.
It should be noted that the integrated control unit 11 is preferably a PLC (Programmable Logic Controller), and the power supply control unit 12 may also be referred to as a three-way power supply control dedicated circuit board) or a power supply centralized Controller, and the integrated control unit 11 and the power supply control unit 12 are connected in a communication manner. And when the double-group power supply or the three-group power supply outputs, the power supply control unit 12 also adopts the distributed logic self-rectification control to balance the load of each plasma power supply 13 when the multiple groups of power supplies output, namely, automatically balance the current load into different multiple groups of plasma power supplies 13 according to the set current value, thereby realizing the current balance.
The connection module comprises a positive control connection unit 21 and a negative control connection unit 22; the positive control connection unit 21 is also called a three-way positive control connection unit, and the negative control connection unit 22 is also called a three-way negative control connection unit, that is, the connection module comprises 3 positive circuits and 3 negative circuits, which not only meets the output of a single power supply, a double power supply and three groups of power supplies, but also has the advantages of easy disassembly and assembly, and is convenient for adapting to the switching requirements of different groups of power supplies and different types of plasma spray guns.
The hydropower junction box comprises a first hydropower cluster connecting unit 31 and a second hydropower cluster connecting unit 32, so that the combined output of a single power supply, a double-group power supply and three groups of power supplies is realized, and if three plasma power supplies are output together, the three plasma power supplies are output in parallel; meanwhile, the plasma power supply has a simple assembling and disassembling function, and can meet the requirement that three plasma power supplies output respectively after being disassembled; and a quick insertion mode is adopted, a sealing ring is adopted to seal a water path, and a connector with insulation isolation is adopted to connect a circuit, so that water and electricity switching is realized. The hydro-electrical junction box also includes a high frequency device and circuitry 33.
Specifically, with the above apparatus, the positive electrodes of the plurality of plasma power supplies 13 are connected to one end of the positive electrode control connection unit 21, and the negative electrodes of the plurality of plasma power supplies 13 are connected to one end of the negative electrode control connection unit 22; the other end of the positive control connecting unit 21 is connected with one end of a first hydroelectric cluster connecting unit 31, the other end of the negative control connecting unit 22 is connected with one end of a second hydroelectric cluster connecting unit 32, the other end of the first hydroelectric cluster connecting unit 31 is connected with the anode of the plasma spray gun 40, the other end of the second hydroelectric cluster connecting unit 32 is connected with the cathode of the plasma spray gun 40, and the first hydroelectric cluster connecting unit 31 and the second hydroelectric cluster connecting unit 32 are both connected with the water-cooling machine 50.
Wherein, the water cooling machine 50 comprises a water outlet and a water return port; the water outlet is connected with a first hydropower cluster connecting unit 31 through a first pipeline, and the water return port is connected with a second hydropower cluster connecting unit 32 through a second pipeline. In addition, the device also comprises an acquisition module; the acquisition module comprises a first acquisition unit and a second acquisition unit, the first acquisition unit is arranged on the first pipeline, and the second acquisition unit is arranged on the second pipeline.
Preferably, the first acquisition unit includes: an effluent pressure sensor 61, an effluent temperature sensor 62 and an effluent flow sensor 63; the second acquisition unit includes: a backwater pressure sensor 64, a backwater temperature sensor 65 and a backwater flow sensor 66. It should be noted that the number of each sensor may be one, or may be multiple, and may be set according to actual situations.
In addition, the plasma torch 40 further includes an anode water cable 41 and a cathode water cable 42; wherein, one end of the anode water cable 41 is connected with the anode, the other end is connected with the other end of the first hydroelectric cluster connecting unit 31, one end of the cathode water cable 42 is connected with the cathode, and the other end is connected with the other end of the second hydroelectric cluster connecting unit 32. In practice, the plasma torch 40 is adapted to different plasma spraying processes, including but not limited to: the inner hole plasma spray gun, the rotary plasma spray gun, the single cathode and anode cascade plasma spray gun, the three cathode plasma spray gun, the three anode plasma spray gun and the three electrode plasma spray gun are adapted to the common atmosphere plasma spray process (covering different forms such as outer surface and internal control spray); a vacuum plasma spray gun adapted to the vacuum plasma spraying process; a high-power plasma spray gun adapted to plasma physical vapor deposition; vacuum suspension spraying deposition three-electrode plasma spray gun is adapted; and the plasma spray gun is suitable for all other specific plasma spraying processes with the output power less than 300kW, and the like, and the plasma spraying processes include but are not limited to vacuum plasma spraying, inner hole plasma spraying, rotating plasma spraying, plasma physical vapor deposition, conventional atmospheric plasma spraying, suspension plasma spraying, vacuum suspension plasma spraying and the like, so that the plasma spraying processes and the plasma spray gun can be specifically set according to actual conditions.
Aiming at single cathode and anode plasma spray guns of different plasma spraying processes, the first water-electricity cluster connecting unit 31 and the second water-electricity cluster connecting unit 32 are adopted for connection, and the output of the plasma power supply 13 is automatically controlled according to the load characteristics of the plasma spray guns; the connection of the first hydroelectric cluster connecting unit 31 and the second hydroelectric cluster connecting unit 32 is disassembled/assembled aiming at the three-cathode plasma spray gun, the three-electrode plasma spray gun and the three-anode plasma spray gun so as to divide the anode or the cathode into three paths for connection.
For a vacuum plasma spray gun and a high-power plasma spray gun adaptive to plasma physical vapor deposition, in practical application, the plasma spray gun works in a vacuum chamber, a first hydroelectric cluster connecting unit 31, a second hydroelectric cluster connecting unit 32, an anode control connecting unit 21 and a cathode control connecting unit 22 need a vacuum penetration plate to connect the plasma spray gun and a hydroelectric junction box, wherein the vacuum penetration plate is provided with 1 anode and 4 cathode water cable interfaces, the cathode water cable interfaces are respectively used for being independently connected with three plasma power outputs and 1 hydroelectric cluster connecting unit, and when the water cables are not connected, the interfaces are blocked by adopting a metal blocking device provided with a sealing ring.
Therefore, the plasma spraying device adopts three groups of high-power plasma power supply parallel control modes, the plasma power supply adopts an integrated controller and distributed logic self-rectification to control the balance load of each group of power supply, and two water and electricity cluster connecting units are set in the water and electricity switching box at the front end of the plasma spray gun, so that the current is stably output, and the requirements of different plasma spraying processes and the plasma spray gun are met. Namely the embodiment of the utility model provides a through an integrated vacuum plasma, hole plasma, the integrated device development and the application of atmosphere plasma spraying, the many technologies of adaptation have been developed, the many power parallel control's of multi-functional plasma spraying deposition system plasma spraying device, the technical problem who uses the different plasma power adaptation plasma spraying technologies among the prior art has been alleviated, a power module has been realized and has been satisfied the demand of different grade type plasma spraying and spray gun, power supply unit's suitability can be promoted by a wide margin, power supply unit's commonality and the replaceability that different grade type system equipped have been realized.
To sum up, the embodiment of the utility model provides a plasma spraying device has following advantage:
(1) The power module can realize various plasma spraying processes and plasma spray guns, has the technical characteristics of independent function, strong adaptability and high universality, and can be adapted to the existing and future developed plasma system equipment with the direct current plasma spraying power of less than 300 kW;
(2) The integrated control unit and the power supply control unit optimize the power supply type and main parameters, restrict the connection between a control mode and the plasma spray gun, realize the output of balanced power supply load under multiple guarantees through the dual guarantees of centralized control and power supply independent control and by combining a plasma spraying process, and improve the stability of current output by adopting a distributed logic control form of current uniform distribution; the overall performance of the power supply module is improved by restricting the high-frequency chopper power supply and the inverter power supply;
(3) Different from the configuration of a specific power supply of a traditional plasma spraying system, the power supply module can be used for building a multifunctional plasma spraying system, is suitable for all plasma spraying processes within a certain power range, and can greatly improve the utilization rate of the power supply and the system;
(4) The output stability of the plasma spraying device is improved, when the plasma power supply outputs at full power or close to rated power for a long time, the output stability is reduced, and meanwhile, the high-load long-time output influences the service life of electronic components.
Further, on above-mentioned plasma spraying device's basis, the embodiment of the utility model provides a still provide a plasma spraying deposition system, this system includes above-mentioned plasma spraying device, in addition, still includes other devices, like vacuum apparatus, the clamping device of centre gripping plasma spray gun etc. specifically can refer to current plasma spraying deposition system, the embodiment of the utility model provides a no longer detailedly give unnecessary detail herein.
The embodiment of the utility model provides a plasma spraying deposition system has the same technical characteristic with the plasma spraying device that above-mentioned embodiment provided, so also can solve the same technical problem, reaches the same technological effect.
It can be clearly understood by those skilled in the art that, for convenience and simplicity of description, the specific working process of the system described above may refer to the corresponding process in the foregoing device embodiment, and details are not described herein again.
In addition, in the description of the embodiments of the present invention, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood as a specific case by those skilled in the art.
In addition, each functional unit in the embodiments provided in the present invention may be integrated into one processing unit, or each unit may exist alone physically, or two or more units are integrated into one unit.
The functions, if implemented in software functional units and sold or used as a stand-alone product, may be stored in a non-transitory computer-readable storage medium executable by a processor. Based on such understanding, the technical solutions of the present invention, which are essential or contributing to the prior art, or portions thereof, can be embodied in the form of a software product stored in a storage medium, and including instructions for causing a computer device (which may be a personal computer, a server, or a network device, etc.) to execute all or part of the steps of the method according to the embodiments of the present invention. And the aforementioned storage medium includes: a U-disk, a removable hard disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a magnetic disk or an optical disk, and other various media capable of storing program codes.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
Finally, it should be noted that: the above-mentioned embodiments are only specific embodiments of the present invention, and are not intended to limit the technical solutions of the present invention, and the protection scope of the present invention is not limited thereto, although the present invention is described in detail with reference to the foregoing embodiments, those skilled in the art should understand that: those skilled in the art can still modify or easily conceive of changes in the technical solutions described in the foregoing embodiments or make equivalent substitutions for some technical features within the technical scope of the present disclosure; such modifications, changes or substitutions do not substantially depart from the spirit and scope of the embodiments of the present invention, and are intended to be included within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.

Claims (10)

1. A plasma spray apparatus, comprising: the device comprises a power supply module, a connecting module, a water and electricity transfer box, a water cooler and a plasma spray gun; the power supply module comprises an integrated control unit, a power supply control unit and a power supply unit which are sequentially arranged, wherein the power supply unit comprises a plurality of plasma power supplies which are connected in parallel; the connecting module comprises a positive control connecting unit and a negative control connecting unit; the water and electricity adapter box includes: the water-electricity cluster connecting device comprises a first water-electricity cluster connecting unit and a second water-electricity cluster connecting unit;
the positive electrodes of the plasma power supplies are connected with one end of the positive electrode control connecting unit, and the negative electrodes of the plasma power supplies are connected with one end of the negative electrode control connecting unit; the other end of positive control linkage unit with the one end of first water and electricity linkage unit tied in a bundle is connected, negative pole control linkage unit's the other end with the one end of second water and electricity linkage unit tied in a bundle is connected, and, the other end of first water and electricity linkage unit tied in a bundle with the positive pole of plasma spray gun is connected, the other end of second water and electricity linkage unit tied in a bundle with the negative pole of plasma spray gun is connected, just, first water and electricity linkage unit tied in a bundle with second water and electricity linkage unit tied in a bundle all with the water-cooled generator is connected.
2. The plasma spray apparatus of claim 1 wherein the plasma power supply is a high power inverter power supply or a high frequency chopper power supply.
3. The plasma spray apparatus of claim 1, wherein each of said plasma power supplies is configured with a first output mode and a second output mode; the first output mode is a high-current low-voltage output mode, and the second output mode is a low-current high-voltage output mode.
4. The plasma spray apparatus of claim 1, wherein the number of plasma power supplies is 3.
5. The plasma spray apparatus of claim 1, wherein the water cooler comprises a water outlet and a water return; the water outlet is connected with the first hydropower cluster connecting unit through a first pipeline, and the water return port is connected with the second hydropower cluster connecting unit through a second pipeline.
6. The plasma spray apparatus of claim 5, further comprising an acquisition module; the acquisition module comprises a first acquisition unit and a second acquisition unit, the first acquisition unit is arranged on the first pipeline, and the second acquisition unit is arranged on the second pipeline.
7. The plasma spray apparatus of claim 6, wherein the first collecting unit comprises: the water outlet pressure sensor, the water outlet temperature sensor and the water outlet flow sensor are arranged on the water inlet pipe; the second acquisition unit includes: a backwater pressure sensor, a backwater temperature sensor and a backwater flow sensor.
8. The plasma spray apparatus of claim 1, wherein the plasma spray gun further comprises an anode water cable and a cathode water cable; wherein, the one end of anode water cable with the positive pole is connected, the other end with the other end of first water and electricity linkage element tied in a bundle is connected, the one end of negative pole water cable with the negative pole is connected, the other end with the other end of second water and electricity linkage element tied in a bundle is connected.
9. The plasma spray apparatus of claim 1, wherein the plasma torch comprises one of: an inner hole plasma spray gun, a rotary plasma spray gun, a single cathode and anode cascade plasma spray gun, a three-cathode plasma spray gun, a three-anode plasma spray gun, a three-electrode plasma spray gun and a vacuum plasma spray gun.
10. A plasma spray deposition system, characterized in that the system comprises a plasma spray device according to any of the preceding claims 1-9.
CN202222756828.2U 2022-10-19 2022-10-19 Plasma spraying device and plasma spraying deposition system Active CN218404367U (en)

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Application Number Priority Date Filing Date Title
CN202222756828.2U CN218404367U (en) 2022-10-19 2022-10-19 Plasma spraying device and plasma spraying deposition system

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