CN217034418U - Optical system and photocuring printing system comprising same - Google Patents
Optical system and photocuring printing system comprising same Download PDFInfo
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- CN217034418U CN217034418U CN202220062595.3U CN202220062595U CN217034418U CN 217034418 U CN217034418 U CN 217034418U CN 202220062595 U CN202220062595 U CN 202220062595U CN 217034418 U CN217034418 U CN 217034418U
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- 230000003287 optical effect Effects 0.000 title claims abstract description 72
- 238000007639 printing Methods 0.000 title claims abstract description 21
- 238000000016 photochemical curing Methods 0.000 title abstract description 19
- 239000002086 nanomaterial Substances 0.000 claims abstract description 52
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 239000000463 material Substances 0.000 claims description 12
- 239000000945 filler Substances 0.000 claims description 8
- 230000010287 polarization Effects 0.000 claims description 7
- 210000001747 pupil Anatomy 0.000 claims description 4
- 235000005811 Viola adunca Nutrition 0.000 claims description 3
- 240000009038 Viola odorata Species 0.000 claims description 3
- 235000013487 Viola odorata Nutrition 0.000 claims description 3
- 235000002254 Viola papilionacea Nutrition 0.000 claims description 3
- 230000001419 dependent effect Effects 0.000 claims description 3
- 238000001723 curing Methods 0.000 abstract 3
- 238000010586 diagram Methods 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 5
- 238000010146 3D printing Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- SDGKUVSVPIIUCF-UHFFFAOYSA-N 2,6-dimethylpiperidine Chemical compound CC1CCCC(C)N1 SDGKUVSVPIIUCF-UHFFFAOYSA-N 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- 229910005540 GaP Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 241000237503 Pectinidae Species 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229950005630 nanofin Drugs 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 235000020637 scallop Nutrition 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Semiconductor Lasers (AREA)
Abstract
The application provides an optical system and contain its photocuring printing system, belongs to optics technical field. The optical system comprises at least one superlens and a light source; wherein the at least one superlens comprises a substrate and nanostructures; the nano structure is arranged on the surface of the substrate; the at least one super lens and the light source are arranged on the same optical axis; the light source is positioned on the focal plane of the at least one superlens; the first light emitted by the light source is modulated by the at least one superlens to form second light; the parallelism between the second light ray and the optical axis is higher than that between the first light ray and the optical axis. The optical system and the light-curing printing system comprising the same have the advantages that the collimating capability of the optical system in the light-curing printing system is improved through the at least one super lens, the volume of the optical system is reduced, and the miniaturization and the light weight of the light-curing printing system are promoted.
Description
Technical Field
The application relates to the technical field of optics, in particular to an optical system and a photocuring printing system comprising the same.
Background
The photocuring 3D printing technique is an additive manufacturing method that uses light to harden polymers into three-dimensional models. The core element of the photocuring 3D printing system is the optical system therein.
In a photocuring printing system in the related art, an aspheric refractive lens is used as an optical system, and light is projected onto a photopolymer through the aspheric refractive lens, so that the photopolymer is cured layer by layer to form a three-dimensional model.
The aspheric collimating and refracting lens adopted by the photo-curing printing system in the related art is large in size, heavy in weight and high in material and processing cost, so that the photo-curing printing system is difficult to miniaturize and lighten.
SUMMERY OF THE UTILITY MODEL
In order to solve the technical problem that the photocuring printing system is difficult to miniaturize and lighten in the related art, the embodiment of the application provides an optical system and a photocuring printing system comprising the same.
In a first aspect, an embodiment of the present application provides an optical system, including at least one superlens and a light source;
wherein the at least one superlens comprises a substrate and nanostructures; the nano structure is arranged on the surface of the substrate;
the at least one super lens and the light source are arranged on the same optical axis;
the light source is located on a focal plane of the at least one superlens;
the first light emitted by the light source is modulated by the at least one superlens to form second light; the parallelism between the second light ray and the optical axis is higher than that between the first light ray and the optical axis.
Optionally, the nanostructures are arranged on the surface of the substrate in a form of a close-packed pattern array;
the nanostructures are disposed at the vertices and/or central locations of the close-packable pattern.
Optionally, the close-packable pattern comprises one or more of a regular hexagon, a square, or a fan.
Optionally, the divergence angle of the second light ray at least satisfies:
where θ' is the divergence angle of the second light rays, f is the focal length of the at least one superlens, and d is the maximum dimension of the light source.
Optionally, the optical system at least satisfies:
D≥d+2ftan(θ)
wherein D is an entrance pupil diameter of the at least one superlens; d is the maximum dimension of the light source, θ is the half divergence angle of the light source, and f is the focal length of the at least one superlens.
Optionally, the at least one superlens is a monolithic superlens;
the phase of the single-chip super lens is rotationally symmetrical along the radius direction of the single-chip super lens.
Optionally, the at least one superlens satisfies at least any one of the following formulas:
wherein r is the distance from the center of the nanostructure on the at least one superlens to the center of the at least one superlens; f is the focal length of the at least one superlens; λ is the operating wavelength of the at least one superlens; a is aiAre coefficients.
Optionally, the optical system further comprises a refractive lens;
the refractive lens is cascaded with the at least one superlens.
Optionally, the nanostructure comprises a polarization-dependent structure.
Optionally, the nanostructure comprises a polarization-independent structure.
Optionally, the light source comprises a light emitting diode, an array of light emitting diodes, a laser light source or an array of laser light sources.
Optionally, the at least one superlens further comprises a filler material;
the filler material fills the voids between the nanostructures.
Optionally, the absolute value of the difference in refractive index between the filler material and the nanostructures is greater than or equal to 0.5.
Optionally, the operating wavelength band of the optical system includes a blue-violet light wavelength band or an ultraviolet light wavelength band.
On the other hand, the embodiment of the present application further provides a photocuring printing system, including the optical system provided in any of the above embodiments.
According to the optical system and the photocuring printing system comprising the same, the first light emitted by the light source is modulated into the second light through the at least one superlens, the parallelism between the second light and the optical axis is higher than that between the first light and the optical axis, the collimation capability of the optical system in the photocuring printing system is improved, the size of the optical system is greatly reduced, and the miniaturization and the light weight of the photocuring printing system are promoted.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments or the background art of the present application, the drawings required to be used in the embodiments or the background art of the present application will be described below.
FIG. 1 illustrates an alternative schematic configuration of an optical system provided by embodiments of the present application;
FIG. 2 is a schematic diagram illustrating an alternative configuration of an optical system according to an embodiment of the present disclosure;
FIG. 3 is a schematic diagram illustrating an alternative configuration of an optical system provided in an embodiment of the present application;
FIG. 4 is a schematic diagram of an alternative superstructure unit provided by embodiments of the present application;
FIG. 5 shows a schematic diagram of yet another alternative superstructure unit provided by embodiments of the present application;
FIG. 6 shows a schematic diagram of yet another alternative superstructure unit provided by embodiments of the present application;
FIG. 7 shows a schematic diagram of an alternative nanostructure provided by an embodiment of the present application;
FIG. 8 shows a schematic view of yet another alternative nanostructure provided by an embodiment of the present application;
FIG. 9 shows a schematic view of yet another alternative nanostructure provided by an embodiment of the present application;
FIG. 10 is a graph showing the distance of a nanostructure from the center of a superlens versus the phase of the superlens in accordance with an embodiment of the present application;
fig. 11 shows the phase and transmittance of the nanostructure provided by the embodiments of the present application.
The reference numerals in the drawings denote:
100-superlens; 101-a substrate; 102-a nanostructure;
200-a light source; 300-refractive lens.
Detailed Description
To facilitate an understanding of the present application, the present application will now be described more fully with reference to the accompanying drawings. Preferred embodiments of the present application are shown in the drawings. This application may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the description of the present application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
The surface of the super lens is provided with a sub-wavelength nano structure, and the phase, amplitude, polarization and other characteristics of incident light can be modulated according to the shape, size and arrangement form of the nano structure. The aspheric collimating and refracting lens in the prior art has the disadvantages of large volume, heavy weight, high material and processing cost, limited refractive index and limited collimating capability of incident light.
In view of this, the present embodiment provides an optical system, as shown in fig. 1 to 3, including at least one superlens 100 and a light source 200. Wherein the at least one superlens 100 comprises a substrate 101 and nanostructures 102; the at least one superlens 100 and the light source 200 are disposed on the same optical axis, and the light source 200 is located on a focal plane of the at least one superlens 100.
In some embodiments of the present application, the Light source 200 includes a Light-Emitting Diode (LED), an LED array, a laser Light source, or a laser array. Preferably, the center wavelength of the light source 200 is greater than or equal to 365nm and less than or equal to 405 nm. More advantageously, the bandwidth of the light source 200 is less than 100 nm. Optionally, the divergence angle of the light source 200 is greater than or equal to 25 ° and less than or equal to 150 °.
Optionally, the at least one superlens 100 includes a substrate 101 and nanostructures 102, the nanostructures 102 are arranged on the surface of the substrate 101 in an array in the form of a close-packed pattern, and the nanostructures 102 are disposed at the vertices and/or the central positions of the close-packed pattern. The close-packable pattern can increase the fill rate of the nanostructures 102, thereby enhancing the optical performance of the at least one superlens 100. As shown in fig. 4-6, the close-packable pattern includes one or more of regular hexagons, squares, or scallops.
Specifically, as shown in fig. 1, a first light emitted from a light source 200 is incident on at least one superlens 100, and is modulated by the arranged nanostructures 102 to form a second light. The second light ray is more parallel to the optical axis of the light source 200 than the first light ray. Generally, the closer to the center of the light source 200, the higher the parallelism of the first light ray with the optical axis of the light source 200; conversely, the closer to the edge position of the light source 200, the larger the included angle between the first ray and the optical axis of the light source 200, that is, the larger the divergence angle of the first ray.
As shown in fig. 7 to 9, in the embodiment of the present application, the nanostructure 102 may be a polarization-dependent structure, such as a nanofin or a nanoelliptic cylinder, which exerts a geometric phase on the incident first light; the nanostructures 102 may also be polarization independent structures, such as nanocylinders and nanosquares, which impart a propagation phase to the incident first light. Preferably, the nanostructures 102 are all dielectric building blocks, having high transmittance in the operating band. For example, the nanostructure 102 has a transmittance of greater than or equal to 20%, greater than or equal to 30%, greater than or equal to 40%, greater than or equal to 50%, greater than or equal to 60%, greater than or equal to 80%, greater than or equal to 90%, or greater than or equal to 95% at the operating band. Optionally, an operating wavelength band of the optical system provided in this embodiment of the present application includes a blue-violet wavelength band or an ultraviolet wavelength band. Illustratively, the material of the nanostructure 102 includes titanium oxide, silicon nitride, fused silica, aluminum oxide, gallium nitride, gallium phosphide, hafnium oxide, and the like. Optionally, the period of the nano-unit is 0.5 λc～1.0λcWherein λ iscIs the central wavelength of the working waveband. Preferably, the period of the nano-unit is between 180nm and 400 nm. The height of the nanostructure is in the range of 0.5 lambdac～1.5λcPreferably, the height of the nanostructures is between 200nm and 900 nm.
In some embodiments, the at least one superlens 100 further includes a filler material that fills voids between the nanostructures 102, the filler material being transparent in the operating band. Preferably, the absolute value of the difference in refractive index between the filler material and the nanostructures 102 is greater than or equal to 0.5.
It should be noted that the optical system provided in the embodiments of the present application is preferably a single superlens. In alternative embodiments, as shown in fig. 2 and 3, the at least one superlens 100 may be a cascade of at least two superlenses, or may be a hybrid optical system in which at least one superlens and a refractive lens 300 are cascaded. The parallelism of the second light ray and the optical axis can be enhanced by at least two super lens cascades; at least one superlens and refractive lens 300 cascade may be suitable for a wide spectrum light source 200. Preferably, when at least two superlenses are cascaded, the nanostructures of the at least two superlenses may share a substrate to further reduce the volume of the optical system.
In order to improve the parallelism of the second light ray with the optical axis, in a further aspect of the embodiment of the present application, the second light ray at least satisfies, through modulation by the at least one superlens 100:
in the above formula (2), θ' is a divergence angle of the second light, f is a focal length of the at least one superlens 100, and d is a maximum size of the light source 200.
In a further embodiment of the present application, in order to make the at least one superlens 100 modulate as much light as possible from the light source 200, the optical system provided by the examples of the present application at least satisfies:
D≥d+2ftan(θ) (1)
in the above formula (1), D is the entrance pupil diameter of at least one superlens 100; d is the maximum dimension of the light source 200, θ is the half divergence angle of the light source 200, and f is the focal length of the at least one superlens 100. Preferably, the light emitting area of the light source 200 is greater than or equal to 100 μm2And is less than or equal to 100mm2. In some alternative cases, the maximum size of the source, detector and superlens is the diameter of the circle circumscribed by the source, detector and superlens.
In some exemplary embodiments of the present application, it is preferable that the at least one superlens 100 is a single-piece superlens, and a phase of the single-piece superlens is rotationally symmetric in a radial direction of the single-piece superlens. At this time, the phase of the single chip superlens is a positive lens phase without spherical aberration. The monolithic superlens satisfies at least one of the following formulas:
in the above formula (3) and formula (4), r is the distance from the center of the nanostructure 102 on the monolithic superlens to the center of the monolithic superlens; f is the focal length of the single-chip super lens; λ is the operating wavelength; a isiAre coefficients. a isiAnd the phase coefficient is obtained by optimization according to different design requirements. For example, it can be optimized as a wheatstone superlens for off-axis aberration correction, or the like.
Example 1
An exemplary embodiment of the present application provides an optical system comprising a light source 200 and a superlens 100 arranged coaxially, the light source 200 being located in a focal plane of the superlens 100. Wherein the light source 200 has a central wavelength of 405nm, a divergence angle of 120 °, and a light-emitting area of 1.25 × 1.25mm2(i.e., a diagonal length of 1.77 mm). The substrate 101 of the superlens 100 is quartz glass with a thickness of 300 μm, the nano-structures 102 are cylindrical silicon nitride arranged in a regular hexagon, the side length of the regular hexagon is 400nm, and the height of the nano-structures 102 is 1100 nm.
The focal length of the superlens 100 is 10 mm. The entrance pupil diameter of the superlens 100 is 36.5mm by combining the formula (1) and the formula (2), and the divergence angle of the second light ray obtained after the first light ray emitted by the light source 200 is modulated by the superlens 100 is 10.1 °. The aperture of the light beam formed by the second light ray is 36.5 mm. From equation (3), the distance of the nanostructure 102 from the center of the superlens 100 is related to the phase of the superlens 100 as shown in FIG. 10.
The diameter of the nanostructures 102 is related to the phase and transmittance of the superlens 100 as shown in fig. 11. As can be seen from fig. 11, when the diameter of the nanostructure 102 is selected from [80nm, 320nm ], the phase coverage of the nanostructure 102 is 2 pi and the average transmittance is higher than 90%.
The embodiment of the application also provides a photocuring printing system which comprises the optical system provided by any one of the embodiments. The first light emitted by the light source 200 is modulated by the at least one superlens 100 to form a second light, and the parallelism between the second light and the optical axis is higher than that between the first light and the optical axis. In an alternative embodiment the second light may be used directly to cure the photopolymer.
The superlens 100 provided in any of the above embodiments may be manufactured by a semiconductor process, and the thickness of the superlens 100 is reduced by two orders of magnitude compared to an aspheric refractive lens having a thickness of millimeter to centimeter.
In summary, according to the optical system and the photocuring printing system including the same provided by the embodiment of the application, the first light emitted by the light source is modulated into the second light through the at least one superlens, and the parallelism between the second light and the optical axis is higher than that between the first light and the optical axis, so that the collimation capability of the optical system in the photocuring printing system is improved, the volume of the optical system is greatly reduced, and the miniaturization and the light weight of the photocuring printing system are promoted.
The above description is only a specific implementation of the embodiments of the present application, but the scope of the embodiments of the present application is not limited thereto, and any person skilled in the art can easily conceive of changes or substitutions within the technical scope of the embodiments disclosed in the present application, and all the changes or substitutions should be covered by the scope of the embodiments of the present application. Therefore, the protection scope of the embodiments of the present application shall be subject to the protection scope of the claims.
Claims (15)
1. An optical system, characterized in that it comprises at least one superlens (100) and a light source (200);
wherein the at least one superlens (100) comprises a substrate (101) and nanostructures (102); the nano-structure (102) is arranged on the surface of the substrate (101);
the at least one superlens (100) and the light source (200) are arranged coaxially;
the light source (200) is located in a focal plane of the at least one superlens (100);
the first light emitted by the light source (200) is modulated by the nano structure (102) to form second light; the parallelism of the second light ray and the optical axis is higher than that of the first light ray and the optical axis.
2. The optical system of claim 1,
the nano structures (102) are arranged on the surface of the substrate (101) in an array in a form of a close-packed pattern;
the nanostructures (102) are disposed at vertices and/or central locations of the close-packable pattern.
3. The optical system of claim 2, wherein the close-packable pattern comprises one or more of a regular hexagon, a square, or a sector.
4. An optical system according to any one of claims 1 to 3, wherein the divergence angle of the second light ray is at least such that:
where θ' is the divergence angle of the second light rays, f is the focal length of the at least one superlens (100), and d is the maximum dimension of the light source (200).
5. An optical system as set forth in any of claims 1-3, characterized in that the optical system at least satisfies:
D≥d+2f tan(θ)
wherein D is an entrance pupil diameter of the at least one superlens (100); d is the maximum dimension of the light source (200), θ is the half divergence angle of the light source (200), and f is the focal length of the at least one superlens (100).
6. An optical system according to any one of claims 1 to 3, characterized in that said at least one superlens (100) is a monolithic superlens;
the phase of the single-chip super lens is rotationally symmetrical along the radius direction of the single-chip super lens.
7. The optical system of claim 6, wherein the at least one superlens (100) satisfies at least one of the following equations:
wherein r is the distance from the center of the nanostructure (102) on the at least one superlens (100) to the center of the at least one superlens (100); f is the focal length of the at least one superlens (100); λ is the operating wavelength of said at least one superlens (100); a is aiAre coefficients.
8. An optical system according to any one of claims 1-3, characterized in that the optical system further comprises a refractive lens (300);
the refractive lens (300) is cascaded with the at least one superlens (100).
9. The optical system according to claim 2, wherein the nanostructure (102) comprises a polarization-dependent structure.
10. The optical system according to claim 2, wherein the nanostructures (102) comprise polarization-independent structures.
11. An optical system according to any one of claims 1-3, characterized in that the light source (200) comprises a light emitting diode, an array of light emitting diodes, a laser light source or an array of laser light sources.
12. The optical system according to any of claims 1 to 3, wherein the at least one superlens (100) further comprises a filling material;
the filler material fills voids between the nanostructures (102).
13. The optical system of claim 12, wherein an absolute value of a difference in refractive index between the filler material and the nanostructures (102) is greater than or equal to 0.5.
14. An optical system as claimed in any one of claims 1 to 3, characterized in that the operating band of the optical system comprises the blue-violet band or the ultraviolet band.
15. A stereolithographic printing system, comprising an optical system according to any of claims 1-14.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220062595.3U CN217034418U (en) | 2022-01-11 | 2022-01-11 | Optical system and photocuring printing system comprising same |
| PCT/CN2022/143108 WO2023134454A1 (en) | 2022-01-11 | 2022-12-29 | Optical system and photocuring printing system comprising same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN202220062595.3U CN217034418U (en) | 2022-01-11 | 2022-01-11 | Optical system and photocuring printing system comprising same |
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| CN217034418U true CN217034418U (en) | 2022-07-22 |
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| CN202220062595.3U Active CN217034418U (en) | 2022-01-11 | 2022-01-11 | Optical system and photocuring printing system comprising same |
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| WO (1) | WO2023134454A1 (en) |
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| WO2023134454A1 (en) * | 2022-01-11 | 2023-07-20 | 深圳迈塔兰斯科技有限公司 | Optical system and photocuring printing system comprising same |
| US11927769B2 (en) | 2022-03-31 | 2024-03-12 | Metalenz, Inc. | Polarization sorting metasurface microlens array device |
| US11978752B2 (en) | 2019-07-26 | 2024-05-07 | Metalenz, Inc. | Aperture-metasurface and hybrid refractive-metasurface imaging systems |
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| US12140778B2 (en) | 2018-07-02 | 2024-11-12 | Metalenz, Inc. | Metasurfaces for laser speckle reduction |
| US12416752B2 (en) | 2018-01-24 | 2025-09-16 | President And Fellows Of Harvard College | Polarization state generation with a metasurface |
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| CN117148547B (en) * | 2023-10-20 | 2025-12-12 | 深圳迈塔兰斯科技有限公司 | An optical system and an optical lens |
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| WO2017053309A1 (en) * | 2015-09-23 | 2017-03-30 | Osram Sylvania Inc. | Collimating metalenses and technologies incorporating the same |
| US11373321B2 (en) * | 2017-11-08 | 2022-06-28 | Samsung Electronics Co., Ltd. | Projector including meta-lens |
| CN109143663B (en) * | 2018-09-05 | 2021-09-24 | 上海天马微电子有限公司 | Liquid crystal display panel and 3D printer |
| US20230204824A1 (en) * | 2020-05-13 | 2023-06-29 | Scivax Corporation | Optical System Device |
| CN214983251U (en) * | 2021-04-07 | 2021-12-03 | 深圳市诺瓦机器人技术有限公司 | Photocuring 3D printer |
| CN113589535B (en) * | 2021-08-16 | 2023-01-03 | 北京京东方技术开发有限公司 | Optical imaging system and head-mounted display device |
| CN217034418U (en) * | 2022-01-11 | 2022-07-22 | 深圳迈塔兰斯科技有限公司 | Optical system and photocuring printing system comprising same |
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2022
- 2022-01-11 CN CN202220062595.3U patent/CN217034418U/en active Active
- 2022-12-29 WO PCT/CN2022/143108 patent/WO2023134454A1/en not_active Ceased
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US11988844B2 (en) | 2017-08-31 | 2024-05-21 | Metalenz, Inc. | Transmissive metasurface lens integration |
| US12411348B2 (en) | 2017-08-31 | 2025-09-09 | Metalenz, Inc. | Transmissive metasurface lens integration |
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| WO2023134454A1 (en) * | 2022-01-11 | 2023-07-20 | 深圳迈塔兰斯科技有限公司 | Optical system and photocuring printing system comprising same |
| US11927769B2 (en) | 2022-03-31 | 2024-03-12 | Metalenz, Inc. | Polarization sorting metasurface microlens array device |
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