CN216960288U - Plasma generating device based on creeping discharge - Google Patents
Plasma generating device based on creeping discharge Download PDFInfo
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- CN216960288U CN216960288U CN202123215544.4U CN202123215544U CN216960288U CN 216960288 U CN216960288 U CN 216960288U CN 202123215544 U CN202123215544 U CN 202123215544U CN 216960288 U CN216960288 U CN 216960288U
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- 239000000758 substrate Substances 0.000 claims abstract description 27
- 239000000919 ceramic Substances 0.000 claims abstract description 26
- 230000006698 induction Effects 0.000 claims abstract description 17
- 230000001939 inductive effect Effects 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 239000007789 gas Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- -1 oxygen ions Chemical class 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 210000001503 joint Anatomy 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Abstract
The utility model relates to the technical field of plasma generation, in particular to a plasma generation device based on creeping discharge, which comprises a ceramic substrate and a generation mechanism arranged on the ceramic substrate; the generating mechanism includes: the discharge electrode, the induction electrode, the left contact and the right contact; the discharge electrode is embedded in the top surface of the ceramic substrate and is contacted with air, the induction electrode is embedded in the ceramic substrate, and the discharge electrode and the induction electrode are arranged in parallel up and down; the left contact and the right contact are embedded in the bottom surface of the ceramic substrate and contacted with air, the left contact is connected to the discharge electrode, and the right contact is connected to the induction electrode. The plasma generating device based on the creeping discharge avoids the complex structure of the traditional device, ensures the long-time stable work of the electrode, can be carried about as a portable product, expands the application field of the plasma generating device and is convenient to use.
Description
Technical Field
The utility model relates to the technical field of plasma generation, in particular to a plasma generating device based on creeping discharge.
Background
At present, the traditional creeping discharge plasma generator comprises more than two creeping discharge modules which are arranged in pairs and are in a flat plate shape, the creeping discharge modules are arranged in parallel, the discharge surfaces of the two high-voltage discharge modules which are arranged in pairs are oppositely arranged, a gap is reserved between the discharge surfaces of the two high-voltage discharge modules to form a gas channel, the discharge modules are provided with medium cooling channels corresponding to the discharge surfaces for cooling the discharge surfaces, the structure is complex, the plasma generator is difficult to carry and use in certain specific occasions, and meanwhile, the generated plasma has oxidation corrosion to electrodes and brings uncertainty to long-time stable work of equipment. In view of this, we propose a plasma generating device based on creeping discharge.
SUMMERY OF THE UTILITY MODEL
The present invention is directed to a plasma generator based on creeping discharge to solve the above-mentioned problems.
In order to achieve the purpose, the utility model provides the following technical scheme:
a plasma generating device based on creeping discharge comprises a ceramic substrate and a generating mechanism arranged on the ceramic substrate;
the generating mechanism includes: the discharge electrode, the induction electrode, the left contact and the right contact; the discharge electrode is embedded in the top surface of the ceramic substrate and is contacted with air, the induction electrode is embedded in the ceramic substrate, and the discharge electrode and the induction electrode are arranged in parallel up and down; the left contact and the right contact are embedded in the bottom surface of the ceramic substrate and contacted with air, the left contact is connected to the discharge electrode, and the right contact is connected to the induction electrode.
Preferably, the discharge electrode and the inductive electrode are both in a C-shaped structure.
Preferably, the left contact is provided with a joint, the discharge electrode is provided with a notch, and the joint is embedded in the notch;
the right contact is provided with a columnar connector, the inducing electrode is provided with a connecting hole, and the columnar connector is embedded in the connecting hole.
Compared with the prior art, the utility model has the beneficial effects that: the plasma generating device based on the creeping discharge avoids the complex structure of the traditional device, ensures the long-time stable work of the electrode, can be carried about as a portable product, expands the application field of the plasma generating device and is convenient to use.
Drawings
FIG. 1 is a schematic overall front view of the present invention;
FIG. 2 is a schematic view of the overall bottom structure of the present invention;
FIG. 3 is a schematic diagram of the structure of the discharge electrode and the induction electrode of the present invention;
fig. 4 is a schematic structural diagram of a left contact and a right contact in the utility model.
In the figure: 1. a ceramic substrate; 2. a generating mechanism; 21. a discharge electrode; 211. a notch; 22. a dielectric electrode; 221. connecting holes; 23. a left contact; 231. a joint; 24. a right contact; 241. a columnar joint.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.
Referring to fig. 1-4, a technical solution provided by the present invention is:
a plasma generating device based on creeping discharge comprises a ceramic substrate 1 and a generating mechanism 2 arranged on the ceramic substrate 1; the generating mechanism 2 includes: a discharge electrode 21, an inductive electrode 22, a left contact 23 and a right contact 24; wherein, the discharge electrode 21 is embedded on the top surface of the ceramic substrate 1 and contacts with the air, the inductive electrode 22 is embedded in the ceramic substrate 1, and the discharge electrode 21 and the inductive electrode 22 are arranged in parallel up and down; the left contact 23 and the right contact 24 are embedded in the bottom surface of the ceramic substrate 1 and are in contact with air, the left contact 23 is connected to the discharge electrode 21, and the right contact 24 is connected to the dielectric electrode 22. Therefore, the high-frequency high-voltage power supply is connected with the external through the left contact 23 and the right contact 24, when the applied current passes through the two electrodes, electrons moving at high speed collide with oxygen molecules, corona discharge occurs between the parallel surfaces of the discharge electrode 21 and the induction electrode 22 which are arranged in parallel up and down, oxygen-bearing gas in the air is ionized, the concentration of oxygen-bearing ions around the discharge electrode is greatly increased, the oxygen ions and the oxygen molecules react with each other to form plasma, and because the discharge electrode 21 on the surface of the substrate is covered with a protective layer, and the induction electrode 22 is embedded in the ceramic substrate 1, the ceramic substrate 1 has good insulating property, can prevent the physical damage and the water erosion of the external to the electrode, avoids the complex structure of the traditional device, meanwhile, the ceramic substrate 1 can ensure the stable operation of the electrode for a long time, can be carried about as a portable product, and expands the application field of the plasma generating device, is convenient to use.
It is worth to be noted that the discharge electrode 21 and the inductive electrode 22 are both C-shaped structures, and the discharge electrode 21 and the inductive electrode 22 in this embodiment are symmetrically arranged, so that two ends of the C-shaped structure of the discharge electrode 21 are vertically parallel to the C-shaped structure of the inductive electrode 22, and the discharge area is increased under the condition of reducing the product volume, and plasma can be efficiently and stably produced.
Furthermore, a joint 231 is arranged on the left contact 23, a notch 211 is arranged on the discharge electrode 21, and the joint 231 is embedded in the notch 211; be provided with the column on the right contact 24 and connect 241, be provided with the hole 221 on the induced electrode 22, and the column connects 241 scarf joint in the hole 221, is convenient for left contact 23 and right contact 24 reliably connect, prevents that the connecting point department from taking place the outage, improves the life of product.
When the plasma generating device based on the creeping discharge is used, the plasma generating device is connected with an external high-frequency high-voltage power supply through the left contact 23 and the right contact 24, when an external current passes through the two electrodes, electrons moving at a high speed collide with oxygen molecules, corona discharge is generated between the parallel surfaces of the discharge electrode 21 and the induction electrode 22 which are arranged in parallel up and down, oxygen-carrying gas in the air is ionized, the concentration of oxygen-containing ions around the discharge electrode is greatly increased, the oxygen ions and the oxygen molecules react with each other to form plasma, and because the discharge electrode 21 and the induction electrode 22 are embedded on the ceramic substrate 1, a protective layer on the surface of the electrode and the ceramic substrate 1 have good insulating property, the physical damage and the moisture erosion of the outside to the electrode can be prevented, the complex structure of the traditional device is avoided, the long-time stable work of the electrode is ensured, and the plasma generating device can be carried about as a portable product, the application field of the plasma generating device is expanded, and the use is convenient.
The foregoing shows and describes the general principles, essential features, and advantages of the utility model. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, and the preferred embodiments of the present invention are described in the above embodiments and the description, and are not intended to limit the present invention. The scope of the utility model is defined by the appended claims and equivalents thereof.
Claims (3)
1. A plasma generating device based on creeping discharge is characterized by comprising a ceramic substrate (1) and a generating mechanism (2) arranged on the ceramic substrate (1);
the generating mechanism (2) comprises: a discharge electrode (21), a dielectric electrode (22), a left contact (23) and a right contact (24); the discharge electrode (21) is embedded in the top surface of the ceramic substrate (1) and is in contact with air, the induction electrode (22) is embedded in the ceramic substrate (1), and the discharge electrode (21) and the induction electrode (22) are arranged in parallel up and down; the left contact (23) and the right contact (24) are embedded in the bottom surface of the ceramic substrate (1) and contacted with air, the left contact (23) is connected to the discharge electrode (21), and the right contact (24) is connected to the induction electrode (22).
2. The creeping discharge-based plasma generating apparatus according to claim 1, wherein: the discharge electrode (21) and the inductive electrode (22) are both in a C-shaped structure.
3. The creeping discharge-based plasma generating apparatus according to claim 1, wherein: a joint (231) is arranged on the left contact (23), a notch (211) is arranged on the discharge electrode (21), and the joint (231) is embedded in the notch (211);
the right contact (24) is provided with a columnar joint (241), the induction electrode (22) is provided with a connecting hole (221), and the columnar joint (241) is embedded in the connecting hole (221).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123215544.4U CN216960288U (en) | 2021-12-20 | 2021-12-20 | Plasma generating device based on creeping discharge |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123215544.4U CN216960288U (en) | 2021-12-20 | 2021-12-20 | Plasma generating device based on creeping discharge |
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| Publication Number | Publication Date |
|---|---|
| CN216960288U true CN216960288U (en) | 2022-07-12 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202123215544.4U Active CN216960288U (en) | 2021-12-20 | 2021-12-20 | Plasma generating device based on creeping discharge |
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| Country | Link |
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| CN (1) | CN216960288U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114340130A (en) * | 2021-12-20 | 2022-04-12 | 徐叶杰 | A plasma generator based on creeping discharge |
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2021
- 2021-12-20 CN CN202123215544.4U patent/CN216960288U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114340130A (en) * | 2021-12-20 | 2022-04-12 | 徐叶杰 | A plasma generator based on creeping discharge |
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