CN215066955U - Measuring device for square resistance of thin film - Google Patents
Measuring device for square resistance of thin film Download PDFInfo
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- CN215066955U CN215066955U CN202120147268.3U CN202120147268U CN215066955U CN 215066955 U CN215066955 U CN 215066955U CN 202120147268 U CN202120147268 U CN 202120147268U CN 215066955 U CN215066955 U CN 215066955U
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- measuring
- rotating roller
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- probe
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- 239000010409 thin film Substances 0.000 title claims description 12
- 239000000523 sample Substances 0.000 claims abstract description 88
- 230000002093 peripheral effect Effects 0.000 claims abstract description 4
- 239000010408 film Substances 0.000 claims description 33
- 238000005259 measurement Methods 0.000 claims description 13
- 239000004020 conductor Substances 0.000 claims description 3
- 239000011810 insulating material Substances 0.000 claims description 3
- 238000001514 detection method Methods 0.000 abstract description 3
- 238000012360 testing method Methods 0.000 description 14
- 239000000758 substrate Substances 0.000 description 10
- 238000009434 installation Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000003064 anti-oxidating effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000009659 non-destructive testing Methods 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
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- Measurement Of Resistance Or Impedance (AREA)
Abstract
The utility model discloses a measuring device of film square resistance, include: a support; the rotating roller is arranged on the bracket, and the rotating speed of the rotating roller is matched with the advancing speed of the film to be detected; the driving device is used for driving the rotating roller to rotate; at least one group of measuring probes arranged on the rotating roller, wherein the measuring probes belonging to the same group are arranged on the peripheral surface of the rotating roller along the direction parallel to the axis of the rotating roller, and each measuring probe has a measuring state of contacting with a film to be measured; acting between the measuring probe and the rotating roller to make the measuring probe press against the elastic part of the film to be measured in a measuring state. The application provides a film square resistance measuring device is applicable to the square resistance of the film product on the on-line detection assembly line.
Description
Technical Field
The utility model relates to a resistance measurement technical field especially relates to a measuring device of film square resistance.
Background
Referring to fig. 1, in the prior art, a four-probe tester is generally used for testing a sheet resistor, during testing, a test probe of the four-probe tester is pressed on a test membrane surface with a certain force and kept relatively static, and after data to be tested is stable, the test instrument records test data.
Based on the testing principle of the four-probe, the probe of the four-probe tester is required to keep relatively static with the sample in the testing process, so that the four-probe tester is difficult to be used in a continuous magnetron sputtering coating production line (a substrate can move continuously) to monitor the sheet resistance of a film layer on line.
The eddy current sheet resistance tester can carry out non-contact measurement on the sheet resistance of the film layer, but based on the principle of eddy current generation, the measurement has certain limitation on the material of the film layer, is only suitable for metal, cannot accurately measure the sheet resistance of some non-metal film layers (such as conductive oxide films with relatively high resistivity), and the cost of the eddy current tester is increased by several times to ten times compared with that of a four-probe.
SUMMERY OF THE UTILITY MODEL
Based on this, provide a measuring device of film square resistance, be applicable to the square resistance of the film product on the on-line measuring assembly line.
A thin film sheet resistance measuring device comprising:
a support;
the rotating roller is arranged on the bracket, and the rotating speed of the rotating roller is matched with the advancing speed of the film to be detected;
the driving device is used for driving the rotating roller to rotate;
at least one group of measuring probes arranged on the rotating roller, wherein the measuring probes belonging to the same group are arranged on the peripheral surface of the rotating roller along the direction parallel to the axis of the rotating roller, and each measuring probe has a measuring state of contacting with a film to be measured;
acting between the measuring probe and the rotating roller to make the measuring probe press against the elastic part of the film to be measured in a measuring state.
Several alternatives are provided below, but not as an additional limitation to the above general solution, but merely as a further addition or preference, each alternative being combinable individually for the above general solution or among several alternatives without technical or logical contradictions.
Optionally, the plurality of groups of measuring probes are arranged around the periphery of the rotating roller.
Optionally, each group of measuring probes is four measuring probes arranged at equal intervals, and each measuring probe is made of a conductive material.
Optionally, the end of each measuring probe contacting the film to be measured protrudes from the outer circumferential surface of the rotating roller.
Optionally, the axis extension lines of the measuring probes intersect at a point, and the plane where the axis extension lines of the measuring probes are located is perpendicular to the axis of the rotating roller.
Optionally, the rotating roller is made of an insulating material, and an installation cavity for accommodating the measuring probe is arranged on the rotating roller.
Optionally, the elastic member is a spring, the spring is located in the installation cavity, and two ends of the spring are respectively connected with the rotating roller and the measuring probe.
Optionally, the number of the installation cavities is at least one, and the measurement probes belonging to the same group are located in the same installation cavity.
Optionally, the end of the measuring probe in contact with the thin film to be measured is conical, and the top of the conical end is in contact with the thin film to be measured.
Optionally, the rotating roller is of an integral structure or a split structure.
The application provides a film square resistance measuring device is applicable to the square resistance of the film product on the on-line detection assembly line.
Drawings
FIG. 1 is a schematic diagram of a four-probe tester testing sheet resistance;
FIG. 2 is a schematic diagram of a measuring apparatus for sheet resistance of the present application;
FIG. 3 is a view taken along the line A in FIG. 2;
FIG. 4 is a schematic diagram illustrating the testing of sheet resistance by the measuring apparatus for sheet resistance of thin film of the present application;
in the figure: 1. a rotating roller; 2. a substrate; 3. a measuring probe; 31. a measuring probe; 32. a measuring probe; 33. a measuring probe; 34. and (4) measuring the probe.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
It will be understood that when an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. When a component is referred to as being "disposed on" another component, it can be directly on the other component or intervening components may also be present.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "or/and" includes any and all combinations of one or more of the associated listed items.
Referring to fig. 2, 3 and 4, a measuring apparatus for sheet resistance of a thin film includes:
a support;
the rotating roller 1 is arranged on the bracket, and the rotating speed of the rotating roller is matched with the advancing speed of the film to be detected;
a driving device for driving the rotating roller 1 to rotate;
at least one group of measuring probes 3 arranged on the rotating roller 1, wherein the measuring probes 3 belonging to the same group are arranged on the peripheral surface of the rotating roller 1 along the direction parallel to the axis of the rotating roller 1, and each measuring probe 3 has a measuring state of contacting with a film to be measured;
acting between the measuring probe 3 and the rotating roller 1 to make the measuring probe 3 press against the elastic piece of the film to be measured in the measuring state.
The substrate 2 bears the film to be measured, the film to be measured moves synchronously with the substrate 2, and when the measuring probe 3 is pressed against the film to be measured, the pressure is borne by the substrate 2.
This application is integrated to 1 with measuring probe 3 on the live-rollers, and live-rollers 1 passes through the drive arrangement drive and rotates, and the drive arrangement of live-rollers 1 and substrate 2 can adopt step motor, or other mechanical structure control, and the transmission speed of substrate 2 and the slew velocity phase-match of live-rollers 1.
Referring to fig. 2, the substrate 2 is transported at a speed v and the rotating roller 1 has an angular velocity ω, where v ═ ω r is required to ensure a relative stationary state between the measuring probe and the substrate 2.
The measuring device for the sheet resistance of the film can measure the sheet resistance of the film on line, and is particularly suitable for measuring the sheet resistance of the film on line on a magnetron sputtering production line.
Referring to fig. 2 and 3, the measuring probes 3 are in one group, and the measuring probes 3 may be in multiple groups, wherein the multiple groups of measuring probes 3 are arranged around the periphery of the rotating roller 1. The number of groups of measuring probes 3 and the distance between the groups are arranged according to the actual test requirements.
Referring to fig. 4, each group of four measuring probes 3 is arranged at equal intervals, and each measuring probe 3 is made of a conductive material.
In the application, the measurement principle of a four-probe tester is adopted between the measurement probes 3 belonging to the same group for square resistance detection, during the test, the width of the film to be tested is far larger than the probe distance of the measurement probes 3 in the same direction, as shown in fig. 4, during the test, constant direct current (generally 0.5-2mA) is loaded on the measurement probe 31 and the measurement probe 34, and a potential difference meter is used for testing the voltage between the measurement probe 32 and the measurement probe 33. Measured sheet resistance R□cU/I. c is a proportionality coefficient, and the correction is carried out according to different conditions. When the measuring probe is brought into sufficient contact with the substrate 2, R□And (4) stabilizing.
Referring to fig. 2 and 3, the end of each measuring probe 3 contacting the film to be measured protrudes from the outer circumferential surface of the rotating roller 1. The rotating roller 1 is not contacted with the film to be measured all the time, and only the measuring probe 3 is contacted with the film to be measured.
The axis extensions of the measuring probes 3 intersect at one point, and the plane in which the axis extensions of the measuring probes 3 are located is perpendicular to the axis of the rotating roll 1. When measuring, the measuring probe 3 is vertically pressed against the film to be measured.
The rotating roller 1 is made of an insulating material, and an installation cavity for accommodating the measuring probe 3 is formed in the rotating roller 1. The number of the installation cavities is at least one, and the measurement probes 3 belonging to the same group are positioned in the same installation cavity. The rotating roller 1 may be made of plastic such as polytetrafluoroethylene. Each measuring probe 3 is made of gold, silver or copper material with good conductivity (not limited to these materials, other wear-resistant materials with good conductivity can also be used), and the surface is subjected to anti-oxidation treatment.
Referring to fig. 2 and 3, the elastic member is a spring, the spring is located in the installation cavity, and two ends of the spring are respectively connected with the rotating roller 1 and the measuring probe 3.
Referring to fig. 4, the end of the measuring probe 3 contacting the thin film to be measured is tapered, and the top of the taper contacts the thin film to be measured.
The rotating roller 1 is of an integral structure or a split structure. The rotating roller 1 is of a split structure, and the installation cavity is arranged on the splicing surface of the split structure, so that the measuring probe 3 can be conveniently installed.
According to the application, the measuring probe 3 is integrated on the same rotating roller 1, so that low-cost nondestructive testing can be performed on the film square resistor moving on the production line.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only represent some embodiments of the present invention, and the description thereof is specific and detailed, but not to be construed as limiting the scope of the present invention. It should be noted that, for those skilled in the art, without departing from the spirit of the present invention, several variations and modifications can be made, which are within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the appended claims.
Claims (10)
1. A device for measuring sheet resistance of a thin film, comprising:
a support;
the rotating roller is arranged on the bracket, and the rotating speed of the rotating roller is matched with the advancing speed of the film to be detected;
the driving device is used for driving the rotating roller to rotate;
at least one group of measuring probes arranged on the rotating roller, wherein the measuring probes belonging to the same group are arranged on the peripheral surface of the rotating roller along the direction parallel to the axis of the rotating roller, and each measuring probe has a measuring state of contacting with a film to be measured;
acting between the measuring probe and the rotating roller to make the measuring probe press against the elastic part of the film to be measured in a measuring state.
2. The apparatus according to claim 1, wherein the measuring probes are provided in plural sets, and the plural sets of measuring probes are arranged around the outer periphery of the rotating roll.
3. The apparatus according to claim 1, wherein each group of the measuring probes is four measuring probes arranged at equal intervals, and each measuring probe is made of a conductive material.
4. The apparatus for measuring sheet resistance according to claim 1, wherein an end portion of each measuring probe contacting the film to be measured protrudes from an outer circumferential surface of the rotating roller.
5. The apparatus for measuring sheet resistance according to claim 1, wherein the axis extensions of the measuring probes intersect at a point, and the plane on which the axis extensions of the measuring probes are located is perpendicular to the axis of the rotating roll.
6. The apparatus according to claim 1, wherein the rotatable roller is made of an insulating material, and the rotatable roller is provided with a mounting cavity for receiving the measuring probe.
7. The apparatus according to claim 6, wherein the elastic member is a spring, the spring is located in the mounting cavity, and two ends of the spring are respectively connected to the rotating roller and the measuring probe.
8. The apparatus according to claim 6, wherein the at least one mounting cavity is provided, and the measurement probes of the same group are located in the same mounting cavity.
9. The apparatus according to claim 1, wherein the end of the measuring probe contacting the thin film to be measured is tapered, and the top of the taper contacts the thin film to be measured.
10. The apparatus of claim 1, wherein the rotating roller is of an integral structure or a separate structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120147268.3U CN215066955U (en) | 2021-01-19 | 2021-01-19 | Measuring device for square resistance of thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120147268.3U CN215066955U (en) | 2021-01-19 | 2021-01-19 | Measuring device for square resistance of thin film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215066955U true CN215066955U (en) | 2021-12-07 |
Family
ID=79251534
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202120147268.3U Active CN215066955U (en) | 2021-01-19 | 2021-01-19 | Measuring device for square resistance of thin film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN215066955U (en) |
-
2021
- 2021-01-19 CN CN202120147268.3U patent/CN215066955U/en active Active
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