[go: up one dir, main page]

CN214393790U - Electromagnetic type polishing device with adjustable gravity center - Google Patents

Electromagnetic type polishing device with adjustable gravity center Download PDF

Info

Publication number
CN214393790U
CN214393790U CN202022814797.2U CN202022814797U CN214393790U CN 214393790 U CN214393790 U CN 214393790U CN 202022814797 U CN202022814797 U CN 202022814797U CN 214393790 U CN214393790 U CN 214393790U
Authority
CN
China
Prior art keywords
polishing
electromagnet
gravity
polishing device
center
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202022814797.2U
Other languages
Chinese (zh)
Inventor
邱磊
柯晓龙
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xiamen University of Technology
Original Assignee
Xiamen University of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xiamen University of Technology filed Critical Xiamen University of Technology
Priority to CN202022814797.2U priority Critical patent/CN214393790U/en
Application granted granted Critical
Publication of CN214393790U publication Critical patent/CN214393790U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

The utility model discloses an electromagnetic type polishing device with adjustable gravity center, which comprises a polishing disk, a power transmission mechanism, a gravity center adjusting mechanism and a bracket; the power transmission mechanism comprises a motor and a power main shaft, and the power main shaft is flexibly connected with the polishing disk; the gravity center adjusting mechanism comprises an electromagnet and a permanent magnet, the electromagnet is fixedly arranged above the polishing disk, and a gap is reserved between the electromagnet and the polishing disk; the polishing disc is internally provided with a cavity, and the permanent magnet is arranged in the cavity. The utility model discloses utilize the electromagnetic force of electro-magnet, later reach the problem that reduces the edge effect through the focus of adjusting polishing dish, and can realize real-time accurate control.

Description

Electromagnetic type polishing device with adjustable gravity center
Technical Field
The utility model belongs to the technical field of the optical element finish machining, a polishing machining tool of optical element precision polishing is related to, in particular to adjustable focus burnishing device of electromagnetic type.
Background
In the field of optical element finishing technology, no matter classical machining or computer controlled surface forming technology (CCOS), when the edge area of a workpiece is machined, the contact pressure is increased due to the fact that the contact area is reduced (because the polishing disc partially extends out of the workpiece) and the polishing stress is not changed, so that the removal amount of the edge of the workpiece is increased, and the edge effect phenomenon of 'edge collapse' is caused, and the edge effect can seriously hinder the convergence of the surface shape error of the workpiece and even reduce the effective caliber of the workpiece.
The chinese patent application No. 201910092105.7 discloses an optical element polishing tool and a polishing method, the tool does not need to install a splice block for auxiliary processing, the movement range of a grinding disc is extended to the outer region of the element, the grinding disc does not overturn, the processing conditions of the edge region and the middle region of the element are consistent, the edge effect problems such as edge collapse or edge warping surface shape are effectively eliminated, and the high-precision processing of the full-aperture surface shape of the optical element is realized.
Cn201610836440.x discloses a polishing assembly for adjusting pressure distribution at edge area of optical element, which is used for adjusting pressure distribution at edge area of optical element during polishing process of edge area of optical element, so as to change material removal distribution at edge area and suppress edge effect. However, the technology can only change the position of the polishing component through the movable joint, so as to change the force application position to the polishing disk, but cannot adjust the force application size, and further cannot solve the purpose of online adjustment according to the actual processing requirement.
SUMMERY OF THE UTILITY MODEL
The utility model aims to solve the technical problem that a focus burnishing device is adjustable to electromagnetic type is provided, its focus through adjusting the polishing dish reaches the problem that reduces the edge effect, and can realize real-time accurate control.
In order to solve the technical problem, the technical solution of the utility model is that:
an electromagnetic polishing disk mechanism with adjustable gravity center comprises a polishing disk, a power transmission mechanism, a gravity center adjusting mechanism and a bracket; the power transmission mechanism comprises a motor and a power main shaft, and the power main shaft is flexibly connected with the polishing disk; the gravity center adjusting mechanism comprises an electromagnet and a permanent magnet, the electromagnet is fixedly arranged above the polishing disk, and a gap is reserved between the electromagnet and the polishing disk; the polishing disc is internally provided with a cavity, and the permanent magnet is arranged in the cavity.
Preferably, a boss is arranged in the accommodating cavity, and the permanent magnet is an annular permanent magnet and is mounted on the boss through a magnet bearing.
Preferably, the flexible connection structure between the polishing disk and the power spindle is as follows: the polishing disc is provided with a polishing disc, a pair of cylindrical lugs is arranged at the bottom of the power spindle, a mounting hole is formed in the polishing disc, a straight groove is formed in the mounting hole, and the cylindrical lugs and the straight groove are matched and clamped to form flexible connection.
Preferably, the flexible connection structure between the polishing disk and the power spindle is a flexible transmission shaft, that is, the flexible transmission shaft is connected between the polishing disk and the power spindle.
Preferably, the polishing disc comprises a base, a middle cover plate and an upper cover plate, wherein the peripheral edges of the base, the middle cover plate and the upper cover plate are hermetically installed together through nuts and screws, the middle cover plate divides a containing cavity between the base and the upper cover plate into an upper part and a lower part, the lower part forms an air bag cavity, and the upper part forms the containing cavity.
Preferably, the bottom of the polishing disk is provided with a polishing pad.
Preferably, the electromagnets are provided with one, two or more electromagnets, and the electromagnets are uniformly distributed on the same circumference when the electromagnets are provided with a plurality of electromagnets.
Preferably, the support include electro-magnet support frame and motor cabinet, this motor cabinet is installed on the electro-magnet support frame, the electro-magnet install on this electro-magnet support frame.
Preferably, the middle of the electromagnet support frame is provided with a shaft hole, a bearing is installed in the shaft hole, and the magnet support frame is installed on the power main shaft through the bearing.
After the scheme is adopted, the utility model discloses compare with current burnishing tool, the utility model discloses the advantage lies in:
1. adjustable polishing dish of electromagnetic type focus, replaced traditional edge polishing method, need not the supplementary splice of installation, control is simple, the operation is easy going. When the polishing disc moves to the edge area of the optical element, the polishing disc enables the stress of the edge area of the workpiece to be reduced and the stress of the middle area to be increased under the action of electromagnetic force, so that an effect of reverse stress compensation is achieved, the removal amount of the edge area and the removal amount of the middle area of the workpiece are consistent, the problem of edge effect can be reduced or eliminated while the machining efficiency is guaranteed, and the polishing machining of the full-aperture surface shape of the workpiece is achieved.
2. The utility model discloses an electromagnetic force can be estimated through the distance that polishing dish exposes the work piece edge, then uses host computer software to control to can adjust according to the processing effect of work piece, finally eliminate edge effect problem such as the edge of collapsing, realize the polishing processing of the full bore shape of face of work piece.
3. The electromagnetic force can lead to input voltage's size and direction and realize accurate control, from this focus guiding mechanism can realize real-time regulation and accurate control to polishing dish's effort.
In a word, adjustable polishing dish mechanism of electromagnetic type focus and polishing method thereof, utilize the electromagnetic force of electro-magnet, can reduce marginal effect through the focus of adjusting the polishing dish, have easy operation, characteristics such as the practicality is strong, can automated control.
Drawings
Fig. 1 is a schematic external structural view of a first embodiment of a polishing disk mechanism according to the present invention;
FIG. 2 is a schematic cross-sectional view of a polishing platen according to a first embodiment of the polishing platen mechanism of the present invention;
FIG. 3 is a schematic structural view of a flexible connection between a polishing plate and a transmission shaft according to a first embodiment of the polishing plate mechanism of the present invention;
fig. 4 is a schematic external structural view of a second embodiment of the polishing disk mechanism according to the present invention;
fig. 5 is a schematic external structural view of a third embodiment of the polishing disk mechanism according to the present invention;
FIG. 6 is a schematic cross-sectional view of a polishing pad according to a third embodiment of the polishing pad mechanism of the present invention;
FIG. 7 is a schematic structural diagram of a polishing disk, a flexible transmission shaft and a power spindle according to a third embodiment of the polishing disk mechanism of the present invention;
fig. 8 is an external schematic view of an electromagnet structure according to a third embodiment of the polishing disk mechanism of the present invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments. It should be noted that the technical features related to the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
The utility model discloses an electromagnetic type adjustable polishing dish mechanism of focus, as shown in fig. 1-3, is the first preferred embodiment of the utility model. The polishing disc mechanism comprises a polishing disc 1, a power transmission mechanism 2, a gravity center adjusting mechanism 3 and a support 4. Wherein:
the polishing disk 1 can be a common grindstone-shaped polishing disk or an air bag-shaped polishing disk. In this embodiment, the polishing disk 1 is a balloon-shaped polishing disk, i.e., a balloon chamber is provided therein. Specifically, the polishing disc 1 may include a base 11 and an upper cover 12, which are sealed and fixed at their peripheral edges, and a sealed air bag chamber 13 is provided between them to form a common air bag polishing disc. Further, the air bag cavity 13 is filled with non-Newtonian liquid 14, so that a non-Newtonian liquid polishing disk is formed. In addition, the bottom of the polishing disk 1 may be provided with a polishing pad 15, and specifically, the bottom surface of the polishing disk 1 may be adhered with the polishing pad 15 made of polyurethane, damping cloth, or other materials as a polishing working surface.
The power transmission mechanism 2 is used for transmitting power to the polishing disk 1, the power transmission mechanism 2 at least comprises a motor 21 and a power main shaft 22, the lower end of the power main shaft 22 is connected with the top of the polishing disk 1, and the power main shaft 22 and the top of the polishing disk 1 are flexibly connected, so that the whole polishing disk 1 can freely deflect at a certain angle under the action of external force. The specific flexible connection structure is matched with the structure shown in fig. 3, a pair of cylindrical bumps 221 is arranged at the bottom of the power spindle 22, a mounting hole 16 is formed in the polishing disc 1, a straight groove 17 is formed in the mounting hole 16, and during mounting, the cylindrical bumps 221 and the straight groove 17 are matched and clamped to form flexible connection. In use, the power spindle 22 provides rotational power to the polishing disk 1, and the polishing disk 1 can swing freely around the cylindrical protrusion 221 under the action of external force, so as to change the center of gravity. In addition, the motor 21 can be connected with the power spindle 22 by using a coupling 23 to transmit power.
The gravity center adjusting mechanism 3 comprises an electromagnet 31 and a permanent magnet 32, the electromagnet 31 is fixedly arranged above the polishing disk 1, and a gap can be left between the electromagnet 31 and the polishing disk 1. The permanent magnet 32 is mounted on the polishing pad 1, and may be mounted on the upper surface of the polishing pad 1 or mounted in the polishing pad 1. Preferably, the polishing pad 1 is installed inside, and in particular, a cavity 18 may be provided inside the polishing pad 1, and the permanent magnet 32 may be installed inside the cavity 18. Further, a boss 181 may be disposed in the cavity 18, the boss 181 may be disposed below the upper cover plate 12, and the permanent magnet 32 is a ring-shaped permanent magnet, and is mounted on the boss 181 through a magnet bearing 33. The purpose of the magnet bearing 33 is to reduce the movement of the permanent magnet 32, reduce the radial shearing component force generated by the acting force of the electromagnet 31 and the permanent magnet 32, and further reduce the difficulty of force analysis. For the airbag-shaped polishing pad 1, a middle cover plate 19 may be further provided, the middle cover plate 19 divides the cavity between the base 11 and the upper cover plate 12 into an upper part and a lower part, the lower part forms the airbag cavity 13, and the upper part forms the cavity 18. And the base 11, the middle cover plate 19 and the upper cover plate 12 may be mounted together by nuts and screws.
The support 4 is used for supporting various parts, and may include an electromagnet support frame 41 and a motor base 42, the motor base 42 is installed on the electromagnet support frame 41, and the spindle motor 22 and the coupling 23 are installed on the motor base 42. The electromagnet 31 is mounted on the electromagnet support 41.
The work piece principle of focus guiding mechanism 3 does: when the polishing disk 1 is exposed on a workpiece, the electromagnet 31 generates attraction or repulsion by adjusting the magnitude or direction of the current of an external power supply to attract the permanent magnet 32 in the polishing disk 1, the electromagnetic repulsion near the center of the workpiece is increased, the electromagnetic attraction near the edge of the workpiece is increased, the polishing disk generates center-of-gravity shift under the action of the resultant force of magnetic force, the polishing stress of the workpiece in the middle area is increased, the stress on the edge area is reduced, the removal amount of the middle area and the edge area of the workpiece is consistent, an effect of reverse stress compensation is achieved, and the generation of edge effect is reduced.
The electromagnet 31 in the gravity center adjusting mechanism 3 of the present invention may be installed in one (as shown in fig. 1) or in multiple (as shown in fig. 4). When one electromagnet 31 is installed, the electromagnet can well respond to the change of a direct current power supply, and the influence of inconsistent response speeds of a plurality of electromagnets is avoided; however, only one action point of the magnetic force is easy to cause stress concentration at the action point, so that the stress distribution on the surface of the workpiece cannot be improved well. When a plurality of electromagnets 31 are installed, the stress distribution on the surface of the workpiece can be improved by applying force to multiple points of the polishing disk 1, but because of a purely mechanical mechanism, the response speed of each electromagnet cannot be guaranteed to be consistent, which may cause inconsistent magnetic force and uneven stress distribution, however, because the polishing disk rotates at a high speed, the influence of the factor is reduced, and therefore, preferably, the number of the electromagnets is three, and the electromagnets are uniformly arranged on the same circumference.
As shown in fig. 5 to 8, in order to implement the third embodiment of the present invention, the polishing disk mechanism of this embodiment also includes a polishing disk 1, a power transmission mechanism 2, a gravity center adjusting mechanism 3, and a bracket 4, and the same reference numerals are used for the same structure as that of the first embodiment in the drawings, and detailed description is omitted.
The difference of this embodiment is: the flexible connection between the power spindle 22 and the polishing disk 1 is a flexible transmission shaft, that is, the two are connected by a flexible transmission shaft 5.
Another difference of this embodiment is that: the middle of the electromagnet support frame 41 is provided with a shaft hole, a bearing 6 is arranged in the shaft hole, and the electromagnet support frame 41 is arranged on the power main shaft 22 through the bearing 6.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the technical scope of the present invention, so that all changes and modifications made according to the claims and the specification of the present invention should fall within the scope covered by the present invention.

Claims (9)

1.一种电磁式可调重心抛光装置,其特征在于:包括抛光盘(1)、动力传动机构(2)、重心调整机构(3)以及支架(4);所述的动力传动机构(2)包括电机(21)及动力主轴(22),该动力主轴与该抛光盘(1)之间采用柔性连接;所述的重心调整机构(3)包括电磁铁(31)和永久磁铁(32),该电磁铁(31)固定安装在该抛光盘(1)的上方,且该电磁铁(31)与抛光盘(1)之间留有间隙;所述的抛光盘(1)内设置有一容腔(18),所述永久磁铁(32)安装在该容腔内。1. An electromagnetic adjustable center of gravity polishing device, characterized in that: comprising a polishing disc (1), a power transmission mechanism (2), a center of gravity adjustment mechanism (3) and a bracket (4); the power transmission mechanism (2) ) includes a motor (21) and a power spindle (22), and a flexible connection is adopted between the power spindle and the polishing disc (1); the center of gravity adjustment mechanism (3) includes an electromagnet (31) and a permanent magnet (32) , the electromagnet (31) is fixedly installed above the polishing disc (1), and a gap is left between the electromagnet (31) and the polishing disc (1); the polishing disc (1) is provided with a container A cavity (18) in which the permanent magnet (32) is installed. 2.根据权利要求1所述的一种电磁式可调重心抛光装置,其特征在于:所述的容腔(18)内设置有凸台(181),所述永久磁铁(32)为环形永久磁铁,其通过磁铁轴承(33)安装在该凸台(181)上。2 . The electromagnetic adjustable gravity center polishing device according to claim 1 , wherein a boss ( 181 ) is arranged in the cavity ( 18 ), and the permanent magnet ( 32 ) is an annular permanent magnet. 3 . A magnet is mounted on the boss (181) through a magnet bearing (33). 3.根据权利要求1所述的一种电磁式可调重心抛光装置,其特征在于:所述抛光盘(1)与动力主轴(22)之间的柔性连接结构为:所述动力主轴(22)底部设有一对圆柱形凸块(221),所述抛光盘(1)上设有安装孔(16),该安装孔内设有直槽(17),该圆柱形凸块(221)与直槽(17)配合卡固形成柔性连接。3. The electromagnetic adjustable center of gravity polishing device according to claim 1, wherein the flexible connection structure between the polishing disc (1) and the power spindle (22) is: the power spindle (22) ) bottom is provided with a pair of cylindrical projections (221), the polishing disc (1) is provided with a mounting hole (16), the mounting hole is provided with a straight groove (17), the cylindrical projection (221) and The straight groove (17) cooperates with the clamping to form a flexible connection. 4.根据权利要求1所述的一种电磁式可调重心抛光装置,其特征在于:所述抛光盘(1)与动力主轴(22)之间的柔性连接结构为柔性传动轴,即两者之间采用柔性传动轴(5)进行连接。4. An electromagnetic adjustable center of gravity polishing device according to claim 1, characterized in that: the flexible connection structure between the polishing disc (1) and the power spindle (22) is a flexible transmission shaft, that is, both A flexible transmission shaft (5) is used for connection between them. 5.根据权利要求1所述的一种电磁式可调重心抛光装置,其特征在于:所述的抛光盘(1)包括基座(11)、中盖板(19)与上盖板(12),三者四周边缘通过螺母和螺钉密封安装在一起,且该中盖板将基座与上盖板之间的容腔分成上下两部分,下部分形成气囊腔(13),上部分形成所述的容腔(18)。5 . The electromagnetic adjustable center of gravity polishing device according to claim 1 , wherein the polishing disc ( 1 ) comprises a base ( 11 ), a middle cover plate ( 19 ) and an upper cover plate ( 12 ). 6 . ), the surrounding edges of the three are sealed together by nuts and screws, and the middle cover plate divides the cavity between the base and the upper cover plate into upper and lower parts, the lower part forms the air bag cavity (13), and the upper part forms the described cavity (18). 6.根据权利要求1所述的一种电磁式可调重心抛光装置,其特征在于:所述的抛光盘(1)底部设有抛光垫(15)。6 . The electromagnetic adjustable center of gravity polishing device according to claim 1 , wherein a polishing pad ( 15 ) is provided at the bottom of the polishing disc ( 1 ). 7 . 7.根据权利要求1所述的一种电磁式可调重心抛光装置,其特征在于:所述的电磁铁(31)设置有一个、两个或者多个,而设置多个时为在同一圆周均匀分布。7. An electromagnetic adjustable gravity center polishing device according to claim 1, characterized in that: the electromagnets (31) are provided with one, two or more, and when a plurality of electromagnets (31) are provided, they are on the same circumference Evenly distributed. 8.根据权利要求1所述的一种电磁式可调重心抛光装置,其特征在于:所述的支架(4)包括电磁铁支撑架(41)及电机座(42),该电机座安装在电磁铁支撑架上,所述的电磁铁(31)安装在该电磁铁支撑架(41)上。8 . The electromagnetic adjustable center of gravity polishing device according to claim 1 , wherein the bracket ( 4 ) comprises an electromagnet support frame ( 41 ) and a motor seat ( 42 ), and the motor seat is installed on the On the electromagnet support frame, the electromagnet (31) is installed on the electromagnet support frame (41). 9.根据权利要求8所述的一种电磁式可调重心抛光装置,其特征在于:所述的电磁铁支撑架(41)中间设有轴孔,轴孔内安装有轴承(6),该磁铁支撑架(41)通过该轴承安装在动力主轴(22)上。9 . The electromagnetic adjustable center of gravity polishing device according to claim 8 , wherein the electromagnet support frame ( 41 ) is provided with a shaft hole in the middle, and a bearing ( 6 ) is installed in the shaft hole. 10 . The magnet support frame (41) is mounted on the power main shaft (22) through the bearing.
CN202022814797.2U 2020-11-29 2020-11-29 Electromagnetic type polishing device with adjustable gravity center Active CN214393790U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202022814797.2U CN214393790U (en) 2020-11-29 2020-11-29 Electromagnetic type polishing device with adjustable gravity center

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202022814797.2U CN214393790U (en) 2020-11-29 2020-11-29 Electromagnetic type polishing device with adjustable gravity center

Publications (1)

Publication Number Publication Date
CN214393790U true CN214393790U (en) 2021-10-15

Family

ID=78036633

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202022814797.2U Active CN214393790U (en) 2020-11-29 2020-11-29 Electromagnetic type polishing device with adjustable gravity center

Country Status (1)

Country Link
CN (1) CN214393790U (en)

Similar Documents

Publication Publication Date Title
CN102172866B (en) Local pressure controllable planar optical element polishing device
CN102765012B (en) Flexible controllable air bag polishing tool based on electrorheological fluid
KR940007405B1 (en) Micro-abrading method and tool
US6183342B1 (en) Polishing apparatus
KR20000068030A (en) Ophthalmic lens generating apparatus having vibration dampening structure
JPH03178767A (en) Micropolishing method and micropolishing tool
JP2827540B2 (en) Polishing spindle
CN112605848A (en) Electromagnetic polishing disk mechanism with adjustable gravity center and polishing method
CN102785131A (en) Rigidity-controllable small grinding tool polishing disk based on magnetorheological fluid and polishing method
CN214393790U (en) Electromagnetic type polishing device with adjustable gravity center
JPH04336954A (en) Micro-polishing method and micro-polishing tool
CN112621458A (en) Spring type polishing disc mechanism with adjustable gravity center and polishing method
JP2005040917A (en) Electrical discharge machining device
CN214213364U (en) A spring-type adjustable center of gravity polishing device
JPH0319031B2 (en)
CN206981930U (en) Radial ultrasonic vibration aids in micro- texture rolling erosion electrolytic machining device
JP4073117B2 (en) Grinding and polishing holding device
CN115284124A (en) Grinding device for inner spherical surface of bearing and using method thereof
CN112605789B (en) Track control type polishing mechanism with adjustable gravity center and polishing method
US3056962A (en) Apparatus for maintaining a predetermined air gap between a transducer head and a record medium in a magnetic data storage device
JP2000317825A (en) Polishing apparatus including attitude control device for substrate holding device
JP3143582B2 (en) Hydrostatic bearing device and positioning stage using the same
JP2938593B2 (en) Polishing tool holding device and polishing head provided with the polishing tool holding device
JP2001062695A (en) Polishing tool and polishing device
JP2021137908A (en) Polishing head system and polishing equipment

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant