Background
The polymer commonly used for pressure-sensitive adhesives may be a rubber such as natural rubber, polyisobutylene rubber, butyl rubber, and may also be various resins such as atactic polypropylene, acrylic resin, silicone resin, fluorine resin, etc. Fluorine is an active nonmetal, has strong oxidizing ability, and fluorine ions in hydrofluoric acid have small radius, so that the hydrofluoric acid has strong permeability, a compact oxide film cannot prevent the permeation, and the hydrofluoric acid can strongly corrode metal, glass and silicon-containing base materials.
When hydrofluoric acid was etched partial surface of substrate (like the glass screen), current pressure sensitive tape was difficult to play fine guard action, even there was a few pressure sensitive tape to play resistant hydrofluoric acid effect, nevertheless it was torn to remove after the substrate surface and has had the cull, still need additionally clear away through removing the cull technology, has reduced production efficiency, leads to the substrate surface to receive wearing and tearing easily.
Disclosure of Invention
In order to overcome the defects and deficiencies in the prior art, the utility model aims to provide a pressure-sensitive adhesive tape which is easy to remove adhesive and is resistant to hydrofluoric acid.
The purpose of the utility model is realized through the following technical scheme: the hydrofluoric acid-resistant pressure-sensitive adhesive tape is composed of a release layer, a hydrofluoric acid-resistant pressure-sensitive adhesive layer and a thermal shrinkage layer which are sequentially compounded, wherein the hydrofluoric acid-resistant pressure-sensitive adhesive layer is formed by coating hydrofluoric acid-resistant acrylic acid pressure-sensitive adhesive on the release layer and then thermally curing.
Preferably, the release layer is a release film.
Preferably, the heat shrinkable layer is a POF heat shrinkable film.
Preferably, the thickness of the release layer is 50-100 μm.
Preferably, the thickness of the hydrofluoric acid resistant pressure sensitive adhesive layer is 10-30 μm.
Preferably, the thickness of the heat-shrinkable layer is 30 to 60 μm.
The beneficial effects of the utility model reside in that: the hydrofluoric acid resistant pressure sensitive adhesive tape is formed by coating hydrofluoric acid resistant acrylic acid pressure sensitive adhesive on a release layer and then thermally curing, and then transferring and coating one surface of the hydrofluoric acid resistant pressure sensitive adhesive layer to a thermal shrinkage layer to enable the hydrofluoric acid resistant pressure sensitive adhesive layer and the thermal shrinkage layer to be tightly bonded; when the adhesive tape is used, the release layer is torn off, the other surface of the hydrofluoric acid resistant pressure sensitive adhesive layer is attached to the surface of the base material, the protective effect can be achieved, the situation that the protected part is still corroded when part of the surface of the base material is etched by hydrofluoric acid is avoided, the adhesive tape is cleaned after the etching is finished, the thermal shrinkage layer shrinks to drive the hydrofluoric acid resistant pressure sensitive adhesive layer to shrink together under the condition of 80-100 ℃, and therefore the adhesive tape is removed and no adhesive residue exists.
Detailed Description
In order to facilitate understanding of those skilled in the art, the present invention will be further described with reference to the following examples and accompanying drawings, which are not intended to limit the present invention.
As shown in fig. 1, the hydrofluoric acid resistant pressure sensitive adhesive tape comprises a release layer 1, a hydrofluoric acid resistant pressure sensitive adhesive layer 2 and a thermal shrinkage layer 3 which are sequentially compounded, wherein the hydrofluoric acid resistant pressure sensitive adhesive layer 2 is formed by coating hydrofluoric acid resistant acrylic acid pressure sensitive adhesive on the release layer 1 and then thermally curing.
According to the hydrofluoric acid resistant pressure sensitive adhesive tape, the hydrofluoric acid resistant pressure sensitive adhesive layer 2 is formed by coating hydrofluoric acid resistant acrylic acid pressure sensitive adhesive on the release layer 1 and then thermally curing, and then one side of the hydrofluoric acid resistant pressure sensitive adhesive layer 2 is transferred and coated to the thermal shrinkage layer 3, so that the hydrofluoric acid resistant pressure sensitive adhesive layer 2 and the thermal shrinkage layer 3 are tightly bonded; when the adhesive tape is used, the release layer 1 is torn off, the other surface of the hydrofluoric acid resistant pressure sensitive adhesive layer 2 is attached to the surface of the base material, the protective effect can be achieved, the situation that the protected part is still corroded when part of the surface of the base material is etched by hydrofluoric acid is avoided, the adhesive tape is cleaned after the etching is finished, the thermal shrinkage layer 3 is shrunk to drive the hydrofluoric acid resistant pressure sensitive adhesive layer 2 to shrink together at the temperature of 80-100 ℃, and therefore the adhesive tape is removed and no adhesive residue exists. The acrylic pressure-sensitive adhesive resistant to hydrofluoric acid is a pressure-sensitive adhesive sold on the market, has the characteristics of thermosetting and hydrofluoric acid resistance, and is only used as an application.
In this embodiment, the release layer 1 is a release film.
By adopting the technical scheme, the hydrofluoric acid-resistant pressure-sensitive adhesive layer 2 is convenient to protect before use, and the hydrofluoric acid-resistant effect is prevented from being reduced due to the fact that hydrofluoric acid permeates along gaps in the etching process caused by the fact that the hydrofluoric acid-resistant pressure-sensitive adhesive layer 2 is stained with water or dust.
In the present embodiment, the heat shrinkable layer 3 is a POF heat shrinkable film.
By adopting the technical scheme, the POF heat shrinkable film is a commercially available heat shrinkable film which shrinks under the condition of 80-100 ℃, is short for biaxially oriented polyolefin shrink film, has high transparency, high shrinkage, high toughness, high heat sealing performance, excellent antistatic property and cold resistance, is safe and reliable, and is only used as a soft shrink film.
In this embodiment, the thickness of the release layer 1 is 50 to 100 μm.
By adopting the technical scheme, the hydrofluoric acid-resistant pressure-sensitive adhesive layer 2 is protected by enough thickness before use, and the hydrofluoric acid-resistant effect is prevented from being reduced due to permeation of hydrofluoric acid along gaps in the etching process caused by water or dust of the hydrofluoric acid-resistant pressure-sensitive adhesive layer 2. Preferably, the thickness of the release layer is 50 μm, 55 μm, 60 μm, 65 μm, 70 μm, 80 μm, 90 μm or 100 μm, and more preferably, the thickness of the release layer is 65 μm.
In the embodiment, the thickness of the hydrofluoric acid resistant pressure sensitive adhesive layer 2 is 10-30 μm.
By adopting the technical scheme, if the thickness of the hydrofluoric acid resistant pressure sensitive adhesive layer 2 is less than 10 microns, the hydrofluoric acid resistant effect is poor due to too thin thickness, and if the thickness of the hydrofluoric acid resistant pressure sensitive adhesive layer 2 is more than 30 microns, the hydrofluoric acid resistant time is longer, the hydrofluoric acid etching process is completed excessively, waste is caused, and the cost is higher. Preferably, the thickness of the hydrofluoric acid resistant pressure sensitive adhesive layer is 10 μm, 12 μm, 15 μm, 18 μm, 20 μm, 25 μm, 28 μm or 30 μm, and more preferably, the thickness of the hydrofluoric acid resistant pressure sensitive adhesive layer is 20 μm.
In this embodiment, the thickness of the heat-shrinkable layer 3 is 30 to 60 μm.
By adopting the technical scheme, the hydrofluoric acid-resistant pressure-sensitive adhesive layer 2 is ensured to be driven to shrink when the film is thermally shrunk, so that the film is convenient to remove. Preferably, the thickness of the heat-shrinkable layer is 30 μm, 32 μm, 35 μm, 38 μm, 40 μm, 45 μm, 48 μm, 50 μm, 55 μm, 58 μm or 60 μm, and more preferably, the thickness of the heat-shrinkable layer is 40 μm.
The above-mentioned embodiment is the utility model discloses the implementation of preferred, in addition, the utility model discloses can also realize by other modes, not deviating from the utility model discloses any obvious replacement is all within the protection scope under the prerequisite of design.