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CN211122509U - Spectrometer structure and electronic equipment - Google Patents

Spectrometer structure and electronic equipment Download PDF

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CN211122509U
CN211122509U CN201921824428.2U CN201921824428U CN211122509U CN 211122509 U CN211122509 U CN 211122509U CN 201921824428 U CN201921824428 U CN 201921824428U CN 211122509 U CN211122509 U CN 211122509U
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modulation
light
spectrometer
light modulation
modulation layer
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崔开宇
蔡旭升
朱鸿博
黄翊东
张巍
冯雪
刘仿
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Tsinghua University
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Abstract

The utility model relates to an optical device technical field discloses a spectrum appearance structure and electronic equipment, including the lens, still include: the optical filter is arranged below the lens and used for filtering light with a specific waveband irradiated on the lens; and a light modulation layer disposed below the optical filter, wherein the light of different frequency bands emitted from the optical filter is modulated by the light modulation layer to obtain a modulated spectrum. The spectrometer structure has the advantages of high spectral analysis precision, short scanning time and low cost.

Description

光谱仪结构及电子设备Spectrometer structure and electronic equipment

技术领域technical field

本实用新型涉及光学器件技术领域,特别是涉及一种光谱仪结构及电子设备。The utility model relates to the technical field of optical devices, in particular to a spectrometer structure and electronic equipment.

背景技术Background technique

光谱仪(Spectrometers)是将成分复杂的光分解为光谱线的科学仪器,由棱镜或衍射光栅等构成,利用光谱仪可测量物体表面反射的光线。通过光谱仪对光信息进行抓取、照相底片显影或通过电脑自动显示数值仪器来进行显示和分析,从而测知物品中含有何种元素。光谱仪被广泛地应用于空气污染、水污染、食品卫生、金属工业等的检测中。Spectrometers are scientific instruments that decompose light with complex components into spectral lines, which are composed of prisms or diffraction gratings. The light information is captured by the spectrometer, the photographic film is developed, or the computer automatically displays the numerical instrument for display and analysis, so as to detect what elements are contained in the article. Spectrometers are widely used in the detection of air pollution, water pollution, food hygiene, metal industry, etc.

传统的光谱检测由于其体积大及使用环境受限,无法满足现场检测和实时监控的需求。对基于移动平台光谱检测系统的研究,不仅可以改善传统光谱检测方式的不足,而且还能够实现将光谱检测系统向微型智能化方向的转型升级,对现代实时光谱检测技术的发展具有重大意义。Due to its large size and limited use environment, traditional spectral detection cannot meet the needs of on-site detection and real-time monitoring. The research on the spectral detection system based on the mobile platform can not only improve the shortcomings of traditional spectral detection methods, but also realize the transformation and upgrading of the spectral detection system to the direction of miniature intelligence, which is of great significance to the development of modern real-time spectral detection technology.

在现有的光谱仪与手机相结合的技术方案中,多需要附加一个分光模块,且现有的分光模块都不成熟,存在光路长和组件复杂的问题,由此,无法顺利地将该分光模块集成在手机等现有的拍摄设备上。此外,现有的分光模块仅仅是只有一层滤光片阵列,光谱分析的精度不够,且还存在扫描时间过长的问题。In the existing technical solution of combining a spectrometer with a mobile phone, one more spectroscopic module needs to be added, and the existing spectroscopic module is immature, and there are problems of long optical path and complicated components. Therefore, the spectroscopic module cannot be smoothly Integrate into existing shooting equipment such as mobile phones. In addition, the existing spectroscopic module only has only one layer of filter array, the precision of spectral analysis is not enough, and there is also the problem that the scanning time is too long.

实用新型内容Utility model content

(一)要解决的技术问题(1) Technical problems to be solved

本实用新型的目的是提供一种光谱仪结构及电子设备,以解决现有技术中的分光模块存在光谱分析精度低的技术问题。The purpose of the utility model is to provide a spectrometer structure and electronic equipment, so as to solve the technical problem of low spectral analysis precision in the spectroscopic module in the prior art.

(二)技术方案(2) Technical solutions

为了解决上述技术问题,根据本实用新型的第一方面,提供一种光谱仪结构,包括镜片,还包括:滤光片,所述滤光片设置在所述镜片的下方,用于滤除照射在镜片上的特定波段的光;以及光调制层,所述光调制层设置在所述滤光片的下方,其中,通过所述光调制层对从所述滤光片射出的不同频段的光进行调制,以得到调制后的光谱。In order to solve the above technical problems, according to the first aspect of the present invention, a spectrometer structure is provided, which includes a lens, and further includes: a filter, which is arranged under the lens and is used to filter out the light of a specific wavelength band on the lens; and a light modulation layer, the light modulation layer is arranged under the filter, wherein the light of different frequency bands emitted from the filter is processed by the light modulation layer modulation to obtain a modulated spectrum.

其中,所述光谱仪结构还包括设置在所述光调制层和所述滤光片之间的衬底。Wherein, the spectrometer structure further includes a substrate disposed between the light modulation layer and the filter.

其中,所述光调制层包括设置在所述衬底的下表面的底板和至少一个调制单元,各个所述调制单元均位于所述底板上,每个所述调制单元内分别设有多个穿设于所述底板内的调制孔,同一所述调制单元内的各个所述调制孔排布成具有第一排布规律的二维图形结构。Wherein, the light modulation layer includes a bottom plate disposed on the lower surface of the substrate and at least one modulation unit, each of the modulation units is located on the bottom plate, and each of the modulation units is respectively provided with a plurality of through-holes. The modulation holes provided in the bottom plate, and the modulation holes in the same modulation unit are arranged in a two-dimensional pattern structure with a first arrangement rule.

其中,所述二维图形结构的第一排布规律包括:同一所述二维图形结构内的所有所述调制孔均具有相同的截面形状,各个所述调制孔按照结构参数大小的渐变顺序呈阵列式排布;和/或同一所述二维图形结构内的各个所述调制孔分别具有相应的截面形状,各个所述调制孔按照第二截面形状进行组合排列。Wherein, the first arrangement rule of the two-dimensional graphic structure includes: all the modulation holes in the same two-dimensional graphic structure have the same cross-sectional shape, and each of the modulation holes is arranged in a gradual order according to the size of the structure parameter. and/or each of the modulation holes in the same two-dimensional pattern structure respectively has a corresponding cross-sectional shape, and each of the modulation holes is arranged in combination according to the second cross-sectional shape.

其中,所述调制孔的结构参数包括但不限于内径、长轴长度、短轴长度、旋转角度、边长或角数;所述调制孔的截面形状包括但不限于圆形、椭圆形、十字形、正多边形、星形或矩形。Wherein, the structural parameters of the modulation hole include but are not limited to inner diameter, long axis length, short axis length, rotation angle, side length or number of angles; the cross-sectional shape of the modulation hole includes but not limited to circle, ellipse, ten Glyph, Regular Polygon, Star or Rectangle.

其中,所述光调制层通过沉积或刻蚀形成在所述衬底的下表面。Wherein, the light modulation layer is formed on the lower surface of the substrate by deposition or etching.

其中,所述光调制层占所述衬底的下表面的全部面积或部分面积。Wherein, the light modulation layer occupies the entire area or part of the area of the lower surface of the substrate.

其中,所述滤光片设置在所述衬底的上表面的不同区域并沉积不同的滤光层,所述滤光片与下方的所述光调制层中的各个所述调制单元相对应。Wherein, the optical filters are disposed in different regions on the upper surface of the substrate and deposit different optical filter layers, and the optical filters correspond to the respective modulation units in the underlying light modulation layer.

其中,所述光谱仪结构还包括用于成像以及接收经所述光调制层调制后的光谱的CMOS图像传感器,所述CMOS图像传感器设置在所述光调制层的下表面;所述光谱仪结构还包括用于信号处理,将差分响应重构,以得到原光谱及图像的信号处理电路,所述信号处理电路设置在所述CMOS图像传感器的下表面。Wherein, the spectrometer structure further includes a CMOS image sensor for imaging and receiving the spectrum modulated by the light modulation layer, the CMOS image sensor is arranged on the lower surface of the light modulation layer; the spectrometer structure further includes For signal processing, the differential response is reconstructed to obtain a signal processing circuit of the original spectrum and image, and the signal processing circuit is arranged on the lower surface of the CMOS image sensor.

根据本实用新型的第二方面,还提供一种电子设备,包括上述所述的光谱仪结构。According to the second aspect of the present invention, there is also provided an electronic device including the above-mentioned spectrometer structure.

(三)有益效果(3) Beneficial effects

本实用新型提供的光谱仪结构,与现有技术相比,具有如下优点:Compared with the prior art, the spectrometer structure provided by the utility model has the following advantages:

光经镜片照射在滤光片上,该滤光片可以滤除照射在镜片上的特定波段的光,也可滤除人眼无法识别的红外光。通过光调制层对从滤光片射出的不同频段的光进行调制,该调制作用包括但不限于光的散射、吸收、投射、反射、干涉、表面等离子激元以及谐振等,同时,利用光调制层内的二维图形结构的区别从而来提高不同区域间的光谱响应的差异性,提高光谱仪结构的分析精度。The light is irradiated on the filter through the lens, and the filter can filter out the light of a specific wavelength band irradiated on the lens, and can also filter out the infrared light that cannot be recognized by the human eye. The light of different frequency bands emitted from the filter is modulated by the light modulation layer, and the modulation effects include but are not limited to light scattering, absorption, projection, reflection, interference, surface plasmon and resonance, etc. At the same time, the use of light modulation The difference of the two-dimensional pattern structure in the layer can improve the difference of the spectral response between different regions and improve the analysis accuracy of the spectrometer structure.

附图说明Description of drawings

图1为本实用新型的实施例一的光谱仪结构的整体爆炸结构示意图;1 is a schematic diagram of the overall explosion structure of the spectrometer structure according to Embodiment 1 of the present invention;

图2为本实用新型的实施例一的光谱仪结构的侧面结构示意图;2 is a schematic side view of the structure of the spectrometer according to the first embodiment of the present invention;

图3为图1中的光调制层的整体结构示意图;FIG. 3 is a schematic diagram of the overall structure of the light modulation layer in FIG. 1;

图4为本实用新型的实施例二的光谱仪结构的整体爆炸结构示意图;4 is a schematic diagram of the overall explosion structure of the spectrometer structure according to the second embodiment of the present invention;

图5为本实用新型的实施例二的光谱仪结构的侧面结构示意图;5 is a schematic side view of the structure of the spectrometer according to the second embodiment of the present invention;

图6为图4中的光调制层的实施例一的整体结构示意图;FIG. 6 is a schematic diagram of the overall structure of the first embodiment of the light modulation layer in FIG. 4;

图7为图4中的光调制层的实施例二的整体结构示意图;FIG. 7 is a schematic diagram of the overall structure of the second embodiment of the light modulation layer in FIG. 4;

图8为图4中的滤光片的整体结构示意图。FIG. 8 is a schematic diagram of the overall structure of the optical filter in FIG. 4 .

附图标记:Reference number:

1:镜片;2:电机马达;3:滤光片;4:衬底;5:光调制层;6:CMOS图像传感器;7:信号处理电路;8:调制单元;9:调制孔;10:第一调制单元;11:第二调制单元;12:第三调制单元;13:第四调制单元;14:第五调制单元;15:空白单元;16:滤光单元。1: lens; 2: motor; 3: filter; 4: substrate; 5: light modulation layer; 6: CMOS image sensor; 7: signal processing circuit; 8: modulation unit; 9: modulation hole; 10: 11: second modulation unit; 12: third modulation unit; 13: fourth modulation unit; 14: fifth modulation unit; 15: blank unit; 16: filter unit.

具体实施方式Detailed ways

下面结合附图和实施例,对本实用新型的具体实施方式作进一步详细描述。以下实例用于说明本实用新型,但不用来限制本实用新型的范围。The specific embodiments of the present utility model will be described in further detail below with reference to the accompanying drawings and embodiments. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

在本实用新型的描述中,需要理解的是,术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”“内”、“外”、“顺时针”、“逆时针”、“轴向”、“径向”、“周向”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本实用新型和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本实用新型的限制。In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inside", "Outside", "Clockwise", "Counterclockwise", "Axial" The orientation or positional relationship indicated by , "radial direction", "circumferential direction", etc. are based on the orientation or positional relationship shown in the accompanying drawings, which are only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying the indicated device. Or the elements must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present invention.

此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本实用新型的描述中,“多个”的含义是至少两个,例如两个,三个等,除非另有明确具体的限定。In addition, the terms "first" and "second" are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, a feature delimited with "first", "second" may expressly or implicitly include at least one of that feature. In the description of the present invention, "plurality" means at least two, such as two, three, etc., unless otherwise expressly and specifically defined.

在本实用新型中,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或成一体;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系,除非另有明确的限定。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本实用新型中的具体含义。In the present utility model, unless otherwise expressly specified and limited, the terms "installation", "connection", "connection", "fixed" and other terms should be understood in a broad sense, for example, it may be a fixed connection or a detachable connection connected, or integrated; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication between two elements or the interaction between the two elements, unless otherwise clearly defined. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific situations.

在本实用新型中,除非另有明确的规定和限定,第一特征在第二特征“上”或“下”可以是第一和第二特征直接接触,或第一和第二特征通过中间媒介间接接触。而且,第一特征在第二特征“之上”、“上方”和“上面”可是第一特征在第二特征正上方或斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”可以是第一特征在第二特征正下方或斜下方,或仅仅表示第一特征水平高度小于第二特征。In the present invention, unless otherwise expressly specified and defined, a first feature "on" or "under" a second feature may be in direct contact with the first and second features, or the first and second features through an intermediary indirect contact. Also, the first feature being "above", "over" and "above" the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is level higher than the second feature. The first feature being "below", "below" and "below" the second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature has a lower level than the second feature.

在本说明书的描述中,参考术语“一个实施例”、“一些实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本实用新型的至少一个实施例或示例中。在本说明书中,对上述术语的示意性表述不必须针对的是相同的实施例或示例。而且,描述的具体特征、结构、材料或者特点可以在任一个或多个实施例或示例中以合适的方式结合。此外,在不相互矛盾的情况下,本领域的技术人员可以将本说明书中描述的不同实施例或示例以及不同实施例或示例的特征进行结合和组合。In the description of this specification, description with reference to the terms "one embodiment," "some embodiments," "example," "specific example," or "some examples", etc., mean specific features described in connection with the embodiment or example , structure, material or feature is included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, those skilled in the art may combine and combine the different embodiments or examples described in this specification, as well as the features of the different embodiments or examples, without conflicting each other.

如图1至图8所示,图中示意性地显示了该光谱仪结构包括镜片1、滤光片3以及光调制层5。本申请的光谱仪结构可以集成在手机、相机或其它具有拍摄功能的电子设备的镜头上。As shown in FIG. 1 to FIG. 8 , the spectrometer structure is schematically shown including a lens 1 , a filter 3 and a light modulation layer 5 . The spectrometer structure of the present application can be integrated on the lens of a mobile phone, a camera or other electronic equipment with a photographing function.

在本申请的实施例中,镜片1用于接收入射光,对物体进行成像。In the embodiment of the present application, the lens 1 is used to receive incident light to image an object.

该滤光片3设置在该镜片1的下方,用于滤除照射在镜片1上的特定波段的光,实现分波段的光谱分析及高质量成像。该特定波段的光可为能透过800nm(纳米)以下的光。The filter 3 is arranged below the lens 1, and is used to filter out the light of a specific wavelength band irradiated on the lens 1, so as to realize spectral analysis of sub-bands and high-quality imaging. The light of the specific wavelength band can be light that can transmit below 800 nm (nanometer).

该光调制层5设置在该滤光片3的下方,其中,通过该光调制层5对从该滤光片3射出的不同频段的光进行调制,以得到调制后的光谱。具体地,光经镜片1照射在滤光片3上。通过光调制层5对从滤光片3射出的不同频段的光进行调制,该调制作用包括但不限于光的散射、吸收、投射、反射、干涉、表面等离子激元以及谐振等,同时,利用光调制层5内的二维图形结构的区别从而来提高不同区域间的光谱响应的差异性,提高光谱仪结构的分析精度。The light modulation layer 5 is disposed under the optical filter 3 , wherein the light in different frequency bands emitted from the optical filter 3 is modulated by the optical modulation layer 5 to obtain the modulated spectrum. Specifically, the light is irradiated on the filter 3 through the lens 1 . The light of different frequency bands emitted from the optical filter 3 is modulated by the light modulation layer 5, and the modulation effects include but are not limited to light scattering, absorption, projection, reflection, interference, surface plasmon polaritons, and resonance. The difference of the two-dimensional pattern structure in the light modulation layer 5 can improve the difference of the spectral response between different regions, and improve the analysis precision of the spectrometer structure.

在本申请的实施例中,该滤光片3可以滤除照射在镜片1上的特定波段的光,也可滤除人眼无法识别的红外光。In the embodiment of the present application, the filter 3 can filter out the light of a specific wavelength band irradiated on the lens 1, and can also filter out the infrared light that cannot be recognized by the human eye.

该光谱仪结构还包括电机马达2,其用于控制镜片1的移动,即,调节镜片1与滤光片3之间的距离,实现高质量成像。需要说明的是,由于电机马达2的结构和工作原理均为本领域技术人员所熟知的,为节约篇幅起见,此处不做详述。The spectrometer structure further includes a motor motor 2, which is used to control the movement of the lens 1, that is, to adjust the distance between the lens 1 and the filter 3, so as to achieve high-quality imaging. It should be noted that, since the structure and working principle of the electric motor 2 are well known to those skilled in the art, in order to save space, no detailed description is given here.

在本申请的实施例中,可将光谱仪结构集成到手机镜头模组中所需的小体积内,也可在不损失原有成像功能的基础上,实现光谱分析功能,利用光谱信息改善图像质量并具有集成度高的优点。In the embodiment of the present application, the structure of the spectrometer can be integrated into the small volume required by the mobile phone lens module, and the spectral analysis function can also be realized without losing the original imaging function, and the spectral information can be used to improve the image quality And has the advantage of high integration.

如图4和图5所示,在本申请的一个优选的实施例中,该光谱仪结构还包括设置在该光调制层5和该滤光片3之间的衬底4。As shown in FIG. 4 and FIG. 5 , in a preferred embodiment of the present application, the spectrometer structure further includes a substrate 4 disposed between the light modulation layer 5 and the filter 3 .

在本申请的另一个优选的实施例中,该光调制层5包括设置在该衬底4的下表面的底板(图中未示出)和至少一个调制单元8,各个该调制单元8均位于该底板上,每个该调制单元8内分别设有多个穿设于该底板内的调制孔9,同一调制单元8内的各个该调制孔9排布成具有第一排布规律的二维图形结构。具体地,利用不同的二维图形结构实现对不同波长的光进行调制作用,该调制作用包括但不限于光的散射、吸收、投射、反射、干涉、表面等离子激元以及谐振等作用,利用二维图形结构的区别还可以提高不同区域间光谱响应的差异性,从而提高光谱仪的分析精度。In another preferred embodiment of the present application, the light modulation layer 5 includes a bottom plate (not shown in the figure) disposed on the lower surface of the substrate 4 and at least one modulation unit 8, each of which is located in On the base plate, each modulation unit 8 is respectively provided with a plurality of modulation holes 9 pierced through the base plate, and the modulation holes 9 in the same modulation unit 8 are arranged in a two-dimensional pattern with a first arrangement rule graphic structure. Specifically, different two-dimensional pattern structures are used to modulate light of different wavelengths. The modulation effects include but are not limited to light scattering, absorption, projection, reflection, interference, surface plasmon polaritons, and resonance. The difference of the dimensional pattern structure can also improve the difference of the spectral response between different regions, thereby improving the analysis accuracy of the spectrometer.

如图6所示,本实施例中的光调制层5的底板上分布有五个调制单元8,分别为第一调制单元10、第二调制单元11、第三调制单元12、第四调制单元13和第五调制单元14,其中第五调制单元14范围最大,其面积不小于前四个调制单元的总和。As shown in FIG. 6 , there are five modulation units 8 distributed on the bottom plate of the light modulation layer 5 in this embodiment, which are a first modulation unit 10 , a second modulation unit 11 , a third modulation unit 12 , and a fourth modulation unit respectively 13 and the fifth modulation unit 14, wherein the fifth modulation unit 14 has the largest range, and its area is not less than the sum of the first four modulation units.

其中,第一调制单元10、第二调制单元11以及第三调制单元12内的调制孔9的排列顺序为按照预设的周期顺序逐行或逐列排布。调制单元8内的调制孔9的特定截面形状互不相同。同一调制单元8内的调制孔9具有相同的特定截面形状,但各调制孔9的排列顺序按照结构参数的大小渐变顺序呈阵列式排布,从而使得每个调制单元8都具有不同的调制作用,并且能针对不同波长的光谱进行调制。根据调制需要改变调制单元8内的调制孔9的结构参数的渐变顺序和/或调制孔9的特定截面形状,即可改变当前调制单元8的调制作用和/或调制对象。Wherein, the modulation holes 9 in the first modulation unit 10 , the second modulation unit 11 and the third modulation unit 12 are arranged in a row-by-row or column-by-column sequence according to a preset periodic sequence. The specific cross-sectional shapes of the modulation holes 9 in the modulation unit 8 are different from each other. The modulation holes 9 in the same modulation unit 8 have the same specific cross-sectional shape, but the arrangement order of the modulation holes 9 is arranged in an array according to the gradual order of the size of the structural parameters, so that each modulation unit 8 has a different modulation effect. , and can be modulated for different wavelengths of the spectrum. The gradation sequence of the structural parameters of the modulation hole 9 in the modulation unit 8 and/or the specific cross-sectional shape of the modulation hole 9 can be changed according to the modulation requirements, so that the modulation function and/or modulation object of the current modulation unit 8 can be changed.

第四调制单元13与第一调制单元10的调制孔9的特定截面形状相同,均为圆形,但第四调制单元13的调制孔9结构参数与第一调制单元10的调制孔9的结构参数不同,具体为:第四调制单元13的调制孔9的内径小于第一调制单元10的调制孔9的内径,由此,第四调制单元13对于输入光谱有第四种调制方式。第一调制单元10、第二调制单元11、第三调制单元12、第四调制单元13整体呈矩阵式排列。The specific cross-sectional shape of the modulation hole 9 of the fourth modulation unit 13 and the modulation hole 9 of the first modulation unit 10 is the same, and both are circular, but the structure parameters of the modulation hole 9 of the fourth modulation unit 13 are the same as the structure of the modulation hole 9 of the first modulation unit 10. The parameters are different, specifically: the inner diameter of the modulation hole 9 of the fourth modulation unit 13 is smaller than the inner diameter of the modulation hole 9 of the first modulation unit 10 . Therefore, the fourth modulation unit 13 has a fourth modulation method for the input spectrum. The first modulation unit 10 , the second modulation unit 11 , the third modulation unit 12 , and the fourth modulation unit 13 are arranged in a matrix as a whole.

第五调制单元14内的所有调制孔9均具有相同的特定截面形状,以椭圆形为例。所有调制孔9按照结构参数大小渐变顺序呈阵列式排布并形成二维图形结构。在该二维图形结构中,所有调制孔9呈阵列式排布,并且所有调制孔9均按照长轴长度、短轴长度和旋转角度由小到大逐行逐列进行排布,从而使得所有调制孔9的整体组成了该第五调制单元14,则该第五调制单元14对于输入光谱有第五种调制方式。All modulation holes 9 in the fifth modulation unit 14 have the same specific cross-sectional shape, taking an ellipse as an example. All the modulation holes 9 are arranged in an array according to the gradual change of the size of the structure parameters and form a two-dimensional graphic structure. In this two-dimensional graphic structure, all modulation holes 9 are arranged in an array, and all modulation holes 9 are arranged row by row according to the length of the long axis, the length of the short axis and the rotation angle from small to large, so that all The whole of the modulation hole 9 constitutes the fifth modulation unit 14, and the fifth modulation unit 14 has a fifth modulation mode for the input spectrum.

可以理解的是,本实施例所述的“对不同波长的光有某种调制方式”可包括但不限于散射、吸收、透射、反射、干涉、表面等离子激元、谐振等作用。第一、第二、第三、第四和第五种光调制方式彼此区别。通过对于调制单元8内的调制孔9结构的设置,可以提高不同单元间光谱响应的差异,通过增加单元数量就可以提高对不同光谱之间差异的灵敏度。It can be understood that the "some modulation mode for light of different wavelengths" described in this embodiment may include, but is not limited to, effects such as scattering, absorption, transmission, reflection, interference, surface plasmon polaritons, and resonance. The first, second, third, fourth and fifth light modulation methods are distinguished from each other. By setting the structure of the modulation hole 9 in the modulation unit 8, the difference in spectral response between different units can be improved, and by increasing the number of units, the sensitivity to the difference between different spectra can be improved.

可理解的是,在针对不同入射光谱进行测量时,可通过改变各调制单元8内的调制孔9的结构参数来改变调制作用,结构参数的改变包括但不限于光调制层5内的微纳结构的周期、半径、边长、占空比和厚度等参数中的一种或各参数的任意组合。It can be understood that when measuring different incident spectra, the modulation effect can be changed by changing the structural parameters of the modulation holes 9 in each modulation unit 8 . One or any combination of parameters such as period, radius, side length, duty cycle and thickness of the structure.

下面对第五调制单元14的结构进行具体说明。The structure of the fifth modulation unit 14 will be described in detail below.

第五调制单元14的所有调制孔9都是按照同一排布规律进行排列的,即按照长轴长度、短轴长度和旋转角度的结构参数由小到大逐行逐列的渐变排布,故而该调制单元8上的所有调制孔9既可以视为一个整体调制单元8,也可以将其任意分割成若干个调制单元8,任意划分出的调制单元8对于光谱都有不同的调制作用,理论上可获得无穷多组调制后的光谱样本,从而急剧增大了用以重构原光谱的数据量,有助于对于宽带光谱的谱型进行恢复。根据每个调制单元8内的调制孔9的结构参数特性确定该调制单元8对不同波长的光的调制作用的效果即可。All modulation holes 9 of the fifth modulation unit 14 are arranged according to the same arrangement rule, that is, according to the structural parameters of the length of the long axis, the length of the short axis and the rotation angle, they are gradually arranged row by row and column by column. All the modulation holes 9 on the modulation unit 8 can be regarded as a whole modulation unit 8, or it can be arbitrarily divided into several modulation units 8. The arbitrarily divided modulation units 8 have different modulation effects on the spectrum. Infinite groups of modulated spectral samples can be obtained on the above, which greatly increases the amount of data used to reconstruct the original spectrum, which is helpful for the recovery of the spectral type of the broadband spectrum. According to the structural parameter characteristics of the modulation holes 9 in each modulation unit 8, it is sufficient to determine the modulation effect of the modulation unit 8 on light of different wavelengths.

可理解的是,上述的调制孔9的特定截面形状包括但不限于圆形、椭圆形、十字形、正多边形、星形或矩形等,也可以为上述各形状的任意组合。上述的调制孔9的结构参数包括但不限于内径、长轴长度、短轴长度、旋转角度、角数或边长等。It can be understood that the specific cross-sectional shape of the modulation hole 9 includes, but is not limited to, a circle, an ellipse, a cross, a regular polygon, a star or a rectangle, etc., and can also be any combination of the above shapes. The above-mentioned structural parameters of the modulation hole 9 include, but are not limited to, inner diameter, length of major axis, length of minor axis, rotation angle, number of angles or side length, and the like.

本实施例中第五调制单元14上的所有调制孔9均为椭圆形,所有椭圆形的调制孔9的长轴长度和短轴长度分别逐行逐列增大,并且以图6中水平向为横轴,竖向为纵轴,则所有椭圆形的调制孔9逐行逐列的自纵轴向横轴旋转,其旋转角度逐渐增大。所有的调制孔9组成了一个整体的二维图形结构,该二维图形结构整体为一矩阵结构,该矩阵结构的面积范围为5μm2~4cm2。该二维图形结构具体为:仅对椭圆形的调制孔9的短轴和旋转角度进行渐变调整,椭圆长轴选取200nm(纳米)~1000nm(纳米)中的定值,例如为500nm(纳米);短轴长度在120nm(纳米)~500nm(纳米)范围内变化,椭圆的旋转角度在0°~90°范围内变化,椭圆的排列周期为200nm(纳米)~1000nm(纳米)中的定值,例如为500nm(纳米)。该二维图形结构的图形整体范围约为长是115μm(微米)、宽是110μm(微米)的矩形阵列结构。In this embodiment, all the modulation holes 9 on the fifth modulation unit 14 are elliptical, and the length of the long axis and the length of the short axis of all the elliptical modulation holes 9 increase row by row and column by row, and the horizontal direction in FIG. 6 increases. is the horizontal axis, and the vertical direction is the vertical axis, then all the elliptical modulation holes 9 rotate from the vertical axis to the horizontal axis row by row, and the rotation angle thereof gradually increases. All the modulation holes 9 form an integral two-dimensional pattern structure, and the two-dimensional pattern structure is a matrix structure as a whole, and the area of the matrix structure ranges from 5 μm 2 to 4 cm 2 . The two-dimensional pattern structure is specifically as follows: only the short axis and the rotation angle of the elliptical modulation hole 9 are gradually adjusted, and the long axis of the ellipse selects a fixed value between 200 nm (nanometer) and 1000 nm (nanometer), for example, 500 nm (nanometer). ; The length of the short axis varies within the range of 120nm (nanometer) to 500nm (nanometer), the rotation angle of the ellipse varies within the range of 0° to 90°, and the arrangement period of the ellipse is a fixed value in the range of 200nm (nanometer) to 1000nm (nanometer). , for example, 500 nm (nanometers). The overall pattern range of the two-dimensional pattern structure is about a rectangular array structure with a length of 115 μm (micrometer) and a width of 110 μm (micrometer).

由此可见,本实施例所述的光调制微纳结构利用不同单元间的不同调制孔9的特定截面形状的区别以及同一单元内特定的调制孔9的排列方式,实现利用改变调制孔9的特定截面形状、调制孔9的结构参数以及调制孔9的排列周期来实现对不同波长的光谱进行不同的调制作用。It can be seen that the light modulation micro-nano structure described in this embodiment utilizes the difference between the specific cross-sectional shapes of the different modulation holes 9 between different units and the arrangement of the specific modulation holes 9 in the same unit to realize the change of the modulation holes 9. The specific cross-sectional shape, the structural parameters of the modulation holes 9 and the arrangement period of the modulation holes 9 can realize different modulation effects on the spectrum of different wavelengths.

本实施例所述的能实现对光进行调制的光调制微纳结构包括但不限于一维、二维光子晶体、表面等离子激元、超材料和超表面。具体材料可包括硅、锗、锗硅材料、硅的化合物、锗的化合物、金属以及III-V族材料等。其中,硅的化合物包括但不限于氮化硅、二氧化硅以及碳化硅等。The light modulation micro-nano structures that can modulate light described in this embodiment include, but are not limited to, one-dimensional and two-dimensional photonic crystals, surface plasmons, metamaterials, and metasurfaces. Specific materials may include silicon, germanium, germanium-silicon materials, compounds of silicon, compounds of germanium, metals, III-V group materials, and the like. Wherein, the compound of silicon includes, but is not limited to, silicon nitride, silicon dioxide, silicon carbide, and the like.

在制备光调制层5时,可直接在衬底4的下表面上生成光调制层5,也可以先将已制备好的光调制层5转移至衬底4的下表面上。When preparing the light modulation layer 5 , the light modulation layer 5 may be directly formed on the lower surface of the substrate 4 , or the prepared light modulation layer 5 may be transferred to the lower surface of the substrate 4 first.

直接在衬底4的下表面上生成光调制层5的过程为:第一步,在衬底4的下表面上通过溅射、化学气相沉积等方法沉积厚度为100nm(纳米)~400nm(纳米)的硅平板。第二步,用光刻、电子束曝光等图形转移方法在上面绘制出所需的二维图形结构。第三步,通过反应离子刻蚀、感应耦合等离子体刻蚀以及离子束刻蚀等方法对硅平板进行刻蚀即可得到所需光调制层5。The process of directly generating the light modulation layer 5 on the lower surface of the substrate 4 is as follows: the first step is to deposit a thickness of 100 nm (nanometer) to 400 nm (nanometer) on the lower surface of the substrate 4 by sputtering, chemical vapor deposition, etc. ) of the silicon plate. In the second step, the required two-dimensional pattern structure is drawn on it by pattern transfer methods such as photolithography and electron beam exposure. In the third step, the desired light modulation layer 5 can be obtained by etching the silicon flat plate by methods such as reactive ion etching, inductively coupled plasma etching, and ion beam etching.

上述的光调制层5的转移制备方式具体为:先根据设计的结构参数在硅片或SOI(指硅-绝缘体-硅片结构)上制备得到光调制层5,然后通过转移的方法转移到衬底4的下表面上。The above-mentioned transfer preparation method of the light modulation layer 5 is specifically as follows: first, according to the designed structural parameters, the light modulation layer 5 is prepared on a silicon wafer or SOI (referring to a silicon-insulator-silicon wafer structure), and then transferred to the substrate by a transfer method. on the lower surface of the bottom 4.

在该实施例中,光调制层5占据衬底4下表面的全部面积,覆盖CMOS(互补金属氧化物半导体)图像传感器6的全部像素。In this embodiment, the light modulation layer 5 occupies the entire area of the lower surface of the substrate 4 , covering all the pixels of the CMOS (Complementary Metal Oxide Semiconductor) image sensor 6 .

在该实施例中,滤光片3只允许特定波段的光通过,比如只允许可见光通过。In this embodiment, the filter 3 only allows light in a specific wavelength band to pass through, for example, only visible light passes through.

衬底4介于滤光片3与光调制层5之间。光调制层5上面有光调制微纳结构,用于对入射光进行光调制,以得到调制后的光谱。CMOS图像传感器6用于成像以及接收所述调制后的光谱,并对所述调制后的光谱提供差分响应。信号处理电路7用于信号处理,将所述差分响应重构,以得到原光谱及图像。The substrate 4 is interposed between the filter 3 and the light modulation layer 5 . The light modulation layer 5 is provided with a light modulation micro-nano structure, which is used for light modulation of the incident light to obtain a modulated spectrum. The CMOS image sensor 6 is used to image and receive the modulated spectrum and provide a differential response to the modulated spectrum. The signal processing circuit 7 is used for signal processing to reconstruct the differential response to obtain the original spectrum and image.

如图7所示,本实施例所述光调制层5上的光调制微纳结构只占据了衬底4下表面的部分面积,空出部分区域(像素点)用于成像,这样可在一个相机模组中同时实现成像和光谱分析功能As shown in FIG. 7 , the light modulation micro-nano structures on the light modulation layer 5 in this embodiment only occupy part of the area of the lower surface of the substrate 4 , leaving part of the area (pixels) for imaging, so that the Simultaneous imaging and spectral analysis functions in the camera module

在本申请的一个实施例中,本实施例所述的光调制微纳结构以及集成在手机镜头上的光谱仪结构、原理、光谱调制方法和制备方法均与上一个实施例基本相同,为节约篇幅起见,相同之处不再赘述。不同之处在于:光调制层5上包含有若干个调制单元8以及空白单元15,每个调制单元8内的调制孔9的特定截面形状互不相同,同一调制单元8内的调制孔9具有相同的特定截面形状,调制孔9的特定截面形状包括但不限于圆形、椭圆形、十字形、正多边形、星形或矩形等,也可以为上述各形状的任意组合。In an embodiment of the present application, the light modulation micro-nano structure described in this embodiment and the structure, principle, spectral modulation method and preparation method of the spectrometer integrated on the lens of the mobile phone are basically the same as those in the previous embodiment, in order to save space For the sake of simplicity, the similarities will not be repeated here. The difference is that: the light modulation layer 5 includes several modulation units 8 and blank units 15, the specific cross-sectional shapes of the modulation holes 9 in each modulation unit 8 are different from each other, and the modulation holes 9 in the same modulation unit 8 have For the same specific cross-sectional shape, the specific cross-sectional shape of the modulation hole 9 includes, but is not limited to, a circle, an ellipse, a cross, a regular polygon, a star, or a rectangle, and can also be any combination of the above shapes.

上述的调制孔9的结构参数包括但不限于内径、长轴长度、短轴长度、旋转角度、角数或边长等。每个调制单元8都具有不同的调制作用,并且能针对不同波长的光谱进行调制。根据调制需要改变调制单元8内的调制孔9的结构参数的渐变顺序和/或调制孔9的特定截面形状,即可改变当前调制单元8的调制作用和/或调制对象。The above-mentioned structural parameters of the modulation hole 9 include, but are not limited to, inner diameter, length of major axis, length of minor axis, rotation angle, number of angles or side length, and the like. Each modulation unit 8 has a different modulation effect and can be modulated for different wavelength spectra. The gradation sequence of the structural parameters of the modulation hole 9 in the modulation unit 8 and/or the specific cross-sectional shape of the modulation hole 9 can be changed according to the modulation requirements, so that the modulation function and/or modulation object of the current modulation unit 8 can be changed.

调制单元8与空白单元15的排列组合方式是多种多样的,本实施例只是示意性地给出了其中一种排列组合方式(具体参见图7)。The arrangement and combination of the modulation unit 8 and the blank unit 15 are various, and this embodiment only schematically provides one of the arrangement and combination (see FIG. 7 for details).

在本申请的实施例中,该光谱仪结构还包括用于成像以及接收经该光调制层5调制后的光谱的CMOS图像传感器6,该CMOS图像传感器6设置在该光调制层5的下表面。滤光片3的设置,还可以降低非成像所需频段的光对CMOS图像传感器6的干扰,提高成像质量。In the embodiment of the present application, the spectrometer structure further includes a CMOS image sensor 6 for imaging and receiving the spectrum modulated by the light modulation layer 5 , and the CMOS image sensor 6 is disposed on the lower surface of the light modulation layer 5 . The setting of the optical filter 3 can also reduce the interference of the light in the frequency band not required for imaging to the CMOS image sensor 6 and improve the imaging quality.

在本申请的优选的实施例中,该光谱仪结构还包括用于信号处理,将差分响应重构,以得到原光谱及图像的信号处理电路7,该信号处理电路7设置在该CMOS图像传感器6的下表面。In a preferred embodiment of the present application, the spectrometer structure further includes a signal processing circuit 7 for signal processing and reconstructing the differential response to obtain the original spectrum and image, and the signal processing circuit 7 is arranged on the CMOS image sensor 6 the lower surface.

如图8所示,本实施例所述的滤光片3包括若干个滤光单元16,每个滤光单元16可根据实际需求设计为对不同波段的光以产生滤光效果,并与下方光调制层5中的微纳结构进行对应,提高对某一波段光谱分析的精度,实现分波段的光谱分析,例如可设计为只通过滤光波段(520nm~600nm)、只通过红光波段(600nm~730nm)等,并与下方光调制层5中的微纳结构进行对应,主要针对相应波段的光的响应进行设计,使得相应波段的光谱分析精度进一步提高,通过多个单元实现对于光谱的高精度分析。滤光单元16的结构参数可自行设计。光调制层5上的微纳结构可根据不同的滤光波段进行对应设计。As shown in FIG. 8 , the filter 3 in this embodiment includes a plurality of filter units 16 , and each filter unit 16 can be designed to filter light of different wavelength bands according to actual needs, and is compatible with the following The micro-nano structures in the light modulation layer 5 correspond to improve the accuracy of spectral analysis of a certain band, and realize spectral analysis of sub-bands. 600nm ~ 730nm), etc., and correspond to the micro-nano structure in the light modulation layer 5 below, mainly designed for the response of light in the corresponding band, so that the spectral analysis accuracy of the corresponding band is further improved, and the spectral analysis is realized through multiple units. High-precision analysis. The structural parameters of the filter unit 16 can be designed by themselves. The micro-nano structures on the light modulation layer 5 can be correspondingly designed according to different filter wavelength bands.

如图1和图2所示,本实施例去掉了衬底4的结构,制备光调制层5时,可直接在滤光片3的下表面上生成光调制层5,也可以先将已制备好的光调制层5转移至滤光片3的下表面上,为节约篇幅起见,与上述实施例的相同工艺流程不再赘述。As shown in FIG. 1 and FIG. 2 , the structure of the substrate 4 is removed in this embodiment. When preparing the light modulation layer 5 , the light modulation layer 5 may be directly formed on the lower surface of the filter 3 , or the prepared light modulation layer 5 may be formed first. The good light modulation layer 5 is transferred to the lower surface of the optical filter 3 . For the sake of space saving, the same process flow as in the above-mentioned embodiment will not be repeated.

如图3所示,本实施例所述的微纳结构中,光调制层5上设有一整体调制单元8。该调制单元8中设有的二维图形结构内的各个调制孔9分别具有各自的特定截面形状,各个调制孔9按照特定的截面形状进行自由组合排列。具体地,在该二维图形结构内,部分调制孔9的特定截面形状相同,具有相同特定截面形状的各个调制孔9构成了多个调制孔组,各个调制孔组的特定截面形状互不相同,且所有的调制孔9均自由组合。As shown in FIG. 3 , in the micro-nano structure described in this embodiment, an integral modulation unit 8 is disposed on the light modulation layer 5 . The modulation holes 9 in the two-dimensional pattern structure provided in the modulation unit 8 have respective specific cross-sectional shapes, and the modulation holes 9 are freely combined and arranged according to the specific cross-sectional shapes. Specifically, in the two-dimensional graphic structure, some modulation holes 9 have the same specific cross-sectional shape, each modulation hole 9 with the same specific cross-sectional shape constitutes a plurality of modulation hole groups, and the specific cross-sectional shapes of each modulation hole group are different from each other , and all modulation holes 9 are freely combined.

可理解的是,该调制单元8整体可视为针对一种特定波长的光谱进行调制,也可以将其自由分割成具有若干个调制孔9的调制单元8,从而可以针对多种不同波长的光谱进行调制,以增加光调制的灵活性和多样性。It is understandable that the modulation unit 8 as a whole can be regarded as modulating a spectrum for a specific wavelength, and it can also be freely divided into modulation units 8 having a number of modulation holes 9, so that it can be used for a variety of spectrums of different wavelengths. Modulation is performed to increase the flexibility and variety of light modulation.

综上所述,滤光片3的下表面制备微纳结构实现光谱分析的分光功能,在不增加相机模组大小的情况下将光谱分析功能集成到手机中。To sum up, the micro-nano structure is prepared on the lower surface of the filter 3 to realize the spectroscopic function of spectral analysis, and the spectral analysis function can be integrated into the mobile phone without increasing the size of the camera module.

微纳结构可占据滤光片3的部分或者全部面积,可空出一部分区域(像素点),这样,可在一个相机模组中同时实现成像和光谱分析功能,通过光谱分析调节白平衡,提高成像质量,也可通过成像进行光谱分析的对象的识别和初步标定,进而提高光谱分析的精度。The micro-nano structure can occupy part or all of the area of the filter 3, and a part of the area (pixels) can be vacated. In this way, imaging and spectral analysis functions can be realized in one camera module, and the white balance can be adjusted through spectral analysis to improve the The imaging quality can also be used to identify and preliminarily calibrate the object of spectral analysis through imaging, thereby improving the accuracy of spectral analysis.

在滤光片3的上表面(靠近镜头透镜组)可在不同区域沉积不同的滤光层,并使其与下方的微纳结构进行对应,以滤掉其他波段的信号,提高对某一波段光谱分析的精度,实现分波段的光谱分析。On the upper surface of the filter 3 (close to the lens group), different filter layers can be deposited in different regions, and make them correspond to the micro-nano structures below, so as to filter out signals in other wavelength bands and improve the accuracy of a certain wavelength band. The precision of spectral analysis enables spectral analysis of sub-bands.

可选择硅基、Si3N4(氮化硅)、III-V族的半导体进行器件制备,可通过现有的微纳加工工艺批量制备实现,一次性进行大面积、多个器件制备,工艺成熟度更高,成本更低。Silicon-based, Si 3 N 4 (silicon nitride), and III-V semiconductors can be selected for device preparation, which can be realized in batches through the existing micro-nano processing technology, and large-area and multiple device preparation can be carried out at one time. Higher maturity and lower cost.

此外,可以通过精确控制微纳结构材料的生长和刻蚀工艺,设计不同的二维结构图和细微结构颗粒尺寸,实现可制光谱仪的测量波长范围以及精度。另外,设计不同的滤光片下表面二维结构可以实现控制原相机功能的技术参数。In addition, by precisely controlling the growth and etching process of micro-nano structured materials, different two-dimensional structure diagrams and fine-structure particle sizes can be designed to achieve the measurement wavelength range and accuracy of the spectrometer. In addition, designing different two-dimensional structures on the lower surface of the filter can realize the technical parameters that control the function of the original camera.

通过CMOS图像传感器6同时接收整个成像面的信号,免除了扫描式光谱仪响应时间长的问题。The CMOS image sensor 6 simultaneously receives the signals of the entire imaging surface, which avoids the problem of long response time of the scanning spectrometer.

以上所述仅为本实用新型的较佳实施例而已,并不用以限制本实用新型,凡在本实用新型的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本实用新型的保护范围之内。The above are only preferred embodiments of the present invention, and are not intended to limit the present invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the within the scope of protection of the present invention.

Claims (10)

1. A spectrometer arrangement comprising a lens, characterized in that it further comprises:
the optical filter is arranged below the lens and used for filtering light with a specific waveband irradiated on the lens; and
and the light modulation layer is arranged below the optical filter, and the light of different frequency bands emitted from the optical filter is modulated by the light modulation layer to obtain a modulated spectrum.
2. The spectrometer structure of claim 1, further comprising a substrate disposed between the light modulation layer and the filter.
3. The spectrometer structure of claim 2, wherein the light modulation layer comprises a bottom plate disposed on the lower surface of the substrate and at least one modulation unit, each modulation unit is disposed on the bottom plate, a plurality of modulation holes penetrating the bottom plate are disposed in each modulation unit, and the modulation holes in the same modulation unit are arranged in a two-dimensional pattern structure having a first arrangement rule.
4. The spectrometer arrangement according to claim 3, wherein the first arrangement rule of the two-dimensional pattern structure comprises:
all the modulation holes in the same two-dimensional graph structure have the same cross section shape, and the modulation holes are arranged in an array mode according to the gradual change sequence of the size of the structural parameter; and/or
And each modulation hole in the same two-dimensional graph structure has a corresponding cross section shape, and the modulation holes are combined and arranged according to a second cross section shape.
5. The spectrometer structure according to claim 4, wherein the structural parameters of the modulation aperture comprise an inner diameter, a length of a long axis, a length of a short axis, a rotation angle, a side length, or a number of angles; the cross-sectional shape of the modulation hole comprises a circle, an ellipse, a cross, a regular polygon, a star or a rectangle.
6. The spectrometer structure of claim 2, wherein the light modulation layer is formed on the lower surface of the substrate by deposition or etching.
7. The spectrometer structure of claim 2, wherein the light modulation layer occupies all or part of the area of the lower surface of the substrate.
8. The spectrometer structure of claim 3, wherein the optical filters are disposed at different areas of the upper surface of the substrate and deposit different filter layers corresponding to each of the modulation cells in the underlying light modulation layer.
9. The spectrometer structure of claim 1, further comprising a CMOS image sensor for imaging and receiving the spectrum modulated by the light modulation layer, the CMOS image sensor being disposed on a lower surface of the light modulation layer;
the spectrometer structure further comprises a signal processing circuit for processing signals and reconstructing the differential response to obtain an original spectrum and an image, wherein the signal processing circuit is arranged on the lower surface of the CMOS image sensor.
10. An electronic device comprising a spectrometer arrangement according to any of claims 1 to 9.
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CN112730267A (en) * 2019-10-28 2021-04-30 清华大学 Spectrometer structure and electronic equipment
CN112018139A (en) * 2020-08-14 2020-12-01 清华大学 Method for generating micro-nano structure array in spectrum chip
WO2022033353A1 (en) * 2020-08-14 2022-02-17 清华大学 Miniature spectrum chip based on units of different shapes, and method for generating micro-nano structure array in miniature spectrum chip
JP2023535426A (en) * 2020-08-14 2023-08-17 清華大学 Microspectral chips based on units of different shapes and methods for producing micronanostructure arrays on microspectral chips
CN112018139B (en) * 2020-08-14 2024-06-18 清华大学 Method for generating micro-nano structure array in spectrum chip
JP7578795B2 (en) 2020-08-14 2024-11-06 清華大学 Microspectral chip based on different shaped units and method for producing micro-nanostructure arrays on the microspectral chip
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