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CN210876006U - High-speed metal droplet/substrate collision device under the action of compound field - Google Patents

High-speed metal droplet/substrate collision device under the action of compound field Download PDF

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CN210876006U
CN210876006U CN201921852123.2U CN201921852123U CN210876006U CN 210876006 U CN210876006 U CN 210876006U CN 201921852123 U CN201921852123 U CN 201921852123U CN 210876006 U CN210876006 U CN 210876006U
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substrate
gas
speed
droplet
assembly
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俞伟元
王锋锋
杨国庆
孙学敏
张涛
吴保磊
雷震
孙军刚
刘赟
李斌斌
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Lanzhou University of Technology
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Abstract

复合场作用下高速金属熔滴/基板碰撞装置,光源(9a)和高速摄像机(4a)与金属熔滴/基板碰撞区域对中;打开高频感应加热线圈(7a),将放入石英玻璃管(8a)内的金属颗粒熔化;打开基板加热组件(6)的电源,第一温度传感器(5c)实时监测样片温度变化;金属熔液在脉冲气体的冲击下,产生单一熔滴;产生高速气体,将金属熔滴加速与基体样片碰撞;打开高速摄像机和照明系统,用来观察和记录熔滴形态及其在样片上接触角的变化;超声波振动棒(14a)与基板安装块(5a)接触;调整基板样片(5b)与液滴入射方向的角度;打开超声波发生器电源,对基板样片(5b)产生超声振荡作用,分析处理输入图像,获得实验数据。

Figure 201921852123

High-speed metal droplet/substrate collision device under the action of compound field, the light source (9a) and high-speed camera (4a) are centered with the metal droplet/substrate collision area; turn on the high-frequency induction heating coil (7a), put the quartz glass tube The metal particles in (8a) are melted; the power supply of the substrate heating assembly (6) is turned on, and the first temperature sensor (5c) monitors the temperature change of the sample in real time; the molten metal is under the impact of the pulse gas to generate a single droplet; high-speed gas is generated , accelerate the metal droplet to collide with the substrate sample; turn on the high-speed camera and lighting system to observe and record the droplet morphology and the change of the contact angle on the sample; the ultrasonic vibrating rod (14a) is in contact with the substrate mounting block (5a) ; Adjust the angle between the substrate sample (5b) and the droplet incident direction; turn on the power of the ultrasonic generator to generate ultrasonic oscillation on the substrate sample (5b), analyze and process the input image, and obtain experimental data.

Figure 201921852123

Description

复合场作用下高速金属熔滴/基板碰撞装置High-speed metal droplet/substrate collision device under the action of compound field

技术领域technical field

本实用新型涉及热喷涂领域的试验装置,尤其涉及热超声复合场作用下高速金属熔滴/基板碰撞试验技术。The utility model relates to a test device in the field of thermal spraying, in particular to a high-speed metal droplet/substrate collision test technology under the action of a thermal ultrasonic compound field.

背景技术Background technique

热喷涂是指将涂层材料加热熔化,用高速气流将其雾化成极细的颗粒,以很高的速度喷射到工件表面,形成涂层。它的结合强度、致密性影响工件耐磨损、耐腐蚀、抗氧化、耐热等方面的性能。锡基、锌基、钴基合金粉等是常用的涂层材料。金属熔滴撞击基板样片后铺展、飞溅的临界条件,润湿角的变化和液/固界面上原子间的交互作用,是材料制备和加工过程中常见的物理化学现象,也是开展热喷涂理论和工程研究的重要输入条件。Thermal spraying refers to heating and melting the coating material, atomizing it into extremely fine particles with a high-speed airflow, and spraying it onto the surface of the workpiece at a high speed to form a coating. Its bonding strength and compactness affect the performance of the workpiece in terms of wear resistance, corrosion resistance, oxidation resistance and heat resistance. Tin-based, zinc-based, and cobalt-based alloy powders are commonly used coating materials. The critical conditions for metal droplets to spread and splash after hitting the substrate sample, the change of the wetting angle and the interaction between atoms at the liquid/solid interface are common physical and chemical phenomena in the process of material preparation and processing, and are also important in the development of thermal spraying theory and methods. Important input for engineering research.

目前未检索到有关反映高速流场、热场、超声场复合作用下金属熔滴/基板碰撞试验装置的公开文献。常用的液滴撞击基体装置中,液滴通过重力获得撞击速度,只能通过调节液滴下落高度来改变速度。专利CN105903599A公开了“喷射角度可调整的高速小液滴发生装置”,该装置采用润滑油,液滴通过加速管后速度远不能达到声速,基板样片不能施加热场、超声场。专利CN103940686A公开了“能利用射流产生高速液滴的液体撞击试验件及试验方法”,该装置能够产生500m/s的高速液滴,而液滴是射流液体通过夹缝或孔洞产生,形状和受力状况不易控制。专利CN107127345A公开了“一种气相辅助的金属微液滴制造装置及方法”,该装置采用脉冲气压驱动和高压气体剪切法产生通过加热器熔融的微熔滴,液滴难以获得高速。So far, there is no published literature about the impact test device of metal droplet/substrate under the combined action of high-speed flow field, thermal field and ultrasonic field. In the commonly used droplet impacting substrate device, the droplet obtains the impact speed through gravity, and the speed can only be changed by adjusting the droplet falling height. Patent CN105903599A discloses "a high-speed small droplet generating device with adjustable spray angle", the device uses lubricating oil, the speed of the droplets after passing through the accelerating tube is far from reaching the speed of sound, and the substrate sample cannot be applied with thermal fields and ultrasonic fields. Patent CN103940686A discloses "liquid impact test piece and test method that can generate high-speed droplets by jet", the device can generate high-speed droplets of 500m/s, and droplets are produced by jet liquid through slits or holes, and the shape and force The situation is not easy to control. Patent CN107127345A discloses "a gas-phase-assisted metal microdroplet manufacturing device and method". The device adopts pulse gas pressure drive and high-pressure gas shearing method to generate microdroplets melted by a heater, and it is difficult for the droplets to obtain high speed.

发明内容SUMMARY OF THE INVENTION

本实用新型的目的是提供一种复合场作用下高速金属熔滴/基板碰撞装置。The purpose of the utility model is to provide a high-speed metal droplet/substrate collision device under the action of a compound field.

本实用新型是复合场作用下高速金属熔滴/基板碰撞装置,由高压气瓶2、气体三联件11、减压阀组12构成的气源系统通过电磁阀组件13分别为微液滴发生装置8和高速气体组件10提供所需压力的气体,高速摄像组件4由高速摄像机4a和相机支架4b组成,基板安装组件5包括使用基板样片压板5d固定在基板安装块5a上的基板样片5b,第一温度传感器5c用来测量基板样片的实时温度;基板加热组件6由电加热板6a和第一可调温控器6b组成,与基板安装块5a相连接,用来加热基板样片5b,通过旋转基座5f及紧定螺钉5g能够调整基板样片5b与液滴入射方向的角度;金属熔滴加热组件7包括高频感应加热线圈7a和第二可调温控器7b,为微液滴发生装置8提供热源;微液滴发生装置8包括由玻璃管下密封法兰8f、第一导向轴8g、高频感应加热线圈安装板8h、第二导向轴8i、微熔滴发生器基座8j构成的安装框架,以及放置在玻璃管下密封法兰与玻璃管上密封法兰8b之间,通过氟密封O圈8k密封的石英玻璃管8a;石英玻璃管中放置有采用高频感应加热线圈7a熔化的金属熔液8l,通过设置在玻璃管上密封法兰的第二温度传感器8e测量金属熔液的温度;玻璃管上密封法兰上还设置有脉冲气流入口8c、脉冲气流出口8d,用以产生压力脉冲从而在石英玻璃管下端喷射出金属微液滴;背光源组件9包括光源9a和光源支架9b,为高速摄像机提供照明;高速气体组件10包括安装在管道夹具10c上的高速气体管道10b,管道前端连接有拉瓦尔喷嘴10a;管道夹具放置在由第一步进电机驱动器18控制的第一单轴电移动平台10e上的竖直导向轴10d上,能够沿竖直和水平方向移动;高速摄像组件4、基板安装组件5、基板加热组件6、金属熔滴加热组件7、微液滴发生装置8、背光源组件9、高速气体组件10均安装在暗箱22中以获取高分辨率的图像信号;减压阀组12包括脉冲气体减压阀12a和高速气体减压阀12b;电磁阀组件13由安装在电磁阀安装基座13a上的脉冲气体进气电磁阀13b、脉冲气体排气电磁阀13c、高速气体进气电磁阀13d组成;超声波组件14包括与固定在由第二步进电机驱动器19控制的第二单轴电移动平台14c上的夹具14b相连接的超声波振动棒14a以及超声波发生器14d。The utility model is a high-speed metal droplet/substrate collision device under the action of a composite field. The gas source system composed of a high-pressure gas cylinder 2, a gas triplet 11, and a pressure reducing valve group 12 is respectively a micro-droplet generating device through a solenoid valve assembly 13. 8 and the high-speed gas assembly 10 provide the gas with the required pressure, the high-speed camera assembly 4 is composed of a high-speed camera 4a and a camera bracket 4b, and the substrate mounting assembly 5 includes a substrate sample 5b fixed on the substrate mounting block 5a using a substrate sample pressing plate 5d. A temperature sensor 5c is used to measure the real-time temperature of the substrate sample; the substrate heating assembly 6 is composed of an electric heating plate 6a and a first adjustable temperature controller 6b, which is connected with the substrate mounting block 5a, and is used to heat the substrate sample 5b. The base 5f and the set screw 5g can adjust the angle between the substrate sample 5b and the droplet incident direction; the metal droplet heating assembly 7 includes a high-frequency induction heating coil 7a and a second adjustable temperature controller 7b, which is a microdroplet generating device 8 provides a heat source; the micro-droplet generating device 8 includes a glass tube lower sealing flange 8f, a first guide shaft 8g, a high-frequency induction heating coil mounting plate 8h, a second guide shaft 8i, and a micro-droplet generator base 8j. The installation frame, and the quartz glass tube 8a placed between the lower sealing flange of the glass tube and the upper sealing flange 8b of the glass tube and sealed by the fluorine sealing O-ring 8k; the quartz glass tube is placed with a high-frequency induction heating coil 7a The molten molten metal 81 measures the temperature of the molten metal through the second temperature sensor 8e provided on the sealing flange on the glass tube; the sealing flange on the glass tube is also provided with a pulsed air flow inlet 8c and a pulsed air flow outlet 8d. To generate pressure pulses to spray metal microdroplets at the lower end of the quartz glass tube; the backlight assembly 9 includes a light source 9a and a light source bracket 9b to provide illumination for the high-speed camera; the high-speed gas assembly 10 includes a high-speed gas pipeline installed on the pipeline fixture 10c 10b, the front end of the pipeline is connected with a Laval nozzle 10a; the pipeline clamp is placed on the vertical guide shaft 10d on the first single-axis electric moving platform 10e controlled by the first stepping motor driver 18, and can move in the vertical and horizontal directions ; High-speed camera assembly 4, substrate mounting assembly 5, substrate heating assembly 6, metal droplet heating assembly 7, micro-droplet generating device 8, backlight assembly 9, high-speed gas assembly 10 are installed in the dark box 22 to obtain high resolution The pressure reducing valve group 12 includes a pulse gas pressure reducing valve 12a and a high-speed gas pressure reducing valve 12b; the solenoid valve assembly 13 consists of a pulse gas intake solenoid valve 13b, a pulse gas exhaust solenoid valve 13b installed on the solenoid valve mounting base 13a The gas solenoid valve 13c and the high-speed gas intake solenoid valve 13d are composed; the ultrasonic component 14 includes the ultrasonic vibration rod 14a connected with the clamp 14b fixed on the second uniaxial electric moving platform 14c controlled by the second stepping motor driver 19 And the ultrasonic generator 14d.

本实用新型与现有技术相比具有以下优点:解决了热喷涂工艺中微液滴碰撞基体测试难的问题,本发明中设有超声波组件,高速气体组件和加热组件,能够通过施加超声场、温度场和高速流场,研究高速金属熔滴撞击不同倾斜角度的基板样片后铺展、飞溅的临界条件,润湿角的变化和液/固界面上原子间的交互作用。Compared with the prior art, the utility model has the following advantages: it solves the problem of difficulty in the test of micro-droplets colliding with the substrate in the thermal spraying process, and the present invention is provided with an ultrasonic component, a high-speed gas component and a heating component, which can be applied by applying an ultrasonic field, Temperature field and high-speed flow field, to study the critical conditions of spreading and splashing of high-speed metal droplets after hitting substrate samples with different tilt angles, the change of wetting angle and the interaction between atoms at the liquid/solid interface.

附图说明Description of drawings

图1为本实用新型实施例提供的整体结构示意图,图2为本实用新型实施例提供的图1(不含暗箱)的主视图,图3为本实用新型实施例提供的图1(不含暗箱)的侧视图,图4为本实用新型实施例提供的图1(不含暗箱)的俯视图,图5为本实用新型实施例提供的的不含气源系统的结构全剖视图,图6为本实用新型实施例提供的图5中Ⅰ处的局部放大示意图,图7为本实用新型实施例提供的机柜布局示意图,图8为本实用新型实施例提供的图7的主视图,图9为本实用新型实施例提供的图7的俯视图,图10为本实用新型实施例提供的石英玻璃管全剖视图。FIG. 1 is a schematic diagram of the overall structure provided by an embodiment of the present utility model, FIG. 2 is a front view of FIG. 1 (excluding a dark box) provided by an embodiment of the present utility model, and FIG. 3 is a schematic diagram of FIG. Figure 4 is a top view of Figure 1 (without the dark box) provided by an embodiment of the present invention, Figure 5 is a full cross-sectional view of the structure of the air source system provided by an embodiment of the present invention, and Figure 6 is a A partial enlarged schematic diagram of part I in FIG. 5 provided by an embodiment of the present invention, FIG. 7 is a schematic diagram of a cabinet layout provided by an embodiment of the present invention, FIG. 8 is a front view of FIG. 7 provided by an embodiment of the present invention, and FIG. 9 is FIG. 7 is a plan view provided by an embodiment of the present invention, and FIG. 10 is a full cross-sectional view of a quartz glass tube provided by an embodiment of the present invention.

附图标记及对应名称为:1—支架组件,2—高压气瓶,3—电气柜,4—高速摄像组件,5—基板安装组件,6—基板加热组件,7—金属熔滴加热组件,8—微液滴发生装置,9—背光源组件,10—高速气体组件,11—气体三联件,12—减压阀组,13—电磁阀组件,14—超声波组件,15—数据采集模块,16—PLC,17—24V开关电源,18—第一步进电机驱动器,19—第二步进电机驱动器,20—空气开关,21—线槽,22—暗箱,1a—气体元件安装板,1b—支架,1c—可调支座,4a—高速摄相机,4b—相机支架,5a—基板安装块,5b—基板样片,5c—第一温度传感器,5d—基板样片压板,5e—金属微熔滴,5f—旋转基座,5g—紧定螺钉,6a—电加热板,6b—第一可调温控器,7a—高频感应加热线圈,7b—第二可调温控器,8a—石英玻璃管,8b—玻璃管上密封法兰,8c—脉冲气流入口,8d—脉冲气流出口,8e—第二温度传感器,8f—玻璃管下密封法兰,8g—第一导向轴,8h—高频感应加热线圈安装板,8i—第二导向轴,8j—微熔滴发生器基座,8k—氟密封O圈,8l—金属熔液,9a—光源,9b—光源支架,10a—拉瓦尔喷嘴,10b—高速气体管道,10c—管道夹具,10 d—竖直导向轴,10e—第一单轴电移动平台,12a—脉冲气体减压阀,12b—高速气体减压阀,13a—电磁阀安装基座,13b—脉冲气体进气电磁阀,13c—脉冲气体排气电磁阀,13d—高速气体进气电磁阀,14a—超声波振动棒,14b—夹具,14c—第二单轴电移动平台,14d—超声波发生器。The reference signs and their corresponding names are: 1—bracket assembly, 2—high pressure gas cylinder, 3—electrical cabinet, 4—high-speed camera assembly, 5—substrate mounting assembly, 6—substrate heating assembly, 7—metal droplet heating assembly, 8—Micro droplet generating device, 9—Backlight source assembly, 10—High-speed gas assembly, 11—Gas triplet, 12—Relief valve group, 13—Solenoid valve assembly, 14—Ultrasonic assembly, 15—Data acquisition module, 16—PLC, 17—24V switching power supply, 18—first stepper motor driver, 19—second stepper motor driver, 20—air switch, 21—wire slot, 22—camera, 1a—gas component mounting plate, 1b - bracket, 1c - adjustable support, 4a - high-speed camera, 4b - camera bracket, 5a - substrate mounting block, 5b - substrate sample, 5c - first temperature sensor, 5d - substrate sample platen, 5e - metal micro-melting Drop, 5f—swivel base, 5g—set screw, 6a—electric heating plate, 6b—first adjustable thermostat, 7a—high frequency induction heating coil, 7b—second adjustable thermostat, 8a— Quartz glass tube, 8b-glass tube upper sealing flange, 8c-pulse airflow inlet, 8d-pulse airflow outlet, 8e-second temperature sensor, 8f-glass tube lower sealing flange, 8g-first guide shaft, 8h- High-frequency induction heating coil mounting plate, 8i—second guide shaft, 8j—micro-droplet generator base, 8k—fluorine sealing O-ring, 8l—metal melt, 9a—light source, 9b—light source bracket, 10a—pull Val nozzle, 10b—high-speed gas pipeline, 10c—pipe clamp, 10d—vertical guide shaft, 10e—first single-axis electric moving platform, 12a—pulse gas pressure reducing valve, 12b—high-speed gas pressure reducing valve, 13a— Solenoid valve mounting base, 13b—pulse gas intake solenoid valve, 13c—pulse gas exhaust solenoid valve, 13d—high-speed gas intake solenoid valve, 14a—ultrasonic vibrating rod, 14b—clamp, 14c—second uniaxial electric valve Mobile platform, 14d - ultrasonic generator.

具体实施方式Detailed ways

本实用新型是复合场作用下高速金属熔滴/基板碰撞装置,如图1~图10所示,由高压气瓶2、气体三联件11、减压阀组12构成的气源系统通过电磁阀组件13分别为微液滴发生装置8和高速气体组件10提供所需压力的气体,高速摄像组件4由高速摄像机4a和相机支架4b组成,基板安装组件5包括使用基板样片压板5d固定在基板安装块5a上的基板样片5b,第一温度传感器5c用来测量基板样片的实时温度;基板加热组件6由电加热板6a和第一可调温控器6b组成,与基板安装块5a相连接,用来加热基板样片5b,通过旋转基座5f及紧定螺钉5g能够调整基板样片5b与液滴入射方向的角度;金属熔滴加热组件7包括高频感应加热线圈7a和第二可调温控器7b,为微液滴发生装置8提供热源;微液滴发生装置8包括由玻璃管下密封法兰8f、第一导向轴8g、高频感应加热线圈安装板8h、第二导向轴8i、微熔滴发生器基座8j构成的安装框架,以及放置在玻璃管下密封法兰与玻璃管上密封法兰8b之间,通过氟密封O圈8k密封的石英玻璃管8a;石英玻璃管中放置有采用高频感应加热线圈7a熔化的金属熔液8l,通过设置在玻璃管上密封法兰的第二温度传感器8e测量金属熔液的温度;玻璃管上密封法兰上还设置有脉冲气流入口8c、脉冲气流出口8d,用以产生压力脉冲从而在石英玻璃管下端喷射出金属微液滴;背光源组件9包括光源9a和光源支架9b,为高速摄像机提供照明;高速气体组件10包括安装在管道夹具10c上的高速气体管道10b,管道前端连接有拉瓦尔喷嘴10a;管道夹具放置在由第一步进电机驱动器18控制的第一单轴电移动平台10e上的竖直导向轴10d上,能够沿竖直和水平方向移动;高速摄像组件4、基板安装组件5、基板加热组件6、金属熔滴加热组件7、微液滴发生装置8、背光源组件9、高速气体组件10均安装在暗箱22中以获取高分辨率的图像信号;减压阀组12包括脉冲气体减压阀12a和高速气体减压阀12b;电磁阀组件13由安装在电磁阀安装基座13a上的脉冲气体进气电磁阀13b、脉冲气体排气电磁阀13c、高速气体进气电磁阀13d组成;超声波组件14包括与固定在由第二步进电机驱动器19控制的第二单轴电移动平台14c上的夹具14b相连接的超声波振动棒14a以及超声波发生器14d。The utility model is a high-speed metal droplet/substrate collision device under the action of a compound field. As shown in Fig. 1 to Fig. 10 , a gas source system composed of a high-pressure gas cylinder 2, a gas triplet 11 and a pressure reducing valve group 12 passes through a solenoid valve. The component 13 provides the gas with the required pressure for the micro droplet generating device 8 and the high-speed gas component 10 respectively. The high-speed camera component 4 is composed of a high-speed camera 4a and a camera bracket 4b. The substrate sample 5b on the block 5a, the first temperature sensor 5c is used to measure the real-time temperature of the substrate sample; the substrate heating assembly 6 is composed of an electric heating plate 6a and a first adjustable temperature controller 6b, and is connected with the substrate mounting block 5a, Used to heat the substrate sample 5b, the angle of the substrate sample 5b and the droplet incident direction can be adjusted by rotating the base 5f and the set screw 5g; the metal droplet heating component 7 includes a high-frequency induction heating coil 7a and a second adjustable temperature control The device 7b provides a heat source for the micro-droplet generating device 8; the micro-droplet generating device 8 includes a lower sealing flange 8f of the glass tube, a first guide shaft 8g, a high-frequency induction heating coil mounting plate 8h, a second guide shaft 8i, The installation frame formed by the base 8j of the micro-droplet generator, and the quartz glass tube 8a placed between the lower sealing flange of the glass tube and the upper sealing flange 8b of the glass tube, and sealed by the fluorine sealing O-ring 8k; The molten metal 8l melted by the high-frequency induction heating coil 7a is placed, and the temperature of the molten metal is measured by a second temperature sensor 8e arranged on the sealing flange on the glass tube; the sealing flange on the glass tube is also provided with a pulsed airflow. The inlet 8c and the pulse airflow outlet 8d are used to generate pressure pulses to eject metal microdroplets at the lower end of the quartz glass tube; the backlight assembly 9 includes a light source 9a and a light source bracket 9b to provide illumination for the high-speed camera; the high-speed gas assembly 10 includes the installation The high-speed gas pipeline 10b on the pipeline fixture 10c, the front end of the pipeline is connected with the Laval nozzle 10a; the pipeline fixture is placed on the vertical guide shaft 10d on the first single-axis electric moving platform 10e controlled by the first step motor driver 18 , can move in vertical and horizontal directions; high-speed camera assembly 4, substrate mounting assembly 5, substrate heating assembly 6, metal droplet heating assembly 7, micro-droplet generating device 8, backlight source assembly 9, high-speed gas assembly 10 are all installed In the dark box 22 to obtain high-resolution image signals; the pressure reducing valve group 12 includes a pulse gas pressure reducing valve 12a and a high-speed gas pressure reducing valve 12b; the solenoid valve assembly 13 consists of the pulse gas installed on the solenoid valve mounting base 13a The intake solenoid valve 13b, the pulsed gas exhaust solenoid valve 13c, and the high-speed gas intake solenoid valve 13d are composed; The ultrasonic vibrating rod 14a and the ultrasonic generator 14d are connected to the jig 14b.

本实用新型的复合场作用下高速金属熔滴/基板碰撞装置的使用方法,其步骤为:The method for using the high-speed metal droplet/substrate collision device under the action of the compound field of the present invention comprises the following steps:

(1)调整光源9a和高速摄像机4a在水平方向与金属熔滴/基板碰撞区域对中;(1) Adjust the light source 9a and the high-speed camera 4a to align with the metal droplet/substrate collision area in the horizontal direction;

(2)打开高频感应加热线圈7a,将放入石英玻璃管8a内的金属颗粒熔化;(2) Turn on the high-frequency induction heating coil 7a, and melt the metal particles put into the quartz glass tube 8a;

(3)打开基板加热组件6的电源,第一温度传感器5c实时监测样片温度变化;(3) Turn on the power of the substrate heating assembly 6, and the first temperature sensor 5c monitors the temperature change of the sample in real time;

(4)打开高压气瓶2,通过气动三联件11和脉冲气体减压阀12a控制由与脉冲气体进气电磁阀13b连接的脉冲气流入口8c的气体流量;(4) Open the high-pressure gas cylinder 2, and control the gas flow of the pulsed gas inlet 8c connected to the pulsed gas inlet solenoid valve 13b through the pneumatic triplet 11 and the pulsed gas pressure reducing valve 12a;

(5)通过控制脉冲气体进气电磁阀13b、脉冲气体排气电磁阀13c的通断时序,调节石英玻璃管内的气体压力,获得脉冲气体;石英玻璃管内的金属熔液在脉冲气体的冲击下,产生单一熔滴;(5) By controlling the on-off sequence of the pulsed gas intake solenoid valve 13b and the pulsed gas exhaust solenoid valve 13c, the gas pressure in the quartz glass tube is adjusted to obtain the pulsed gas; the molten metal in the quartz glass tube is under the impact of the pulsed gas , producing a single droplet;

(6)打开与高速气体减压阀12b相连接的高速气体进气电磁阀13d,气体通过拉瓦尔喷嘴10a后,产生高速气体,将金属熔滴加速与基体样片碰撞;(6) Open the high-speed gas inlet solenoid valve 13d connected to the high-speed gas pressure reducing valve 12b, after the gas passes through the Laval nozzle 10a, a high-speed gas is generated, and the metal droplet is accelerated to collide with the substrate sample;

(7)打开高速摄像机和照明系统,用来观察和记录熔滴形态及其在样片上接触角的变化;(8)调节第二单轴电移动平台14c,带动超声波振动棒14a与基板安装块5a接触;(7) Turn on the high-speed camera and lighting system to observe and record the droplet shape and the change of the contact angle on the sample; (8) Adjust the second uniaxial electric moving platform 14c to drive the ultrasonic vibrating rod 14a and the substrate mounting block 5a contact;

(9)通过旋转基座5f及紧定螺5g调整基板样片5b与液滴入射方向的角度;(9) Adjust the angle between the substrate sample 5b and the droplet incident direction through the rotating base 5f and the set screw 5g;

(10)打开超声波发生器电源,对基板样片5b产生超声振荡作用,分析处理输入图像,获得实验数据。(10) Turn on the power of the ultrasonic generator, generate ultrasonic oscillation on the substrate sample 5b, analyze and process the input image, and obtain experimental data.

下面结合附图进一步展开本实用新型。如图1~10所示,复合场作用下高速金属熔滴/基板碰撞试验装置,包括支架组件1,高压气瓶2,电气柜3,高速摄像组件4,基板安装组件5,基板加热组件6,金属熔滴加热组件7,微液滴发生装置8,背光源组件9,高速气体组件10,气体三联件11,减压阀组12,电磁阀组件13,超声波组件14,数据采集模块15,PLC16,24V开关电源17,第一步进电机驱动器18,第二步进电机驱动器19,空气开关20,线槽21,暗箱22。所述高压气瓶2、气体三联件11、减压阀组12构成的气源系统通过电磁阀组件13分别为微液滴发生装置8和高速气体组件10提供所需压力的气体。所述的高速摄像组件4由高速摄像机4a和相机支架4b组成。所述的基板安装组件5包括使用基板样片压板5d固定在基板安装块5a上的基板样片5b,第一温度传感器5c用来测量基板样片的实时温度。所述的基板加热组件6由电加热板6a和第一可调温控器6b组成,用来加热基板样片5b。所述的金属熔滴加热组件7包括高频感应加热线圈7a和第二可调温控器7b,为微液滴发生装置8提供热源。所述的微液滴发生装置8包括由玻璃管下密封法兰8f、第一导向轴8g、高频感应加热线圈安装板8h、第二导向轴8i、微熔滴发生器基座8j构成的安装框架,以及放置在玻璃管下密封法兰与玻璃管上密封法兰8b之间,通过氟密封O圈8k密封的石英玻璃管8a。所述的石英玻璃管中放置有采用高频感应加热线圈7a熔化的金属熔液8l,通过设置在玻璃管上密封法兰的第二温度传感器8e测量金属熔液的温度。所述的玻璃管上密封法兰上还设置有脉冲气流入口8c、脉冲气流出口8d。所述的背光源组件9包括光源9a和光源支架9b,为高速摄像机提供照明。所述的高速气体组件10包括安装在管道夹具10c上的高速气体管道10b,管道前端连接有拉瓦尔喷嘴10a。所述的管道夹具放置在由第一步进电机驱动器18控制的第一单轴电移动平台10e上的竖直导向轴10d上,可以沿竖直和水平方向移动。所述的高速摄像组件4,基板安装组件5,基板加热组件6,金属熔滴加热组件7,微液滴发生装置8,背光源组件9,高速气体组件10均放置在暗箱22中以获取高分辨率的图像信号。所述的减压阀组12包括脉冲气体减压阀12a和高速气体减压阀12b。所述的电磁阀组件13由安装在电磁阀安装基座13a上的脉冲气体进气电磁阀13b、脉冲气体排气电磁阀13c、高速气体进气电磁阀13d组成。所述的超声波组件14包括与固定在由第二步进电机驱动器19控制的第二单轴电移动平台14c上的夹具14b相连接的超声波振动棒14a,以及超声波发生器14d。The utility model is further developed below in conjunction with the accompanying drawings. As shown in Figures 1 to 10, the high-speed metal droplet/substrate collision test device under the action of the compound field includes a bracket assembly 1, a high-pressure gas cylinder 2, an electrical cabinet 3, a high-speed camera assembly 4, a substrate mounting assembly 5, and a substrate heating assembly 6. , metal droplet heating assembly 7, micro droplet generating device 8, backlight assembly 9, high-speed gas assembly 10, gas triplet 11, pressure reducing valve group 12, solenoid valve assembly 13, ultrasonic assembly 14, data acquisition module 15, PLC16, 24V switching power supply 17, first stepper motor driver 18, second stepper motor driver 19, air switch 20, wire slot 21, and dark box 22. The gas source system composed of the high-pressure gas cylinder 2 , the gas triplet 11 , and the pressure-reducing valve group 12 respectively provides the micro-droplet generating device 8 and the high-speed gas component 10 with gas of the required pressure through the solenoid valve assembly 13 . The high-speed camera assembly 4 is composed of a high-speed camera 4a and a camera bracket 4b. The substrate mounting assembly 5 includes a substrate sample 5b fixed on the substrate mounting block 5a by a substrate sample pressing plate 5d, and the first temperature sensor 5c is used to measure the real-time temperature of the substrate sample. The substrate heating assembly 6 is composed of an electric heating plate 6a and a first adjustable temperature controller 6b, and is used for heating the substrate sample 5b. The metal droplet heating assembly 7 includes a high-frequency induction heating coil 7a and a second adjustable temperature controller 7b to provide a heat source for the microdroplet generating device 8 . The micro-droplet generating device 8 includes a glass tube lower sealing flange 8f, a first guide shaft 8g, a high-frequency induction heating coil mounting plate 8h, a second guide shaft 8i, and a micro-droplet generator base 8j. The installation frame, and the quartz glass tube 8a placed between the lower sealing flange of the glass tube and the upper sealing flange 8b of the glass tube and sealed by the fluorine sealing O-ring 8k. The molten metal 8l melted by the high-frequency induction heating coil 7a is placed in the quartz glass tube, and the temperature of the molten metal is measured by a second temperature sensor 8e disposed on the glass tube to seal the flange. The upper sealing flange of the glass tube is also provided with a pulse gas flow inlet 8c and a pulse gas flow outlet 8d. The backlight assembly 9 includes a light source 9a and a light source bracket 9b to provide illumination for the high-speed camera. The high-speed gas assembly 10 includes a high-speed gas pipeline 10b mounted on a pipeline fixture 10c, and a Laval nozzle 10a is connected to the front end of the pipeline. The pipe clamp is placed on the vertical guide shaft 10d on the first single-axis electric moving platform 10e controlled by the first step motor driver 18, and can move in vertical and horizontal directions. The high-speed camera assembly 4, the substrate mounting assembly 5, the substrate heating assembly 6, the metal droplet heating assembly 7, the microdroplet generating device 8, the backlight assembly 9, and the high-speed gas assembly 10 are all placed in the dark box 22 to obtain high resolution image signal. The pressure reducing valve group 12 includes a pulse gas pressure reducing valve 12a and a high-speed gas pressure reducing valve 12b. The solenoid valve assembly 13 is composed of a pulsed gas intake solenoid valve 13b, a pulsed gas exhaust solenoid valve 13c, and a high-speed gas intake solenoid valve 13d mounted on the solenoid valve mounting base 13a. The ultrasonic assembly 14 includes an ultrasonic vibrating rod 14a connected to a fixture 14b fixed on a second uniaxial electric moving platform 14c controlled by a second stepping motor driver 19, and an ultrasonic generator 14d.

其中,如图1、图3、图10所示,石英玻璃管为圆锥型结构,减少熔液的流动阻力。玻璃管锥端有直径1mm的直导管,使熔液在表面张力的作用下不滴落。石英玻璃管下半部分被高频感应加热线圈7a包围,用于加热固体金属颗粒,温度调节范围是0-1000℃。Among them, as shown in FIG. 1 , FIG. 3 , and FIG. 10 , the quartz glass tube has a conical structure, which reduces the flow resistance of the melt. The tapered end of the glass tube has a straight conduit with a diameter of 1mm, so that the melt does not drip under the action of surface tension. The lower half of the quartz glass tube is surrounded by a high-frequency induction heating coil 7a for heating solid metal particles, and the temperature adjustment range is 0-1000°C.

如图1、图6、图7、图9所示,金属微熔滴5e由压力脉冲驱动石英玻璃管内的金属熔液喷射产生。压力脉冲由通过脉冲气体进气电磁阀13b、脉冲气体排气电磁阀13c的通断时序控制脉冲气流入口8c、脉冲气流出口8d的气体流量,调节石英玻璃管内的气体压力变化获得。As shown in FIG. 1 , FIG. 6 , FIG. 7 , and FIG. 9 , the metal microdroplets 5e are generated by the pressure pulse driving the metal melt injection in the quartz glass tube. The pressure pulse is obtained by controlling the gas flow of the pulse gas inlet 8c and the pulse gas outlet 8d through the on-off sequence of the pulse gas inlet solenoid valve 13b and the pulse gas exhaust solenoid valve 13c, and adjusting the gas pressure change in the quartz glass tube.

如图1、图6、图8基板安装块5a材料采用黄铜合金,便于热传导,基板加热组件6的温度调节范围是0~500℃。超声波振动棒14a在第二单轴电移动平台14c的带动下,与基板安装块5a接触,对基板样片5b产生超声振荡作用。As shown in FIG. 1 , FIG. 6 and FIG. 8 , the base plate mounting block 5 a is made of brass alloy, which is convenient for heat conduction. The temperature adjustment range of the base plate heating assembly 6 is 0~500°C. Driven by the second uniaxial electric moving platform 14c, the ultrasonic vibrating rod 14a is in contact with the substrate mounting block 5a to generate ultrasonic oscillation on the substrate sample 5b.

如图1、图2所示,拉瓦尔喷嘴10a由两个锥形管构成,其中一个为收缩管,另一个为扩张管。压力为0.1-0.7MPa的惰性气体流入喷嘴的前半部,穿过窄部后由后半部逸出,气流速度最高达到400m/s,可以为金属微熔滴提供高速流场。As shown in FIGS. 1 and 2 , the Laval nozzle 10a is composed of two conical tubes, one of which is a shrinking tube and the other is an expanding tube. The inert gas with a pressure of 0.1-0.7MPa flows into the first half of the nozzle, and escapes from the second half after passing through the narrow part.

如图4所示,基板样片5b与液滴入射方向的角度可以通过旋转基座5f及紧定螺5g调整,可调范围是60°~120°。As shown in FIG. 4 , the angle between the substrate sample 5b and the droplet incident direction can be adjusted by the rotating base 5f and the fixing screw 5g, and the adjustable range is 60°~120°.

如图6所示,金属微熔滴5e与基板样片5b碰撞区域分别设置高速摄像机和照明系统,用来观察熔滴形态及其在样片上接触角的变化。As shown in FIG. 6 , a high-speed camera and an illumination system are respectively set in the collision area of the metal microdroplet 5e and the substrate sample 5b to observe the droplet shape and the change of the contact angle on the sample.

复合场作用下高速金属熔滴/基板碰撞试验装置的使用方法,其步骤为:如图1~图10所示,调整He-Ne激光光源9a和高速摄像机4a在水平方向与金属熔滴/基板碰撞区域对中。打开高频感应加热线圈7a,将放入石英玻璃管8a内的金属颗粒熔化。打开基板加热组件6电源,其温度调节范围是0-500℃,用于加热基体样片,温度传感器Ⅰ实时监测样片温度变化。打开高压气瓶2,通过气动三联件11和脉冲气体减压阀12a控制由与脉冲气体进气电磁阀13b连接的脉冲气流入口8c的气体流量。通过控制脉冲气体进气电磁阀13b、脉冲气体排气电磁阀13c的通断时序,调节石英玻璃管内的气体压力,获得脉冲气体。石英玻璃管内的金属熔液在脉冲气体的冲击下,产生单一熔滴。打开与高速气体减压阀12b相连接的高速气体进气电磁阀13d,气体通过拉瓦尔喷嘴10a后,产生高速气体,将金属熔滴加速与基体样片碰撞。通过调节拉瓦尔喷嘴与液滴的距离,可以获得0-400m/s的风速。打开高速摄像机和照明系统,用来观察和记录熔滴形态及其在样片上接触角的变化。调节单轴电移动平台Ⅱ14c,带动超声波振动棒14a与基板安装块5a接触。通过旋转基座5f及紧定螺5g调整基板样片5b与液滴入射方向的角度。打开超声波发生器电源,对基板样片5b产生超声振荡作用,分析处理输入图像,获得实验数据。The method of using the high-speed metal droplet/substrate collision test device under the action of the compound field, the steps are: as shown in Figures 1 to 10, adjust the He-Ne laser light source 9a and the high-speed camera 4a in the horizontal direction with the metal droplet/substrate. The collision area is centered. The high-frequency induction heating coil 7a is turned on, and the metal particles put into the quartz glass tube 8a are melted. Turn on the power supply of the substrate heating assembly 6, and its temperature adjustment range is 0-500 °C, which is used to heat the substrate sample, and the temperature sensor I monitors the temperature change of the sample in real time. Open the high-pressure gas cylinder 2, and control the gas flow from the pulse gas inlet 8c connected to the pulse gas inlet solenoid valve 13b through the pneumatic triplet 11 and the pulse gas pressure reducing valve 12a. By controlling the on-off sequence of the pulsed gas intake solenoid valve 13b and the pulsed gas exhaust solenoid valve 13c, the gas pressure in the quartz glass tube is adjusted to obtain the pulsed gas. The molten metal in the quartz glass tube produces a single droplet under the impact of the pulsed gas. The high-speed gas inlet solenoid valve 13d connected to the high-speed gas pressure reducing valve 12b is opened, and after the gas passes through the Laval nozzle 10a, high-speed gas is generated, and the metal droplets are accelerated to collide with the substrate sample. By adjusting the distance between the Laval nozzle and the droplet, the wind speed of 0-400m/s can be obtained. The high-speed camera and illumination system were turned on to observe and record the droplet morphology and its contact angle changes on the sample. Adjust the uniaxial electric moving platform II 14c to drive the ultrasonic vibrating rod 14a to contact the base plate mounting block 5a. The angle of the substrate sample 5b and the droplet incident direction is adjusted by the rotating base 5f and the set screw 5g. Turn on the power of the ultrasonic generator, generate ultrasonic oscillation on the substrate sample 5b, analyze and process the input image, and obtain experimental data.

以上述依据实用新型的理想实施例为启示,通过上述的说明内容,相关工作人员可以在不偏离本项实用新型技术思想的范围内,进行多样的变更及修改,本项实用新型的技术性范围并不局限于说明书上的内容,必须要根据权利要求范围来确定其技术性范围。Taking the above-mentioned ideal embodiment according to the utility model as inspiration, through the above-mentioned description content, relevant staff can make various changes and modifications within the scope of not departing from the technical idea of the present utility model, and the technical scope of the present utility model does not It is not limited to the content in the specification, and its technical scope must be determined according to the scope of the claims.

Claims (6)

1. A high-speed metal molten drop/substrate collision device under the action of a composite field is characterized in that a gas source system consisting of a high-pressure gas cylinder (2), a gas triple piece (11) and a pressure reducing valve group (12) respectively provides gas with required pressure for a micro-drop generating device (8) and a high-speed gas component (10) through a solenoid valve component (13), and a high-speed camera component (4) consists of a high-speed camera (4 a) and a camera support (4 b), wherein a substrate mounting component (5) comprises a substrate sample (5 b) fixed on a substrate mounting block (5 a) through a substrate sample pressing plate (5 d), and a first temperature sensor (5 c) is used for measuring the real-time temperature of the substrate sample; the substrate heating assembly (6) consists of an electric heating plate (6 a) and a first adjustable temperature controller (6 b), is connected with the substrate mounting block (5 a) and is used for heating the substrate sample wafer (5 b), and the angle between the substrate sample wafer (5 b) and the incidence direction of liquid drops can be adjusted through a rotary base (5 f) and a set screw (5 g); the metal molten drop heating assembly (7) comprises a high-frequency induction heating coil (7 a) and a second adjustable temperature controller (7 b) and provides a heat source for the micro-droplet generating device (8); the micro-droplet generating device (8) comprises a mounting frame consisting of a glass tube lower sealing flange (8 f), a first guide shaft (8 g), a high-frequency induction heating coil mounting plate (8 h), a second guide shaft (8 i) and a micro-droplet generator base (8 j), and a quartz glass tube (8 a) which is arranged between the glass tube lower sealing flange and the glass tube upper sealing flange (8 b) and is sealed by a fluorine sealing O ring (8 k); a molten metal (8 l) melted by a high-frequency induction heating coil (7 a) is placed in the quartz glass tube, and the temperature of the molten metal is measured by a second temperature sensor (8 e) arranged on a sealing flange on the glass tube; the upper sealing flange of the glass tube is also provided with a pulse airflow inlet (8 c) and a pulse airflow outlet (8 d) which are used for generating pressure pulse so as to spray metal micro-droplets at the lower end of the quartz glass tube; the backlight source assembly (9) comprises a light source (9 a) and a light source bracket (9 b) for providing illumination for the high-speed camera; the high-speed gas assembly (10) comprises a high-speed gas pipeline (10 b) arranged on a pipeline clamp (10 c), and the front end of the pipeline is connected with a Laval nozzle (10 a); the pipe clamp is placed on a vertical guide shaft (10 d) on a first single-shaft electric moving platform (10 e) controlled by a first stepping motor driver (18) and can move along the vertical and horizontal directions; the high-speed camera shooting assembly (4), the substrate mounting assembly (5), the substrate heating assembly (6), the metal molten drop heating assembly (7), the micro-droplet generating device (8), the backlight source assembly (9) and the high-speed gas assembly (10) are all mounted in a dark box (22) to obtain high-resolution image signals; the pressure reducing valve group (12) comprises a pulse gas pressure reducing valve (12 a) and a high-speed gas pressure reducing valve (12 b); the electromagnetic valve component (13) consists of a pulse gas inlet electromagnetic valve (13 b), a pulse gas outlet electromagnetic valve (13 c) and a high-speed gas inlet electromagnetic valve (13 d) which are arranged on an electromagnetic valve mounting base (13 a); the ultrasonic assembly (14) includes an ultrasonic vibrator rod (14 a) connected to a jig (14 b) fixed to a second uniaxial electric moving stage (14 c) controlled by a second stepping motor driver (19), and an ultrasonic generator (14 d).
2. A high speed metal droplet/substrate collision device under combined field action according to claim 1, wherein: the pressure pulse is obtained by controlling the gas flow of a pulse gas flow inlet (8 c) and a pulse gas flow outlet (8 d) through the on-off time sequence of a pulse gas inlet electromagnetic valve (13 b) and a pulse gas exhaust electromagnetic valve (13 c) and adjusting the gas pressure change in the quartz glass tube.
3. A high speed metal droplet/substrate collision device under combined field action according to claim 1, wherein: the lower half part of the quartz glass tube is surrounded by a high-frequency induction heating coil (7 a) and used for heating solid metal particles, and the temperature adjusting range is 0-1000 ℃.
4. A high speed metal droplet/substrate collision device under combined field action according to claim 1, wherein: the base plate mounting block (5 a) is made of brass alloy and is connected with the electric heating plate (6 a), so that heat conduction is facilitated, and the temperature regulation range of the base plate heating assembly (6) is 0-500 ℃.
5. A high speed metal droplet/substrate collision device under combined field action according to claim 1, wherein: the Laval nozzle (10 a) is composed of two conical tubes, wherein one is a contraction tube, and the other is an expansion tube; inert gas with pressure of 0.1-0.7MPa flows into the front half part of the nozzle, passes through the narrow part and escapes from the rear half part, and the gas flow velocity reaches 400m/s at most.
6. A high speed metal droplet/substrate collision device under combined field action according to claim 1, wherein: the ultrasonic vibrating rod (14 a) is driven by the second uniaxial electric moving platform (14 c) to contact with the substrate mounting block (5 a) to generate ultrasonic oscillation action on the substrate sample wafer (5 b).
CN201921852123.2U 2019-10-31 2019-10-31 High-speed metal droplet/substrate collision device under the action of compound field Active CN210876006U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110624751A (en) * 2019-10-31 2019-12-31 兰州理工大学 High-speed metal droplet/substrate collision device under the action of compound field and its application method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110624751A (en) * 2019-10-31 2019-12-31 兰州理工大学 High-speed metal droplet/substrate collision device under the action of compound field and its application method
CN110624751B (en) * 2019-10-31 2024-07-23 兰州理工大学 High-speed metal droplet/substrate collision device under action of composite field and application method

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