CN210489263U - Low-energy radiation electron beam irradiation device - Google Patents
Low-energy radiation electron beam irradiation device Download PDFInfo
- Publication number
- CN210489263U CN210489263U CN201921343087.7U CN201921343087U CN210489263U CN 210489263 U CN210489263 U CN 210489263U CN 201921343087 U CN201921343087 U CN 201921343087U CN 210489263 U CN210489263 U CN 210489263U
- Authority
- CN
- China
- Prior art keywords
- electron beam
- magnet
- collimator
- accelerator
- energy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Apparatus For Disinfection Or Sterilisation (AREA)
Abstract
The utility model discloses a low energy radiation electron beam irradiation device, including the frame, be provided with electron gun, accelerator, scanning magnet and vacuum irradiation box in the frame, electron gun and scanning magnet link to each other with the accelerator respectively, the vacuum irradiation box links to each other with scanning magnet, the opening orientation of vacuum irradiation box is irradiated article, be provided with low scattered energy subassembly between accelerator and the scanning magnet, low scattered energy subassembly includes dipolar deflection magnet and collimator, and dipolar deflection magnet one end links to each other with the accelerator, and the other end links to each other with the collimator, and the collimator links to each other with scanning magnet. The energy dissipation can be better reduced through the two-pole deflection magnet and the collimator, and the application range of the two-pole deflection magnet is improved.
Description
Technical Field
The utility model relates to a green processing technology field, more specifically say, relate to a low energy radiation electron beam irradiation device.
Background
The electron beam irradiation processing is a high-tech green processing technology for disinfecting, sterilizing and modifying a product by utilizing a physical effect, a chemical effect and a biological effect generated by the interaction of ionizing radiation and a substance.
The higher the energy of the electron beam, the stronger the penetration of the electron, the larger the range, and the greater the thickness of the irradiated article. Internationally recognized that the highest electron beam energy which does not produce secondary pollution such as radioactivity is 10MeV, so that 10MeV or slightly lower electron beam energy is generally adopted in the application fields of disinfection and sterilization, food preservation and the like. The electron beam can excite a certain absorbed dose (energy) distribution after being incident on the irradiated object, when the required dose uniformity is better than 90%, the penetration depth of the 10MeV electron beam in water is about 4cm, and the penetration depth is smaller when the density of the irradiated object is higher. The dose generated in unit time depends on the average power of the electron beam, i.e. the multiplication of the electron energy and the average beam current intensity. For a 10MeV electron beam, if the average beam intensity is 2mA, the average beam power is 20 kW. If an absorbed dose of 5kGy (Gy being a dose unit, 1Gy being 1J/kg) is required, a processing capacity of 2kg/s, i.e. 170 tonnes per day, can be achieved for 20kW of electron beam irradiation, assuming a 50% conversion of the electron beam dose.
In the process of longitudinal bunching, namely the process of longitudinally bunching continuous electron beams in the macropulse into shorter micropulses, electrons at different longitudinal positions are subjected to velocity modulation of different electric field strengths, namely different electrons obtain different energies. During the acceleration process, since the micro-pulses have a certain width relative to the 2856MHz acceleration electric field, electrons of different phases obtain different acceleration intensities within the width of each micro-pulse. In addition to the influence of space charge effect and beam load effect, finally, at the outlet of the accelerator, the electron beam has certain energy dispersion, namely, around the designed central energy (10MeV), the electron energy spectrum has certain width, and the full width at half maximum energy dispersion is generally +/-5%. Since the beam line is a straight line from the electron gun to the accelerator to the scanning magnet, except for a part of the beam which is transversely lost on the wall of the vacuum tube, the rest beams (even if the energy is different) can be transmitted and passed, and finally radiated to the product. In certain irradiation processing fields, such as chip irradiation, it is desirable that the electron beam is a quasi-monoenergetic electron beam, i.e., the electron beam energy spread is less than 1%. To solve this problem, we have devised the low-energy-dispersion electron beam irradiation apparatus.
SUMMERY OF THE UTILITY MODEL
1. Technical problem to be solved
To the problem that exists among the prior art, the utility model aims to provide a low energy radiation electron beam irradiation device to solve the technical problem who mentions in the background art.
2. Technical scheme
In order to solve the above problems, the utility model adopts the following technical proposal.
The utility model provides a low energy scattered electron beam irradiation device, includes the frame, is provided with electron gun, accelerator, scanning magnet and vacuum irradiation box in the frame, electron gun and scanning magnet link to each other with the accelerator respectively, the vacuum irradiation box links to each other with scanning magnet, the opening orientation of vacuum irradiation box is irradiated article, be provided with low scattered energy subassembly between accelerator and the scanning magnet, low scattered energy subassembly includes dipolar deflection magnet and collimator, and dipolar deflection magnet one end links to each other with the accelerator, and the other end links to each other with the collimator, and the collimator links to each other with scanning magnet.
Preferably, the two deflection magnets and the two collimators are respectively provided, and the two deflection magnets and the collimators are alternately connected.
In any of the above schemes, preferably, water cooling pipes are provided on both of the collimators.
In any of the above embodiments, the water-cooling pipe is preferably made of copper.
3. Advantageous effects
Compared with the prior art, the utility model has the advantages of:
1. after the electron beams interact with the two groups of two-pole deflection magnets and the collimator, the energy of the electron beams is reduced from +/-5% to within 1%, namely the energy of the electron beams finally acting on the irradiated objects is dispersed within 1%, and the electron beams are quasi-monoenergetic (10MeV) electron beams.
2. The dipolar deflection magnet and the collimator are common parts in the field of accelerators, are easy to manufacture and process, are convenient to install and run stably.
Drawings
FIG. 1 is a schematic structural view of a conventional electron beam irradiation apparatus;
fig. 2 is a schematic view of the overall structure of the present invention.
The reference numbers in the figures illustrate:
1. the device comprises a frame, 2, an electron gun, 3, an accelerator, 4, a scanning magnet, 5, a vacuum irradiation box, 6, a dipolar deflection magnet, 7 and a collimator.
Detailed Description
The technical solution in the embodiment of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiment of the present invention; obviously, the described embodiments are only a part of the embodiments of the present invention, and not all embodiments, and all other embodiments obtained by those skilled in the art without any inventive work are within the scope of the present invention based on the embodiments of the present invention.
In the description of the present invention, it should be noted that the terms "upper", "lower", "inner", "outer", "top/bottom", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it should be noted that, unless explicitly stated or limited otherwise, the terms "mounted," "disposed," "sleeved/connected," "connected," and the like are used in a broad sense, and for example, "connected," may be fixedly connected, detachably connected, or integrally connected, mechanically connected, electrically connected, directly connected, indirectly connected through an intermediate medium, or connected between two elements.
Example 1:
referring to fig. 2, the low-energy radiation electron beam irradiation device comprises a frame 1, wherein an electron gun 2, an accelerator 3, a scanning magnet 4 and a vacuum irradiation box 5 are arranged on the frame 1, the electron gun 2 and the scanning magnet 4 are respectively connected with the accelerator 3, the vacuum irradiation box 5 is connected with the scanning magnet 4, an opening of the vacuum irradiation box 5 faces an irradiated object, a low-energy radiation assembly is arranged between the accelerator 3 and the scanning magnet 4, the low-energy radiation assembly comprises a two-pole deflection magnet 6 and a collimator 7, one end of the two-pole deflection magnet 6 is connected with the accelerator 3, the other end of the two-pole deflection magnet is connected with the collimator 7, and the collimator 7 is connected with the scanning magnet 4.
In this embodiment, for better energy dissipation elimination, two dipole deflection magnets 6 and two collimators 7 are respectively arranged, and the dipole deflection magnets 6 and the collimators 7 are alternately connected, so that the energy dissipation elimination effect is improved.
In this embodiment, two all be provided with the water-cooling pipeline on the collimator 7, through the overheated condition of collimator emergence that prevents that water-cooling pipeline can be fine, prolong its life.
In this embodiment, for better use water-cooling pipeline, water-cooling pipeline's material is copper, has improved its radiating efficiency.
The structure of a conventional electron beam irradiation apparatus is shown in fig. 1. The direct current hot cathode electron gun is used for generating a low-energy and high-current macropulse electron beam current. The accelerator operating at 2856MHz frequency is used for longitudinally bunching a macropulse electron beam into a series of micropulses and accelerating the macropulse electron beam to a designed energy such as 10MeV, and solenoid magnets are arranged on the periphery of the accelerator 3 to transversely focus the electron beam. The scanning magnet 4 periodically scans the electron beam in the transverse direction to widen the electron beam in the transverse direction. The vacuum irradiation box 5 receives the electron beam which is expanded by scanning, and isolates the vacuum environment in the accelerator 3 from the outside atmosphere, and the electron beam can penetrate through the titanium film at the bottom of the vacuum irradiation box 5 and be emitted vertically downwards. The irradiated articles are boxed and then are placed on a conveying belt to be conveyed anticlockwise, and when the irradiated articles run to the position right below the irradiation box, the irradiated articles can be irradiated by the electron beams to realize disinfection and sterilization. In addition to the key equipments shown in fig. 1, the complete irradiation device of the electron accelerator 3 further includes auxiliary systems such as a power supply system, a water cooling system, a vacuum system, and a control system, which are described in detail in references [1, 2 ].
The auxiliary system that the accelerator is connected set up with reference to the following documents:
[1] chenjia er main edition, physical foundation of accelerator, Beijing university Press, 2012
[2] Peiyuan Jean, design basis for electronic linear accelerators, scientific Press, 2013
Example 2:
on the basis of embodiment 1, as shown in fig. 2, in order to distinguish two sets of dipole deflection magnets 6 and two sets of collimators 7, the names are edited, but the structures are the same only for understanding the positions and the working principles thereof, which are the first dipole deflection magnet 6, the second dipole deflection magnet 6, the first collimator 7 and the second collimator 7, respectively, and the low energy dispersion electron beam irradiation apparatus is based on the conventional electron beam irradiation apparatus, and the working principle thereof is as follows: two sets of dipole deflection magnets 6 and collimators 7 are added. After the electron beam with high energy dispersion is deflected by the first two-pole deflection magnet 6, only electrons with energy just being 10MeV of central energy can be deflected to the central line of the beam pipeline due to different deflection angles of electrons with different energies, namely, dispersion exists, and the more electrons with energy deviating from 10MeV, the more electrons the operation track deviates from the central line after deflection. In order to prevent the first collimator 7 from overheating, a first collimator 7 is provided with a water cooling pipe, and the first collimator 7 is additionally provided with a first collimator 7 at a proper position behind the first dipole deflection magnet 6, so that electrons which are most deviated from the central line can be lost on the first collimator 7. The energy spread of the electron beam after passing the first collimator 7 is substantially reduced. The second dipole deflection magnet 6 is responsible for deflecting the electron beam back to the vertical downward direction, and once again, electrons with energy deviating from 10MeV will deviate from the center line of the beam conduit after being deflected by the second dipole deflection magnet 6 and finally be lost on the second collimator 7. Similarly, the second collimator 7 is also provided with a water-cooled pipe. The electron beam, which passes through the second collimator 7 and finally reaches the scanning magnet 4, has its power divergence substantially eliminated, with a power divergence of less than 1%.
After passing through the two groups of two-pole deflection magnets 6 and the collimator 7, the energy dispersion of the electron beams is reduced from +/-5% to within 1%, namely the electron beams finally acting on the irradiated objects are dispersed within 1%, and the electron beams are quasi-monoenergetic electron beams.
The above description is only the preferred embodiment of the present invention; the scope of the present invention is not limited thereto. Any person skilled in the art should also be able to cover the technical scope of the present invention by replacing or changing the technical solution and the improvement concept of the present invention with equivalents and modifications within the technical scope of the present invention.
Claims (4)
1. The utility model provides a low energy scattered electron beam irradiation device, includes frame (1), is provided with electron gun (2), accelerator (3), scanning magnet (4) and vacuum irradiation box (5) in frame (1), electron gun (2) and scanning magnet (4) link to each other with accelerator (3) respectively, vacuum irradiation box (5) link to each other with scanning magnet (4), the opening orientation of vacuum irradiation box (5) is irradiated article, its characterized in that, be provided with low scattered energy subassembly between accelerator (3) and scanning magnet (4), low scattered energy subassembly includes dipolar deflection magnet (6) and collimator (7), and dipolar deflection magnet (6) one end links to each other with accelerator (3), and the other end links to each other with collimator (7), and collimator (7) link to each other with scanning magnet (4).
2. The low energy radiation electron beam irradiation apparatus according to claim 1, wherein: the two deflection magnets (6) and the two collimators (7) are respectively arranged, and the two deflection magnets (6) are alternately connected with the collimators (7).
3. The low energy radiation electron beam irradiation apparatus according to claim 1, wherein: at least one of the two collimators (7) is provided with a water cooling pipeline.
4. A low energy radiation electron beam irradiation apparatus according to claim 3, wherein: the water cooling pipeline is made of copper.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921343087.7U CN210489263U (en) | 2019-08-19 | 2019-08-19 | Low-energy radiation electron beam irradiation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921343087.7U CN210489263U (en) | 2019-08-19 | 2019-08-19 | Low-energy radiation electron beam irradiation device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210489263U true CN210489263U (en) | 2020-05-08 |
Family
ID=70536425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921343087.7U Active CN210489263U (en) | 2019-08-19 | 2019-08-19 | Low-energy radiation electron beam irradiation device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210489263U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113409981A (en) * | 2021-06-18 | 2021-09-17 | 中国科学院近代物理研究所 | Multi-surface irradiation method and system for electron beam irradiation processing |
| CN113903493A (en) * | 2020-06-22 | 2022-01-07 | 四川智研科技有限公司 | Irradiation method for container |
| CN114158175A (en) * | 2021-11-26 | 2022-03-08 | 中山大学 | Chicane System in Intensive Electron Linear Accelerator |
-
2019
- 2019-08-19 CN CN201921343087.7U patent/CN210489263U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113903493A (en) * | 2020-06-22 | 2022-01-07 | 四川智研科技有限公司 | Irradiation method for container |
| CN113409981A (en) * | 2021-06-18 | 2021-09-17 | 中国科学院近代物理研究所 | Multi-surface irradiation method and system for electron beam irradiation processing |
| CN114158175A (en) * | 2021-11-26 | 2022-03-08 | 中山大学 | Chicane System in Intensive Electron Linear Accelerator |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5571751B2 (en) | Decontamination and sterilization system using large area X-ray source | |
| CN210489263U (en) | Low-energy radiation electron beam irradiation device | |
| EP2427901B1 (en) | Multiple output cavities in sheet beam klystron | |
| CN102119584A (en) | High-current DC proton accelerator | |
| JP3308941B2 (en) | Industrial X-ray source and electron beam source using electron beam accelerator | |
| CN109842986B (en) | Fast-cycle synchrotrons and accelerator systems with uniform transverse beams | |
| CN201418200Y (en) | Double-beam rosette radiation accelerator | |
| CN114025836A (en) | Compact rotating gantry for proton radiation systems | |
| CN212750391U (en) | Electron beam irradiation treatment device for inner and outer surfaces of barrel-shaped container | |
| US20080067406A1 (en) | Irradiating device and method for controlling the same | |
| Auditore et al. | Pulsed 5 MeV standing wave electron linac for radiation processing | |
| CN211016567U (en) | Water cooling structure of vacuum irradiation box | |
| CA2676857C (en) | A system and method for non-destructive decontamination of sensitive electronics using soft x-ray radiation | |
| Zhang et al. | Simulation analysis of a pulsed compact FLTD system for large-area hard X-ray sources | |
| Ramler | Machine sources | |
| Cleland | Electron beam materials irradiators | |
| Nayak et al. | Physics studies of a DC electron accelerator for Industrial applications | |
| Zhang | PHYSICAL DESIGN OF A 10MeV HIGH SCANNING FREQUENCY IRRADIATION ELECTRON LINEAR ACCELERATOR | |
| CN218499329U (en) | X-ray source | |
| Jing et al. | Compact Accelerator Technology and Its Applications | |
| CN202796845U (en) | Cluster tip wavefront field emission cold cathode X-ray tube with registration hole control sheet | |
| Cleland et al. | Physical aspects of X-Ray processing | |
| JP3803845B2 (en) | X-ray generator using electron accelerator | |
| Hatori et al. | Accelerator system at the wakasa-wan energy research center | |
| Korolyov et al. | Design of compact system with wide electron beam for radiation technologies |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |