CN209912898U - Quantum Dot Light Emitting Diode - Google Patents
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Abstract
Description
技术领域technical field
本实用新型实施例涉及半导体技术领域,尤其涉及一种量子点发光二极管。The embodiments of the present utility model relate to the technical field of semiconductors, and in particular, to a quantum dot light-emitting diode.
背景技术Background technique
量子点是一种新型发光材料,有光谱可调,成本低,可大面积制备等优势。Quantum dots are a new type of luminescent material with the advantages of tunable spectrum, low cost and large area preparation.
对于量子点发光二极管,需要将载流子(空穴、电子)限制在发光层复合,而目前的器件结构虽然可以一定程度上的限制,但仍有载流子通过。因此,目前的量子点发光二极管中,载流子不能很好的被限制在发光层,而存在器件的发光效率不是很高的技术问题。For quantum dot light-emitting diodes, it is necessary to confine the carriers (holes, electrons) in the light-emitting layer for recombination. Although the current device structure can be restricted to a certain extent, the carriers still pass through. Therefore, in the current quantum dot light-emitting diodes, the carriers cannot be well confined in the light-emitting layer, and there is a technical problem that the light-emitting efficiency of the device is not very high.
实用新型内容Utility model content
有鉴于此,本实用新型实施例提供了一种量子点发光二极管,以解决现有技术中目前的量子点发光二极管中,载流子不能很好的被限制在发光层,而存在器件的发光效率不是很高的技术问题。In view of this, the embodiment of the present invention provides a quantum dot light-emitting diode to solve the problem that in the current quantum dot light-emitting diode in the prior art, the carriers cannot be well confined in the light-emitting layer, and there is a luminescence of the device. Efficiency is not a very technical issue.
本实用新型实施例提供了一种量子点发光二极管,包括:The embodiment of the present utility model provides a quantum dot light-emitting diode, comprising:
基底;base;
形成在所述基底上的阳极;an anode formed on the substrate;
形成在所述阳极上的空穴传输层;a hole transport layer formed on the anode;
形成在所述空穴传输层上的多量子阱层,所述多量子阱层包括至少两层势垒层和比所述势垒层的层数少一层的发光层,所述势垒层和所述发光层间隔层叠设置,所述空穴传输层紧邻所述势垒层;形成在所述多量子阱层的电子传输层,紧邻所述多量子阱层中的势垒层;a multiple quantum well layer formed on the hole transport layer, the multiple quantum well layer including at least two barrier layers and a light-emitting layer one less than the number of the barrier layers, the barrier layer and the light-emitting layer is stacked and arranged at intervals, and the hole transport layer is adjacent to the barrier layer; the electron transport layer formed in the multiple quantum well layer is adjacent to the potential barrier layer in the multiple quantum well layer;
形成在所述电子传输层上的阴极。A cathode formed on the electron transport layer.
可选的,所述势垒层为第一禁带量子点层,所述发光层为第二禁带量子点层,所述第一禁带量子点层的禁带宽度大于所述第二禁带量子点层的禁带宽度。Optionally, the barrier layer is a first forbidden quantum dot layer, the light emitting layer is a second forbidden quantum dot layer, and the forbidden band width of the first forbidden quantum dot layer is larger than that of the second forbidden quantum dot layer. The forbidden band width of the layer with quantum dots.
可选的,还包括形成在所述阴极上的薄膜封装层。Optionally, it also includes a thin film encapsulation layer formed on the cathode.
可选的,所述空穴传输层为聚(3,4-亚乙二氧基噻吩)聚苯乙烯磺酸盐空穴传输层。Optionally, the hole transport layer is a poly(3,4-ethylenedioxythiophene) polystyrene sulfonate hole transport layer.
可选的,所述电子传输层包括氧化锌电子传输层、氧化钛电子传输层以及氧化锆电子传输层中的任一一种。Optionally, the electron transport layer includes any one of a zinc oxide electron transport layer, a titanium oxide electron transport layer and a zirconia electron transport layer.
可选的,所述第一禁带量子点层和所述第二禁带量子点层包括硫化铅量子点层、硒化铅量子点层或者碲化铅量子点层中的任一一种。Optionally, the first band gap quantum dot layer and the second band gap quantum dot layer include any one of a lead sulfide quantum dot layer, a lead selenide quantum dot layer, or a lead telluride quantum dot layer.
本实用新型实施例提供了一种量子点发光二极管,该量子点发光二极管包括由势垒层和发光层组成的多量子阱层,势垒层将载流子更好的限制在发光层中复合发光,从而提高了量子点发光二极管的发光效率,解决了现有技术中目前的近红外量子点发光二极管中,载流子不能很好的被限制在发光层,而存在器件的发光效率不是很高的技术问题。The embodiment of the present utility model provides a quantum dot light emitting diode, the quantum dot light emitting diode includes a multiple quantum well layer composed of a barrier layer and a light emitting layer, and the barrier layer better confines the carriers in the light emitting layer to recombine It emits light, thereby improving the luminous efficiency of quantum dot light-emitting diodes, and solving the problem that in the current near-infrared quantum dot light-emitting diodes in the prior art, the carriers cannot be well confined in the light-emitting layer, and the luminous efficiency of the existing devices is not very high. high technical issues.
附图说明Description of drawings
图1为本实用新型实施例一提供的一种量子点发光二极管的结构示意图;1 is a schematic structural diagram of a quantum dot light-emitting diode according to
图2为本实用新型实施例一提供的又一种量子点发光二极管的结构示意图;2 is a schematic structural diagram of another quantum dot light-emitting diode according to
图3为本实用新型实施例二提供的一种有量子点发光二极管的制备方法流程图。FIG. 3 is a flow chart of a method for preparing a light-emitting diode with quantum dots according to the second embodiment of the present invention.
具体实施方式Detailed ways
下面结合附图和实施例对本实用新型作进一步的详细说明。可以理解的是,此处所描述的具体实施例仅仅用于解释本实用新型,而非对本实用新型的限定。另外还需要说明的是,为了便于描述,附图中仅示出了与本实用新型相关的部分而非全部结构。The present utility model will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, the drawings only show some but not all structures related to the present invention.
实施例一Example 1
本实用新型实施例提供了一种量子点发光二极管的结构示意图,如图1所示,该量子点发光二极管包括:基底1;形成在基底1上的阳极2;形成在阳极2上的空穴传输层3;形成在空穴传输层3上的多量子阱层4,多量子阱层4包括至少两层势垒层41和比势垒层41的层数少一层的发光层42,势垒层41和发光层42间隔层叠设置,空穴传输层3紧邻势垒层41;形成在多量子阱层4的电子传输层5,紧邻多量子阱层4中的势垒层41;形成在电子传输层5上的阴极6。An embodiment of the present invention provides a schematic structural diagram of a quantum dot light-emitting diode. As shown in FIG. 1 , the quantum dot light-emitting diode includes: a
需要说明的是,图1示出的量子点发光二极管的结构示意图中,示例性的示出了三层势垒层41和两层发光层42,其中,空穴传输层3紧邻势垒层41。本实用新型实施例对于势垒层41和发光层42的具体层数不作限定。It should be noted that, in the schematic structural diagram of the quantum dot light emitting diode shown in FIG. 1 , three
在本实施例中,阳极示例性的可以选用具有良好透射率的氧化铟锡(Indium TinOxides,ITO)导电玻璃。阴极可以采用较高功函数的金属,例如银和铝。In this embodiment, the anode can be exemplarily selected from indium tin oxide (Indium Tin Oxides, ITO) conductive glass with good transmittance. Cathodes can employ higher work function metals such as silver and aluminum.
在本实施例中,量子点发光二极管的发光机理如下:In this embodiment, the light-emitting mechanism of the quantum dot light-emitting diode is as follows:
量子点发光二极管的阳极施加正电压,阴极施加负电压,在外加电场的作用下,载流子从阳极2和阴极6注入,经过空穴传输层3和电子传输层5,到达多量子阱层4的发光层42复合发光。其中,势垒层41的作用是,将载流子限制在发光层42复合发光。A positive voltage is applied to the anode of the quantum dot light-emitting diode, and a negative voltage is applied to the cathode. Under the action of the applied electric field, the carriers are injected from the
本实用新型实施例提供了一种量子点发光二极管,该量子点发光二极管包括由势垒层和发光层组成的多量子阱层,势垒层将载流子更好的限制在发光层中复合发光,从而提高了量子点发光二极管的发光效率,解决了现有技术中目前的量子点发光二极管中,载流子不能很好的被限制在发光层,而存在器件的发光效率不是很高的技术问题。The embodiment of the present utility model provides a quantum dot light-emitting diode, the quantum dot light-emitting diode comprises a multi-quantum well layer composed of a barrier layer and a light-emitting layer, and the barrier layer better confines the carriers in the light-emitting layer to recombine It emits light, thereby improving the luminous efficiency of the quantum dot light-emitting diode, and solving the problem that in the current quantum dot light-emitting diode in the prior art, the carriers cannot be well confined in the light-emitting layer, and the luminous efficiency of the existing device is not very high. technical problem.
可选的,在上述技术方案的基础上,势垒层41为第一禁带量子点层,发光层42为第二禁带量子点层,第一禁带量子点层的禁带宽度大于第二禁带量子点层的禁带宽度。势垒层的禁带宽度大于发光层禁带宽度,将从阳极2和阴极6注入的载流子限制在发光层42复合发光。Optionally, on the basis of the above technical solution, the
可选的,在上述技术方案的基础上,参见图2,本实用新型实施例提供的量子点发光二极管还包括形成在阴极6上的薄膜封装层7。薄膜封装层7的作用是防止外界水氧入侵,影响量子点发光二极管的发光性能,其材料的选取,示例性的,可以为有机材料层、无机材料层、或者有机材料与无机材料形成的叠层。Optionally, on the basis of the above technical solution, referring to FIG. 2 , the quantum dot light-emitting diode provided by the embodiment of the present invention further includes a thin
在本实施例中,量子点发光二极管的发光机理如下:载流子从阳极和阴极注入,经过空穴传输层和电子传输层,到达多量子阱层中的发光层复合发光。势垒层41的作用是,将载流子限制在发光层42复合发光。In this embodiment, the light-emitting mechanism of the quantum dot light-emitting diode is as follows: the carriers are injected from the anode and the cathode, pass through the hole transport layer and the electron transport layer, and reach the light-emitting layer in the multi-quantum well layer for composite light emission. The function of the
量子点是零维的半导体纳米颗粒,具有量子限域效应、量子尺寸效应和量子表面效应等纳米效应。量子点的颗粒尺寸小于其相应体材料的激子波尔半径,出现由量子限域效应引起的准连续能带分裂为分立能级。纳米颗粒尺寸越小,能级分裂越大,禁带宽度而随之变宽,量子点的发光光谱随颗粒尺寸的减小而发生蓝移,所以可通过调节量子点的尺寸来调节发光波长。其中量子点的尺寸可以通过在制备量子点的过程中,调节合成温度和合成时间来控制。Quantum dots are zero-dimensional semiconductor nanoparticles with nano-effects such as quantum confinement effect, quantum size effect and quantum surface effect. The particle size of quantum dots is smaller than the exciton Bohr radius of their corresponding bulk materials, and the quasi-continuous energy band splitting into discrete energy levels occurs due to the quantum confinement effect. The smaller the nanoparticle size, the larger the energy level splitting, the wider the forbidden band width, and the blue-shift of the emission spectrum of quantum dots with the decrease of particle size, so the emission wavelength can be adjusted by adjusting the size of quantum dots. The size of the quantum dots can be controlled by adjusting the synthesis temperature and synthesis time in the process of preparing the quantum dots.
可选的,在上述技术方案的基础上,空穴传输层3为聚(3,4-亚乙二氧基噻吩)聚苯乙烯磺酸盐空穴传输层。其中,聚(3,4-乙烯二氧噻吩)-聚苯乙烯磺酸英(Poly(3,4-ethylenedioxythiophene)/poly(styrenesulfonate),PEDOT/PSS)空穴传输层起到传输空穴的作用。Optionally, based on the above technical solution, the
可选的,在上述技术方案的基础上,电子传输层5包括氧化锌电子传输层、氧化钛电子传输层以及氧化锆电子传输层中的任一一种,起到传输电子的作用。Optionally, based on the above technical solution, the
可选的,在上述技术方案的基础上,第一禁带量子点层和第二禁带量子点层包括硫化铅量子点层、硒化铅量子点层或者碲化铅量子点层中的任一一种。硫化铅量子点层、硒化铅量子点层或者碲化铅量子点层中的任一一种的发光波长在红外波段。Optionally, on the basis of the above technical solution, the first band gap quantum dot layer and the second band gap quantum dot layer include any one of a lead sulfide quantum dot layer, a lead selenide quantum dot layer, or a lead telluride quantum dot layer. One by one. The emission wavelength of any one of the lead sulfide quantum dot layer, the lead selenide quantum dot layer, or the lead telluride quantum dot layer is in the infrared band.
实施例二
在上述实施例的基础上,本实用新型实施例提供了一种量子点发光二极管的制备方法,以图1示出的量子点发光二极管为例进行说明,量子点发光二极管的制备方法参见图3,包括以下步骤:On the basis of the above-mentioned embodiments, the embodiment of the present invention provides a preparation method of a quantum dot light-emitting diode. The quantum dot light-emitting diode shown in FIG. 1 is used as an example for description. For the preparation method of the quantum dot light-emitting diode, see FIG. , including the following steps:
步骤110、提供基底。
参见图1,提供基底1。Referring to Figure 1, a
步骤120、在基底上形成阳极。
参见图1,在基底1上形成阳极2。Referring to FIG. 1 , an
步骤130、在阳极上形成空穴传输层。
在见图1,在阳极2上形成空穴传输层3。In FIG. 1 , a
步骤140、在空穴传输层上形成多量子阱层,多量子阱层包括至少两层势垒层和比势垒层的层数少一层的发光层,势垒层和发光层间隔层叠设置,空穴传输层紧邻势垒层。
参见图1,在空穴传输层3上形成多量子阱层4,多量子阱层4包括至少两层势垒层41和比势垒层41的层数少一层的发光层42,势垒层41和发光层42间隔层叠设置,空穴传输层3紧邻势垒层41。Referring to FIG. 1 , a
步骤150、在多量子阱层上形成电子传输层,紧邻多量子阱层中的势垒层。
参见图1,在多量子阱层4上形成电子传输层5,紧邻多量子阱层4中的势垒层41。Referring to FIG. 1 , the
步骤160、在电子传输层上形成阴极。
参见图1,在电子传输层5上形成阴极6。Referring to FIG. 1 , the
本实用新型实施例提供了一种量子点发光二极管的制备方法,通过在量子点发光二极管形成由势垒层和发光层组成的多量子阱层,势垒层将载流子更好的限制在发光层中复合发光,从而提高了量子点发光二极管的发光效率,解决了现有技术中目前的量子点发光二极管中,载流子不能很好的被限制在发光层,而存在器件的发光效率不是很高的技术问题。The embodiment of the present invention provides a preparation method of a quantum dot light-emitting diode. By forming a multi-quantum well layer composed of a barrier layer and a light-emitting layer in the quantum dot light-emitting diode, the barrier layer can better confine the carriers to Compound light emission in the light-emitting layer, thereby improving the light-emitting efficiency of the quantum dot light-emitting diode, solving the problem that in the current quantum dot light-emitting diode in the prior art, the carriers cannot be well confined in the light-emitting layer, and the light-emitting efficiency of the device exists. Not a very technical problem.
可选的,在上述技术方案的基础上,步骤140在空穴传输层3上形成多量子阱层4具体包括:在空穴传输层3上采用溶液旋涂法,交叉旋涂势垒层41和发光层42。Optionally, on the basis of the above technical solution, forming the multiple
可选的,在上述技术方案的基础上,以图2示出的量子点发光二极管为例进行说明,在步骤160之后,还包括在阴极6上形成薄膜封装层7。Optionally, on the basis of the above technical solution, taking the quantum dot light emitting diode shown in FIG. 2 as an example for illustration, after
可选的,在上述技术方案的基础上,步骤160在电子传输层上形成阴极具体包括:通过蒸镀工艺在电子传输层上形成阴极。Optionally, on the basis of the above technical solution, forming a cathode on the electron transport layer in
注意,上述仅为本实用新型的较佳实施例及所运用技术原理。本领域技术人员会理解,本实用新型不限于这里所述的特定实施例,对本领域技术人员来说能够进行各种明显的变化、重新调整、互相结合和替代而不会脱离本实用新型的保护范围。因此,虽然通过以上实施例对本实用新型进行了较为详细的说明,但是本实用新型不仅仅限于以上实施例,在不脱离本实用新型构思的情况下,还可以包括更多其他等效实施例,而本实用新型的范围由所附的权利要求范围决定。Note that the above are only preferred embodiments of the present invention and applied technical principles. Those skilled in the art will understand that the present invention is not limited to the specific embodiments described herein, and various obvious changes, readjustments, combinations and substitutions can be made to those skilled in the art without departing from the protection of the present invention scope. Therefore, although the present utility model has been described in detail through the above embodiments, the present utility model is not limited to the above embodiments, and can also include more other equivalent embodiments without departing from the concept of the present utility model. Rather, the scope of the present invention is determined by the scope of the appended claims.
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CN112909193A (en) * | 2021-01-26 | 2021-06-04 | 京东方科技集团股份有限公司 | Organic light emitting device, display device and manufacturing method |
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CN112909193A (en) * | 2021-01-26 | 2021-06-04 | 京东方科技集团股份有限公司 | Organic light emitting device, display device and manufacturing method |
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