CN209759580U - A CVD deposition furnace with diverter plate - Google Patents

Abstract

The utility model provides a CVD deposition furnace device with a splitter plate, which includes a furnace body, an air intake device, a splitter plate and a deposition chamber. The splitter plate is provided with a number of holes, and the source gas passes through the intake device and reaches the gas mixing chamber. It will enter the deposition chamber through the holes on the splitter plate. Since the inner diameter of the holes near the central axis of the splitter plate is thinner and the inclination angle is larger, the excessive gas concentration in the local space near the central axis of the splitter plate is avoided. At the same time, it is far away from the The inner diameter of the holes on the central axis of the splitter plate is thicker and the inclination angle is smaller, so the gas concentration in the local space close to the central axis of the splitter plate in the deposition chamber is avoided from being too small. In general, the gas concentration in the deposition chamber tends to be uniform, which greatly improves the utilization of the source gas. efficiency, significantly improving the deposition quality.

Description

A CVD deposition furnace with diverter plate

technical field

The utility model relates to the field of semiconductor industry, in particular to a CVD deposition furnace with a diverter plate.

Background technique

As one of the widely used technologies in the semiconductor industry, chemical vapor deposition (CVD) is to input the source gas containing raw material components into a high-temperature deposition furnace, and deposit a solid film on the preform through diffusion and convection mechanisms to form a finished product. process. In the CVD process, the structure of the deposition furnace has a great influence on the deposition efficiency and deposition quality.

The existing traditional deposition furnace is usually divided into a gas mixing chamber and a deposition chamber by a planar splitter plate, and the source gas first enters the gas mixing chamber after passing through the inlet pipe. In the gas mixing chamber, since the air inlet device is close to the central axis of the splitter plate, the gas concentration in the local area close to the central axis of the splitter plate is relatively large; on the contrary, the gas concentration in the local area far away from the central axis of the splitter plate is small, resulting in the gas concentration in the gas mixing chamber. Uneven concentration. Since the size and shape of the holes in the existing deposition furnace are consistent with the set position, the uneven gas concentration still exists after entering the deposition chamber through the holes on the splitter plate, which affects the deposition efficiency and deposition quality.

Utility model content

The purpose of this utility model is to provide a CVD deposition furnace device with a diverter plate, aiming to solve the technical problems of excessive loss of source gas and uneven distribution in the deposition chamber in the prior art, and the adopted technical scheme is as follows:

A CVD deposition furnace device with a diverter plate, including a furnace body, an air intake device, a gas mixing chamber, a diversion plate and a deposition chamber, the gas intake device, the gas mixing chamber, a diversion plate and a deposition chamber are distributed in sequence, and are all connected to the furnace body , the top surface of the diverter tray is close to the air intake device, the bottom surface of the diverter tray is close to the deposition chamber, the top surface and the bottom surface of the diverter tray are circular, and the radius of the top surface and the bottom surface are both larger than the thickness of the diverter tray;

The diverter plate is provided with several holes, the cross section of which is circular or oval, and the holes run through the top and bottom of the diverter plate;

The distance from the intersection point of the central axis of the hole and the top surface of the distribution plate to the central axis of the distribution plate is the top distance of the hole, and the distance from the intersection point of the central axis of the hole and the bottom surface of the distribution plate to the central axis of the distribution plate is the bottom distance of the hole, and the top distance of the hole is smaller than the bottom distance of the hole ;

The angle between the central axis of the hole and the central axis of the diverter plate is the inclination angle of the hole. The inclination angle of the hole is negatively correlated with the distance from the top of the hole, and the inner diameter and circumference of the cross section of the hole are positively correlated with the distance from the top of the hole.

Further, the diameter of the top surface of the splitter plate is 500mm-1200mm, the diameter of the bottom surface is 500mm-1200mm, and the thickness is 10mm-30mm.

Further, the inner diameter and circumference of the cross-section of the hole are 45 mm to 120 mm.

Further, the inclination angle of the hole is 0°-35°.

Further, the distance between the central axis of the hole and the central axis of the diverter plate is less than 10mm.

Further, the number of holes is 20-50.

Further, the material of the splitter plate is graphite or C/C composite material.

The beneficial effects of the pyrolysis furnace device provided by the utility model are:

As the distance from the hole to the central axis of the splitter plate increases, the inner diameter and circumference of the cross section of the hole increase, and the inclination angle of the hole becomes smaller, so that the gas entering the deposition chamber through the hole can be evenly distributed, avoiding uneven gas concentration in the deposition chamber, and greatly improving the source efficiency. Gas utilization efficiency significantly improves deposition quality.

Description of drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the accompanying drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description These are only some embodiments recorded in the utility model, and those skilled in the art can also obtain other drawings according to these drawings without creative work.

Fig. 1 is a structural diagram of a pyrolysis furnace device according to an embodiment of the present invention.

Detailed ways

In order to make the purpose, technical solution and advantages of the utility model clearer, the utility model will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the utility model, and are not intended to limit the utility model.

It should be noted that the orientation or positional relationship indicated by the terms "upper", "lower", "left", "right" and so on are based on the orientation or positional relationship shown in the drawings, and are only for convenience of description, rather than indicating or Implications that a referenced device or element must have a particular orientation, be constructed, and operate in a particular orientation should therefore not be construed as limiting the patent. The terms "first" and "second" are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of technical features. "Plurality" means two or more, unless otherwise clearly and specifically defined.

It should also be noted that, unless otherwise clearly stipulated and limited, the terms "installation", "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection, Or integrally connected; it may be mechanically connected or electrically connected; it may be directly connected or indirectly connected through an intermediary, and it may be the internal communication of two components. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present utility model in specific situations.

In order to illustrate the technical solution described in the utility model, the following will be described in detail in conjunction with specific drawings and embodiments.

As shown in Figure 1, the embodiment of the utility model provides a CVD deposition furnace device with a diverter plate, which is characterized in that it includes a furnace body 1, an air intake device 2, a gas mixing chamber 3, a diverter plate 4 and a deposition chamber 5, The air intake device 2, the gas mixing chamber 3, the distribution plate 4 and the deposition chamber 5 are distributed in sequence, all of which are connected to the furnace body 1. The top surface of the distribution plate 4 is close to the intake device 2, the bottom surface of the distribution plate 4 is close to the deposition chamber 5, and the distribution plate 4 The top surface and the bottom surface are circular, and the radius of the top surface and the bottom surface are both greater than the thickness of the splitter plate 4;

Divider plate 4 is provided with several holes 6, the cross section of hole 6 is circular or oval, and hole 6 runs through the top surface and bottom surface of diverter plate 4;

The distance from the intersection point of the central axis of the hole 6 and the top surface of the distribution plate 4 to the central axis of the distribution plate 4 is the distance from the top of the hole, and the distance from the intersection point of the central axis of the hole and the bottom surface of the distribution plate 4 to the central axis of the distribution plate 4 is the distance from the bottom of the hole. The distance is less than the bottom distance of the hole;

The angle between the central axis of the hole 6 and the central axis of the diverter plate 4 is the hole inclination angle, and the hole inclination angle is negatively correlated with the distance from the top of the hole, and the circumference of the inner diameter of the cross section of the hole 6 is positively correlated with the distance from the top of the hole.

As a further preference of this embodiment, the diameter of the top surface of the splitter plate 4 is 500 mm to 1200 mm, the diameter of the bottom surface is 500 mm to 1200 mm, and the thickness is 10 mm to 30 mm.

As a further preference in this embodiment, the inner diameter and circumference of the cross section of the hole 6 are 45 mm to 120 mm.

As a further preference of this embodiment, the inclination angle of the holes is 0°-35°.

As a further preference of this embodiment, the distance between the central axis of the hole 6 and the central axis of the diverter plate 4 is less than 10mm.

As a further preference of this embodiment, the number of holes 6 is 20-50.

As a further preference of this embodiment, the material of the splitter plate 4 is graphite or C/C composite material.

The working principle of this embodiment is as follows:

The source gas reaches the gas mixing chamber through the gas inlet device 2, and reaches the deposition chamber 5 through the hole 6 on the splitter plate 4. Since the inner diameter of the hole close to the central axis of the splitter plate is relatively small and the inclination angle is large, it is avoided that the deposition chamber is close to the center of the splitter plate. The gas concentration in the local space of the axis is too high. At the same time, the inner diameter of the hole away from the central axis of the splitter plate is thicker and the inclination angle is smaller, so the gas concentration in the local space close to the central axis of the splitter plate is prevented from being too small. The gas concentration in the deposition chamber tends to be uniform, which greatly improves the utilization efficiency of the source gas and significantly improves the deposition quality.

It should be noted that, in this document, the terms "comprising", "comprising" or any other variation thereof are intended to cover a non-exclusive inclusion such that a process, method, article or apparatus comprising a set of elements includes not only those elements, It also includes other elements not expressly listed, or elements inherent in the process, method, article, or apparatus.

In this paper, specific examples are used to illustrate the principle and implementation of the present invention. The description of the above examples is only used to help understand the method and core idea of the present invention. The above are only preferred embodiments of the present utility model. It should be pointed out that due to the limitation of literal expression, there are objectively unlimited specific structures. Under these conditions, several improvements, modifications or changes can also be made, and the above-mentioned technical features can also be combined in an appropriate manner; these improvements, modifications, changes or combinations, or the ideas and technical solutions of the utility model can be directly applied to other Occasions, all should be regarded as the protection scope of the present utility model.

Claims (7)

1. a CVD deposition furnace device with splitter plate, is characterized in that, comprises body of heater (1), gas inlet device (2), gas mixing chamber (3), splitter plate (4) and deposition chamber (5), The air inlet device (2), the gas mixing chamber (3), the distribution plate (4) and the deposition chamber (5) are distributed sequentially, all connected to the furnace body (1), and the top surface of the distribution plate (4) Close to the air inlet device (2), the bottom surface of the splitter tray (4) is close to the deposition chamber (5), the top and bottom surfaces of the splitter tray (4) are circular, and the radius of the top surface and the bottom surface are larger than The thickness of the diverter plate (4); The distribution plate (4) is provided with several holes (6), the cross section of the holes (6) is circular or elliptical, and the holes (6) run through the top surface and the bottom surface of the distribution plate (4); The distance from the intersection point of the central axis of the hole (6) and the top surface of the distribution plate (4) to the central axis of the distribution plate (4) is the distance from the top of the hole, and the central axis of the hole and the distribution plate ( 4) The distance from the intersection point of the bottom surface to the central axis of the diverter plate (4) is the bottom distance of the hole, and the top distance of the hole is smaller than the bottom distance of the hole; The included angle between the central axis of the hole (6) and the central axis of the splitter plate (4) is the hole inclination, and the hole inclination is negatively correlated with the distance from the top of the hole, and the inner diameter of the cross section of the hole (6) is The perimeter is positively correlated with the distance from the top of the hole. 2 . The CVD deposition furnace device with a splitter plate according to claim 1 , wherein the splitter plate ( 4 ) has a top diameter of 500 mm to 1200 mm, a bottom diameter of 500 mm to 1200 mm, and a thickness of 10 mm to 30 mm. 3. The CVD deposition furnace device with a splitter plate according to claim 1, characterized in that, the inner diameter and circumference of the cross section of the hole (6) are 45mm-120mm. 4 . The CVD deposition furnace device with a diverter plate according to claim 1 , wherein the inclination angle of the holes is 0°˜35°. 5. The CVD deposition furnace device with a splitter plate according to claim 1, characterized in that the distance between the central axis of the hole (6) and the central axis of the splitter plate (4) is less than 10mm. 6. The CVD deposition furnace device with a splitter plate according to claim 1, characterized in that, the number of said holes (6) is 20-50. 7. The CVD deposition furnace device with a splitter plate as claimed in claim 1, wherein the splitter plate (4) is made of graphite or C/C composite material.