CN209015727U - A kind of transparent conductive film and touch screen - Google Patents
A kind of transparent conductive film and touch screen Download PDFInfo
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- CN209015727U CN209015727U CN201821632157.6U CN201821632157U CN209015727U CN 209015727 U CN209015727 U CN 209015727U CN 201821632157 U CN201821632157 U CN 201821632157U CN 209015727 U CN209015727 U CN 209015727U
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Abstract
The utility model discloses a kind of transparent conductive film and touch screen, transparent conductive film includes the transparent substrate layer set gradually from top to bottom, the first ITO layer, transparent metal layer and the second ITO layer, and the thickness of the transparent metal layer is less than or equal to 40nm.The transparent conductive film and touch screen, by using sandwich structure, transparent metal layer is set between the first ITO and the second ITO layer, utilize this feature that the thickness of metal layer is transparent when being less than 40nm, simultaneously because the resistivity of the metal layer of same thickness is far below the resistivity of ITO, so that after transparent metal layer is added, the square resistance rapid decrease of the transparent conductive film, it allows for being not necessarily to by the enlarged in thickness of the first ITO layer or the second ITO layer, while obtaining low-resistance product, since the thickness of entire transparent conductive film is smaller, it is less likely to occur to fall off, improve the reliability of product, utilize the first ITO layer, second ITO layer protects the transparent metal layer, improve the weatherability of product.
Description
Technical field
The utility model relates to electrically conducting transparent technical fields, more particularly to a kind of transparent conductive film and touch screen.
Background technique
Due to needing to be arranged electrode in luminous component in some devices, such as LED, laser and touch screen, and it is general
Electrode is opaque, so that the light out part point in device is blocked by the electrodes, causes light emission rate to decline, the light emission luminance of device is not
Ideal is blocked simultaneously because part goes out light, causes device to generate heat to the absorption of this part light, cause the temperature of device
Rise, reliability decrease.And the use of transparent conductive film, no matter be mainly used as on the solar cell battery transparent electrode or
Antireflective coating, still in other aspects, while as electrode, additionally it is possible to light extraction efficiency is not reduced, the device improved
Working efficiency.Requirement to transparent conductive film be carrier concentration is high, band gap width is big, photoelectric characteristic is good, chemical property is stable,
Lower resistivity, high mechanical strength and excellent wear resistance etc..
Traditional transparent conductive film is ITO conductive film, and it is tin indium oxide that ito thin film, which is a kind of semiconductor transparent membrane,
(indium tin oxide) abbreviation, as transparent conductive electrode, it is desirable that ito thin film has the good transparency and electric conductivity.And
Ito thin film in terms of also applying on a large scale.
But being continuously increased with product size, traditional ito thin film is due to its biggish surface resistance, so that it is consumed
It is electric serious, and the temperature raising of product is more obvious.ITO belongs to transparent conductive film, but ITO accomplishes square electricity if necessary
When resistance is less than 10 ohm, need to plate very thick film layer, can be led to the problem of by doing so by two:
First, low efficiency.
Second, too thick film layer is easy to fall off due to stress.
Utility model content
The purpose of the utility model is to provide a kind of transparent conductive film and touch screens, under the premise of thickness is constant, drop
The low sheet resistance of product.
In order to solve the above technical problems, the utility model embodiment provides a kind of transparent conductive film, including from top to bottom
Transparent substrate layer, the first ITO layer, transparent metal layer and the second ITO layer set gradually, the thickness of the transparent metal layer are less than
Equal to 40nm.
Wherein, the transparent metal layer is golden transparent metal layer, silver-colored transparent metal layer or copper transparent metal layer.
Wherein, the transparent metal layer with a thickness of 3nm~30nm.
Wherein, the transparent substrate layer is PET transparent substrate layer, PMMA transparent substrate layer, PP transparent substrate layer, PS transparent
Substrate layer, PEN transparent substrate layer or PC transparent substrate layer.
Wherein, the transparent substrate layer with a thickness of 5 μm~200 μm.
Wherein, the thickness of first ITO layer and second ITO layer is equal.
In addition to this, the utility model embodiment additionally provides a kind of touch screen, including transparent conductive film as described above.
Transparent conductive film and touch screen provided by the utility model embodiment have following excellent compared with prior art
Point:
The transparent conductive film and touch screen are set between ITO layers in the first ITO and the 2nd by using sandwich structure
Transparent metal layer is set, using this feature that the thickness of metal layer is transparent when being less than 40nm, simultaneously because the gold of same thickness
The resistivity for belonging to layer is far below the resistivity of ITO, so that after transparent metal layer is added, the square electricity of the transparent conductive film
Rapid decrease is hindered, is allowed for without by the enlarged in thickness of the first ITO layers or the second ITO layer, while obtaining low-resistance product,
Since the thickness of entire transparent conductive film is smaller, it is not easy to fall off, improve the reliability of product, using the first ITO layer,
Second ITO layer protects the transparent metal layer, improves the weatherability of product.
Detailed description of the invention
In order to illustrate the embodiment of the utility model or the technical proposal in the existing technology more clearly, below will be to embodiment
Or attached drawing needed to be used in the description of the prior art is briefly described, it should be apparent that, the accompanying drawings in the following description is this
Some embodiments of utility model, for those of ordinary skill in the art, without creative efforts, also
Other drawings may be obtained according to these drawings without any creative labor.
Fig. 1 is a kind of structural schematic diagram of specific embodiment of transparent conductive film provided by the embodiment of the utility model.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
Every other embodiment obtained, fall within the protection scope of the utility model.
Referring to FIG. 1, Fig. 1 is a kind of knot of specific embodiment of transparent conductive film provided by the embodiment of the utility model
Structure schematic diagram.
In a specific embodiment, the transparent conductive film, including the transparent substrate layer set gradually from top to bottom
10, the thickness of the first ITO layer 20, transparent metal layer 30 and the second ITO layer 40, the transparent metal layer 30 is less than or equal to 40nm.
By using sandwich structure, transparent metal layer 30 is set between the first ITO and the second ITO layer 40, utilizes gold
Belong to the thickness of layer this feature transparent when being less than 40nm, simultaneously because the resistivity of the metal layer of same thickness is far below
The resistivity of ITO, so that after transparent metal layer 30 is added, the square resistance rapid decrease of the transparent conductive film just makes
It obtains and is not necessarily to the enlarged in thickness of the first ITO layer 20 or the second ITO layer 40, while obtaining low-resistance product, due to entire transparent
The thickness of conductive film is smaller, it is not easy to fall off, improve the reliability of product, utilize the first ITO layer the 20, the 2nd ITO layers
40 pairs of transparent metal layers 30 are protected, and the weatherability of product is improved.
Weatherability refers to material such as coating, building plastic, rubber product etc., the test applied to outdoor through climate,
Comprehensive as caused by illumination, cold and hot, wind and rain, bacterium etc. to destroy, tolerance is weatherability.
Transparent conductive film in the utility model, with traditional transparent conductive film, such as ITO and graphene, difference exists
In the electricity and chemical property that existing ITO and graphene etc. are using a flood as transparency conducting layer, at each position
It is essentially identical, is all same material.And the transparent conductive film in the utility model, it is in the first ITO layer 20, second
Transparent metal layer 30 is set between ITO layer 40, since traditional metal layer is opaque, and transparent in the present invention
The thickness of metal layer 30 is less than or equal to 40nm, and at this moment it is changed into transparent, using its low-resistance characteristic, reduces entire transparent
The sheet resistance of conductive film needs to plate when traditional ITO layer reaches sheet resistance less than 10 ohm if necessary to set very thick film layer, and uses
This structure allows to be greatly decreased its overall resistivity since the resistivity of transparent metal layer 30 is far below ITO.This reality
It is contacted with the transparent metal layer 30 in novel is not direct with other devices, at this moment because it is generally only less than the thickness of 40nm,
It is very fragile, it is extremely easy to be damaged, therefore the first ITO layer 20 and the second ITO layer 40 is arranged on its two sides, so that entire transparent
Conductive film, which becomes, both contains traditional ITO or the mixture containing metal.
The utility model for transparent metal layer 30 thickness and material without limitation, the transparent metal layer 30 can be with
For golden transparent metal layer, or silver-colored transparent metal layer can also be the transparent of copper transparent metal layer or other materials
Metal layer or alloy-layer, as long as can become transparent, property is stablized.
Generally, the transparent metal layer 30 with a thickness of 3nm~30nm.
The utility model for transparent metal layer 30 set-up mode without limitation, in the present invention, due to transparent
The transmitance of conductive film changes with transparent metal layer 30 and the first ITO layer 20 and the thickness change of the 2nd ITO layer 40,
Staff can be changed by adjusting transparent metal layer 30 and the first ITO layer 20 and the thickness of the second ITO layer 40.
Transparent metal layer 30 and the first ITO layer 20 and the second ITO layer 40 are typically all to be splashed by magnetic control in the utility model
What the mode penetrated was made, it is of course also possible to use other mode, setting can be adopted vapor deposition method such as ITO layers.
In the present invention, due to the first ITO layer 20 and the second ITO layer 40 can using existing equipment and technique into
Row production, and the setting of transparent metal layer 30 can also be using traditional techniques such as magnetron sputterings, so that entire transparent conductive film
Simple process, and increased process flow is extremely limited, and it is limited to increase cost.
In the utility model without limitation for the material and thickness of transparent substrate layer 10, the transparent substrate layer 10 can
Think PET transparent substrate layer, PMMA transparent substrate layer, PP transparent substrate layer, PS transparent substrate layer, PEN transparent substrate layer, PC
Any one in transparent substrate layer, or using other materials.
Generally, the transparent substrate layer 10 with a thickness of 5 μm~200 μm.
In order to further decrease technology difficulty in the utility model, general first ITO layer 20 and second ITO layer
40 thickness is equal.
The first ITO layer 20 in the utility model is used as transition zone, realizes transparent substrate layer 10 and transparent metal layer 30
Transition, exterior cover sheets of second ITO layer 40 as entire transparent conductive film, staff can be according to different needs, such as
The temperature of use environment, the light transmittance of needs, the characteristics such as wear-resisting, select suitable thickness.
In addition to this, the utility model embodiment additionally provides a kind of touch screen, including transparent conductive film as described above.
Since the touch screen includes transparent conductive film as described above, beneficial effect having the same, the utility model exists
This is repeated no more.
In conclusion transparent conductive film provided by the embodiment of the utility model and touch screen, by using sandwich structure,
Transparent metal layer is set between the first ITO and the second ITO layer, using the thickness of metal layer when being less than 40nm transparent this
Feature, simultaneously because the resistivity of the metal layer of same thickness be far below ITO resistivity so that be added transparent metal layer it
Afterwards, the square resistance rapid decrease of the transparent conductive film is allowed for without adding the thickness of the first ITO layer or the second ITO layer
Greatly, while obtaining low-resistance product, since the thickness of entire transparent conductive film is smaller, it is not easy to fall off, improve production
The reliability of product protects the transparent metal layer using the first ITO layer, the second ITO layer, improves the weather-proof of product
Property.
Transparent conductive film provided by the utility model and touch screen are described in detail above.It is used herein
Specific case is expounded the principles of the present invention and embodiment, and the explanation of above example is only intended to help to manage
Solve the method and its core concept of the utility model.It should be pointed out that for those skilled in the art, not
Under the premise of being detached from the utility model principle, several improvements and modifications can be made to this utility model, these improve and repair
Decorations are also fallen into the protection scope of the utility model claims.
Claims (7)
1. a kind of transparent conductive film, which is characterized in that including set gradually from top to bottom transparent substrate layer, the first ITO layer, thoroughly
The thickness of bright metal layer and the second ITO layer, the transparent metal layer is less than or equal to 40nm.
2. transparent conductive film as described in claim 1, which is characterized in that the transparent metal layer is saturating for golden transparent metal layer, silver
Bright metal layer or copper transparent metal layer.
3. transparent conductive film as claimed in claim 2, which is characterized in that the transparent metal layer with a thickness of 3nm~30nm.
4. transparent conductive film as claimed in claim 3, which is characterized in that the transparent substrate layer is PET transparent substrate layer, PMMA
Transparent substrate layer, PP transparent substrate layer, PS transparent substrate layer, PEN transparent substrate layer or PC transparent substrate layer.
5. transparent conductive film as claimed in claim 4, which is characterized in that the transparent substrate layer with a thickness of 5 μm~200 μm.
6. transparent conductive film as claimed in claim 5, which is characterized in that the thickness of first ITO layer and second ITO layer
It is equal.
7. a kind of touch screen, which is characterized in that including transparent conductive film as claimed in any one of claims 1 to 6.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821632157.6U CN209015727U (en) | 2018-10-08 | 2018-10-08 | A kind of transparent conductive film and touch screen |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821632157.6U CN209015727U (en) | 2018-10-08 | 2018-10-08 | A kind of transparent conductive film and touch screen |
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| CN209015727U true CN209015727U (en) | 2019-06-21 |
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| CN201821632157.6U Active CN209015727U (en) | 2018-10-08 | 2018-10-08 | A kind of transparent conductive film and touch screen |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113130674A (en) * | 2021-03-18 | 2021-07-16 | 上海交通大学 | Vertical germanium-silicon photoelectric detector with ITO electrode and preparation method thereof |
-
2018
- 2018-10-08 CN CN201821632157.6U patent/CN209015727U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113130674A (en) * | 2021-03-18 | 2021-07-16 | 上海交通大学 | Vertical germanium-silicon photoelectric detector with ITO electrode and preparation method thereof |
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