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CN208724321U - A kind of novel anti-electromagnetic-radiation optical shielding film structure - Google Patents

A kind of novel anti-electromagnetic-radiation optical shielding film structure Download PDF

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Publication number
CN208724321U
CN208724321U CN201820926754.3U CN201820926754U CN208724321U CN 208724321 U CN208724321 U CN 208724321U CN 201820926754 U CN201820926754 U CN 201820926754U CN 208724321 U CN208724321 U CN 208724321U
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China
Prior art keywords
electromagnetic
shielding film
novel anti
utility
model
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Active
Application number
CN201820926754.3U
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Chinese (zh)
Inventor
黄宗义
蒋华梁
辛似波
王曙
冯金宝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changzhou No2 Electronic Instrument Co Ltd
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Changzhou No2 Electronic Instrument Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Priority to CN201820926754.3U priority Critical patent/CN208724321U/en
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Abstract

The utility model discloses a kind of novel anti-electromagnetic-radiation optical shielding film structures, comprising: be coated with indium tin oxide films layer on the optical window eyeglass for be easy to causeing electromagnetism to invade, indium tin oxide films layer with a thickness of 160-170nm.By the above-mentioned means, the utility model can resist external electromagnetic interference, 50000V electromagnetic pulse can be resisted, to meet GJB1389A-2005 system EMC requirement.

Description

A kind of novel anti-electromagnetic-radiation optical shielding film structure
Technical field
The utility model relates to optics, electronic field, more particularly to a kind of novel anti-electromagnetic-radiation optical thin film screen Shield structure.
Background technique
Before most military photovoltaics all do not claim to anti-electromagnetic-radiation, especially electromagnetic pulse-resisting requirement. And GJB1389A-2005 system EMC requires to specify the requirement of this respect, photovoltaic needs pass through anti-50000V Electromagnetic pulse experiment, photovoltaic before are easy to that high-voltage pulse is allowed to reach internal circuit by optical window, to internal electricity Road, which interferes, even damages.
Utility model content
The utility model is wanted mainly solving the technical problems that providing one kind and meeting GJB1389A-2005 Electro Magnetic Compatibility It asks, the novel anti-electromagnetic-radiation optical shielding film structure of 50000V electromagnetic pulse can be resisted.
In order to solve the above technical problems, the technical solution that the utility model uses is: providing a kind of novel anti-electricity Magnetic radiation optical shielding film structure, comprising: tin indium oxide is coated on the optical window eyeglass for be easy to causeing electromagnetism to invade Film layer, indium tin oxide films layer with a thickness of 160-170nm.
In one preferred embodiment of the utility model, the transmitance of optical window eyeglass is maintained between 85%-90%.
In one preferred embodiment of the utility model, which is set in photoelectric instrument, becomes fully on Equipotentiality body.
In one preferred embodiment of the utility model, which can resist 50000V electromagnetic pulse.
The beneficial effects of the utility model are: the utility model can resist external electromagnetic interference, 50000V can be resisted Electromagnetic pulse, to meet GJB1389A-2005 system EMC requirement.
Detailed description of the invention
It, below will be to required in embodiment description in order to illustrate more clearly of the technical scheme in the embodiment of the utility model Attached drawing to be used is briefly described, it should be apparent that, the accompanying drawings in the following description is only some realities of the utility model Example is applied, it for those of ordinary skill in the art, without creative efforts, can also be according to these attached drawings Obtain other attached drawings, in which:
Fig. 1 is the structural schematic diagram of one preferred embodiment of the utility model anti-electromagnetic-radiation optical shielding film structure.
Specific embodiment
Below by the technical scheme in the utility model embodiment is clearly and completely described, it is clear that described Embodiment is only a part of the embodiment of the utility model, instead of all the embodiments.Based on the implementation in the utility model Example, all other embodiment obtained by those of ordinary skill in the art without making creative efforts belong to The range of the utility model protection.
Referring to Fig. 1, the utility model embodiment includes:
A kind of novel anti-electromagnetic-radiation optical shielding film structure, comprising: in the optical window for be easy to causeing electromagnetism to invade Plating one layer by the technology of optical vacuum Ion Aided Film Coating on mouth mirror piece 1 has indium tin oxide films layer 2.
By the thickness of the control film layer of quartz monitoring in real time, the final thickness of indium tin oxide films layer 2 is 160-170nm. The preferred thickness of the utility model is 163nm.
Thicknesses of layers is finely adjusted by the transmitance of real-time optical window lens 1, so that optical window not only has There is higher transmitance, transmitance is maintained between 85%-90%, does not influence the optical application of product.
The shielding construction is set in photoelectric instrument, has good conductive property (40 Ou Zuo of spacing 30mm point-to-point transmission measurement It is right), so that it is become a fully on equipotentiality body with entire casing after assembling by metal o-ring.
The shielding construction can resist 50000V electromagnetic pulse, meet GJB1389A-2005 system EMC requirement.
Electric conductivity test case and transmission measurement can obtain optical band transmitance averagely about 88%.
The above description is only the embodiments of the present invention, and therefore it does not limit the scope of the patent of the utility model, all Using equivalent structure or equivalent flow shift made by the utility model description, it is applied directly or indirectly in other phases The technical field of pass, is also included in the patent protection scope of the utility model.

Claims (4)

1. a kind of novel anti-electromagnetic-radiation optical shielding film structure characterized by comprising electromagnetism is being be easy to cause to invade Optical window eyeglass on be coated with indium tin oxide films layer, indium tin oxide films layer with a thickness of 160-170nm.
2. novel anti-electromagnetic-radiation optical shielding film structure according to claim 1, which is characterized in that optical window The transmitance of eyeglass is maintained between 85%-90%.
3. novel anti-electromagnetic-radiation optical shielding film structure according to claim 1, which is characterized in that the shielding Structure is set in photoelectric instrument, becomes fully on equipotentiality body.
4. novel anti-electromagnetic-radiation optical shielding film structure according to claim 1, which is characterized in that the shielding knot Structure can resist 50000V electromagnetic pulse.
CN201820926754.3U 2018-06-15 2018-06-15 A kind of novel anti-electromagnetic-radiation optical shielding film structure Active CN208724321U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201820926754.3U CN208724321U (en) 2018-06-15 2018-06-15 A kind of novel anti-electromagnetic-radiation optical shielding film structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201820926754.3U CN208724321U (en) 2018-06-15 2018-06-15 A kind of novel anti-electromagnetic-radiation optical shielding film structure

Publications (1)

Publication Number Publication Date
CN208724321U true CN208724321U (en) 2019-04-09

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201820926754.3U Active CN208724321U (en) 2018-06-15 2018-06-15 A kind of novel anti-electromagnetic-radiation optical shielding film structure

Country Status (1)

Country Link
CN (1) CN208724321U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114755659A (en) * 2022-04-25 2022-07-15 上海禾赛科技有限公司 Photomask for lidar and preparation method thereof, lidar

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114755659A (en) * 2022-04-25 2022-07-15 上海禾赛科技有限公司 Photomask for lidar and preparation method thereof, lidar

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