CN208724321U - A kind of novel anti-electromagnetic-radiation optical shielding film structure - Google Patents
A kind of novel anti-electromagnetic-radiation optical shielding film structure Download PDFInfo
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- CN208724321U CN208724321U CN201820926754.3U CN201820926754U CN208724321U CN 208724321 U CN208724321 U CN 208724321U CN 201820926754 U CN201820926754 U CN 201820926754U CN 208724321 U CN208724321 U CN 208724321U
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Abstract
The utility model discloses a kind of novel anti-electromagnetic-radiation optical shielding film structures, comprising: be coated with indium tin oxide films layer on the optical window eyeglass for be easy to causeing electromagnetism to invade, indium tin oxide films layer with a thickness of 160-170nm.By the above-mentioned means, the utility model can resist external electromagnetic interference, 50000V electromagnetic pulse can be resisted, to meet GJB1389A-2005 system EMC requirement.
Description
Technical field
The utility model relates to optics, electronic field, more particularly to a kind of novel anti-electromagnetic-radiation optical thin film screen
Shield structure.
Background technique
Before most military photovoltaics all do not claim to anti-electromagnetic-radiation, especially electromagnetic pulse-resisting requirement.
And GJB1389A-2005 system EMC requires to specify the requirement of this respect, photovoltaic needs pass through anti-50000V
Electromagnetic pulse experiment, photovoltaic before are easy to that high-voltage pulse is allowed to reach internal circuit by optical window, to internal electricity
Road, which interferes, even damages.
Utility model content
The utility model is wanted mainly solving the technical problems that providing one kind and meeting GJB1389A-2005 Electro Magnetic Compatibility
It asks, the novel anti-electromagnetic-radiation optical shielding film structure of 50000V electromagnetic pulse can be resisted.
In order to solve the above technical problems, the technical solution that the utility model uses is: providing a kind of novel anti-electricity
Magnetic radiation optical shielding film structure, comprising: tin indium oxide is coated on the optical window eyeglass for be easy to causeing electromagnetism to invade
Film layer, indium tin oxide films layer with a thickness of 160-170nm.
In one preferred embodiment of the utility model, the transmitance of optical window eyeglass is maintained between 85%-90%.
In one preferred embodiment of the utility model, which is set in photoelectric instrument, becomes fully on
Equipotentiality body.
In one preferred embodiment of the utility model, which can resist 50000V electromagnetic pulse.
The beneficial effects of the utility model are: the utility model can resist external electromagnetic interference, 50000V can be resisted
Electromagnetic pulse, to meet GJB1389A-2005 system EMC requirement.
Detailed description of the invention
It, below will be to required in embodiment description in order to illustrate more clearly of the technical scheme in the embodiment of the utility model
Attached drawing to be used is briefly described, it should be apparent that, the accompanying drawings in the following description is only some realities of the utility model
Example is applied, it for those of ordinary skill in the art, without creative efforts, can also be according to these attached drawings
Obtain other attached drawings, in which:
Fig. 1 is the structural schematic diagram of one preferred embodiment of the utility model anti-electromagnetic-radiation optical shielding film structure.
Specific embodiment
Below by the technical scheme in the utility model embodiment is clearly and completely described, it is clear that described
Embodiment is only a part of the embodiment of the utility model, instead of all the embodiments.Based on the implementation in the utility model
Example, all other embodiment obtained by those of ordinary skill in the art without making creative efforts belong to
The range of the utility model protection.
Referring to Fig. 1, the utility model embodiment includes:
A kind of novel anti-electromagnetic-radiation optical shielding film structure, comprising: in the optical window for be easy to causeing electromagnetism to invade
Plating one layer by the technology of optical vacuum Ion Aided Film Coating on mouth mirror piece 1 has indium tin oxide films layer 2.
By the thickness of the control film layer of quartz monitoring in real time, the final thickness of indium tin oxide films layer 2 is 160-170nm.
The preferred thickness of the utility model is 163nm.
Thicknesses of layers is finely adjusted by the transmitance of real-time optical window lens 1, so that optical window not only has
There is higher transmitance, transmitance is maintained between 85%-90%, does not influence the optical application of product.
The shielding construction is set in photoelectric instrument, has good conductive property (40 Ou Zuo of spacing 30mm point-to-point transmission measurement
It is right), so that it is become a fully on equipotentiality body with entire casing after assembling by metal o-ring.
The shielding construction can resist 50000V electromagnetic pulse, meet GJB1389A-2005 system EMC requirement.
Electric conductivity test case and transmission measurement can obtain optical band transmitance averagely about 88%.
The above description is only the embodiments of the present invention, and therefore it does not limit the scope of the patent of the utility model, all
Using equivalent structure or equivalent flow shift made by the utility model description, it is applied directly or indirectly in other phases
The technical field of pass, is also included in the patent protection scope of the utility model.
Claims (4)
1. a kind of novel anti-electromagnetic-radiation optical shielding film structure characterized by comprising electromagnetism is being be easy to cause to invade
Optical window eyeglass on be coated with indium tin oxide films layer, indium tin oxide films layer with a thickness of 160-170nm.
2. novel anti-electromagnetic-radiation optical shielding film structure according to claim 1, which is characterized in that optical window
The transmitance of eyeglass is maintained between 85%-90%.
3. novel anti-electromagnetic-radiation optical shielding film structure according to claim 1, which is characterized in that the shielding
Structure is set in photoelectric instrument, becomes fully on equipotentiality body.
4. novel anti-electromagnetic-radiation optical shielding film structure according to claim 1, which is characterized in that the shielding knot
Structure can resist 50000V electromagnetic pulse.
Priority Applications (1)
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CN201820926754.3U CN208724321U (en) | 2018-06-15 | 2018-06-15 | A kind of novel anti-electromagnetic-radiation optical shielding film structure |
Applications Claiming Priority (1)
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CN201820926754.3U CN208724321U (en) | 2018-06-15 | 2018-06-15 | A kind of novel anti-electromagnetic-radiation optical shielding film structure |
Publications (1)
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CN208724321U true CN208724321U (en) | 2019-04-09 |
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CN201820926754.3U Active CN208724321U (en) | 2018-06-15 | 2018-06-15 | A kind of novel anti-electromagnetic-radiation optical shielding film structure |
Country Status (1)
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CN (1) | CN208724321U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114755659A (en) * | 2022-04-25 | 2022-07-15 | 上海禾赛科技有限公司 | Photomask for lidar and preparation method thereof, lidar |
-
2018
- 2018-06-15 CN CN201820926754.3U patent/CN208724321U/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114755659A (en) * | 2022-04-25 | 2022-07-15 | 上海禾赛科技有限公司 | Photomask for lidar and preparation method thereof, lidar |
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