CN207175782U - Anti reflection glass - Google Patents

Abstract

The utility model relates to an anti-reflection glass. An anti-reflection glass, comprising a glass substrate, a first high-refractive-index layer, a first low-refractive-index layer, a second high-refractive-index layer, a second low-refractive-index layer and a protective layer laminated in sequence; the glass base material is sodium calcium Glass, borosilicate glass or aluminosilicate glass; the first high refractive index layer is Si ₃ N ₄ layers with a thickness of 12nm to 30nm; the first low refractive index layer is SiO ₂ layer with a thickness of 20nm to 40nm; the second high refractive index layer The index layer is Si ₃ N ₄ layer with a thickness of 50nm-150nm; the second low refractive index layer is SiO ₂ layer with a thickness of 50nm-100nm; and the protective layer is ZrO ₂ layer, Si ₃ N ₄ layer or SiC layer. The visible light reflectance of the above-mentioned anti-reflection glass is ≤5%, and the number and thickness of the film layers are reduced, so that the thickness of the anti-reflection glass is smaller, which meets the needs of product miniaturization; at the same time, the above-mentioned anti-reflection glass is wear-resistant, durable Scratch performance and good acid and alkali corrosion resistance make the anti-reflection glass suitable for outdoor use.

Description

Anti-reflection glass

technical field

The utility model relates to the field of glass, in particular to anti-reflection glass.

Background technique

As we all know, light will reflect on the interface of two media. In today's buildings with glass curtain wall as the shell, when sunlight hits the glass surface, the reflected light will cause serious light pollution to the environment. In order to solve these problems, a single-layer or multi-layer film of a certain thickness is usually coated on the surface of the glass in order to reduce the reflected light on the glass surface. Such an optical film is an anti-reflection film (Anti-reflection film).

However, there are more requirements for the light weight of glass products at present. On the basis of meeting the requirements for the use of glass products, the thickness of anti-reflection glass is also required to be smaller, and for anti-reflection coated glass used outdoors, it is scratch-resistant, There are also higher requirements for abrasive resistance and corrosion resistance.

Utility model content

Based on this, it is necessary to provide an anti-reflection glass for the problems of anti-reflection glass thickness and insufficient scratch resistance, abrasion resistance and corrosion resistance.

An antireflection glass, the antireflection glass comprising a glass substrate, a first high refractive index layer, a first low refractive index layer, a second high refractive index layer, a second low refractive index layer and a protective layer laminated in sequence;

The first high refractive index layer is a Si ₃ N ₄ layer, and the thickness of the first high refractive index layer is 12 nm to 30 nm;

The first low refractive index layer is a SiO ₂ layer, and the thickness of the first low refractive index layer is 20nm to 40nm;

The second high refractive index layer is a Si ₃ N ₄ layer, and the thickness of the second high refractive index layer is 50nm-150nm;

The second low refractive index layer is a SiO ₂ layer, and the thickness of the second low refractive index layer is 50nm-100nm; and

The protection layer is a ZrO ₂ layer, a Si ₃ N ₄ layer or a SiC layer.

In one embodiment, the glass substrate has a thickness of 3 mm to 19 mm.

In one embodiment, the protective layer has a thickness of 2 nm to 20 nm.

In one embodiment, the thickness of the first high refractive index layer is 12nm-20nm.

In one embodiment, the thickness of the first low refractive index layer is 20nm-35nm.

In one embodiment, the thickness of the second high refractive index layer is 80nm-140nm.

In one embodiment, the thickness of the second low refractive index layer is 50nm-90nm.

In one of the implementations, the first high refractive index layer is a Si ₃ N ₄ layer, and the thickness of the first high refractive index layer is 14nm; the first low refractive index layer is a SiO ₂ layer, and the The thickness of the first low refractive index layer is 29.6nm; the second high refractive index layer is Si ₃ N ₄ layer, the thickness of the second high refractive index layer is 119.1nm; the second low refractive index layer is SiO ₂ layer, the thickness of the second low refractive index layer is 72nm.

In one of the implementations, the first high refractive index layer is a Si ₃ N ₄ layer, and the thickness of the first high refractive index layer is 14nm; the first low refractive index layer is a SiO ₂ layer, and the The thickness of the first low refractive index layer is 28nm; the second high refractive index layer is Si ₃ N ₄ layer, the thickness of the second high refractive index layer is 113.5nm; the second low refractive index layer is SiO ₂ layers, the thickness of the second low refractive index layer is 63nm.

The above-mentioned anti-reflection glass includes the first high-refractive index layer, the first low-refractive-index layer, the second high-refractive-index layer, the second low-refractive-index layer and the protective layer laminated in sequence on the glass substrate, and the above-mentioned film layer The material and thickness are limited so that the visible light reflectance of the above-mentioned anti-reflection glass is ≤5%, and the number and thickness of the above-mentioned anti-reflection glass film layers are reduced, so that the thickness of the anti-reflection glass is smaller to meet the needs of product miniaturization; At the same time, the above-mentioned anti-reflection glass has wear resistance, scratch resistance and good acid and alkali corrosion resistance, so that the anti-reflection glass can be used outdoors.

Description of drawings

1 is a schematic structural view of an anti-reflection glass according to an embodiment;

Fig. 2 is a process flow diagram of a method for preparing anti-reflection glass according to an embodiment.

Detailed ways

The anti-reflection glass and its preparation method will be further described in detail below in conjunction with specific embodiments and accompanying drawings.

Please refer to FIG. 1 , an anti-reflection glass 100 of an embodiment includes a glass substrate 110, a first high refractive index layer 120, a first low refractive index layer 130, a second high refractive index layer 140, a second low refractive index layer 150 and protective layer 160 .

In the illustrated embodiment, the glass substrate 110 is a cleaned and polished glass substrate. In one embodiment, the thickness of the glass substrate 110 is 3mm˜19mm. Preferably, the thickness of the glass substrate is 3mm, 4mm, 5mm, 6mm, 8mm, 10mm, 12mm, 15mm or 19mm. In one embodiment, the maximum glass size of the glass substrate 110 is 3300mm*6000mm.

In one embodiment, the glass substrate 110 is soda lime glass, borosilicate glass or aluminosilicate glass.

In one embodiment, the refractive index of the glass substrate 110 is 1.47˜1.55.

In the illustrated embodiment, the first high refractive index layer 120 is laminated on the surface of the glass substrate 110 . The first high refractive index layer 120 is a Si ₃ N ₄ layer. In one embodiment, the refractive index of the first high refractive index layer 120 is 2.0-2.35. In one implementation manner, the thickness of the first high refractive index layer 120 is 12 nm˜30 nm. Preferably, the thickness of the first high refractive index layer 120 is 12nm-20nm. More preferably, the thickness of the first high refractive index layer 120 is 12nm-18nm. The first high refractive index layer 120 is mainly used to connect with the glass substrate. The first high refractive index layer 120 can also adjust the reflective color performance and block the diffusion of alkali metal ions in the glass.

In the illustrated embodiment, the first low refractive index layer 130 is stacked on the surface of the first high refractive index layer 120 away from the glass substrate 110 . The first low refractive index layer 130 is a SiO ₂ layer. In one embodiment, the refractive index of the first low refractive index layer 130 is 1.47˜1.53. In one implementation manner, the thickness of the first low refractive index layer 130 is 20 nm˜40 nm. Preferably, the thickness of the first low refractive index layer 130 is 20 nm˜35 nm. More preferably, the thickness of the first low refractive index layer 130 is 25nm-30nm. The main function of the first low refractive index layer 130 is to adjust the interference and appearance color of the film layer.

In the illustrated embodiment, the second high refractive index layer 140 is stacked on the surface of the first low refractive index layer 130 away from the first high refractive index layer 120 . The second high refractive index layer 140 is a Si ₃ N ₄ layer. In one embodiment, the refractive index of the second high refractive index layer 140 is 2.0-2.35. In one implementation manner, the thickness of the second high refractive index layer 140 is 50 nm˜150 nm. Preferably, the thickness of the second high refractive index layer 140 is 80nm-140nm. More preferably, the thickness of the second high refractive index layer 140 is 100 nm˜120 nm. The main function of the second high refractive index layer 140 is to adjust the interference and appearance color of the film layer.

In the illustrated embodiment, the second low refractive index layer 150 is stacked on the surface of the second high refractive index layer 140 away from the first low refractive index layer 130 . The second low refractive index layer 150 is a SiO ₂ layer. In one embodiment, the refractive index of the second low refractive index layer 150 is 1.47˜1.53. In one implementation manner, the thickness of the second low refractive index layer 150 is 50 nm˜100 nm. Preferably, the thickness of the second low refractive index layer 150 is 50nm-90nm. More preferably, the thickness of the second low refractive index layer 150 is 50nm-80nm. The main function of the second low refractive index layer 150 is to adjust the interference and appearance color of the film layer.

In the illustrated embodiment, the protective layer 160 is stacked on the surface of the second low refractive index layer 150 away from the second high refractive index layer 140 . In one embodiment, the protection layer 160 is a ZrO ₂ layer, a Si ₃ N ₄ layer or a SiC layer. Preferably, the protection layer 160 is a ZrO ₂ layer or a Si ₃ N ₄ layer. More preferably, the protection layer 160 is a Si ₃ N ₄ layer. In one embodiment, the protective layer 160 has a thickness of 2 nm˜20 nm. Preferably, the thickness of the protection layer 160 is 4nm˜15nm. More preferably, the protective layer 160 has a thickness of 5nm˜8nm. The protection layer 160 is a scratch-resistant material plated by magnetron sputtering, which has effects of scratch resistance, abrasion resistance and corrosion resistance. The main function of the protective layer 160 is to enable the glass 100 to be exposed to outdoor environments, and to prevent scratches, chemical corrosion and other defects on the coating layer, so as to ensure the integrity of the product during transportation, installation and use.

The above-mentioned anti-reflection glass includes the first high-refractive index layer, the first low-refractive-index layer, the second high-refractive-index layer, the second low-refractive-index layer and the protective layer laminated in sequence on the glass substrate, and the above-mentioned film layer The material and thickness are limited so that the visible light reflectance of the above-mentioned anti-reflection glass is ≤5%, and the number and thickness of the above-mentioned anti-reflection glass film layers are reduced, so that the thickness of the anti-reflection glass is smaller to meet the needs of product miniaturization; At the same time, the above-mentioned anti-reflection glass has wear resistance, scratch resistance and good acid and alkali corrosion resistance, so that the anti-reflection glass can be used outdoors. The above-mentioned anti-reflection glass can be used outdoors in the form of a single piece of coated glass, or the anti-reflection coated surface of the anti-reflection glass can be exposed to the outdoor environment for use.

In addition, the thickness of the above-mentioned anti-reflection glass film layer is nano-scale, and the film layer structure does not contain precious metals such as Ag and Au, which greatly reduces the production cost; the anti-reflection glass has an adjustable appearance color effect, which can be adjusted according to customer needs. Meet the needs of differentiation; use solid pure inorganic materials to avoid pollution and damage to the environment and human body caused by organic chemical production raw materials; Glass deep-processing enterprises have further integrated and improved production efficiency and reduced costs.

Please refer to Fig. 2, the preparation method of the anti-reflection glass of an embodiment, comprises the following steps:

S110 , cleaning the glass substrate.

In one embodiment, the glass substrate is soda lime glass, borosilicate glass or aluminosilicate glass.

In one of the embodiments, an automatic cleaning machine is used to clean the glass substrate.

S120, sequentially depositing a first high-refractive index layer, a first low-refractive-index layer, a second high-refractive-index layer, a second low-refractive-index layer, and a protective layer on the glass substrate.

In one of the embodiments, the first high-refractive index layer, the first low-refractive-index layer, the second high-refractive-index layer, the second low-refractive-index layer, and the protective layer are sequentially deposited on the glass substrate by magnetron sputtering. .

In one of the implementation manners, a horizontal coating process is used for coating.

In one of the embodiments, the power of magnetron sputtering is 15KW～75KW; the dynamic deposition rate of magnetron sputtering is 1.2nm·(m/min)/KW～4.5nm·(m/min)/KW; The vacuum degree of controlled sputtering is 3*10 ^-3 mbar～8*10 ^{- 3} mbar.

In one embodiment, the material of the first high-refractive index layer is Si ₃ N ₄ , and the thickness of the first high-refractive index layer is 12 nm to 30 nm; the material of the first low-refractive index layer is SiO ₂ , and the first low-refractive index layer is The thickness of the index layer is 20nm-40nm; the material of the second high-refractive-index layer is Si ₃ N ₄ , the thickness of the second high-refractive-index layer is 50nm-150nm; the material of the second low-refractive-index layer is SiO ₂ , and the second The thickness of the low refractive index layer is 50nm-100nm; and the material of the protective layer is selected from at least one of ZrO ₂ , Si ₃ N ₄ and SiC.

The preparation method of the above-mentioned anti-reflection glass adopts the horizontal coating process to carry out coating treatment by means of magnetron sputtering, which can realize large-scale and large-scale production, and the maximum size of the anti-reflection glass can reach 3300mm*5200mm, simplifying the preparation process and shortening the production cycle, while reducing costs, the production efficiency has been greatly improved, which is more conducive to the realization of industrialized production.

The following is the description of the specific embodiments. If there is no special description, the following embodiments do not contain other unspecified structures except unavoidable structures.

Example 1

The glass substrate is cleaned, and the first high-refractive index layer, the first low-refractive-index layer, the second high-refractive-index layer, the second low-refractive index layer, and rate layer and protection layer. Among them, the glass substrate is ultra-white soda lime glass, and the thickness of the glass substrate is 6mm; the first high refractive index layer is Si ₃ N ₄ layers, and the thickness of the film layer is 14nm; the first low refractive index layer is SiO ₂ layer, and the film layer The thickness is 29.6nm; the second high refractive index layer is Si ₃ N ₄ layer, the film thickness is 119.1nm; the second low refractive index layer is SiO ₂ layer, the film thickness is 72nm; the protective layer is Si ₃ N ₄ layer , the film thickness is 5nm. The power for magnetron sputtering is 20KW～75KW; the dynamic deposition rate of magnetron sputtering is 1.5nm·(m/min)/KW～4.5nm·(m/min)/KW; the vacuum degree of magnetron sputtering 3.5*10 ^-3 mbar ~ 7.6*10 ^-3 mbar.

Example 2

The glass substrate is cleaned, and the first high-refractive index layer, the first low-refractive-index layer, the second high-refractive-index layer, the second low-refractive index layer, and rate layer and protection layer. Among them, the glass substrate is ultra-white soda lime glass, and the thickness of the glass substrate is 6mm; the first high refractive index layer is Si ₃ N ₄ layers, and the thickness of the film layer is 14nm; the first low refractive index layer is SiO ₂ layer, and the film layer The thickness is 28nm; the second high refractive index layer is Si ₃ N ₄ layer, the film thickness is 113.5nm; the second low refractive index layer is SiO ₂ layer, the film thickness is 63nm; the protective layer is Si ₃ N ₄ layer, The film thickness is 6nm. The power of magnetron sputtering is 20KW～70KW; the dynamic deposition rate of magnetron sputtering is 1.5nm·(m/min)/KW～4.2nm·(m/min)/KW; the vacuum degree of magnetron sputtering 3.5*10 ^-3 mbar ~ 7.6*10 ^-3 mbar.

Example 3

The glass substrate is cleaned, and the first high-refractive index layer, the first low-refractive-index layer, the second high-refractive-index layer, the second low-refractive index layer, and rate layer and protection layer. Among them, the glass substrate is ultra-white soda-lime glass, and the thickness of the glass substrate is 6 mm; the first high refractive index layer is Si ₃ N ₄ layers, and the thickness of the film layer is 12 nm; the first low refractive index layer is SiO ₂ layer, and the film layer The thickness is 25nm; the second high refractive index layer is Si ₃ N ₄ layer, the film thickness is 108.9nm; the second low refractive index layer is SiO ₂ layer, the film thickness is 55nm; the protective layer is Si ₃ N ₄ layer, The film thickness is 6nm. The power of magnetron sputtering is 15KW～65KW; the dynamic deposition rate of magnetron sputtering is 1.2nm·(m/min)/KW～4nm·(m/min)/KW; the vacuum degree of magnetron sputtering is 3.5* ^10-3 mbar～7.6* ^10-3 mbar.

Example 4

The glass substrate is cleaned, and the first high-refractive index layer, the first low-refractive-index layer, the second high-refractive-index layer, the second low-refractive index layer, and rate layer and protection layer. Among them, the glass substrate is ultra-white soda lime glass, and the thickness of the glass substrate is 6mm; the first high refractive index layer is Si ₃ N ₄ layers, and the thickness of the film layer is 18nm; the first low refractive index layer is SiO ₂ layer, and the film layer The thickness is 25.5nm; the second high refractive index layer is Si ₃ N ₄ layer, the film thickness is 102nm; the second low refractive index layer is SiO ₂ layer, the film thickness is 60nm; the protective layer is Si ₃ N ₄ layer, The film thickness is 7.8nm. The power of magnetron sputtering is 20KW～63KW; the dynamic deposition rate of magnetron sputtering is 1.5nm·(m/min)/KW～4nm·(m/min)/KW; the vacuum degree of magnetron sputtering is 3.5* ^10-3 mbar～7.6* ^10-3 mbar.

The visible light reflectance and transmittance tests were performed on the anti-reflection glasses of Examples 1-4, and the results are shown in Table 1. Among them, the visible light reflectance test is obtained by using the 650 instrument of datacolor manufacturer, and the transmittance test is obtained by using the 650 instrument of datacolor manufacturer.

Table 1

The technical features of the above-mentioned embodiments can be combined arbitrarily. To make the description concise, all possible combinations of the technical features in the above-mentioned embodiments are not described. However, as long as there is no contradiction in the combination of these technical features, should be considered as within the scope of this specification.

The above-mentioned embodiments only express several implementation modes of the utility model, and the description thereof is relatively specific and detailed, but it should not be interpreted as a limitation on the patent scope of the utility model. It should be noted that those skilled in the art can make several modifications and improvements without departing from the concept of the utility model, and these all belong to the protection scope of the utility model. Therefore, the scope of protection of the utility model patent should be based on the appended claims.

Claims (9)

1. A kind of anti-reflection glass, it is characterized in that, described anti-reflection glass comprises successively laminated glass substrate, the first high refractive index layer, the first low refractive index layer, the second high refractive index layer, the second low refractive index layer layer and protective layer; The first high refractive index layer is a Si ₃ N ₄ layer, and the thickness of the first high refractive index layer is 12 nm to 30 nm; The first low refractive index layer is a SiO ₂ layer, and the thickness of the first low refractive index layer is 20nm to 40nm; The second high refractive index layer is a Si ₃ N ₄ layer, and the thickness of the second high refractive index layer is 50nm-150nm; The second low refractive index layer is a SiO ₂ layer, and the thickness of the second low refractive index layer is 50nm-100nm; and The protection layer is a ZrO ₂ layer, a Si ₃ N ₄ layer or a SiC layer. 2 . The anti-reflection glass according to claim 1 , wherein the thickness of the glass substrate is 3 mm to 19 mm. 3. The anti-reflection glass according to claim 1, characterized in that, the thickness of the protective layer is 2nm-20nm. 4. The anti-reflection glass according to claim 1, characterized in that, the thickness of the first high refractive index layer is 12nm-20nm. 5. The anti-reflection glass according to claim 1, characterized in that, the thickness of the first low refractive index layer is 20nm-35nm. 6. The anti-reflection glass according to claim 1, characterized in that, the thickness of the second high refractive index layer is 80nm-140nm. 7. The anti-reflection glass according to claim 1, characterized in that, the thickness of the second low refractive index layer is 50nm-90nm. 8. The antireflection glass according to claim 1, characterized in that, the first high refractive index layer is a Si ₃ N ₄ layer, and the thickness of the first high refractive index layer is 14nm; the first low refractive index layer The refractive index layer is SiO ₂ layer, the thickness of the first low refractive index layer is 29.6nm; the second high refractive index layer is Si ₃ N ₄ layer, the thickness of the second high refractive index layer is 119.1nm ; The second low refractive index layer is a SiO ₂ layer, and the thickness of the second low refractive index layer is 72nm. 9. The anti-reflection glass according to claim 1, characterized in that, the first high refractive index layer is a Si ₃ N ₄ layer, and the thickness of the first high refractive index layer is 14nm; the first low refractive index layer The refractive index layer is SiO ₂ layer, the thickness of the first low refractive index layer is 28nm; the second high refractive index layer is Si ₃ N ₄ layer, the thickness of the second high refractive index layer is 113.5nm; The second low refractive index layer is a SiO ₂ layer, and the thickness of the second low refractive index layer is 63nm.