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CN207097785U - It is a kind of to seal the uniform spray photovoltaic silicon wafer quartz diffusion furnace strengthened - Google Patents

It is a kind of to seal the uniform spray photovoltaic silicon wafer quartz diffusion furnace strengthened Download PDF

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Publication number
CN207097785U
CN207097785U CN201720902881.5U CN201720902881U CN207097785U CN 207097785 U CN207097785 U CN 207097785U CN 201720902881 U CN201720902881 U CN 201720902881U CN 207097785 U CN207097785 U CN 207097785U
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quartz
diffusion furnace
furnace
quartzy
quartzy diffusion
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周文华
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Shanghai Qiang Hua Industrial Limited by Share Ltd
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Shanghai Strong China Industrial Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Abstract

It is a kind of to seal the uniform spray photovoltaic silicon wafer quartz diffusion furnace strengthened,Quartz boat is used to carry photovoltaic silicon wafer,Quartz furnace door is arranged on the head of quartzy diffusion furnace,Sealing function is played for quartzy diffusion furnace,Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side,Play heat-blocking action,Shower is located at quartzy diffusion furnace internal upper part,For being passed through spray protective gas POCl3,Baffle plate is arranged between shower and heat-preserving container with the mode of hook,For stopping quartzy diffusion furnace internal gas flow,The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace,For being passed through oxygen,Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace,Waste pipe is used to discharge waste liquid,TC is managed for placing thermocouple,The Quartz furnace door has ledge structure,One of Quartz furnace door is stuffed into inside quartzy diffusion furnace,Another of Quartz furnace door acts against the edge of quartzy diffusion furnace and outside quartzy diffusion furnace by ledge structure.

Description

It is a kind of to seal the uniform spray photovoltaic silicon wafer quartz diffusion furnace strengthened
Technical field
The utility model belongs to field of semiconductor fabrication processes, more particularly to a kind of to seal the uniform spray photovoltaic silicon strengthened Bauerite diffusion furnace.
Background technology
Application No. CN201521039652.2 patent document, mention " in crystal silicon solar energy battery manufacturing process, Silicon chip diffusion technique is that silicon chip is put into high temperature dispersing furnace, passes to the gases such as nitrogen, oxygen and POCl3, sends out at high temperature It is biochemical to react and form PN junction in silicon chip surface after spreading.Specifically, first silicon chip is inserted on quartz boat, then by quartz Boat is put into high temperature dispersing furnace (being typically exactly diffusion quartz tube), is passed through the gas containing diffusion source, is spread under the high temperature conditions Source reacts with silicon chip, realizes diffusion process so as to form PN junction.”
This document disclose " a kind of solar silicon wafers disperser, including quartz boat, between quartz boat and air inlet Air-flow aggregating apparatus, multiple quartzy bar construction supporting constructions of the quartz boat by two supporting plates and between supporting plate, and Multiple cuttings for being used to place silicon chip are provided with quartz pushrod, it is characterised in that:Quartz pushrod uses hollow type structure, is opened in supporting plate There are multiple through holes communicated with each quartz pushrod;Air dispelling hole, and air dispelling hole and stone are also provided with quartz pushrod between adjacent cutting English rod penetrates;Air-flow aggregating apparatus is a baffle-type structure with hole of confluxing, and hole exits end of confluxing supports towards quartz boat The projection of through hole is respectively positioned in the port of export in hole of confluxing on plate ".
The purpose of above-mentioned technical proposal is " first, the air-flow aggregating apparatus air-flow in hole of being confluxed by band, makes air-flow fast In the quartz pushrod that speed is flowed on quartz boat and silicon chip is blowed at air dispelling hole, effectively increases the utilization rate in diffusion source, can also Further increase transmission range, so as to improve the yield of single stove diffusion, reduce production cost;Second, by hollow quartz pushrod and open The air dispelling hole being located on quartz pushrod, the area of space that diffusion source is abundant and is evenly distributed between silicon chip can be carried significantly High silicon chip diffusion uniformity, so as to improve conversion efficiency of solar cell, while the utilization in diffusion source is also substantially increased, saved About production cost;Third, can be distributed by position of opening of the air dispelling hole on quartz pushrod, to control the direction of air-flow, make expansion Dissipate source air-flow to be more evenly distributed in the range of silicon chip place, flexibly set according to production requirement, practical ".It is however, real In trampling, when this quartzy diffusion furnace works, the problem of confluxing except considering air-flow, it is also contemplated that other factors, such as quartz expand The sealing problem of stove is dissipated, heat-insulating problem the problem of quartzy diffusion furnace internal sparger pipe non-uniform spraying and in quartzy diffusion furnace
Utility model content
The utility model provides a kind of uniform spray photovoltaic silicon wafer quartz diffusion furnace for sealing and strengthening, and is expanded with solving quartz The problem of dissipating furnace interior.
A kind of to seal the uniform spray photovoltaic silicon wafer quartz diffusion furnace strengthened, the quartzy diffusion furnace includes shower, quartz Boat, baffle plate, heat-preserving container, Quartz furnace door, waste pipe and TC pipes,
Quartz boat is used to carry photovoltaic silicon wafer,
Quartz furnace door is arranged on the head of quartzy diffusion furnace, and sealing function is played for quartzy diffusion furnace,
Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side, plays heat-blocking action,
Shower is located at quartzy diffusion furnace internal upper part, for being passed through spray protective gas POCl3,
Baffle plate is arranged between shower and heat-preserving container with the mode of hook, for stopping quartzy diffusion furnace internal gas flow,
The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace, for being passed through oxygen,
Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace, and waste pipe is used to discharge waste liquid, and TC is managed for placing Thermocouple,
The Quartz furnace door has ledge structure, and one of Quartz furnace door is stuffed into inside quartzy diffusion furnace, Quartz furnace door Another the edge of quartzy diffusion furnace is acted against and outside quartzy diffusion furnace by ledge structure.
The tube wall of shower is provided with multiple spray apertures, the diameters of the nearer spray apertures of distance quartz diffusion furnace head be more than away from The diameter of the spray apertures nearer from quartzy diffusion furnace afterbody,
Heat-preserving container is made up of multi-disc quartz plate arranged in parallel, is welded to connect between quartz plate with quartzy pillar.
TC pipes are temperature tube, and TC is English thermocouple abbreviation.
The utility model is directed to existing photovoltaic silicon wafer quartz diffusion furnace, wherein, the effect of Quartz furnace door is mainly to stone English boiler tube is sealed, and original fire door is sealed by the oral area end face of Quartz stove tube, and the utility model is by fire door Increase step, in addition to by end face, also add the sealing of furnace tube outer wall, enhance the integral sealing effect of diffusion furnace.Stone Shower in English pipe, more weaker to distal end air-flow, the utility model gradually increases the bore dia of shower so that shower Near-end and the air-flow of end approach so that diffusion uniformity is more preferable.Heat-preserving container in quartz ampoule, main function be in order to every Heat.And opaque quartz has many stomatas, the ability of absorptive thermal radiation is stronger, and effect of heat insulation is substantially better than suprasil material Matter, therefore introduce opaque quartz and substitute original suprasil, it greatly strengthen the effect of heat insulation of quartz thermal insulation barrel.
Brief description of the drawings
Detailed description below is read by reference to accompanying drawing, the utility model illustrative embodiments above-mentioned and other Objects, features and advantages will become prone to understand.In the accompanying drawings, show that this practicality is new by way of example, and not by way of limitation Some embodiments of type, wherein:
Fig. 1 is the utility model quartz diffusion-furnace structure schematic side view.
Fig. 2 is the structural representation of Quartz furnace door in the utility model.
Fig. 3 is shower schematic side view in the utility model quartz diffusion-furnace structure
1 --- shower, 2 --- quartz boat, 3 --- baffle plate, 4 --- heat-preserving container, 5 --- Quartz furnace door, 6 --- air inlet Mouthful, 7 --- waste pipe, 8 --- TC is managed.
Embodiment
As shown in figure 1, a kind of seal the uniform spray photovoltaic silicon wafer quartz diffusion furnace strengthened, the quartzy diffusion furnace includes spray Shower pipe, quartz boat, baffle plate, heat-preserving container, Quartz furnace door, waste pipe and TC pipes.
Quartz boat is used to carry photovoltaic silicon wafer.Quartz furnace door is arranged on the head of quartzy diffusion furnace, for quartzy diffusion furnace Play sealing function.Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side, plays heat-blocking action.Shower is located at stone English diffusion furnace internal upper part, for being passed through spray protective gas POCl3.Baffle plate is arranged on shower and guarantor with the mode of hook Between warm bucket, for stopping quartzy diffusion furnace internal gas flow.The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace, For being passed through oxygen.Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace, and waste pipe is used to discharge waste liquid, and TC, which is managed, to be used for Place thermocouple.
The Quartz furnace door has ledge structure, and one of Quartz furnace door is stuffed into inside quartzy diffusion furnace, Quartz furnace door Another the edge of quartzy diffusion furnace is acted against and outside quartzy diffusion furnace by ledge structure.
The tube wall of shower is provided with multiple spray apertures, the diameters of the nearer spray apertures of distance quartz diffusion furnace head be more than away from The diameter of the spray apertures nearer from quartzy diffusion furnace afterbody.The change of multiple spray bore dias of shower, from quartzy diffusion furnace Head to afterbody, when gradual change.The spray apertures of shower are arranged as 2 rows up and down.
Heat-preserving container is made up of multi-disc quartz plate arranged in parallel, is welded to connect between quartz plate with quartzy pillar.Quartz plate It is circular piece, and uses opaque quartz material.
What deserves to be explained is created although foregoing teachings describe the utility model by reference to some embodiments Spirit and principle, it should be appreciated that, the utility model is not limited to disclosed embodiment, and each side is drawn Divide and also do not mean that the feature in these aspects can not combine, this division is merely to the convenience of statement.The utility model purport Covering various modifications included in spirit and scope of the appended claims and equivalent arrangements.

Claims (3)

1. a kind of seal the uniform spray photovoltaic silicon wafer quartz diffusion furnace strengthened, it is characterised in that the quartzy diffusion furnace includes spray Shower pipe, quartz boat, baffle plate, heat-preserving container, Quartz furnace door, waste pipe and TC pipes,
Quartz boat is used to carry photovoltaic silicon wafer,
Quartz furnace door is arranged on the head of quartzy diffusion furnace, and sealing function is played for quartzy diffusion furnace,
Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side, plays heat-blocking action,
Shower is located at quartzy diffusion furnace internal upper part, for being passed through spray protective gas POCl3,
Baffle plate is arranged between shower and heat-preserving container with the mode of hook, for stopping quartzy diffusion furnace internal gas flow,
The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace, for being passed through oxygen,
Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace, and waste pipe is used to discharge waste liquid, and TC is managed for placing thermoelectricity It is even,
The Quartz furnace door has ledge structure, and one of Quartz furnace door is stuffed into inside quartzy diffusion furnace, Quartz furnace door it is another One acts against the edge of quartzy diffusion furnace and outside quartzy diffusion furnace by ledge structure,
The tube wall of shower is provided with multiple spray apertures, and the diameter of the nearer spray apertures of distance quartz diffusion furnace head is more than apart from stone The diameter of the nearer spray apertures of English diffusion furnace afterbody,
Heat-preserving container is made up of multi-disc quartz plate arranged in parallel, is welded to connect between quartz plate with quartzy pillar, and quartz plate is round Shape piece, and use opaque quartz material.
2. the uniform spray photovoltaic silicon wafer quartz diffusion furnace that sealing as claimed in claim 1 is strengthened, it is characterised in that shower Multiple spray bore dias change, from quartz diffusion furnace head to afterbody, when gradual change.
3. the uniform spray photovoltaic silicon wafer quartz diffusion furnace that sealing as claimed in claim 2 is strengthened, it is characterised in that shower Spray apertures be arranged as up and down 2 rows.
CN201720902881.5U 2017-07-24 2017-07-24 It is a kind of to seal the uniform spray photovoltaic silicon wafer quartz diffusion furnace strengthened Active CN207097785U (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109112636A (en) * 2018-10-29 2019-01-01 珠海格力电器股份有限公司 Diffusion furnace tube and diffusion furnace
CN112349631A (en) * 2020-11-04 2021-02-09 长江存储科技有限责任公司 Gas transmission pipeline and semiconductor machine
CN113373522A (en) * 2021-05-31 2021-09-10 北海惠科半导体科技有限公司 Diffusion device and diffusion system
CN115287628A (en) * 2022-07-23 2022-11-04 盛吉盛精密制造(绍兴)有限公司 Semiconductor diffusion furnace heat-preserving container and clamping device thereof
CN117026383A (en) * 2023-08-11 2023-11-10 天合光能股份有限公司 Sleeve for improving flow field uniformity in diffusion furnace, diffusion furnace and air inlet method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109112636A (en) * 2018-10-29 2019-01-01 珠海格力电器股份有限公司 Diffusion furnace tube and diffusion furnace
CN112349631A (en) * 2020-11-04 2021-02-09 长江存储科技有限责任公司 Gas transmission pipeline and semiconductor machine
CN112349631B (en) * 2020-11-04 2021-09-10 长江存储科技有限责任公司 Gas transmission pipeline and semiconductor machine
CN113373522A (en) * 2021-05-31 2021-09-10 北海惠科半导体科技有限公司 Diffusion device and diffusion system
CN115287628A (en) * 2022-07-23 2022-11-04 盛吉盛精密制造(绍兴)有限公司 Semiconductor diffusion furnace heat-preserving container and clamping device thereof
CN117026383A (en) * 2023-08-11 2023-11-10 天合光能股份有限公司 Sleeve for improving flow field uniformity in diffusion furnace, diffusion furnace and air inlet method

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Address after: 201507, No. 3312, Ting Wei Road, Cao Jing Town, Shanghai, Jinshan District

Patentee after: Shanghai Qiang Hua Industrial Limited by Share Ltd

Address before: 201507, No. 3312, Ting Wei Road, Cao Jing Town, Shanghai, Jinshan District

Patentee before: Shanghai strong China Industrial Co., Ltd.