CN206685346U - A kind of high current low energy cluster ions beam guider - Google Patents
A kind of high current low energy cluster ions beam guider Download PDFInfo
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Abstract
本实用新型提供了一种强流低能团簇离子束导向装置,包括一对间隔分布的电极和一对设置于电极周围的磁铁,电极通过一对绝缘体固定并且与磁铁相互隔离,两个电极之间区域构成离子束通道;磁铁和绝缘体通过位于磁铁两端的一对极靴固定,两个磁铁均为永磁铁或电磁铁;本实用新型可提供稳恒‑可变两种磁场模式,通过改变电场强度大小,可调节团簇离子束流输运方向,通过极靴和绝缘体固定磁铁与电极,保证磁铁不会相互排斥或吸引而偏离固定位置,保证磁铁安装的灵活性和安全性,绝缘体隔离磁铁与电极,以保证磁铁与电极位置固定以确保各自的磁场、电场分布比较均匀,确保调节束流方向,在强流低能团簇离子束纳米加工设备中具有重要的实际应用价值。
The utility model provides a high-current low-energy cluster ion beam guiding device, which includes a pair of electrodes distributed at intervals and a pair of magnets arranged around the electrodes. The electrodes are fixed by a pair of insulators and are isolated from the magnets. The area between the ion beams constitutes the channel of the ion beam; the magnet and the insulator are fixed by a pair of pole pieces located at both ends of the magnet, and the two magnets are permanent magnets or electromagnets; The strength can adjust the transport direction of the cluster ion beam. The magnet and the electrode are fixed by the pole piece and the insulator, so that the magnet will not repel or attract each other and deviate from the fixed position, ensuring the flexibility and safety of the magnet installation. The insulator isolates the magnet And electrodes, to ensure that the positions of the magnets and electrodes are fixed to ensure that the respective magnetic and electric field distributions are relatively uniform, and to ensure that the beam current direction is adjusted. It has important practical application value in high-current and low-energy cluster ion beam nanoprocessing equipment.
Description
技术领域technical field
本实用新型涉及一种强流低能团簇离子束纳米加工设备中的束流导向装置,属于离子束纳米加工技术领域。The utility model relates to a beam guide device in high-current low-energy cluster ion beam nano-processing equipment, which belongs to the technical field of ion beam nano-processing.
背景技术Background technique
在当今以信息技术引领发展的高科技时代,集成电路无处不在,其研发和生产成为一个国家重要的支柱性产业,而每一块集成电路都离不开离子注入工艺。随着集成度进一步提高,MOSFET尺度进一步减小(32至22nm),器件结深越来越浅,必然要求采用超低能量的离子注入工艺,而低能条件下离子束流必然降低,且单原子离子的沟道效应难以避免,因此必须采用团簇离子束技术。这一技术的基础是团簇离子源和团簇离子束加工设备。In today's high-tech era led by information technology, integrated circuits are ubiquitous, and its research and development and production have become an important pillar industry in a country, and every integrated circuit is inseparable from the ion implantation process. With the further improvement of the integration level, the further reduction of the MOSFET scale (32 to 22nm), and the shallower and shallower junction depth of the device, it is necessary to adopt an ultra-low energy ion implantation process, and the ion beam current must be reduced under low energy conditions, and the single atom Ion channeling is unavoidable, so cluster ion beam technology must be used. The basis of this technology is cluster ion source and cluster ion beam processing equipment.
强流低能团簇离子束纳米加工成套设备可以产生数十至数千个原子范围的团簇离子束,满足硅基集成电路10nm超浅结制造、半导体表面平化、超薄纳米材料制备等多方面的需求。建立团簇离子束设备研发制造体系,有利于形成具有自主知识产权的离子束纳米加工极端制造技术。The complete set of high-current and low-energy cluster ion beam nanoprocessing equipment can generate cluster ion beams ranging from tens to thousands of atoms, which can meet the needs of manufacturing 10nm ultra-shallow junctions of silicon-based integrated circuits, flattening semiconductor surfaces, and preparing ultra-thin nanomaterials. aspects of demand. The establishment of a cluster ion beam equipment R&D and manufacturing system is conducive to the formation of ion beam nanoprocessing extreme manufacturing technology with independent intellectual property rights.
束流导向装置在强流低能团簇离子束纳米加工成套设备具有重要的应用地位,其主体结构为电磁场控制单元。传统的离子束加工设备中依靠单一电场或磁场的偏转、导向装置具有一定的局限性。因为一般载能离子束导向装置有平行板静电装置和电磁场装置,对于质量轻的载能带电粒子束的偏转、导向具有很大的优势,但对于质量很重的团簇离子则影响甚微。The beam guiding device has an important application position in the complete set of equipment for high-current and low-energy cluster ion beam nanoprocessing, and its main structure is an electromagnetic field control unit. The deflection and guidance devices relying on a single electric field or magnetic field in traditional ion beam processing equipment have certain limitations. Because the general energy-carrying ion beam guiding device has a parallel-plate electrostatic device and an electromagnetic field device, it has great advantages for the deflection and guidance of the light-mass energy-carrying charged particle beam, but it has little effect on the heavy-mass cluster ions.
发明内容Contents of the invention
本实用新型的目的是针对现有技术存在的不足,提出一种安全、方便的强流低能团簇离子束纳米加工设备中的电磁场束流导向装置,通过产生的正交交叉电场和磁场,让具有一定速度的载能粒子顺利通过,起到甄别团簇尺寸并导向输运该团簇离子的作用。The purpose of this utility model is to address the deficiencies in the prior art, and propose a safe and convenient electromagnetic field beam guide device in the high-current low-energy cluster ion beam nano-processing equipment, through the generated orthogonal cross electric field and magnetic field, so that The energy-carrying particles with a certain speed pass through smoothly, which plays the role of screening the cluster size and guiding and transporting the cluster ions.
实现本实用新型目的所采用的技术方案为,一种强流低能团簇离子束导向装置,至少包括一对间隔分布的电极和一对设置于电极周围的磁铁,所述电极通过一对绝缘体固定并且与磁铁相互隔离,两个电极之间区域构成离子束通道;所述磁铁和绝缘体通过位于磁铁两端的一对极靴固定,磁铁位于电极外侧,两个磁铁均为永磁铁或电磁铁。The technical solution adopted to realize the purpose of the utility model is a high-current low-energy cluster ion beam guiding device, which at least includes a pair of electrodes distributed at intervals and a pair of magnets arranged around the electrodes, and the electrodes are fixed by a pair of insulators. And it is isolated from the magnet, and the area between the two electrodes forms an ion beam channel; the magnet and the insulator are fixed by a pair of pole pieces located at both ends of the magnet, and the magnet is located outside the electrode, and both magnets are permanent magnets or electromagnets.
所述绝缘体内侧面的中部向上突出构成卡槽,两个绝缘体的卡槽槽口相对,两个电极分别固定于两个绝缘体的卡槽中,磁铁与绝缘体的外侧面相接触。The middle part of the inner side of the insulator protrudes upwards to form a slot, the slots of the two insulators face each other, the two electrodes are respectively fixed in the slots of the two insulators, and the magnet contacts the outer side of the insulator.
所述极靴的中部向上凸起构成限位凸台,限位凸台抵紧绝缘体卡槽的槽壁,极靴的位于限位凸台两侧的部位开设有与磁铁端部形状相匹配的凹槽,磁铁的两端分别嵌于两个极靴位于同侧的凹槽中。The middle part of the pole piece protrudes upwards to form a limit boss, which is pressed against the groove wall of the insulator slot, and the pole shoe is provided with holes matching the shape of the end of the magnet on both sides of the limit boss. The two ends of the magnet are respectively embedded in the grooves where the two pole pieces are located on the same side.
所述限位凸台的根部设有台阶,绝缘体固定于两个极靴的台阶阶面和限位凸台所限定的区域中。The root of the limiting boss is provided with a step, and the insulator is fixed in the area defined by the stepped surfaces of the two pole pieces and the limiting boss.
所述台阶的阶面高于凹槽的槽底。The step surface of the step is higher than the groove bottom of the groove.
两个电极相对的表面为镜面。The opposite surfaces of the two electrodes are mirror surfaces.
所述绝缘体与磁铁和电极均紧密接触。The insulator is in close contact with both the magnet and the electrodes.
所述绝缘体为聚四氟乙烯绝缘体。The insulator is polytetrafluoroethylene insulator.
所述电磁铁由铁芯和绕制式线圈构成。The electromagnet is composed of an iron core and a wound coil.
所述永磁铁由SmCo5稀土永磁材料构成。The permanent magnet is made of SmCo 5 rare earth permanent magnet material.
由上述技术方案可知,本实用新型提供的强流低能团簇离子束导向装置,磁铁和电极之间通过耐高压的聚四氟乙烯绝缘体(标准状况下,耐压为5kV)来隔离。绝缘体将磁铁和电极隔开后,同时又通过其上设置的适当尺寸的卡槽将电极固定,磁铁则通过位于其两端的一对极靴安装固定,便于安装操作,磁铁位于电极外侧,两个电极之间区域构成团簇离子束通过的离子束通道。It can be seen from the above technical solution that in the high-current low-energy cluster ion beam guiding device provided by the utility model, the magnet and the electrode are separated by a high-voltage polytetrafluoroethylene insulator (under standard conditions, the withstand voltage is 5kV). After the insulator separates the magnet from the electrode, at the same time the electrode is fixed by a card slot of appropriate size set on it. The magnet is installed and fixed by a pair of pole shoes at its two ends, which is convenient for installation and operation. The magnet is located on the outside of the electrode. Two The region between the electrodes constitutes the ion beam channel through which the cluster ion beam passes.
根据磁场模式不同,提供两种正交交叉电磁场:其一为恒稳磁场模式,采用高强度永磁铁提供约1000高斯磁场强度的恒稳磁场,电极通电可以提供电场,二者叠加形成正交交叉电磁场,该高强度永磁铁产生的磁场和极间电场正交,可以让速度较快、质量较小的单离子或小团簇离子通过,起到单离子或小团簇离子束流偏转、导向作用;其二为可调磁场模式,采用绕制式线圈-铁芯电磁铁,保证通入合适大小的直流电后能产生8000~15000高斯磁场强度的可变磁场,该磁场与极间电场正交,可以让速度慢、质量较大的团簇离子通过,起到调节一定尺寸(1000~3000atoms/cluster)团簇离子束流导向作用。According to different magnetic field modes, two orthogonal cross electromagnetic fields are provided: one is the constant and stable magnetic field mode, which uses high-strength permanent magnets to provide a constant and stable magnetic field with a magnetic field strength of about 1000 Gauss, and the electrodes can provide electric fields when they are energized. Electromagnetic field, the magnetic field generated by the high-strength permanent magnet is orthogonal to the electric field between the poles, allowing single ions or small cluster ions with faster speed and lower mass to pass through, and deflect and guide the beam of single ions or small cluster ions Function; the second is the adjustable magnetic field mode, which adopts a wound coil-iron core electromagnet to ensure that a variable magnetic field with a magnetic field strength of 8000-15000 Gauss can be generated after the DC power of a suitable size is connected. The magnetic field is orthogonal to the electric field between the poles. It can allow cluster ions with slow speed and high mass to pass through, and play a role in regulating the beam current of cluster ions with a certain size (1000-3000atoms/cluster).
由此,本实用新型可提供稳恒-可变两种磁场模式;通过改变电场强度大小,可调节团簇离子束流输运方向,根据正离子束通过电磁场的速度,调节极板电压的大小,使离子所受的合作用力达到平衡,从而让具有一定速度的载能离子顺利地从电磁场中间通过;两个电极相对的表面为镜面,以避免毛刺等污染物可能引起的极间尖端放电。Therefore, the utility model can provide two kinds of magnetic field modes: stable and variable; by changing the electric field strength, the transport direction of the cluster ion beam can be adjusted, and the voltage of the plate can be adjusted according to the speed of the positive ion beam passing through the electromagnetic field , so that the cooperative force on the ions is balanced, so that the energy-carrying ions with a certain speed can pass through the electromagnetic field smoothly; the opposite surfaces of the two electrodes are mirror surfaces to avoid the tip discharge between the electrodes that may be caused by pollutants such as burrs.
本实用新型提供的强流低能团簇离子束导向装置,通过高强度永磁铁和电磁铁提供稳恒-可变两种磁场模式,通过改变电场强度大小,可调节团簇离子束流输运方向,通过一对极靴和一对绝缘体固定磁铁与电极,保证磁铁不会相互排斥或吸引而偏离固定位置,保证磁铁安装的灵活性和安全性,绝缘体隔离磁铁与电极,以保证磁铁与电极位置固定以确保各自的磁场、电场分布比较均匀,确保调节束流方向;该装置结构简单,操作方便,在强流低能团簇离子束纳米加工设备中具有重要的实际应用价值。The high-current low-energy cluster ion beam guiding device provided by the utility model provides two kinds of magnetic field modes, stable and variable, through high-strength permanent magnets and electromagnets, and can adjust the transport direction of the cluster ion beam by changing the electric field intensity , through a pair of pole shoes and a pair of insulators to fix the magnet and the electrode, to ensure that the magnets will not repel or attract each other and deviate from the fixed position, to ensure the flexibility and safety of the magnet installation, and the insulator isolates the magnet and the electrode to ensure the position of the magnet and the electrode It is fixed to ensure that the distribution of the respective magnetic and electric fields is relatively uniform, and to ensure that the beam direction is adjusted; the device has a simple structure and is easy to operate, and has important practical application value in high-current and low-energy cluster ion beam nanoprocessing equipment.
附图说明Description of drawings
图1为本实用新型提供的强流低能团簇离子束导向装置的整体结构图。Fig. 1 is an overall structural diagram of the high-current low-energy cluster ion beam guiding device provided by the utility model.
图2为极靴的结构示意图。Figure 2 is a schematic structural view of the pole piece.
其中,1-极靴,2-磁铁,3-电极,4-绝缘体,5-离子束通道,6-卡槽,7-限位凸台,8-凹槽,9-台阶。Among them, 1-pole piece, 2-magnet, 3-electrode, 4-insulator, 5-ion beam channel, 6-card slot, 7-limiting boss, 8-groove, 9-step.
具体实施方式detailed description
下面结合附图和实施例对本实用新型进行详细具体说明,本实用新型的内容不局限于以下实施例。The utility model is described in detail below in conjunction with the accompanying drawings and embodiments, and the content of the utility model is not limited to the following embodiments.
参见图1,本实用新型提供的强流低能团簇离子束导向装置,包括一对极靴1、一对磁铁2、一对间隔分布的电极3和一对绝缘体4,两个电极3之间区域构成离子束通道5,两个电极3正负极极板相对的表面需要机械抛光成镜面,以避免毛刺等污染物可能引起的极间尖端放电;在恒稳磁场模式下,两个磁铁2均为由SmCo5稀土永磁材料制成的永磁铁,在可调磁场模式下,两个磁铁2均为由铁芯和绕制式线圈构成的电磁铁;Referring to Fig. 1, the high-current low-energy cluster ion beam guiding device provided by the utility model includes a pair of pole pieces 1, a pair of magnets 2, a pair of electrodes 3 distributed at intervals and a pair of insulators 4, between the two electrodes 3 The area constitutes the ion beam channel 5, and the opposite surfaces of the positive and negative plates of the two electrodes 3 need to be mechanically polished to a mirror surface to avoid the tip discharge between the poles that may be caused by pollutants such as burrs; in the constant magnetic field mode, the two magnets 2 Both are permanent magnets made of SmCo 5 rare earth permanent magnet materials. In the adjustable magnetic field mode, the two magnets 2 are electromagnets composed of iron cores and wound coils;
所述电极3通过绝缘体4固定,绝缘体4内侧面的中部向上突出构成卡槽6,两个绝缘体4的卡槽6槽口相对,两个电极3分别固定于两个绝缘体4的卡槽6中,磁铁2分布于电极3外侧并且与绝缘体4的外侧面相接触,绝缘体4与磁铁2和电极3均紧密接触,电极3与磁铁2通过绝缘体4相互隔离,绝缘体4优选聚四氟乙烯绝缘体;The electrodes 3 are fixed by the insulator 4, the middle part of the inner surface of the insulator 4 protrudes upwards to form a slot 6, the notches of the slots 6 of the two insulators 4 are opposite, and the two electrodes 3 are respectively fixed in the slots 6 of the two insulators 4 , the magnet 2 is distributed on the outside of the electrode 3 and is in contact with the outer surface of the insulator 4, the insulator 4 is in close contact with the magnet 2 and the electrode 3, the electrode 3 and the magnet 2 are isolated from each other by the insulator 4, and the insulator 4 is preferably a polytetrafluoroethylene insulator;
所述磁铁2和绝缘体4均通过位于磁铁两端的一对极靴1固定,参见图2,所述极靴1的中部向上凸起构成限位凸台7,限位凸台7抵紧绝缘体4卡槽6的槽壁,极靴1的位于限位凸台7两侧的部位开设有与磁铁2端部形状相匹配的凹槽8,磁铁2的两端分别嵌于两个极靴1位于同侧的凹槽8中,限位凸台7的根部设有台阶9,绝缘体4固定于两个极靴1的台阶9阶面和限位凸台7所限定的区域中,由于电极尺寸远小于磁铁,台阶的阶面高于凹槽的槽底,即绝缘体4的尺寸小于磁铁,在保证隔离效果的条件下尽可能缩小绝缘体体积。Both the magnet 2 and the insulator 4 are fixed by a pair of pole shoes 1 located at both ends of the magnet. Referring to FIG. On the groove wall of the clamping groove 6, the pole piece 1 is provided with a groove 8 matching the shape of the end of the magnet 2 at the position on both sides of the limit boss 7, and the two ends of the magnet 2 are embedded in the two pole pieces 1 respectively In the groove 8 on the same side, the root of the limiting boss 7 is provided with a step 9, and the insulator 4 is fixed in the area defined by the step 9 surface of the two pole pieces 1 and the limiting boss 7. Since the electrode size is far Smaller than the magnet, the step surface of the step is higher than the groove bottom of the groove, that is, the size of the insulator 4 is smaller than that of the magnet, and the volume of the insulator can be reduced as much as possible under the condition of ensuring the isolation effect.
实际使用中,先安装两侧磁铁(永磁铁或电磁铁)后,保证磁铁不会相互排斥或吸引而偏离固定位置。之后安装聚四氟乙烯绝缘体,最后安装正、负电极极板和引线,正负极极板相对的表面需要机械抛光成镜面以避免毛刺等污染物可能引起的极间尖端放电。安装时需要使磁铁、绝缘体和电极极板的接触面没有空隙,以保证三者位置比较固定来确保各自的磁场、电场分布比较均匀。在引线两端接上可调式双路直流电压源,通过调节极板间电压大小减小束流传输包络,让束流始终沿着离子束通道中轴线方向输运,起到偏转、导向小团簇束流的作用,并保证团簇离子束设备的正常运行。In actual use, after installing the magnets (permanent magnets or electromagnets) on both sides first, it is ensured that the magnets will not repel or attract each other and deviate from the fixed position. Then install the PTFE insulator, and finally install the positive and negative electrode plates and lead wires. The opposite surfaces of the positive and negative plates need to be mechanically polished to a mirror surface to avoid tip discharges between electrodes that may be caused by pollutants such as burrs. When installing, it is necessary to make the contact surfaces of the magnet, the insulator and the electrode plate have no gaps, so as to ensure that the positions of the three are relatively fixed to ensure that the respective magnetic and electric fields are distributed evenly. Connect an adjustable dual-channel DC voltage source at both ends of the lead, and reduce the beam transmission envelope by adjusting the voltage between the plates, so that the beam is always transported along the axis of the ion beam channel, and the deflection and guidance are small. The role of the cluster beam, and to ensure the normal operation of the cluster ion beam equipment.
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